SG103932A1 - Vortex phase shift mask for optical lithography - Google Patents

Vortex phase shift mask for optical lithography

Info

Publication number
SG103932A1
SG103932A1 SG200304003A SG200304003A SG103932A1 SG 103932 A1 SG103932 A1 SG 103932A1 SG 200304003 A SG200304003 A SG 200304003A SG 200304003 A SG200304003 A SG 200304003A SG 103932 A1 SG103932 A1 SG 103932A1
Authority
SG
Singapore
Prior art keywords
phase shift
shift mask
optical lithography
vortex phase
vortex
Prior art date
Application number
SG200304003A
Other languages
English (en)
Inventor
David Levenson Marc
Original Assignee
David Levenson Marc
Dainippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by David Levenson Marc, Dainippon Printing Co Ltd filed Critical David Levenson Marc
Publication of SG103932A1 publication Critical patent/SG103932A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/28—Phase shift masks [PSM]; PSM blanks; Preparation thereof with three or more diverse phases on the same PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG200304003A 2002-07-01 2003-06-30 Vortex phase shift mask for optical lithography SG103932A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/186,587 US6811933B2 (en) 2002-07-01 2002-07-01 Vortex phase shift mask for optical lithography

Publications (1)

Publication Number Publication Date
SG103932A1 true SG103932A1 (en) 2004-05-26

Family

ID=29735249

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200304003A SG103932A1 (en) 2002-07-01 2003-06-30 Vortex phase shift mask for optical lithography

Country Status (7)

Country Link
US (1) US6811933B2 (ko)
KR (1) KR101055246B1 (ko)
CN (1) CN1294454C (ko)
DE (1) DE10329384A1 (ko)
IT (1) ITTO20030494A1 (ko)
SG (1) SG103932A1 (ko)
TW (1) TWI336425B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7096452B2 (en) * 2003-06-24 2006-08-22 Micron Technology, Inc. Method and device for checking lithography data
US8057963B2 (en) * 2004-06-10 2011-11-15 Lsi Corporation Maskless vortex phase shift optical direct write lithography
TW200807187A (en) * 2006-07-21 2008-02-01 Promos Technologies Inc Vortex mask and method for preparing the same and method for preparing a circular pattern using the same
US9101126B2 (en) * 2010-01-11 2015-08-11 Jager Pro, Llc Remote control gate release for trap enclosure
JP5838622B2 (ja) * 2011-07-05 2016-01-06 大日本印刷株式会社 露光装置および露光方法
CN104865790A (zh) * 2015-05-13 2015-08-26 中国科学院光电技术研究所 一种制备连续面形螺旋相位板的方法
JP7199669B2 (ja) * 2017-11-16 2023-01-06 国立大学法人長岡技術科学大学 光発生装置、光発生装置を備える露光装置、露光システム、光発生方法、及び露光フォトレジスト製造方法
WO2021049867A1 (ko) * 2019-09-10 2021-03-18 한국기초과학지원연구원 반사 방식의 나선형 위상 플레이트 및 이를 포함하는 라게르-가우시안 빔 생성 장치
TWI749874B (zh) 2020-11-17 2021-12-11 力晶積成電子製造股份有限公司 相移遮罩及半導體元件的製作方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6139994A (en) * 1999-06-25 2000-10-31 Broeke; Doug Van Den Use of intersecting subresolution features for microlithography
TW463232B (en) * 1999-11-15 2001-11-11 United Microelectronics Corp Method to form two different patterns by using the same mask

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970007822B1 (ko) * 1993-11-15 1997-05-17 현대전자산업 주식회사 반도체 장치의 제조 방법
KR950027933A (ko) * 1994-03-21 1995-10-18 김주용 위상반전 마스크
KR100399444B1 (ko) * 1995-06-30 2004-04-29 주식회사 하이닉스반도체 에지강조형위상반전마스크및그제조방법
US5914202A (en) * 1996-06-10 1999-06-22 Sharp Microeletronics Technology, Inc. Method for forming a multi-level reticle
JP3119217B2 (ja) * 1997-10-31 2000-12-18 日本電気株式会社 フォトマスクおよびフォトマスクを使用した露光方法
US6246477B1 (en) 1998-04-22 2001-06-12 Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College High resolution scanning microscope
US6344298B1 (en) * 1999-08-26 2002-02-05 Sabeus Photonics, Inc. Circumferentially varying mask and fabrication of fiber gratings using a mask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6139994A (en) * 1999-06-25 2000-10-31 Broeke; Doug Van Den Use of intersecting subresolution features for microlithography
TW463232B (en) * 1999-11-15 2001-11-11 United Microelectronics Corp Method to form two different patterns by using the same mask

Also Published As

Publication number Publication date
ITTO20030494A1 (it) 2004-01-02
US20040002010A1 (en) 2004-01-01
DE10329384A1 (de) 2004-01-15
CN1470942A (zh) 2004-01-28
TWI336425B (en) 2011-01-21
KR101055246B1 (ko) 2011-08-08
CN1294454C (zh) 2007-01-10
KR20040026109A (ko) 2004-03-27
TW200402609A (en) 2004-02-16
US6811933B2 (en) 2004-11-02

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