SG11201610011RA - Wafer marking method - Google Patents

Wafer marking method

Info

Publication number
SG11201610011RA
SG11201610011RA SG11201610011RA SG11201610011RA SG11201610011RA SG 11201610011R A SG11201610011R A SG 11201610011RA SG 11201610011R A SG11201610011R A SG 11201610011RA SG 11201610011R A SG11201610011R A SG 11201610011RA SG 11201610011R A SG11201610011R A SG 11201610011RA
Authority
SG
Singapore
Prior art keywords
marking method
wafer marking
wafer
marking
Prior art date
Application number
SG11201610011RA
Inventor
Chun Hoe Gu
Soo Young Kim
Sung Beom Jung
Original Assignee
Eo Technics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eo Technics Co Ltd filed Critical Eo Technics Co Ltd
Publication of SG11201610011RA publication Critical patent/SG11201610011RA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/355—Texturing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67282—Marking devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54433—Marks applied to semiconductor devices or parts containing identification or tracking information
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Laser Beam Processing (AREA)
SG11201610011RA 2014-07-03 2014-08-11 Wafer marking method SG11201610011RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140083232A KR101602782B1 (en) 2014-07-03 2014-07-03 Method for marking wafer
PCT/KR2014/007448 WO2016003005A1 (en) 2014-07-03 2014-08-11 Wafer marking method

Publications (1)

Publication Number Publication Date
SG11201610011RA true SG11201610011RA (en) 2016-12-29

Family

ID=55019517

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201610011RA SG11201610011RA (en) 2014-07-03 2014-08-11 Wafer marking method

Country Status (7)

Country Link
US (1) US10304778B2 (en)
KR (1) KR101602782B1 (en)
CN (1) CN106463497B (en)
MY (1) MY190094A (en)
SG (1) SG11201610011RA (en)
TW (1) TWI607545B (en)
WO (1) WO2016003005A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107256898B (en) * 2017-05-18 2018-08-03 广东爱旭科技股份有限公司 Tubular type PERC double-sided solar batteries and preparation method thereof and special equipment
CN107256894B (en) * 2017-05-18 2018-08-10 广东爱旭科技股份有限公司 Tubular type PERC single side solar cells and preparation method thereof and special equipment
TWI759044B (en) * 2020-12-30 2022-03-21 環球晶圓股份有限公司 Laser engraving method of silicon carbide wafer

