SG11201608670PA - Photolithography apparatus comprising projection system for control of image size - Google Patents
Photolithography apparatus comprising projection system for control of image sizeInfo
- Publication number
- SG11201608670PA SG11201608670PA SG11201608670PA SG11201608670PA SG11201608670PA SG 11201608670P A SG11201608670P A SG 11201608670PA SG 11201608670P A SG11201608670P A SG 11201608670PA SG 11201608670P A SG11201608670P A SG 11201608670PA SG 11201608670P A SG11201608670P A SG 11201608670PA
- Authority
- SG
- Singapore
- Prior art keywords
- control
- projection system
- image size
- photolithography apparatus
- photolithography
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B15/00—Optical objectives with means for varying the magnification
- G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP14165611 | 2014-04-23 | ||
| PCT/EP2015/058641 WO2015162147A1 (en) | 2014-04-23 | 2015-04-22 | Photolithography apparatus comprising projection system for control of image size |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201608670PA true SG11201608670PA (en) | 2016-11-29 |
Family
ID=50542861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201608670PA SG11201608670PA (en) | 2014-04-23 | 2015-04-22 | Photolithography apparatus comprising projection system for control of image size |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US9939734B2 (en) |
| EP (1) | EP3134772B1 (en) |
| JP (1) | JP6626495B2 (en) |
| KR (1) | KR20160141861A (en) |
| CN (1) | CN106462077B (en) |
| PT (1) | PT3134772T (en) |
| SG (1) | SG11201608670PA (en) |
| TW (1) | TWI657316B (en) |
| WO (1) | WO2015162147A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021228725A1 (en) * | 2020-05-09 | 2021-11-18 | Asml Netherlands B.V. | Determining metrics for a portion of a pattern on a substrate |
| CN117647880B (en) * | 2024-01-29 | 2024-04-05 | 长春长光智欧科技有限公司 | Immersion type high numerical aperture wide spectrum micro objective optical system |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5117255A (en) * | 1990-09-19 | 1992-05-26 | Nikon Corporation | Projection exposure apparatus |
| US5610754A (en) | 1994-08-09 | 1997-03-11 | Gheen; Gregory | Method and apparatus for photolithography by rotational scanning |
| US6312859B1 (en) * | 1996-06-20 | 2001-11-06 | Nikon Corporation | Projection exposure method with corrections for image displacement |
| JP2001117213A (en) * | 1999-08-10 | 2001-04-27 | Nikon Corp | Photomask, method for manufacturing the photomask, projection aligner handling the photomask and projection alignment method |
| KR20030051624A (en) * | 2000-11-22 | 2003-06-25 | 가부시키가이샤 니콘 | Aligner, aligning method and method for fabricating device |
| CN101135864A (en) * | 2000-12-28 | 2008-03-05 | 株式会社尼康 | Exposure method and apparatus and device manufacturing method |
| JP2003068622A (en) * | 2001-08-28 | 2003-03-07 | Canon Inc | Aligner, control method thereof, and method of manufacturing device |
| JP4191923B2 (en) * | 2001-11-02 | 2008-12-03 | 株式会社東芝 | Exposure method and exposure apparatus |
| US20050243295A1 (en) | 2004-04-30 | 2005-11-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing |
-
2015
- 2015-04-22 EP EP15716849.3A patent/EP3134772B1/en active Active
- 2015-04-22 WO PCT/EP2015/058641 patent/WO2015162147A1/en active Application Filing
- 2015-04-22 PT PT157168493T patent/PT3134772T/en unknown
- 2015-04-22 KR KR1020167032628A patent/KR20160141861A/en unknown
- 2015-04-22 TW TW104112889A patent/TWI657316B/en active
- 2015-04-22 US US15/305,164 patent/US9939734B2/en active Active
- 2015-04-22 JP JP2017507075A patent/JP6626495B2/en active Active
- 2015-04-22 SG SG11201608670PA patent/SG11201608670PA/en unknown
- 2015-04-22 CN CN201580019559.1A patent/CN106462077B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| PT3134772T (en) | 2018-04-13 |
| KR20160141861A (en) | 2016-12-09 |
| CN106462077A (en) | 2017-02-22 |
| JP6626495B2 (en) | 2019-12-25 |
| EP3134772B1 (en) | 2018-03-14 |
| CN106462077B (en) | 2019-01-25 |
| US9939734B2 (en) | 2018-04-10 |
| EP3134772A1 (en) | 2017-03-01 |
| TW201602733A (en) | 2016-01-16 |
| TWI657316B (en) | 2019-04-21 |
| US20170123329A1 (en) | 2017-05-04 |
| JP2017514184A (en) | 2017-06-01 |
| WO2015162147A1 (en) | 2015-10-29 |
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