SG11201405925QA - GASEOUS OZONE (O<sb>3</sb>) TREATMENT FOR SOLAR CELL FABRICATION - Google Patents

GASEOUS OZONE (O<sb>3</sb>) TREATMENT FOR SOLAR CELL FABRICATION

Info

Publication number
SG11201405925QA
SG11201405925QA SG11201405925QA SG11201405925QA SG11201405925QA SG 11201405925Q A SG11201405925Q A SG 11201405925QA SG 11201405925Q A SG11201405925Q A SG 11201405925QA SG 11201405925Q A SG11201405925Q A SG 11201405925QA SG 11201405925Q A SG11201405925Q A SG 11201405925QA
Authority
SG
Singapore
Prior art keywords
treatment
solar cell
cell fabrication
gaseous ozone
ozone
Prior art date
Application number
SG11201405925QA
Inventor
Scott Harrington
Original Assignee
Sunpower Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sunpower Corp filed Critical Sunpower Corp
Publication of SG11201405925QA publication Critical patent/SG11201405925QA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0236Special surface textures
    • H01L31/02363Special surface textures of the semiconductor body itself, e.g. textured active layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • H01L31/0682Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells back-junction, i.e. rearside emitter, solar cells, e.g. interdigitated base-emitter regions back-junction cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876Particular processes or apparatus for batch treatment of the devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Photovoltaic Devices (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning In General (AREA)
SG11201405925QA 2012-03-23 2012-12-17 GASEOUS OZONE (O<sb>3</sb>) TREATMENT FOR SOLAR CELL FABRICATION SG11201405925QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/429,134 US20130247967A1 (en) 2012-03-23 2012-03-23 Gaseous ozone (o3) treatment for solar cell fabrication
PCT/US2012/070179 WO2013141913A1 (en) 2012-03-23 2012-12-17 Gaseous ozone (o3) treatment for solar cell fabrication

Publications (1)

Publication Number Publication Date
SG11201405925QA true SG11201405925QA (en) 2014-10-30

Family

ID=49210625

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201405925QA SG11201405925QA (en) 2012-03-23 2012-12-17 GASEOUS OZONE (O<sb>3</sb>) TREATMENT FOR SOLAR CELL FABRICATION

Country Status (11)

Country Link
US (1) US20130247967A1 (en)
EP (1) EP2850663A4 (en)
JP (1) JP6220853B2 (en)
KR (1) KR20140139004A (en)
CN (1) CN104205354B (en)
MX (1) MX2014011370A (en)
MY (1) MY171360A (en)
PH (1) PH12014502089A1 (en)
SG (1) SG11201405925QA (en)
TW (1) TWI578558B (en)
WO (1) WO2013141913A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9837259B2 (en) 2014-08-29 2017-12-05 Sunpower Corporation Sequential etching treatment for solar cell fabrication
CN107170846A (en) * 2017-06-02 2017-09-15 嘉兴尚能光伏材料科技有限公司 The surface matte preparation method of monocrystaline silicon solar cell
CN114664972B (en) * 2020-12-23 2024-04-16 比亚迪股份有限公司 Polishing method of silicon wafer, preparation method of solar cell and solar cell
CN115148832A (en) * 2022-07-14 2022-10-04 上饶捷泰新能源科技有限公司 N-TOPCon battery and manufacturing method thereof

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8987039B2 (en) * 2007-10-12 2015-03-24 Air Products And Chemicals, Inc. Antireflective coatings for photovoltaic applications
JP4986054B2 (en) * 2007-11-13 2012-07-25 株式会社明電舎 Oxide film forming method and apparatus
DE102008014166B3 (en) * 2008-03-14 2009-11-26 Rena Gmbh Process for producing a silicon surface with a pyramidal texture
KR20100125448A (en) * 2008-03-25 2010-11-30 어플라이드 머티어리얼스, 인코포레이티드 Surface cleaning texturing process for crystalline solar cells
US8048754B2 (en) * 2008-09-29 2011-11-01 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing SOI substrate and method for manufacturing single crystal semiconductor layer
TW201027768A (en) * 2008-10-29 2010-07-16 Ulvac Inc Manufacturing method of solar battery, etching device and CVD device
US8329046B2 (en) * 2009-02-05 2012-12-11 Asia Union Electronic Chemical Corporation Methods for damage etch and texturing of silicon single crystal substrates
JP2012521075A (en) * 2009-03-17 2012-09-10 ロート ウント ラウ アーゲー Substrate processing apparatus and substrate processing method
JP5537101B2 (en) * 2009-09-10 2014-07-02 株式会社カネカ Crystalline silicon solar cell
MY166305A (en) * 2009-12-09 2018-06-25 Solexel Inc High-efficiency photovoltaic back-contact solar cell structures and manufacturing methods using thin planar semiconductor absorbers
JP2011205058A (en) * 2009-12-17 2011-10-13 Rohm & Haas Electronic Materials Llc Improved method of texturing semiconductor substrate
US8759231B2 (en) * 2009-12-29 2014-06-24 Intermolecular, Inc. Silicon texture formulations with diol additives and methods of using the formulations
FR2955707B1 (en) * 2010-01-27 2012-03-23 Commissariat Energie Atomique METHOD FOR PRODUCING A PHOTOVOLTAIC CELL WITH SURFACE PREPARATION OF A CRYSTALLINE SILICON SUBSTRATE
TWM382585U (en) * 2010-02-02 2010-06-11 Castec Internat Corp Solar cell manufacturing equipment
US8790957B2 (en) * 2010-03-04 2014-07-29 Sunpower Corporation Method of fabricating a back-contact solar cell and device thereof
US20130130508A1 (en) * 2011-09-02 2013-05-23 Air Products And Chemicals, Inc. Compositions and Methods for Texturing of Silicon Wafers

Also Published As

Publication number Publication date
US20130247967A1 (en) 2013-09-26
PH12014502089B1 (en) 2014-11-24
EP2850663A4 (en) 2015-04-15
EP2850663A1 (en) 2015-03-25
KR20140139004A (en) 2014-12-04
TW201340362A (en) 2013-10-01
MX2014011370A (en) 2015-06-05
PH12014502089A1 (en) 2014-11-24
CN104205354B (en) 2016-12-21
MY171360A (en) 2019-10-10
CN104205354A (en) 2014-12-10
WO2013141913A1 (en) 2013-09-26
TWI578558B (en) 2017-04-11
JP2015514313A (en) 2015-05-18
JP6220853B2 (en) 2017-10-25

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