SG109614A1 - Lithography apparatus for manufacture of integrated circuits - Google Patents
Lithography apparatus for manufacture of integrated circuitsInfo
- Publication number
- SG109614A1 SG109614A1 SG200405091A SG200405091A SG109614A1 SG 109614 A1 SG109614 A1 SG 109614A1 SG 200405091 A SG200405091 A SG 200405091A SG 200405091 A SG200405091 A SG 200405091A SG 109614 A1 SG109614 A1 SG 109614A1
- Authority
- SG
- Singapore
- Prior art keywords
- manufacture
- integrated circuits
- lithography apparatus
- lithography
- circuits
- Prior art date
Links
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US49415403P | 2003-08-11 | 2003-08-11 | |
US10/826,602 US7579135B2 (en) | 2003-08-11 | 2004-04-16 | Lithography apparatus for manufacture of integrated circuits |
Publications (1)
Publication Number | Publication Date |
---|---|
SG109614A1 true SG109614A1 (en) | 2005-03-30 |
Family
ID=34594562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200405091A SG109614A1 (en) | 2003-08-11 | 2004-08-10 | Lithography apparatus for manufacture of integrated circuits |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN1624588B (en) |
SG (1) | SG109614A1 (en) |
TW (1) | TWI244683B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1996145B (en) * | 2005-12-31 | 2010-08-25 | 上海集成电路研发中心有限公司 | Method for reducing water pollution of optical elements in immersion type photoengraving technology |
CN114527627B (en) * | 2022-03-09 | 2023-10-10 | 中国科学院宁波材料技术与工程研究所 | Photoetching method for preparing organic semiconductor micro-device without photoresist and micro-device |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57153433A (en) * | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
US5121256A (en) * | 1991-03-14 | 1992-06-09 | The Board Of Trustees Of The Leland Stanford Junior University | Lithography system employing a solid immersion lens |
JP2753930B2 (en) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | Immersion type projection exposure equipment |
US5900354A (en) * | 1997-07-03 | 1999-05-04 | Batchelder; John Samuel | Method for optical inspection and lithography |
-
2004
- 2004-08-10 TW TW93123894A patent/TWI244683B/en active
- 2004-08-10 SG SG200405091A patent/SG109614A1/en unknown
- 2004-08-11 CN CN 200410058067 patent/CN1624588B/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
TWI244683B (en) | 2005-12-01 |
CN1624588A (en) | 2005-06-08 |
CN1624588B (en) | 2011-11-02 |
TW200515479A (en) | 2005-05-01 |
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