SG103822A1 - Method of silicon oxide and siicon glass films deposition - Google Patents

Method of silicon oxide and siicon glass films deposition

Info

Publication number
SG103822A1
SG103822A1 SG200004460A SG200004460A SG103822A1 SG 103822 A1 SG103822 A1 SG 103822A1 SG 200004460 A SG200004460 A SG 200004460A SG 200004460 A SG200004460 A SG 200004460A SG 103822 A1 SG103822 A1 SG 103822A1
Authority
SG
Singapore
Prior art keywords
siicon
silicon oxide
glass films
films deposition
deposition
Prior art date
Application number
SG200004460A
Inventor
Y Vassiliev Vladislav
Leonard Sudijono John
Original Assignee
Chartered Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/458,729 external-priority patent/US6583069B1/en
Application filed by Chartered Semiconductor Mfg filed Critical Chartered Semiconductor Mfg
Publication of SG103822A1 publication Critical patent/SG103822A1/en

Links

SG200004460A 1999-12-13 2000-08-15 Method of silicon oxide and siicon glass films deposition SG103822A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/458,729 US6583069B1 (en) 1999-12-13 1999-12-13 Method of silicon oxide and silicon glass films deposition

Publications (1)

Publication Number Publication Date
SG103822A1 true SG103822A1 (en) 2004-05-26

Family

ID=33452168

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200004460A SG103822A1 (en) 1999-12-13 2000-08-15 Method of silicon oxide and siicon glass films deposition

Country Status (1)

Country Link
SG (1) SG103822A1 (en)

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