SG11202103542WA - Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression - Google Patents

Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

Info

Publication number
SG11202103542WA
SG11202103542WA SG11202103542WA SG11202103542WA SG11202103542WA SG 11202103542W A SG11202103542W A SG 11202103542WA SG 11202103542W A SG11202103542W A SG 11202103542WA SG 11202103542W A SG11202103542W A SG 11202103542WA SG 11202103542W A SG11202103542W A SG 11202103542WA
Authority
SG
Singapore
Prior art keywords
hollow cathode
cathode discharge
flow apertures
apertures configured
discharge suppression
Prior art date
Application number
SG11202103542WA
Inventor
Michael John Selep
Patrick G Breiling
Karl Frederick Leeser
Timothy Scott Thomas
David William Kamp
Sean M Donnelly
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG11202103542WA publication Critical patent/SG11202103542WA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
SG11202103542WA 2018-10-10 2019-10-01 Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression SG11202103542WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/156,918 US10984987B2 (en) 2018-10-10 2018-10-10 Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression
PCT/US2019/054109 WO2020076562A1 (en) 2018-10-10 2019-10-01 Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

Publications (1)

Publication Number Publication Date
SG11202103542WA true SG11202103542WA (en) 2021-05-28

Family

ID=70160358

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202103542WA SG11202103542WA (en) 2018-10-10 2019-10-01 Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

Country Status (7)

Country Link
US (4) US10984987B2 (en)
JP (1) JP2022512675A (en)
KR (1) KR20210057836A (en)
CN (1) CN113196443A (en)
SG (1) SG11202103542WA (en)
TW (1) TW202029841A (en)
WO (1) WO2020076562A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210310122A1 (en) * 2020-04-03 2021-10-07 Applied Materials, Inc. Method of forming holes from both sides of substrate
US11854770B2 (en) * 2021-01-14 2023-12-26 Applied Materials, Inc. Plasma processing with independent temperature control

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7004107B1 (en) * 1997-12-01 2006-02-28 Applied Materials Inc. Method and apparatus for monitoring and adjusting chamber impedance
US6441554B1 (en) * 2000-11-28 2002-08-27 Se Plasma Inc. Apparatus for generating low temperature plasma at atmospheric pressure
US6793733B2 (en) * 2002-01-25 2004-09-21 Applied Materials Inc. Gas distribution showerhead
JP2005536042A (en) 2002-08-08 2005-11-24 トリコン テクノロジーズ リミティド Improved shower head
JP5150217B2 (en) * 2007-11-08 2013-02-20 東京エレクトロン株式会社 Shower plate and substrate processing apparatus
JP5039576B2 (en) 2008-01-11 2012-10-03 シャープ株式会社 Plasma processing equipment
US8409459B2 (en) * 2008-02-28 2013-04-02 Tokyo Electron Limited Hollow cathode device and method for using the device to control the uniformity of a plasma process
JP5082967B2 (en) * 2008-03-21 2012-11-28 株式会社島津製作所 Plasma electrode and plasma chemical vapor deposition apparatus
ATE551439T1 (en) * 2010-02-08 2012-04-15 Roth & Rau Ag PARALLEL PLATE REACTOR FOR EVEN THIN FILM DEPOSITION WITH REDUCED TOOL SETUP AREA
US9315899B2 (en) 2012-06-15 2016-04-19 Novellus Systems, Inc. Contoured showerhead for improved plasma shaping and control
US10526708B2 (en) * 2012-06-19 2020-01-07 Aixtron Se Methods for forming thin protective and optical layers on substrates
US9121097B2 (en) 2012-08-31 2015-09-01 Novellus Systems, Inc. Variable showerhead flow by varying internal baffle conductance
US10077497B2 (en) 2014-05-30 2018-09-18 Lam Research Corporation Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate
US10378107B2 (en) * 2015-05-22 2019-08-13 Lam Research Corporation Low volume showerhead with faceplate holes for improved flow uniformity
CN106480427A (en) * 2015-08-25 2017-03-08 沈阳拓荆科技有限公司 A kind of spray head avoiding hollow cathode discharge
US10358722B2 (en) * 2015-12-14 2019-07-23 Lam Research Corporation Showerhead assembly

Also Published As

Publication number Publication date
US20230099566A1 (en) 2023-03-30
CN113196443A (en) 2021-07-30
TW202029841A (en) 2020-08-01
US20200118795A1 (en) 2020-04-16
US11515124B2 (en) 2022-11-29
WO2020076562A1 (en) 2020-04-16
US11837443B2 (en) 2023-12-05
US20240112890A1 (en) 2024-04-04
US10984987B2 (en) 2021-04-20
JP2022512675A (en) 2022-02-07
US20210210310A1 (en) 2021-07-08
KR20210057836A (en) 2021-05-21

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