SG108825A1 - Ion source having replaceable and sputterable solid source material - Google Patents

Ion source having replaceable and sputterable solid source material

Info

Publication number
SG108825A1
SG108825A1 SG200104693A SG200104693A SG108825A1 SG 108825 A1 SG108825 A1 SG 108825A1 SG 200104693 A SG200104693 A SG 200104693A SG 200104693 A SG200104693 A SG 200104693A SG 108825 A1 SG108825 A1 SG 108825A1
Authority
SG
Singapore
Prior art keywords
sputterable
replaceable
solid
source
ion source
Prior art date
Application number
SG200104693A
Inventor
Neil Horsky Thomas
Dale Hollingsworth Tommy
Original Assignee
Axcelis Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/633,322 external-priority patent/US6583544B1/en
Application filed by Axcelis Tech Inc filed Critical Axcelis Tech Inc
Publication of SG108825A1 publication Critical patent/SG108825A1/en

Links

SG200104693A 2000-08-07 2001-08-03 Ion source having replaceable and sputterable solid source material SG108825A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63332400A 2000-08-07 2000-08-07
US09/633,322 US6583544B1 (en) 2000-08-07 2000-08-07 Ion source having replaceable and sputterable solid source material

Publications (1)

Publication Number Publication Date
SG108825A1 true SG108825A1 (en) 2005-02-28

Family

ID=33479356

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200104694A SG106057A1 (en) 2000-08-07 2001-08-03 Magnet for generating a magnetic field in an ion source
SG200104693A SG108825A1 (en) 2000-08-07 2001-08-03 Ion source having replaceable and sputterable solid source material

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200104694A SG106057A1 (en) 2000-08-07 2001-08-03 Magnet for generating a magnetic field in an ion source

Country Status (1)

Country Link
SG (2) SG106057A1 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4016421A (en) * 1975-02-13 1977-04-05 E. I. Du Pont De Nemours And Company Analytical apparatus with variable energy ion beam source
US4166952A (en) * 1978-02-24 1979-09-04 E. I. Du Pont De Nemours And Company Method and apparatus for the elemental analysis of solids
US5497006A (en) * 1994-11-15 1996-03-05 Eaton Corporation Ion generating source for use in an ion implanter
US5703372A (en) * 1996-10-30 1997-12-30 Eaton Corporation Endcap for indirectly heated cathode of ion source
JPH10188833A (en) * 1996-12-26 1998-07-21 Toshiba Corp Ion generation device and ion irradiation device
US5852345A (en) * 1996-11-01 1998-12-22 Implant Sciences Corp. Ion source generator auxiliary device for phosphorus and arsenic beams
US5886355A (en) * 1991-05-14 1999-03-23 Applied Materials, Inc. Ion implantation apparatus having increased source lifetime

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62271334A (en) * 1986-05-16 1987-11-25 Mitsubishi Electric Corp Ion source for ion implantation device
JP2838738B2 (en) * 1991-10-11 1998-12-16 株式会社日本製鋼所 Electron cyclotron resonance ion source
JP2860073B2 (en) * 1995-11-06 1999-02-24 株式会社日立製作所 Negative ion source device
JP4667553B2 (en) * 1999-12-01 2011-04-13 株式会社Ｓｅｎ Ion source

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4016421A (en) * 1975-02-13 1977-04-05 E. I. Du Pont De Nemours And Company Analytical apparatus with variable energy ion beam source
US4166952A (en) * 1978-02-24 1979-09-04 E. I. Du Pont De Nemours And Company Method and apparatus for the elemental analysis of solids
US5886355A (en) * 1991-05-14 1999-03-23 Applied Materials, Inc. Ion implantation apparatus having increased source lifetime
US5497006A (en) * 1994-11-15 1996-03-05 Eaton Corporation Ion generating source for use in an ion implanter
US5703372A (en) * 1996-10-30 1997-12-30 Eaton Corporation Endcap for indirectly heated cathode of ion source
US5852345A (en) * 1996-11-01 1998-12-22 Implant Sciences Corp. Ion source generator auxiliary device for phosphorus and arsenic beams
JPH10188833A (en) * 1996-12-26 1998-07-21 Toshiba Corp Ion generation device and ion irradiation device

Also Published As

Publication number Publication date
SG106057A1 (en) 2004-09-30

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