SG11202002819RA - Method of manufacturing high-defined pattern and method of manufacturing display device using the same - Google Patents
Method of manufacturing high-defined pattern and method of manufacturing display device using the sameInfo
- Publication number
- SG11202002819RA SG11202002819RA SG11202002819RA SG11202002819RA SG11202002819RA SG 11202002819R A SG11202002819R A SG 11202002819RA SG 11202002819R A SG11202002819R A SG 11202002819RA SG 11202002819R A SG11202002819R A SG 11202002819RA SG 11202002819R A SG11202002819R A SG 11202002819RA
- Authority
- SG
- Singapore
- Prior art keywords
- manufacturing
- display device
- same
- defined pattern
- manufacturing high
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D161/00—Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
- C09D161/04—Condensation polymers of aldehydes or ketones with phenols only
- C09D161/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
- G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017203846A JP2019078812A (en) | 2017-10-20 | 2017-10-20 | Method for manufacturing high definition pattern and method for manufacturing display element using the same |
PCT/EP2018/078356 WO2019076957A1 (en) | 2017-10-20 | 2018-10-17 | Method of manufacturing high-defined pattern and method of manufacturing display device using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202002819RA true SG11202002819RA (en) | 2020-05-28 |
Family
ID=63965653
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202002819RA SG11202002819RA (en) | 2017-10-20 | 2018-10-17 | Method of manufacturing high-defined pattern and method of manufacturing display device using the same |
Country Status (7)
Country | Link |
---|---|
US (1) | US20210191263A1 (en) |
JP (3) | JP2019078812A (en) |
KR (2) | KR102607855B1 (en) |
CN (1) | CN111295736A (en) |
SG (1) | SG11202002819RA (en) |
TW (1) | TWI820047B (en) |
WO (1) | WO2019076957A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022126150A (en) | 2021-02-18 | 2022-08-30 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | Resist film thickening composition and method for manufacturing thickened pattern |
CN113204181B (en) * | 2021-04-25 | 2023-09-12 | 华虹半导体(无锡)有限公司 | Lithographic method |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US204399A (en) | 1878-05-28 | Improvement in adjustable axle-nuts | ||
JP3340493B2 (en) * | 1993-02-26 | 2002-11-05 | 沖電気工業株式会社 | Pattern forming method, method for forming photomask for phase shift method |
JP3071401B2 (en) | 1996-07-05 | 2000-07-31 | 三菱電機株式会社 | Fine pattern forming material, method of manufacturing semiconductor device using the same, and semiconductor device |
JP3189773B2 (en) * | 1998-01-09 | 2001-07-16 | 三菱電機株式会社 | Method of forming resist pattern, method of manufacturing semiconductor device using the same, and semiconductor device |
JP2001093816A (en) * | 1999-09-24 | 2001-04-06 | Clariant (Japan) Kk | Method of forming resist pattern with improved dry- etching strength |
JP2001109165A (en) * | 1999-10-05 | 2001-04-20 | Clariant (Japan) Kk | Performance forming method |
JP3348715B2 (en) * | 2000-02-25 | 2002-11-20 | ティーディーケイ株式会社 | Resist pattern forming method, frame plating method, and method of manufacturing thin-film magnetic head |
JP2001312060A (en) * | 2000-05-01 | 2001-11-09 | Tokyo Ohka Kogyo Co Ltd | Positive type photoresist composition, board with photosensitive film and resist pattern forming method |
TW536734B (en) * | 2000-07-31 | 2003-06-11 | Clariant Int Ltd | Process for manufacturing a microelectronic device |
JP2003195496A (en) | 2001-12-26 | 2003-07-09 | Tokyo Ohka Kogyo Co Ltd | Positive photoresist composition for manufacture of liquid crystal display device and method for forming resist pattern |
JP3850767B2 (en) * | 2002-07-25 | 2006-11-29 | 富士通株式会社 | Resist pattern thickening material, resist pattern and manufacturing method thereof, and semiconductor device and manufacturing method thereof |
JP4053402B2 (en) * | 2002-10-23 | 2008-02-27 | 東京応化工業株式会社 | Positive photoresist composition for LCD production and method for forming resist pattern |
JP2005221515A (en) * | 2004-01-08 | 2005-08-18 | Tokyo Ohka Kogyo Co Ltd | Positive photoresist composition for production of system lcd and resist pattern forming method |
JP2007108483A (en) * | 2005-10-14 | 2007-04-26 | Sharp Corp | Resist material and resist pattern forming method |
KR20100006952A (en) * | 2008-07-11 | 2010-01-22 | 삼성전자주식회사 | Photoresist composition, method of forming a metal pattern using the same, and method of manufacturing a display substrate |
TWI476816B (en) * | 2009-06-26 | 2015-03-11 | 羅門哈斯電子材料有限公司 | Self-aligned spacer multiple patterning methods |
CN101963754B (en) * | 2009-06-26 | 2012-12-19 | 罗门哈斯电子材料有限公司 | Methods of forming electronic device |
JP6482120B2 (en) * | 2015-03-31 | 2019-03-13 | デクセリアルズ株式会社 | Master production method, optical body production method, optical member production method, and display device production method |
-
2017
- 2017-10-20 JP JP2017203846A patent/JP2019078812A/en active Pending
-
2018
- 2018-10-17 CN CN201880068097.6A patent/CN111295736A/en active Pending
- 2018-10-17 KR KR1020207014496A patent/KR102607855B1/en active IP Right Grant
- 2018-10-17 JP JP2020514669A patent/JP7280869B2/en active Active
- 2018-10-17 KR KR1020237040620A patent/KR20230167142A/en not_active Application Discontinuation
- 2018-10-17 US US16/757,435 patent/US20210191263A1/en active Pending
- 2018-10-17 SG SG11202002819RA patent/SG11202002819RA/en unknown
- 2018-10-17 WO PCT/EP2018/078356 patent/WO2019076957A1/en active Application Filing
- 2018-10-18 TW TW107136697A patent/TWI820047B/en active
-
2023
- 2023-05-11 JP JP2023078691A patent/JP2023106469A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
TW201922825A (en) | 2019-06-16 |
WO2019076957A1 (en) | 2019-04-25 |
JP7280869B2 (en) | 2023-05-24 |
US20210191263A1 (en) | 2021-06-24 |
CN111295736A (en) | 2020-06-16 |
TWI820047B (en) | 2023-11-01 |
JP2019078812A (en) | 2019-05-23 |
KR102607855B1 (en) | 2023-11-30 |
JP2020537759A (en) | 2020-12-24 |
KR20200066370A (en) | 2020-06-09 |
KR20230167142A (en) | 2023-12-07 |
JP2023106469A (en) | 2023-08-01 |
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