SG11201907078XA - Lasers or leds based on nanowires grown on graphene type substrates - Google Patents
Lasers or leds based on nanowires grown on graphene type substratesInfo
- Publication number
- SG11201907078XA SG11201907078XA SG11201907078XA SG11201907078XA SG11201907078XA SG 11201907078X A SG11201907078X A SG 11201907078XA SG 11201907078X A SG11201907078X A SG 11201907078XA SG 11201907078X A SG11201907078X A SG 11201907078XA SG 11201907078X A SG11201907078X A SG 11201907078XA
- Authority
- SG
- Singapore
- Prior art keywords
- lasers
- leds based
- type substrates
- nanowires grown
- graphene type
- Prior art date
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title 1
- 229910021389 graphene Inorganic materials 0.000 title 1
- 239000002070 nanowire Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
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- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
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- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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GBGB1701829.2A GB201701829D0 (en) | 2017-02-03 | 2017-02-03 | Device |
PCT/EP2018/052836 WO2018141974A1 (en) | 2017-02-03 | 2018-02-05 | Lasers or leds based on nanowires grown on graphene type substrates |
Publications (1)
Publication Number | Publication Date |
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SG11201907078XA true SG11201907078XA (en) | 2019-08-27 |
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Application Number | Title | Priority Date | Filing Date |
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SG11201907078XA SG11201907078XA (en) | 2017-02-03 | 2018-02-05 | Lasers or leds based on nanowires grown on graphene type substrates |
Country Status (12)
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US (1) | US11515688B2 (en) |
EP (1) | EP3577730B1 (en) |
JP (1) | JP7229164B2 (en) |
KR (1) | KR102461045B1 (en) |
CN (1) | CN110249491B (en) |
AU (1) | AU2018215248A1 (en) |
BR (1) | BR112019015807A2 (en) |
CA (1) | CA3051303A1 (en) |
GB (1) | GB201701829D0 (en) |
SG (1) | SG11201907078XA (en) |
TW (1) | TW201841226A (en) |
WO (1) | WO2018141974A1 (en) |
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JP7188690B2 (en) * | 2018-08-22 | 2022-12-13 | セイコーエプソン株式会社 | projector |
GB201814693D0 (en) * | 2018-09-10 | 2018-10-24 | Crayonano As | Semiconductor devices |
FR3091622B1 (en) * | 2019-01-09 | 2021-09-17 | Soitec Silicon On Insulator | Optoelectronic semiconductor structure comprising a p-type injection layer based on InGaN |
US10777728B2 (en) * | 2019-01-18 | 2020-09-15 | Microsoft Technology Licensing, Llc | Fabrication of a quantum device |
US10978632B2 (en) | 2019-01-18 | 2021-04-13 | Microsoft Technology Licensing, Llc | Fabrication of a device |
CN111463659B (en) * | 2019-01-21 | 2021-08-13 | 华为技术有限公司 | Quantum dot semiconductor optical amplifier and preparation method thereof |
CN113646906A (en) * | 2019-04-09 | 2021-11-12 | 杜鹏 | Superlattice absorber for detector |
CN110530969B (en) * | 2019-08-14 | 2021-05-25 | 江苏大学 | Preparation process of graphene resonant gas sensor based on doped metal atoms |
GB201913701D0 (en) * | 2019-09-23 | 2019-11-06 | Crayonano As | Composition of matter |
WO2021076786A1 (en) * | 2019-10-15 | 2021-04-22 | The Regents Of The University Of Michigan | Nanocrystal surface-emitting lasers |
JP7392426B2 (en) * | 2019-11-28 | 2023-12-06 | セイコーエプソン株式会社 | Light emitting devices and projectors |
KR20210156624A (en) | 2020-06-18 | 2021-12-27 | 삼성전자주식회사 | Nanorod light emitting device, method of manufacturing the same, and display apparatus including the same |
JP7176700B2 (en) * | 2020-07-31 | 2022-11-22 | セイコーエプソン株式会社 | Light-emitting device and projector |
KR102458001B1 (en) * | 2020-09-24 | 2022-10-25 | 한국과학기술연구원 | Method For Forming Ion Implantation Mask and Vacancy Center Using the Same |
JP7203390B2 (en) * | 2020-10-13 | 2023-01-13 | セイコーエプソン株式会社 | Light-emitting device and projector |