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10305420A (en) * 1997-03-04 1998-11-17 Ngk Insulators Ltd Method for fabricating matrix made up of oxide single crystal and method for manufacturing functional device
KR20010073299A (en) 2000-01-13 2001-08-01 성규동 Apparatus For Marking The Wafer
GB2386184B (en) * 2000-07-12 2004-05-26 Electro Scient Ind Inc UV laser system and method for single pulse severing of IC fuses
US6720522B2 (en) * 2000-10-26 2004-04-13 Kabushiki Kaisha Toshiba Apparatus and method for laser beam machining, and method for manufacturing semiconductor devices using laser beam machining
JP2005294636A (en) 2004-04-01 2005-10-20 Hitachi Constr Mach Co Ltd Wafer chipping method, chip, laser marking method, and laser marking apparatus
US8410410B2 (en) * 2006-07-12 2013-04-02 Nordson Corporation Ultraviolet lamp system with cooling air control
KR101040439B1 (en) 2006-10-24 2011-06-09 주식회사 엘지화학 Dicing die adhesive film and method of packaging semi-conductor using the same
JP2008178886A (en) * 2007-01-23 2008-08-07 Disco Abrasive Syst Ltd Marking method of product information
KR100897755B1 (en) 2007-10-31 2009-05-15 주식회사 동부하이텍 Wafer Marking Method
US9446840B2 (en) * 2008-07-01 2016-09-20 The Boeing Company Systems and methods for alleviating aircraft loads with plasma actuators
KR101012332B1 (en) * 2008-07-18 2011-02-08 주식회사 티이피 Semiconductor wafer dicing system
JP5231136B2 (en) * 2008-08-22 2013-07-10 株式会社ディスコ Processing method of optical device wafer
JP5805367B2 (en) 2009-01-30 2015-11-04 日東電工株式会社 Dicing tape integrated wafer back surface protection film
CN101533771A (en) 2009-03-03 2009-09-16 浙江水晶光电科技股份有限公司 A laser marking method on wafer surface
JP5885325B2 (en) * 2009-05-29 2016-03-15 日東電工株式会社 Dicing tape integrated semiconductor backside film
JP5501938B2 (en) 2009-12-24 2014-05-28 日東電工株式会社 Flip chip type film for semiconductor backside
JP5249290B2 (en) 2010-07-20 2013-07-31 日東電工株式会社 Flip chip type semiconductor back film, dicing tape integrated semiconductor back film, semiconductor device manufacturing method, and flip chip type semiconductor device
US9287175B2 (en) * 2010-11-05 2016-03-15 Win Semiconductors Corp. Fabrication method for dicing of semiconductor wafers using laser cutting techniques
TWI484655B (en) * 2011-01-31 2015-05-11 Inventec Solar Energy Corp Method for scribing and reading id on solar cell
JP2012183549A (en) 2011-03-04 2012-09-27 Mitsubishi Electric Corp METHOD OF MARKING SiC SEMICONDUCTOR WAFER AND SiC SEMICONDUCTOR WAFER
WO2012133077A1 (en) * 2011-03-25 2012-10-04 株式会社村田製作所 Multilayer ceramic capacitor, dielectric ceramic, multilayer ceramic electronic component, and method for manufacturing multilayer ceramic capacitor
CN103165542A (en) 2011-12-15 2013-06-19 北京大学深圳研究生院 Chip back coating in flip chip package
KR101299236B1 (en) * 2011-12-28 2013-08-22 주식회사 이오테크닉스 Apparatus and method of cutting tape supporting wafer
JP2013149737A (en) 2012-01-18 2013-08-01 Nitto Denko Corp Flip-chip semiconductor device manufacturing method
KR102108102B1 (en) * 2012-12-10 2020-05-11 닛토덴코 가부시키가이샤 Dicing tape integrated adhesive sheet, manufacturing method of semiconductor device using dicing tape integrated adhesive sheet, and semiconductor device
US20150037915A1 (en) * 2013-07-31 2015-02-05 Wei-Sheng Lei Method and system for laser focus plane determination in a laser scribing process

Also Published As

Publication number Publication date
TWI607545B (en) 2017-12-01
KR20160004640A (en) 2016-01-13
US20170200680A1 (en) 2017-07-13
MY190094A (en) 2022-03-26
CN106463497B (en) 2019-10-22
KR101602782B1 (en) 2016-03-11
TW201601865A (en) 2016-01-16
US10304778B2 (en) 2019-05-28
CN106463497A (en) 2017-02-22
WO2016003005A1 (en) 2016-01-07

Similar Documents

Publication Publication Date Title
IL249981A0 (en) Method
GB201406151D0 (en) Method
GB201409558D0 (en) Method
GB201406155D0 (en) Method
GB201408119D0 (en) Method
GB201414496D0 (en) Method
SG10202008300RA (en) Method
GB201403470D0 (en) Method
GB201410022D0 (en) Method
GB201411500D0 (en) Method
GB201410101D0 (en) Method
SG11201610011RA (en) Wafer marking method
SG11201610032VA (en) Marking method for wafer dice
GB201416675D0 (en) Method
GB201412802D0 (en) Method
GB201409128D0 (en) Method
GB201412736D0 (en) Method
GB201412226D0 (en) Method
GB201409234D0 (en) Method
GB201409101D0 (en) Method
GB201616383D0 (en) Method
GB201414181D0 (en) Method
GB201413929D0 (en) Method
GB201413612D0 (en) Method
GB201408649D0 (en) Method