SG110084A1 - Radiation sensitive composition for color filters - Google Patents

Radiation sensitive composition for color filters

Info

Publication number
SG110084A1
SG110084A1 SG200401068A SG200401068A SG110084A1 SG 110084 A1 SG110084 A1 SG 110084A1 SG 200401068 A SG200401068 A SG 200401068A SG 200401068 A SG200401068 A SG 200401068A SG 110084 A1 SG110084 A1 SG 110084A1
Authority
SG
Singapore
Prior art keywords
color filters
radiation sensitive
sensitive composition
composition
radiation
Prior art date
Application number
SG200401068A
Inventor
Kamii Hideyuki
Suzuki Yoshinobu
Niwa Kazuaki
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG110084A1 publication Critical patent/SG110084A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/287—Interference filters comprising deposited thin solid films comprising at least one layer of organic material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Graft Or Block Polymers (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
SG200401068A 2003-03-06 2004-03-04 Radiation sensitive composition for color filters SG110084A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003060240 2003-03-06
JP2004006246A JP4561101B2 (en) 2003-03-06 2004-01-14 Radiation sensitive composition for color filter and color filter

Publications (1)

Publication Number Publication Date
SG110084A1 true SG110084A1 (en) 2005-04-28

Family

ID=33302151

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200401068A SG110084A1 (en) 2003-03-06 2004-03-04 Radiation sensitive composition for color filters

Country Status (5)

Country Link
JP (1) JP4561101B2 (en)
KR (1) KR20040079322A (en)
CN (1) CN1532566B (en)
SG (1) SG110084A1 (en)
TW (1) TWI358554B (en)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4923496B2 (en) * 2005-02-18 2012-04-25 Ｊｓｒ株式会社 Radiation sensitive resin composition for color filter and color filter
JP4918759B2 (en) * 2005-07-08 2012-04-18 東ソー株式会社 Optical film
JP5270814B2 (en) * 2005-08-11 2013-08-21 東京応化工業株式会社 Colorant dispersion for photosensitive composition
JP4826187B2 (en) * 2005-09-26 2011-11-30 大日本印刷株式会社 Manufacturing method of color filter
KR101313538B1 (en) * 2006-04-06 2013-10-01 주식회사 동진쎄미켐 Negative photosensitive resin composition
JP5178081B2 (en) * 2007-01-15 2013-04-10 富士フイルム株式会社 Curable composition for forming color filter, color filter using the same, method for producing the same, and solid-state imaging device
US8778575B2 (en) 2007-01-15 2014-07-15 Fujifilm Corporation Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element
JP4947294B2 (en) * 2007-02-23 2012-06-06 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP4983310B2 (en) * 2007-02-28 2012-07-25 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP4910792B2 (en) * 2007-03-12 2012-04-04 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display device
WO2008149662A1 (en) * 2007-06-01 2008-12-11 Fujifilm Corporation Curable composition for color filter, method for producing curable composition for color filter, colored curable resin composition, method for forming colored pattern, colored pattern, method for producing color filter, color filter, and liquid crystal display device
JP5144971B2 (en) * 2007-06-14 2013-02-13 株式会社Ｄｎｐファインケミカル Photosensitive resin composition
US9442372B2 (en) 2007-09-26 2016-09-13 Fujifilm Corporation Pigment dispersion composition, photocurable composition and color filter
JP5121522B2 (en) * 2008-03-24 2013-01-16 富士フイルム株式会社 Colored curable composition, color filter, and liquid crystal display device
JP5109716B2 (en) * 2008-02-28 2012-12-26 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
KR101671249B1 (en) 2008-03-17 2016-11-01 후지필름 가부시키가이샤 Colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element
JP5047057B2 (en) * 2008-05-20 2012-10-10 東洋インキＳｃホールディングス株式会社 Photosensitive coloring composition for color filter and color filter
TWI459131B (en) * 2008-05-20 2014-11-01 Toyo Ink Mfg Co Photosensitive coloring composition for color filter and color filter
JP5124341B2 (en) * 2008-05-20 2013-01-23 東洋インキＳｃホールディングス株式会社 Photosensitive coloring composition for color filter and color filter
JP5542316B2 (en) * 2008-09-17 2014-07-09 富士フイルム株式会社 Pigment dispersion composition, colored photosensitive composition, color filter, liquid crystal display device, and solid-state imaging device
KR101659382B1 (en) 2009-02-16 2016-09-23 후지필름 가부시키가이샤 Pigment dispersion composition, colored curable composition, color filter, liquid crystal display device and solid-state image sensor
JP5340198B2 (en) * 2009-02-26 2013-11-13 富士フイルム株式会社 Dispersion composition
JP5701576B2 (en) 2009-11-20 2015-04-15 富士フイルム株式会社 Dispersion composition, photosensitive resin composition, and solid-state imaging device
WO2012153826A1 (en) * 2011-05-06 2012-11-15 Fujifilm Corporation Dispersion composition, curable composition, composition, transparent film, microlens, solid-state image sensing device, method for manufacturing transparent film, method for manufacturing microlens and method for manufacturing solid-state image sensing device
JP5898887B2 (en) * 2011-05-18 2016-04-06 富士フイルム株式会社 Composition, and transparent film, microlens, solid-state imaging device, method for manufacturing transparent film, method for manufacturing microlens, and method for manufacturing solid-state imaging device using the same
WO2013108716A1 (en) * 2012-01-19 2013-07-25 日産化学工業株式会社 Negative photosensitive resin composition
KR101999803B1 (en) 2012-11-02 2019-07-12 롬엔드하스전자재료코리아유한회사 Photosensitive resin composition and spacer prepared therefrom
US11034922B2 (en) 2016-06-07 2021-06-15 The Yokohama Rubber Co., Ltd. Cleaning agent composition

