SG11201508564QA - Cleaning liquid composition - Google Patents

Cleaning liquid composition

Info

Publication number
SG11201508564QA
SG11201508564QA SG11201508564QA SG11201508564QA SG11201508564QA SG 11201508564Q A SG11201508564Q A SG 11201508564QA SG 11201508564Q A SG11201508564Q A SG 11201508564QA SG 11201508564Q A SG11201508564Q A SG 11201508564QA SG 11201508564Q A SG11201508564Q A SG 11201508564QA
Authority
SG
Singapore
Prior art keywords
cleaning liquid
liquid composition
composition
cleaning
liquid
Prior art date
Application number
SG11201508564QA
Inventor
Kikue Morita
Chiyoko Horike
Keisuke Fukaya
Takuo Ohwada
Original Assignee
Kanto Kagaku
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=51731300&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SG11201508564Q(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Kanto Kagaku filed Critical Kanto Kagaku
Publication of SG11201508564QA publication Critical patent/SG11201508564QA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/28—Heterocyclic compounds containing nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
    • C11D17/08—Liquid soap, e.g. for dispensers; capsuled
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/36—Organic compounds containing phosphorus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
    • H01L21/02074—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a planarization of conductive layers
    • C11D2111/22—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
SG11201508564QA 2013-04-19 2014-04-07 Cleaning liquid composition SG11201508564QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013088637A JP6203525B2 (en) 2013-04-19 2013-04-19 Cleaning liquid composition
PCT/JP2014/060060 WO2014171355A1 (en) 2013-04-19 2014-04-07 Cleaning liquid composition

Publications (1)

Publication Number Publication Date
SG11201508564QA true SG11201508564QA (en) 2015-11-27

Family

ID=51731300

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201508564QA SG11201508564QA (en) 2013-04-19 2014-04-07 Cleaning liquid composition

Country Status (8)

Country Link
US (2) US20160083675A1 (en)
EP (1) EP2988321B1 (en)
JP (1) JP6203525B2 (en)
KR (1) KR102226023B1 (en)
CN (1) CN105122429B (en)
SG (1) SG11201508564QA (en)
TW (1) TWI624541B (en)
WO (1) WO2014171355A1 (en)

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KR102058426B1 (en) * 2015-01-05 2019-12-24 엔테그리스, 아이엔씨. Formulation and method of use after chemical mechanical polishing
JP6991711B2 (en) * 2016-12-27 2022-01-12 関東化学株式会社 Cleaning liquid composition
CN110447090A (en) * 2017-03-22 2019-11-12 三菱化学株式会社 The cleaning solution of semiconductor device substrate, the cleaning method of semiconductor device substrate, the manufacturing method of semiconductor device substrate and semiconductor device substrate
CN111033697B (en) * 2017-08-31 2023-10-10 富士胶片株式会社 Treatment liquid, kit, and method for cleaning substrate
EP3824059A4 (en) * 2018-07-20 2022-04-27 Entegris, Inc. Cleaning composition with corrosion inhibitor
SG11202012288PA (en) 2018-08-24 2021-01-28 Kioxia Corp Semiconductor device and method of manufacturing same
JP7220040B2 (en) 2018-09-20 2023-02-09 関東化学株式会社 cleaning liquid composition
KR20210144694A (en) * 2019-03-27 2021-11-30 에이지씨 가부시키가이샤 Manufacturing method of gallium oxide substrate and polishing slurry for gallium oxide substrate
WO2021054009A1 (en) * 2019-09-18 2021-03-25 富士フイルムエレクトロニクスマテリアルズ株式会社 Cleaning method
JP2022154513A (en) * 2021-03-30 2022-10-13 株式会社フジミインコーポレーテッド Semiconductor substrate manufacturing method, and semiconductor substrate obtained by the sane

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Also Published As

Publication number Publication date
TW201506152A (en) 2015-02-16
EP2988321B1 (en) 2019-03-20
WO2014171355A1 (en) 2014-10-23
JP6203525B2 (en) 2017-09-27
CN105122429B (en) 2019-11-26
KR20150144780A (en) 2015-12-28
CN105122429A (en) 2015-12-02
KR102226023B1 (en) 2021-03-09
TWI624541B (en) 2018-05-21
JP2014212262A (en) 2014-11-13
EP2988321A1 (en) 2016-02-24
US20160083675A1 (en) 2016-03-24
US20210163856A1 (en) 2021-06-03
EP2988321A4 (en) 2016-11-02

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