SG11201404493YA - Methods and apparatus for synchronising rf pulses in a plasma processing system - Google Patents

Methods and apparatus for synchronising rf pulses in a plasma processing system

Info

Publication number
SG11201404493YA
SG11201404493YA SG11201404493YA SG11201404493YA SG11201404493YA SG 11201404493Y A SG11201404493Y A SG 11201404493YA SG 11201404493Y A SG11201404493Y A SG 11201404493YA SG 11201404493Y A SG11201404493Y A SG 11201404493YA SG 11201404493Y A SG11201404493Y A SG 11201404493YA
Authority
SG
Singapore
Prior art keywords
synchronising
pulses
methods
processing system
plasma processing
Prior art date
Application number
SG11201404493YA
Inventor
John Valcore
Harmeet Singh
Bradford J Lyndaker
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG11201404493YA publication Critical patent/SG11201404493YA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
SG11201404493YA 2012-02-22 2013-02-07 Methods and apparatus for synchronising rf pulses in a plasma processing system SG11201404493YA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261602041P 2012-02-22 2012-02-22
US13/550,719 US9368329B2 (en) 2012-02-22 2012-07-17 Methods and apparatus for synchronizing RF pulses in a plasma processing system
PCT/IB2013/051010 WO2013124756A1 (en) 2012-02-22 2013-02-07 Methods and apparatus for synchronising rf pulses in a plasma processing system

Publications (1)

Publication Number Publication Date
SG11201404493YA true SG11201404493YA (en) 2014-10-30

Family

ID=48981797

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201404493YA SG11201404493YA (en) 2012-02-22 2013-02-07 Methods and apparatus for synchronising rf pulses in a plasma processing system

Country Status (6)

Country Link
US (2) US9368329B2 (en)
KR (1) KR20140125879A (en)
CN (1) CN104160789B (en)
SG (1) SG11201404493YA (en)
TW (2) TWI593320B (en)
WO (1) WO2013124756A1 (en)

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US20160268100A1 (en) 2016-09-15
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US9368329B2 (en) 2016-06-14
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US20130214828A1 (en) 2013-08-22

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