SG11201705969VA - Non-thermal soft plasma cleaning - Google Patents

Non-thermal soft plasma cleaning

Info

Publication number
SG11201705969VA
SG11201705969VA SG11201705969VA SG11201705969VA SG11201705969VA SG 11201705969V A SG11201705969V A SG 11201705969VA SG 11201705969V A SG11201705969V A SG 11201705969VA SG 11201705969V A SG11201705969V A SG 11201705969VA SG 11201705969V A SG11201705969V A SG 11201705969VA
Authority
SG
Singapore
Prior art keywords
plasma cleaning
soft plasma
thermal soft
thermal
cleaning
Prior art date
Application number
SG11201705969VA
Inventor
Chia Sern Chan
Original Assignee
Chia Sern Chan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chia Sern Chan filed Critical Chia Sern Chan
Publication of SG11201705969VA publication Critical patent/SG11201705969VA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/15—Ambient air; Ozonisers
SG11201705969VA 2015-01-22 2016-01-22 Non-thermal soft plasma cleaning SG11201705969VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SG10201500483V 2015-01-22
PCT/SG2016/050029 WO2016118088A1 (en) 2015-01-22 2016-01-22 Non-thermal soft plasma cleaning

Publications (1)

Publication Number Publication Date
SG11201705969VA true SG11201705969VA (en) 2017-08-30

Family

ID=56417484

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201705969VA SG11201705969VA (en) 2015-01-22 2016-01-22 Non-thermal soft plasma cleaning

Country Status (8)

Country Link
US (1) US10672592B2 (en)
JP (1) JP6832858B2 (en)
KR (1) KR102443097B1 (en)
CN (1) CN207587690U (en)
MY (1) MY182688A (en)
SG (1) SG11201705969VA (en)
TW (1) TWI726863B (en)
WO (1) WO2016118088A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3620035B1 (en) * 2017-05-01 2023-01-25 General Fusion Inc. Systems for forming a liquid liner of a cavity
US10284244B1 (en) * 2018-05-24 2019-05-07 Motorola Mobility Llc Method and apparatus for coupling one or more transceivers to a plurality of antennas
US11275106B2 (en) * 2018-10-05 2022-03-15 Celadon Systems, Inc. High voltage probe card system
US11047880B2 (en) 2019-01-16 2021-06-29 Star Technologies, Inc. Probing device
KR102054147B1 (en) * 2019-10-21 2019-12-12 주식회사 아이엠티 A test module
KR102323438B1 (en) 2020-02-25 2021-11-05 연세대학교 산학협력단 Electric field shaping apparatus and target processing device using electric field
CN114308898A (en) * 2020-09-28 2022-04-12 扬中市华龙橡塑电器有限公司 Novel high-efficient extruded sheet

