SG10202011390UA - Top ring for holding a substrate and substrate processing apparatus - Google Patents

Top ring for holding a substrate and substrate processing apparatus

Info

Publication number
SG10202011390UA
SG10202011390UA SG10202011390UA SG10202011390UA SG10202011390UA SG 10202011390U A SG10202011390U A SG 10202011390UA SG 10202011390U A SG10202011390U A SG 10202011390UA SG 10202011390U A SG10202011390U A SG 10202011390UA SG 10202011390U A SG10202011390U A SG 10202011390UA
Authority
SG
Singapore
Prior art keywords
substrate
holding
processing apparatus
top ring
substrate processing
Prior art date
Application number
SG10202011390UA
Inventor
Ishii Yu
Satori Hirotaka
Kashiwagi Makoto
FURUSAWA Manato
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2019208865A external-priority patent/JP7328874B2/en
Priority claimed from JP2020167306A external-priority patent/JP2022059509A/en
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of SG10202011390UA publication Critical patent/SG10202011390UA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B24B37/32—Retaining rings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG10202011390UA 2019-11-19 2020-11-16 Top ring for holding a substrate and substrate processing apparatus SG10202011390UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019208865A JP7328874B2 (en) 2019-11-19 2019-11-19 Top ring for holding the substrate and substrate handling equipment
JP2020167306A JP2022059509A (en) 2020-10-01 2020-10-01 Top ring and substrate treatment apparatus

Publications (1)

Publication Number Publication Date
SG10202011390UA true SG10202011390UA (en) 2021-06-29

Family

ID=74141246

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202011390UA SG10202011390UA (en) 2019-11-19 2020-11-16 Top ring for holding a substrate and substrate processing apparatus

Country Status (6)

Country Link
US (1) US11701750B2 (en)
EP (1) EP3825061A3 (en)
KR (1) KR20210061273A (en)
CN (1) CN112894612B (en)
SG (1) SG10202011390UA (en)
TW (1) TW202133246A (en)

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0911115B1 (en) * 1992-09-24 2003-11-26 Ebara Corporation Polishing apparatus
USRE38878E1 (en) * 1992-09-24 2005-11-15 Ebara Corporation Polishing apparatus
US5398459A (en) * 1992-11-27 1995-03-21 Kabushiki Kaisha Toshiba Method and apparatus for polishing a workpiece
JP2757112B2 (en) 1993-10-27 1998-05-25 信越半導体株式会社 Wafer polishing equipment
JPH07241764A (en) 1994-03-04 1995-09-19 Fujitsu Ltd Polishing device and polishing method
JPH08229809A (en) 1995-03-01 1996-09-10 Hitachi Ltd Substrate holder for polishing device, and polishing method thereof
JP3668529B2 (en) 1995-07-26 2005-07-06 ソニー株式会社 Vacuum chuck device for polishing flaky members
TW371635B (en) 1996-10-10 1999-10-11 Applied Materials Inc Carrier head with a layer conformable material for a chemical mechanical polishing system
JPH10217112A (en) * 1997-02-06 1998-08-18 Speedfam Co Ltd Cmp device
JP2940611B2 (en) 1997-05-28 1999-08-25 株式会社東京精密 Wafer polishing machine with retainer ring
DE69813374T2 (en) 1997-05-28 2003-10-23 Tokyo Seimitsu Co Ltd Semiconductor wafer polishing device with holder ring
US6116992A (en) * 1997-12-30 2000-09-12 Applied Materials, Inc. Substrate retaining ring
US6276998B1 (en) * 1999-02-25 2001-08-21 Applied Materials, Inc. Padless substrate carrier
US6645050B1 (en) * 1999-02-25 2003-11-11 Applied Materials, Inc. Multimode substrate carrier
SG90746A1 (en) * 1999-10-15 2002-08-20 Ebara Corp Apparatus and method for polishing workpiece
JP2001319905A (en) * 2000-05-11 2001-11-16 Meiji Kikai Kk Vacuum chuck
US7101273B2 (en) * 2000-07-25 2006-09-05 Applied Materials, Inc. Carrier head with gimbal mechanism
JP3856634B2 (en) * 2000-09-14 2006-12-13 株式会社荏原製作所 Substrate holding device and polishing apparatus provided with the substrate holding device
US6676497B1 (en) * 2000-09-08 2004-01-13 Applied Materials Inc. Vibration damping in a chemical mechanical polishing system
US6848980B2 (en) * 2001-10-10 2005-02-01 Applied Materials, Inc. Vibration damping in a carrier head
US7255637B2 (en) * 2000-09-08 2007-08-14 Applied Materials, Inc. Carrier head vibration damping
US7497767B2 (en) * 2000-09-08 2009-03-03 Applied Materials, Inc. Vibration damping during chemical mechanical polishing
US6755723B1 (en) * 2000-09-29 2004-06-29 Lam Research Corporation Polishing head assembly
JP2002187060A (en) * 2000-10-11 2002-07-02 Ebara Corp Substrate holding device, polishing device and grinding method
JP3294600B1 (en) 2001-02-28 2002-06-24 不二越機械工業株式会社 Wafer polishing equipment
JP4515047B2 (en) * 2003-06-06 2010-07-28 株式会社荏原製作所 Elastic film, substrate holding apparatus, polishing apparatus, and polishing method
TWI393209B (en) * 2003-02-10 2013-04-11 Ebara Corp A method of polishing a substrate
JP2008296334A (en) 2007-05-31 2008-12-11 Toshiba Corp Vacuum suction chuck and grinding machine using the same
JP2009050943A (en) * 2007-08-24 2009-03-12 Applied Materials Inc Retainer ring, carrier head and chemical mechanical polishing apparatus
JP5493919B2 (en) 2010-01-29 2014-05-14 富士電機株式会社 Chuck table device and semiconductor device manufacturing method using the same
US8591286B2 (en) * 2010-08-11 2013-11-26 Applied Materials, Inc. Apparatus and method for temperature control during polishing
JP5847435B2 (en) * 2011-05-19 2016-01-20 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 Polishing head and polishing apparatus
JP2014176950A (en) 2013-02-12 2014-09-25 Ebara Corp Polishing device and polishing pad bonding method
JP6556066B2 (en) * 2016-02-09 2019-08-07 株式会社ディスコ Cutting equipment
JP6360586B1 (en) * 2017-04-13 2018-07-18 三菱電線工業株式会社 Elastic film for wafer holding of CMP apparatus
JP7177320B2 (en) 2018-06-05 2022-11-24 株式会社バルコス bag
JP7118025B2 (en) 2019-03-29 2022-08-15 東京エレクトロン株式会社 Deposition method

Also Published As

Publication number Publication date
CN112894612A (en) 2021-06-04
US20210170543A1 (en) 2021-06-10
EP3825061A3 (en) 2021-10-06
TW202133246A (en) 2021-09-01
KR20210061273A (en) 2021-05-27
CN112894612B (en) 2024-06-04
US20230249313A9 (en) 2023-08-10
EP3825061A2 (en) 2021-05-26
US11701750B2 (en) 2023-07-18

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