SG11201709068RA - Grinding wheel - Google Patents

Grinding wheel

Info

Publication number
SG11201709068RA
SG11201709068RA SG11201709068RA SG11201709068RA SG11201709068RA SG 11201709068R A SG11201709068R A SG 11201709068RA SG 11201709068R A SG11201709068R A SG 11201709068RA SG 11201709068R A SG11201709068R A SG 11201709068RA SG 11201709068R A SG11201709068R A SG 11201709068RA
Authority
SG
Singapore
Prior art keywords
grinding wheel
grinding
wheel
Prior art date
Application number
SG11201709068RA
Inventor
Yoshihiro Usami
Original Assignee
Shinetsu Handotai Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Handotai Kk filed Critical Shinetsu Handotai Kk
Publication of SG11201709068RA publication Critical patent/SG11201709068RA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/14Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/06Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
    • B24D7/066Grinding blocks; their mountings or supports
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/06Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002Preparing wafers
    • H01L21/02005Preparing bulk and homogeneous wafers
    • H01L21/02008Multistep processes
    • H01L21/0201Specific process step
    • H01L21/02013Grinding, lapping

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG11201709068RA 2015-05-11 2016-03-11 Grinding wheel SG11201709068RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015096632A JP6350384B2 (en) 2015-05-11 2015-05-11 Grinding wheel
PCT/JP2016/001362 WO2016181594A1 (en) 2015-05-11 2016-03-11 Grinding stone

Publications (1)

Publication Number Publication Date
SG11201709068RA true SG11201709068RA (en) 2017-12-28

Family

ID=57248906

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201709068RA SG11201709068RA (en) 2015-05-11 2016-03-11 Grinding wheel

Country Status (8)

Country Link
US (1) US10456891B2 (en)
JP (1) JP6350384B2 (en)
KR (1) KR102285111B1 (en)
CN (1) CN107530867B (en)
DE (1) DE112016001798T5 (en)
SG (1) SG11201709068RA (en)
TW (1) TWI684494B (en)
WO (1) WO2016181594A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7115850B2 (en) * 2017-12-28 2022-08-09 株式会社ディスコ Workpiece processing method and processing apparatus
CN110561272A (en) * 2019-10-23 2019-12-13 无锡市兰天金刚石有限责任公司 Superhard tool for dressing grinding wheel and preparation method thereof
JP7429203B2 (en) * 2021-03-16 2024-02-07 株式会社日立インダストリアルプロダクツ Rotating machine maintenance equipment and maintenance method
WO2022231308A1 (en) * 2021-04-27 2022-11-03 Globalwafers Co., Ltd. Double side grinding apparatus having convex polygon-shaped abrasive members