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3842507A1 (en) * 1987-12-18 1989-06-29 Fuji Photo Film Co Ltd Process for the production of a multicolour pattern for colour filters
EP0359934A1 (en) * 1988-07-25 1990-03-28 Matsushita Electric Industrial Co., Ltd. Color filter
US5362603A (en) * 1991-05-17 1994-11-08 Nippon Kayaku Kabushiki Kaisha Photopolymerizable composition for color filter and color filter prepared therefrom
US5498498A (en) * 1992-07-29 1996-03-12 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition used in a method for forming a light-shielding film

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3824285B2 (en) * 1997-03-14 2006-09-20 富士写真フイルム株式会社 Radiation-sensitive coloring composition
JP3867177B2 (en) * 1997-04-30 2007-01-10 Ｊｓｒ株式会社 Radiation sensitive composition for color filter
JP3829412B2 (en) * 1997-05-28 2006-10-04 Ｊｓｒ株式会社 Radiation sensitive composition for color filter
US6140019A (en) 1997-07-24 2000-10-31 Jsr Corporation Radiation sensitive composition
JP2003064138A (en) * 2001-08-28 2003-03-05 Mitsubishi Chemicals Corp Curing resin composition, color filter, method for producing the color filter and liquid crystal display

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3842507A1 (en) * 1987-12-18 1989-06-29 Fuji Photo Film Co Ltd Process for the production of a multicolour pattern for colour filters
EP0359934A1 (en) * 1988-07-25 1990-03-28 Matsushita Electric Industrial Co., Ltd. Color filter
US5362603A (en) * 1991-05-17 1994-11-08 Nippon Kayaku Kabushiki Kaisha Photopolymerizable composition for color filter and color filter prepared therefrom
US5498498A (en) * 1992-07-29 1996-03-12 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition used in a method for forming a light-shielding film

Also Published As

Publication number Publication date
CN1532566A (en) 2004-09-29
KR20040079322A (en) 2004-09-14
JP4561101B2 (en) 2010-10-13
TWI358554B (en) 2012-02-21
CN1532566B (en) 2010-05-12
TW200426404A (en) 2004-12-01
JP2004287409A (en) 2004-10-14

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