SG11201505371UA - Hdd patterning using flowable cvd film - Google Patents

Hdd patterning using flowable cvd film

Info

Publication number
SG11201505371UA
SG11201505371UA SG11201505371UA SG11201505371UA SG11201505371UA SG 11201505371U A SG11201505371U A SG 11201505371UA SG 11201505371U A SG11201505371U A SG 11201505371UA SG 11201505371U A SG11201505371U A SG 11201505371UA SG 11201505371U A SG11201505371U A SG 11201505371UA
Authority
SG
Singapore
Prior art keywords
hdd
patterning
cvd film
flowable cvd
flowable
Prior art date
Application number
SG11201505371UA
Inventor
Brian Saxton Underwood
Abhijit Basu Mallick
Nitin Ingle
Roman Gouk
Steven Verhaverbeke
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11201505371UA publication Critical patent/SG11201505371UA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/85—Coating a support with a magnetic layer by vapour deposition
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
SG11201505371UA 2013-02-19 2014-02-11 Hdd patterning using flowable cvd film SG11201505371UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361766197P 2013-02-19 2013-02-19
PCT/US2014/015877 WO2014130304A1 (en) 2013-02-19 2014-02-11 Hdd patterning using flowable cvd film

Publications (1)

Publication Number Publication Date
SG11201505371UA true SG11201505371UA (en) 2015-09-29

Family

ID=51350405

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201505371UA SG11201505371UA (en) 2013-02-19 2014-02-11 Hdd patterning using flowable cvd film

Country Status (5)

Country Link
US (1) US8986557B2 (en)
CN (1) CN104995333B (en)
MY (1) MY171887A (en)
SG (1) SG11201505371UA (en)
WO (1) WO2014130304A1 (en)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9404178B2 (en) * 2011-07-15 2016-08-02 Applied Materials, Inc. Surface treatment and deposition for reduced outgassing
US20140175051A1 (en) * 2012-12-21 2014-06-26 Michael Feldbaum Method of magnetic meida manufacturing
US20160079034A1 (en) * 2014-09-12 2016-03-17 Applied Materials Inc. Flowable film properties tuning using implantation
US9355922B2 (en) 2014-10-14 2016-05-31 Applied Materials, Inc. Systems and methods for internal surface conditioning in plasma processing equipment
US9966240B2 (en) 2014-10-14 2018-05-08 Applied Materials, Inc. Systems and methods for internal surface conditioning assessment in plasma processing equipment
US9896326B2 (en) 2014-12-22 2018-02-20 Applied Materials, Inc. FCVD line bending resolution by deposition modulation
US9777378B2 (en) 2015-01-07 2017-10-03 Applied Materials, Inc. Advanced process flow for high quality FCVD films
GB201514501D0 (en) * 2015-08-14 2015-09-30 Semblant Ltd Electroless plating method
TWI615504B (en) * 2016-09-13 2018-02-21 Zhang yu shun Plasma generating device for remote plasma enhanced chemical vapor deposition system
US10224224B2 (en) 2017-03-10 2019-03-05 Micromaterials, LLC High pressure wafer processing systems and related methods
US10847360B2 (en) 2017-05-25 2020-11-24 Applied Materials, Inc. High pressure treatment of silicon nitride film
US10622214B2 (en) 2017-05-25 2020-04-14 Applied Materials, Inc. Tungsten defluorination by high pressure treatment
WO2018222771A1 (en) 2017-06-02 2018-12-06 Applied Materials, Inc. Dry stripping of boron carbide hardmask
US10269571B2 (en) 2017-07-12 2019-04-23 Applied Materials, Inc. Methods for fabricating nanowire for semiconductor applications
US10234630B2 (en) 2017-07-12 2019-03-19 Applied Materials, Inc. Method for creating a high refractive index wave guide
US10179941B1 (en) 2017-07-14 2019-01-15 Applied Materials, Inc. Gas delivery system for high pressure processing chamber
US10096516B1 (en) 2017-08-18 2018-10-09 Applied Materials, Inc. Method of forming a barrier layer for through via applications
US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
JP6947914B2 (en) 2017-08-18 2021-10-13 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Annealing chamber under high pressure and high temperature
JP7274461B2 (en) 2017-09-12 2023-05-16 アプライド マテリアルズ インコーポレイテッド Apparatus and method for manufacturing semiconductor structures using protective barrier layers
US10643867B2 (en) 2017-11-03 2020-05-05 Applied Materials, Inc. Annealing system and method
EP3707746B1 (en) 2017-11-11 2023-12-27 Micromaterials LLC Gas delivery system for high pressure processing chamber
WO2019099125A1 (en) 2017-11-16 2019-05-23 Applied Materials, Inc. High pressure steam anneal processing apparatus
JP2021503714A (en) 2017-11-17 2021-02-12 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Capacitor system for high pressure processing system
CN111699549A (en) 2018-01-24 2020-09-22 应用材料公司 Seam closure using high pressure annealing
KR20230079236A (en) 2018-03-09 2023-06-05 어플라이드 머티어리얼스, 인코포레이티드 High pressure annealing process for metal containing materials
US10714331B2 (en) 2018-04-04 2020-07-14 Applied Materials, Inc. Method to fabricate thermally stable low K-FinFET spacer
US10950429B2 (en) 2018-05-08 2021-03-16 Applied Materials, Inc. Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom
US10566188B2 (en) 2018-05-17 2020-02-18 Applied Materials, Inc. Method to improve film stability
US10704141B2 (en) 2018-06-01 2020-07-07 Applied Materials, Inc. In-situ CVD and ALD coating of chamber to control metal contamination
US10748783B2 (en) 2018-07-25 2020-08-18 Applied Materials, Inc. Gas delivery module
US10675581B2 (en) 2018-08-06 2020-06-09 Applied Materials, Inc. Gas abatement apparatus
JP7179172B6 (en) 2018-10-30 2022-12-16 アプライド マテリアルズ インコーポレイテッド Method for etching structures for semiconductor applications
SG11202103763QA (en) 2018-11-16 2021-05-28 Applied Materials Inc Film deposition using enhanced diffusion process
WO2020117462A1 (en) 2018-12-07 2020-06-11 Applied Materials, Inc. Semiconductor processing system
US11901222B2 (en) 2020-02-17 2024-02-13 Applied Materials, Inc. Multi-step process for flowable gap-fill film