CN112563882A (en) * | 2020-12-28 | 2021-03-26 | 深圳大学 | Laser based on aluminum nitride nanowire |
KR20220170662A (en) * | 2021-06-23 | 2022-12-30 | 삼성전자주식회사 | Nanorod light emitting device, method of manufacturing the same, and display apparatus including the same |
DE102021118463A1 (en) * | 2021-07-16 | 2023-01-19 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | PROCESSES FOR MANUFACTURING A VARIETY OF SURFACE EMITTING SEMICONDUCTOR LASER DIODES |
WO2023134966A1 (en) * | 2022-01-14 | 2023-07-20 | Ams-Osram International Gmbh | Method for processing an optoelectronic device and optoelectronic device |
CN116742475B (en) * | 2023-07-14 | 2024-01-23 | 江苏华兴激光科技有限公司 | Narrow linewidth vertical cavity surface emitting laser |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100584921C (en) * | 2002-09-05 | 2010-01-27 | 奈米系统股份有限公司 | Organic species that facilitate charge transfer to or from nanostructures |
US7177021B2 (en) * | 2004-09-14 | 2007-02-13 | Hewlett-Packard Development Company, L.P. | Integrated radiation sources and amplifying structures, and methods of using the same |
US7400665B2 (en) * | 2004-11-05 | 2008-07-15 | Hewlett-Packard Developement Company, L.P. | Nano-VCSEL device and fabrication thereof using nano-colonnades |
AU2007313096B2 (en) | 2006-03-10 | 2011-11-10 | Unm Rainforest Innovations | Pulsed growth of GaN nanowires and applications in group III nitride semiconductor substrate materials and devices |
US20120037886A1 (en) * | 2007-11-13 | 2012-02-16 | Epistar Corporation | Light-emitting diode device |
WO2010014032A1 (en) | 2008-07-07 | 2010-02-04 | Glo Ab | A nanostructured LED |
SE533090C2 (en) * | 2008-07-09 | 2010-06-22 | Qunano Ab | Nanostructured LED |
US8669544B2 (en) * | 2011-02-10 | 2014-03-11 | The Royal Institution For The Advancement Of Learning/Mcgill University | High efficiency broadband semiconductor nanowire devices and methods of fabricating without foreign catalysis |
US9112085B2 (en) * | 2009-11-30 | 2015-08-18 | The Royal Institution For The Advancement Of Learning/Mcgill University | High efficiency broadband semiconductor nanowire devices |
WO2011162715A1 (en) | 2010-06-24 | 2011-12-29 | Glo Ab | Substrate with buffer layer for oriented nanowire growth |
US20120141799A1 (en) * | 2010-12-03 | 2012-06-07 | Francis Kub | Film on Graphene on a Substrate and Method and Devices Therefor |
GB201021112D0 (en) | 2010-12-13 | 2011-01-26 | Ntnu Technology Transfer As | Nanowires |
JP2012222001A (en) | 2011-04-04 | 2012-11-12 | Jvc Kenwood Corp | Laser light source device and image display unit |
GB201200355D0 (en) | 2012-01-10 | 2012-02-22 | Norwegian Univ Sci & Tech Ntnu | Nanowires |
WO2013128540A1 (en) | 2012-02-27 | 2013-09-06 | 富士通株式会社 | Semiconductor laser |
GB201211038D0 (en) | 2012-06-21 | 2012-08-01 | Norwegian Univ Sci & Tech Ntnu | Solar cells |
CA2880034C (en) * | 2012-07-27 | 2021-01-05 | Thorlabs, Inc. | Tunable short cavity laser sensor |
GB201311101D0 (en) | 2013-06-21 | 2013-08-07 | Norwegian Univ Sci & Tech Ntnu | Semiconducting Films |
US9983135B2 (en) * | 2013-11-17 | 2018-05-29 | Quantum-Si Incorporated | Active-source-pixel, integrated device for rapid analysis of biological and chemical specimens |
KR20150098019A (en) * | 2014-02-19 | 2015-08-27 | 삼성전자주식회사 | Method of manufacturing a light source module and method of manufacturing a lighting apparatus |
US10347791B2 (en) | 2015-07-13 | 2019-07-09 | Crayonano As | Nanowires or nanopyramids grown on graphitic substrate |
AU2016292849B2 (en) | 2015-07-13 | 2019-05-16 | Crayonano As | Nanowires/nanopyramids shaped light emitting diodes and photodetectors |
KR20180053652A (en) | 2015-07-31 | 2018-05-23 | 크래요나노 에이에스 | Method for growing nanowires or nanopires on a graphite substrate |
US20190189840A1 (en) * | 2017-12-18 | 2019-06-20 | National Cheng Kung University | Method of transferring nanostructures and device having the nanostructures |
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