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT339169B (en) * 1975-09-25 1977-10-10 Voest Ag PROCESS FOR CLEANING AUSTENITIC MATERIAL SURFACES, IN PARTICULAR FERRITIC CONTAMINATIONS
US4947591A (en) * 1990-01-09 1990-08-14 Avonite, Inc. Dry paint stripping method
CA2090139C (en) * 1992-03-05 2006-01-24 Roger Grondin Glass material for treating hard surfaces, comprising particles of broken glass, and a process for making said particles
US5243790A (en) * 1992-06-25 1993-09-14 Abrasifs Vega, Inc. Abrasive member
US5308404A (en) * 1993-01-21 1994-05-03 Church & Dwight Co., Inc. Less aggressive blast media formed from compacted particles
US5607480A (en) * 1993-11-10 1997-03-04 Implant Innovations, Inc. Surgically implantable prosthetic devices
US5637030A (en) * 1994-02-17 1997-06-10 Minerals Research & Recovery, Inc. Abrasive formulation for waterjet cutting and method employing same
JP3683353B2 (en) 1996-01-10 2005-08-17 豊田バンモップス株式会社 Segment type grinding wheel
US5964644A (en) * 1996-03-01 1999-10-12 Extrude Hone Corporation Abrasive jet stream polishing
DE19640945A1 (en) * 1996-10-04 1998-04-16 Polygram Manufacturing & Distr Method and device for mechanically removing a foreign matter coating from a base material
US5865620A (en) * 1997-06-12 1999-02-02 Kreativ, Inc. Abrasive dental composition and method for use
JPH11156728A (en) 1997-12-02 1999-06-15 Tokyo Diamond Kogu Seisakusho:Kk Diamond grinding wheel
US20030180537A1 (en) * 1998-01-30 2003-09-25 Black Diamond Granules, Inc. Spheroidal particles and apparatus and process for producing same
WO2001039675A1 (en) * 1999-12-01 2001-06-07 Aesthetic Technologies, Inc. Skin abrasion system and method
JP4374740B2 (en) * 2000-06-19 2009-12-02 三菱マテリアル株式会社 Grinding wheel and method for manufacturing the same
JP4352588B2 (en) * 2000-06-19 2009-10-28 三菱マテリアル株式会社 Grinding wheel
US6672943B2 (en) * 2001-01-26 2004-01-06 Wafer Solutions, Inc. Eccentric abrasive wheel for wafer processing
JP2003062740A (en) * 2001-08-22 2003-03-05 Shin Etsu Handotai Co Ltd Manufacturing method for mirror-polished wafer
JP2006224201A (en) * 2005-02-15 2006-08-31 Disco Abrasive Syst Ltd Grinding wheel
US20060219825A1 (en) * 2005-04-05 2006-10-05 United Materials International High pressure fluid/particle jet mixtures utilizing metallic particles
JP4969118B2 (en) * 2006-03-15 2012-07-04 三菱重工業株式会社 Pre-treatment method for molded body, adhesive article and method for producing the same, and coated article and method for producing the same
JP4794602B2 (en) 2008-05-26 2011-10-19 株式会社ノリタケカンパニーリミテド Grinding wheel tip and grinding wheel using this grinding wheel tip
KR101220608B1 (en) * 2010-06-09 2013-01-10 주식회사 포스코 Descaling Apparatus
WO2012092590A2 (en) * 2010-12-31 2012-07-05 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
CN202123406U (en) * 2011-06-16 2012-01-25 广州晶体科技有限公司 Grinding wheel
US20130331015A1 (en) * 2012-06-11 2013-12-12 Goei Co., Ltd. Cup type grinding wheel
US20140186585A1 (en) * 2012-12-31 2014-07-03 Saint-Gobain Ceramics & Plastics, Inc. Abrasive blasting media and methods of forming and using same

Also Published As

Publication number Publication date
WO2016181594A1 (en) 2016-11-17
KR102285111B1 (en) 2021-08-04
CN107530867A (en) 2018-01-02
US10456891B2 (en) 2019-10-29
TW201639663A (en) 2016-11-16
TWI684494B (en) 2020-02-11
JP2016209963A (en) 2016-12-15
KR20180006907A (en) 2018-01-19
DE112016001798T5 (en) 2018-01-11
US20180290265A1 (en) 2018-10-11
CN107530867B (en) 2019-08-13
JP6350384B2 (en) 2018-07-04

Similar Documents

Publication Publication Date Title
EP3892476C0 (en) Wheel assembly
GB201612893D0 (en) Centreless wheel
PL3118083T3 (en) Steering wheel
GB201504959D0 (en) Cushioning wheel member
GB2525491B (en) Steering wheel
SG10201601410RA (en) Grinding wheel
GB201511618D0 (en) Wheel assembly
GB2552114B (en) Wheel recutting
GB2539032B (en) Wheel
ZA201800503B (en) Abrasive wheel
SG11201709068RA (en) Grinding wheel
GB2525931B (en) Disc wheel
SG10201600749RA (en) Abrasive grindstone
GB201416143D0 (en) Wheel
GB201521222D0 (en) Wheel connection arrangement
GB201502140D0 (en) Wheel within the wheel
PL3219439T3 (en) Grinding wheel
IL257412B (en) Wheel
PT3600771T (en) Improved abrading wheel
PL3201008T3 (en) Wheel
GB2521862B (en) Vernon wheel
TWM534066U (en) Wheel grinder
AP00968S1 (en) Wheel
PL3154745T3 (en) Grinding wheel
GB201600113D0 (en) Hydro-Gravity wheel