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8022416B2 (en) * 2005-10-19 2011-09-20 General Electric Company Functional blocks for assembly
US7498273B2 (en) 2006-05-30 2009-03-03 Applied Materials, Inc. Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes
JP4703608B2 (en) * 2007-06-28 2011-06-15 株式会社東芝 Discrete track medium manufacturing method
US7745352B2 (en) 2007-08-27 2010-06-29 Applied Materials, Inc. Curing methods for silicon dioxide thin films deposited from alkoxysilane precursor with harp II process
US7943531B2 (en) 2007-10-22 2011-05-17 Applied Materials, Inc. Methods for forming a silicon oxide layer over a substrate
JP2010061708A (en) * 2008-09-01 2010-03-18 Showa Denko Kk Method of manufacturing magnetic recording medium, and magnetic recording/reproducing apparatus
US8329587B2 (en) * 2009-10-05 2012-12-11 Applied Materials, Inc. Post-planarization densification
TWI612700B (en) * 2010-07-28 2018-01-21 應用材料股份有限公司 Resist fortification for magnetic media patterning
US9284649B2 (en) * 2011-06-30 2016-03-15 Seagate Technology Llc Method of patterning a stack
WO2013077952A1 (en) * 2011-11-23 2013-05-30 Applied Materials, Inc. Apparatus and methods for silicon oxide cvd photoresist planarization

Also Published As

Publication number Publication date
US20140231384A1 (en) 2014-08-21
WO2014130304A1 (en) 2014-08-28
CN104995333A (en) 2015-10-21
US8986557B2 (en) 2015-03-24
CN104995333B (en) 2017-09-22
MY171887A (en) 2019-11-06

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