SG11201909052RA - Shutter device - Google Patents

Shutter device

Info

Publication number
SG11201909052RA
SG11201909052RA SG11201909052RA SG11201909052RA SG 11201909052R A SG11201909052R A SG 11201909052RA SG 11201909052R A SG11201909052R A SG 11201909052RA SG 11201909052R A SG11201909052R A SG 11201909052RA
Authority
SG
Singapore
Prior art keywords
motion
shading
module
control module
blades
Prior art date
Application number
Inventor
Yanfei Wang
Fuping Zhang
Xiang Jia
Original Assignee
Shanghai Micro Electronics Equipment Group Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Group Co Ltd filed Critical Shanghai Micro Electronics Equipment Group Co Ltd
Publication of SG11201909052RA publication Critical patent/SG11201909052RA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/58—Means for varying duration of "open" period of shutter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
    • G03B9/14—Two separate members moving in opposite directions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shutters For Cameras (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A shutter device, comprising a shading motion module (1) and a motion control module (2). The motion control module (2) controls motion of the shading motion module (1). The shading motion module (1) comprises a shading unit (30), a drive unit (40), and a signal measurement unit (20). The shading unit (30) comprises two blades (302). The motion control module (2) sends a control signal; the drive unit (40) receives the control signal and drives the two blades (302) to operate; the signal measurement unit (20) measures and feeds back the operation state of the two blades (302) in real time to the motion control module (2); the motion control module (2) updates the control signal according to the fed back operation state. Thus, the problems of low precision of the shutter exposure dose and light leakage are resolved; requirements of various exposure doses are satisfied; and the precision of the exposure dose is controlled.
SG11201909052R 2017-03-31 2017-08-09 Shutter device SG11201909052RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710210543.XA CN108663871B (en) 2017-03-31 2017-03-31 Shutter device
PCT/CN2017/096611 WO2018176719A1 (en) 2017-03-31 2017-08-09 Shutter device

Publications (1)

Publication Number Publication Date
SG11201909052RA true SG11201909052RA (en) 2019-11-28

Family

ID=63674077

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201909052R SG11201909052RA (en) 2017-03-31 2017-08-09 Shutter device

Country Status (8)

Country Link
US (1) US10928704B2 (en)
EP (1) EP3605220A4 (en)
JP (1) JP6955025B2 (en)
KR (1) KR102289586B1 (en)
CN (1) CN108663871B (en)
SG (1) SG11201909052RA (en)
TW (1) TWI640824B (en)
WO (1) WO2018176719A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108345157B (en) * 2017-01-25 2019-07-23 上海微电子装备（集团）股份有限公司 Shutter device and its control method, litho machine and its exposure dose control method
CN110010261A (en) * 2019-04-15 2019-07-12 中国原子能科学研究院 A kind of speed radiation shielding shutter

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60102737A (en) * 1983-11-10 1985-06-06 Canon Inc Shutter device
US5349414A (en) * 1992-11-16 1994-09-20 Samsung Aerospace Industries, Ind. Aperture-priority lens shutter apparatus for a camera
JPH09105979A (en) * 1995-10-13 1997-04-22 Olympus Optical Co Ltd Exposure control mechanism for camera
JPH11111612A (en) * 1997-10-03 1999-04-23 Nikon Corp Exposure apparatus
JPH11219893A (en) 1998-02-04 1999-08-10 Nikon Corp Aligner
JPH11233423A (en) * 1998-02-06 1999-08-27 Canon Inc Shutter for exposure, aligner, and manufacture of device
US6188193B1 (en) * 1998-09-02 2001-02-13 Manfred G. Michelson Light valve shutter control system with zero-light position control
JP4306910B2 (en) * 2000-02-01 2009-08-05 日本電産コパル株式会社 Focal plane shutter for digital camera
JP2001350173A (en) 2000-06-07 2001-12-21 Nidec Copal Corp Camera shutter
JP2002359173A (en) 2001-05-31 2002-12-13 Canon Inc Light source apparatus, aligner and method for manufacturing device
KR100475051B1 (en) * 2001-09-07 2005-03-10 삼성전자주식회사 Exposing system of semiconductor wafer and method for operating the same
JP2005106970A (en) * 2003-09-29 2005-04-21 Nidec Copal Corp Exposure adjustment device for camera
CN2718641Y (en) * 2004-01-10 2005-08-17 中国科学院长春光学精密机械与物理研究所 Control circuit for realizing positioning by AC servo velometer set
KR100762627B1 (en) * 2005-11-17 2007-10-01 삼성전자주식회사 Shutter driving apparatus for camera module
US7628554B2 (en) * 2006-08-22 2009-12-08 Sony Ericsson Mobile Communications Ab Camera shutter
JP5268309B2 (en) * 2006-12-26 2013-08-21 Ｔｈｋ株式会社 Rod linear actuator
JP2010107831A (en) * 2008-10-31 2010-05-13 Nsk Ltd Exposure device
CN102087476A (en) * 2009-12-08 2011-06-08 上海微电子装备有限公司 Shutter device for exposure subsystem of photoetching machine
US8333521B2 (en) * 2010-04-01 2012-12-18 Va, Inc. Shutter assembly with rotating magnet
JP5604246B2 (en) 2010-09-28 2014-10-08 日本電産コパル株式会社 Camera blade drive
JP5773629B2 (en) * 2010-12-01 2015-09-02 キヤノン株式会社 Shutter device
JP5366983B2 (en) 2011-01-21 2013-12-11 マミヤ・デジタル・イメージング株式会社 Camera shutter
JP5743190B2 (en) * 2011-02-28 2015-07-01 ニスカ株式会社 Light amount adjusting device and optical apparatus equipped with the same
JP5858655B2 (en) * 2011-06-10 2016-02-10 キヤノン株式会社 Light intensity adjustment device
CN102661725A (en) * 2012-05-31 2012-09-12 吴江迈为技术有限公司 Device of using linear grating scale for positioning angles
CN104937485B (en) 2012-11-26 2017-12-01 统雷有限公司 Bistable electro magnetic control shutter

Also Published As

Publication number Publication date
WO2018176719A1 (en) 2018-10-04
KR102289586B1 (en) 2021-08-12
KR20190132486A (en) 2019-11-27
CN108663871B (en) 2021-06-25
EP3605220A4 (en) 2021-01-20
TW201837585A (en) 2018-10-16
CN108663871A (en) 2018-10-16
TWI640824B (en) 2018-11-11
JP2020515896A (en) 2020-05-28
US20200103727A1 (en) 2020-04-02
US10928704B2 (en) 2021-02-23
JP6955025B2 (en) 2021-10-27
EP3605220A1 (en) 2020-02-05

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