SG11202001752WA - Closure mechanism vacuum chamber isolation device and sub-system - Google Patents

Closure mechanism vacuum chamber isolation device and sub-system

Info

Publication number
SG11202001752WA
SG11202001752WA SG11202001752WA SG11202001752WA SG11202001752WA SG 11202001752W A SG11202001752W A SG 11202001752WA SG 11202001752W A SG11202001752W A SG 11202001752WA SG 11202001752W A SG11202001752W A SG 11202001752WA SG 11202001752W A SG11202001752W A SG 11202001752WA
Authority
SG
Singapore
Prior art keywords
sub
vacuum chamber
isolation device
closure mechanism
chamber isolation
Prior art date
Application number
SG11202001752WA
Inventor
Tuan Anh Nguyen
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11202001752WA publication Critical patent/SG11202001752WA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3288—Maintenance
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/04—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with pivoted closure members
    • F16K3/06—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with pivoted closure members in the form of closure plates arranged between supply and discharge passages
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/0218—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with only one sealing face
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F16K31/04—Actuating devices; Operating means; Releasing devices electric; magnetic using a motor
    • F16K31/041—Actuating devices; Operating means; Releasing devices electric; magnetic using a motor for rotating valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K37/00—Special means in or on valves or other cut-off apparatus for indicating or recording operation thereof, or for enabling an alarm to be given
    • F16K37/0025—Electrical or magnetic means
    • F16K37/0041—Electrical or magnetic means for measuring valve parameters
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/024—Moving components not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
SG11202001752WA 2017-09-29 2018-09-28 Closure mechanism vacuum chamber isolation device and sub-system SG11202001752WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762565900P 2017-09-29 2017-09-29
PCT/US2018/053503 WO2019067948A1 (en) 2017-09-29 2018-09-28 Closure mechanism vacuum chamber isolation device and sub-system

Publications (1)

Publication Number Publication Date
SG11202001752WA true SG11202001752WA (en) 2020-04-29

Family

ID=65902704

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202001752WA SG11202001752WA (en) 2017-09-29 2018-09-28 Closure mechanism vacuum chamber isolation device and sub-system

Country Status (6)

Country Link
US (1) US11530751B2 (en)
JP (1) JP2020536374A (en)
KR (1) KR20200051042A (en)
CN (1) CN111164730B (en)
SG (1) SG11202001752WA (en)
WO (1) WO2019067948A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11854839B2 (en) 2020-04-15 2023-12-26 Mks Instruments, Inc. Valve apparatuses and related methods for reactive process gas isolation and facilitating purge during isolation
KR102587459B1 (en) * 2021-04-16 2023-10-11 주식회사 에스와이티 Remote plasma source separation valve and plasma or process gas supply method using the same
WO2023235214A1 (en) * 2022-06-01 2023-12-07 Mks Instruments, Inc. Valve apparatuses and related methods for reactive process gas isolation and facilitating purge during isolation
KR102612086B1 (en) * 2022-09-05 2023-12-11 주식회사 셀비드 Particle free remote plasma source isolation valve

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1286954A (en) * 1915-07-06 1918-12-10 Okadee Company Valve.
US1438709A (en) * 1921-04-04 1922-12-12 Johnson John Arthur Theft-preventing device for vehicles
US1643300A (en) * 1926-09-07 1927-09-27 Egbert H Gold Train-pipe end valve
US1882600A (en) * 1929-06-03 1932-10-11 Okadee Company Blow-off valve
US3237916A (en) * 1963-10-02 1966-03-01 Grove Valve & Regulator Co Disc valve
US6089537A (en) * 1999-06-23 2000-07-18 Mks Instruments, Inc. Pendulum valve assembly
US6409149B1 (en) * 2000-06-28 2002-06-25 Mks Instruments, Inc. Dual pendulum valve assembly with valve seat cover
US20030111342A1 (en) * 2001-12-18 2003-06-19 Compuvac Systems, Inc. Sputter coating apparatus
US6800134B2 (en) * 2002-03-26 2004-10-05 Micron Technology, Inc. Chemical vapor deposition methods and atomic layer deposition methods
JP3837391B2 (en) * 2003-03-24 2006-10-25 Ｓｍｃ株式会社 Gate valve
US7637477B2 (en) * 2004-12-17 2009-12-29 Tokyo Electron Limited Gate valve apparatus of vacuum processing system
US20060278164A1 (en) * 2005-06-10 2006-12-14 Petrach Philip M Dual gate isolating maintenance slit valve chamber with pumping option
US7469715B2 (en) * 2005-07-01 2008-12-30 Applied Materials, Inc. Chamber isolation valve RF grounding
US7763147B1 (en) * 2006-05-15 2010-07-27 Lam Research Corporation Arc suppression plate for a plasma processing chamber
JP5519099B2 (en) * 2006-06-28 2014-06-11 アプライド マテリアルズ インコーポレイテッド Valve door with ball joint
TWI381470B (en) * 2007-05-08 2013-01-01 Tokyo Electron Ltd And a treatment device provided with the valve
US7699935B2 (en) * 2008-06-19 2010-04-20 Applied Materials, Inc. Method and system for supplying a cleaning gas into a process chamber
US20110180097A1 (en) * 2010-01-27 2011-07-28 Axcelis Technologies, Inc. Thermal isolation assemblies for wafer transport apparatus and methods of use thereof
US8641014B2 (en) * 2010-09-10 2014-02-04 Applied Materials, Inc. Gate valve
JP6051788B2 (en) * 2012-11-05 2016-12-27 東京エレクトロン株式会社 Plasma processing apparatus and plasma generating apparatus
US20160326648A1 (en) * 2015-05-07 2016-11-10 Applied Materials, Inc. Apparatus for selectively sealing a gas feedthrough
US20170162366A1 (en) * 2015-12-08 2017-06-08 Asm Ip Holding B.V. Film forming apparatus, recording medium, and film forming method
US10535506B2 (en) * 2016-01-13 2020-01-14 Mks Instruments, Inc. Method and apparatus for deposition cleaning in a pumping line

Also Published As

Publication number Publication date
JP2020536374A (en) 2020-12-10
CN111164730A (en) 2020-05-15
US11530751B2 (en) 2022-12-20
WO2019067948A1 (en) 2019-04-04
US20200273677A1 (en) 2020-08-27
KR20200051042A (en) 2020-05-12
CN111164730B (en) 2023-08-15

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