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0642462B2 (en) 1988-09-07 1994-06-01 日電アネルバ株式会社 Plasma processing device
US5938854A (en) * 1993-05-28 1999-08-17 The University Of Tennessee Research Corporation Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
US6379575B1 (en) * 1997-10-21 2002-04-30 Applied Materials, Inc. Treatment of etching chambers using activated cleaning gas
US6610257B2 (en) * 1999-01-11 2003-08-26 Ronald A. Vane Low RF power electrode for plasma generation of oxygen radicals from air
US6118218A (en) 1999-02-01 2000-09-12 Sigma Technologies International, Inc. Steady-state glow-discharge plasma at atmospheric pressure
US5997705A (en) 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source
US6972071B1 (en) * 1999-07-13 2005-12-06 Nordson Corporation High-speed symmetrical plasma treatment system
US6329297B1 (en) 2000-04-21 2001-12-11 Applied Materials, Inc. Dilute remote plasma clean
US6835678B2 (en) 2000-05-04 2004-12-28 Kimberly-Clark Worldwide, Inc. Ion sensitive, water-dispersible fabrics, a method of making same and items using same
EP1170066A1 (en) * 2000-07-05 2002-01-09 Förnsel, Peter Process and apparatus for cleaning rollers and bands
US7159597B2 (en) * 2001-06-01 2007-01-09 Applied Materials, Inc. Multistep remote plasma clean process
US6843858B2 (en) * 2002-04-02 2005-01-18 Applied Materials, Inc. Method of cleaning a semiconductor processing chamber
JP4338355B2 (en) * 2002-05-10 2009-10-07 東京エレクトロン株式会社 Plasma processing equipment
US7588036B2 (en) * 2002-07-01 2009-09-15 Applied Materials, Inc. Chamber clean method using remote and in situ plasma cleaning systems
US6906280B2 (en) 2003-03-21 2005-06-14 The Regents Of The University Of California Fast pulse nonthermal plasma reactor
US6903511B2 (en) * 2003-05-06 2005-06-07 Zond, Inc. Generation of uniformly-distributed plasma
FR2863817A1 (en) 2003-12-12 2005-06-17 Air Liquide TUYERE WITH DEFLECTOR FOR PLASMA ARC TORCH
US8471171B2 (en) 2004-05-28 2013-06-25 Robert O. Price Cold air atmospheric pressure micro plasma jet application method and device
KR100603434B1 (en) * 2004-12-30 2006-07-20 (주)프로닉스 Cleaning Apparatus using plasma generating device
US7651585B2 (en) * 2005-09-26 2010-01-26 Lam Research Corporation Apparatus for the removal of an edge polymer from a substrate and methods therefor
US20070170155A1 (en) 2006-01-20 2007-07-26 Fink Steven T Method and apparatus for modifying an etch profile
US7695567B2 (en) * 2006-02-10 2010-04-13 Applied Materials, Inc. Water vapor passivation of a wall facing a plasma
US8100081B1 (en) 2006-06-30 2012-01-24 Novellus Systems, Inc. Edge removal of films using externally generated plasma species
US7754994B2 (en) 2006-12-13 2010-07-13 Atomic Energy Council Cleaning device using atmospheric gas discharge plasma
JP4700633B2 (en) * 2007-02-15 2011-06-15 株式会社新川 Wire cleaning guide
CN101284711B (en) * 2007-04-11 2011-01-26 赖中平 Portable atmospheric pressure plasma cleaner
US8440142B2 (en) * 2008-03-14 2013-05-14 Atomic Energy Council—Institute of Nuclear Energy Research Dual-mode plasma reactor
US20110000432A1 (en) * 2008-06-12 2011-01-06 Atomic Energy Council - Institute Of Nuclear Energy Research One atmospheric pressure non-thermal plasma reactor with dual discharging-electrode structure
JP5492574B2 (en) * 2010-01-08 2014-05-14 東京エレクトロン株式会社 Substrate cleaning method and substrate cleaning apparatus
AU2010349785B2 (en) * 2010-03-31 2014-02-27 Colorado State University Research Foundation Liquid-gas interface plasma device
US9255330B2 (en) * 2010-07-09 2016-02-09 Vito Nv Method and device for atmospheric pressure plasma treatment
JP2012021223A (en) * 2010-07-14 2012-02-02 Plasma Ion Assist Co Ltd Plasma treatment apparatus and surface modifying method of contact probe
JP2012174922A (en) * 2011-02-22 2012-09-10 Central Glass Co Ltd Cleaning gas and remote plasma cleaning method using the same
DE112013002561T5 (en) * 2012-05-18 2015-02-19 Rave N.P., Inc. Apparatus and method for removing contaminants
US9793098B2 (en) * 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9514953B2 (en) * 2013-11-20 2016-12-06 Applied Materials, Inc. Methods for barrier layer removal

Also Published As

Publication number Publication date
CN207587690U (en) 2018-07-06
WO2016118088A1 (en) 2016-07-28
MY182688A (en) 2021-01-29
US10672592B2 (en) 2020-06-02
KR102443097B1 (en) 2022-09-14
TW201638988A (en) 2016-11-01
KR20170106363A (en) 2017-09-20
JP6832858B2 (en) 2021-02-24
JP2018508344A (en) 2018-03-29
US20180019106A1 (en) 2018-01-18
TWI726863B (en) 2021-05-11

Similar Documents

Publication Publication Date Title
GB2538304B (en) Cleaning appliance
GB2538300B (en) Cleaning appliance
GB2538309B (en) Cleaning appliance
GB2538302B (en) Cleaning appliance
GB2538303B (en) Cleaning appliance
GB201618073D0 (en) Cleaning Appliance
GB201616272D0 (en) Cleaning appliance
GB201616273D0 (en) Cleaning appliance
GB2538299B (en) Cleaning appliance
GB2538305B (en) Cleaning appliance
GB2538308B (en) Cleaning appliance
GB201401146D0 (en) Non-thermal plasma
GB2536152B (en) Cleaning appliance
GB2538306B (en) Cleaning appliance
GB201618075D0 (en) Cleaning Appliance
GB201618076D0 (en) Cleaning appliance
GB201618246D0 (en) Cleaning appliance
GB201617819D0 (en) Cleaning appliance
GB2544777B (en) Hand held appliance
SG11201705969VA (en) Non-thermal soft plasma cleaning
GB2544778B (en) Hand held appliance
GB2544776B (en) Hand held appliance
GB201616823D0 (en) Cleaning appliance
GB2538301B (en) Cleaning appliance
GB201506410D0 (en) Cleaning apparatus