SG109614A1 - Lithography apparatus for manufacture of integrated circuits - Google Patents

Lithography apparatus for manufacture of integrated circuits

Info

Publication number
SG109614A1
SG109614A1 SG200405091A SG200405091A SG109614A1 SG 109614 A1 SG109614 A1 SG 109614A1 SG 200405091 A SG200405091 A SG 200405091A SG 200405091 A SG200405091 A SG 200405091A SG 109614 A1 SG109614 A1 SG 109614A1
Authority
SG
Singapore
Prior art keywords
manufacture
integrated circuits
lithography apparatus
lithography
circuits
Prior art date
Application number
SG200405091A
Inventor
Yee-Chia Yeo
Chenming Hu
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/826,602 external-priority patent/US7579135B2/en
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Publication of SG109614A1 publication Critical patent/SG109614A1/en

Links

SG200405091A 2003-08-11 2004-08-10 Lithography apparatus for manufacture of integrated circuits SG109614A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49415403P 2003-08-11 2003-08-11
US10/826,602 US7579135B2 (en) 2003-08-11 2004-04-16 Lithography apparatus for manufacture of integrated circuits

Publications (1)

Publication Number Publication Date
SG109614A1 true SG109614A1 (en) 2005-03-30

Family

ID=34594562

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200405091A SG109614A1 (en) 2003-08-11 2004-08-10 Lithography apparatus for manufacture of integrated circuits

Country Status (3)

Country Link
CN (1) CN1624588B (en)
SG (1) SG109614A1 (en)
TW (1) TWI244683B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1996145B (en) * 2005-12-31 2010-08-25 上海集成电路研发中心有限公司 Method for reducing water pollution of optical elements in immersion type photoengraving technology
CN114527627B (en) * 2022-03-09 2023-10-10 中国科学院宁波材料技术与工程研究所 Photoetching method for preparing organic semiconductor micro-device without photoresist and micro-device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57153433A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacturing device for semiconductor
US5121256A (en) * 1991-03-14 1992-06-09 The Board Of Trustees Of The Leland Stanford Junior University Lithography system employing a solid immersion lens
JP2753930B2 (en) * 1992-11-27 1998-05-20 キヤノン株式会社 Immersion type projection exposure equipment
US5900354A (en) * 1997-07-03 1999-05-04 Batchelder; John Samuel Method for optical inspection and lithography

Also Published As

Publication number Publication date
TWI244683B (en) 2005-12-01
CN1624588A (en) 2005-06-08
CN1624588B (en) 2011-11-02
TW200515479A (en) 2005-05-01

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