SG10202009129SA - Mark position determination method, lithography method, method of manufacturing article, program, and lithography apparatus - Google Patents
Mark position determination method, lithography method, method of manufacturing article, program, and lithography apparatusInfo
- Publication number
- SG10202009129SA SG10202009129SA SG10202009129SA SG10202009129SA SG10202009129SA SG 10202009129S A SG10202009129S A SG 10202009129SA SG 10202009129S A SG10202009129S A SG 10202009129SA SG 10202009129S A SG10202009129S A SG 10202009129SA SG 10202009129S A SG10202009129S A SG 10202009129SA
- Authority
- SG
- Singapore
- Prior art keywords
- lithography
- program
- position determination
- mark position
- manufacturing article
- Prior art date
Links
- 238000001459 lithography Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 2
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/001—Industrial image inspection using an image reference approach
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7019—Calibration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
-
- G06T3/18—
-
- G06T5/80—
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/70—Determining position or orientation of objects or cameras
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/10—Image acquisition modality
- G06T2207/10056—Microscopic image
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30204—Marker
- G06T2207/30208—Marker matrix
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019170807A JP7339826B2 (en) | 2019-09-19 | 2019-09-19 | Mark positioning method, lithographic method, article manufacturing method, program and lithographic apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10202009129SA true SG10202009129SA (en) | 2021-04-29 |
Family
ID=74876275
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202009129SA SG10202009129SA (en) | 2019-09-19 | 2020-09-17 | Mark position determination method, lithography method, method of manufacturing article, program, and lithography apparatus |
Country Status (6)
Country | Link |
---|---|
US (1) | US20210090231A1 (en) |
JP (1) | JP7339826B2 (en) |
KR (1) | KR20210033907A (en) |
CN (1) | CN112526835A (en) |
SG (1) | SG10202009129SA (en) |
TW (1) | TWI810484B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102541500B1 (en) * | 2022-11-14 | 2023-06-13 | (주)오로스테크놀로지 | System for centering position of overlay key based on correlation and method thereof |
KR102560241B1 (en) * | 2022-11-14 | 2023-07-28 | (주)오로스테크놀로지 | System for centering position of overlay key based on deep learning and method thereof |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11176751A (en) * | 1997-10-09 | 1999-07-02 | Canon Inc | Exposure method |
JPH11307424A (en) * | 1998-04-22 | 1999-11-05 | Hitachi Ltd | Method and device for manufacturing semiconductor and semiconductor device manufactured by the device |
SG108975A1 (en) * | 2003-07-11 | 2005-02-28 | Asml Netherlands Bv | Marker structure for alignment or overlay to correct pattern induced displacement, mask pattern for defining such a marker structure and lithographic projection apparatus using such a mask pattern |
JP2006030021A (en) | 2004-07-16 | 2006-02-02 | Nikon Corp | Position detection apparatus and position detection method |
JP2007017763A (en) | 2005-07-08 | 2007-01-25 | Fujifilm Holdings Corp | Image position measuring device and exposure device |
JP2011018864A (en) | 2009-07-10 | 2011-01-27 | Nikon Corp | Position detection device, substrate superimposing device, and position detecting method |
KR101885385B1 (en) | 2010-02-26 | 2018-08-03 | 마이크로닉 아베 | Method and apparatus for performing pattern alignment |
JP5523207B2 (en) * | 2010-06-01 | 2014-06-18 | 株式会社トプコン | Exposure equipment |
JP5209012B2 (en) | 2010-09-22 | 2013-06-12 | 株式会社東芝 | Alignment measurement method and alignment measurement apparatus |
JP6401501B2 (en) * | 2014-06-02 | 2018-10-10 | キヤノン株式会社 | Imprint apparatus and article manufacturing method |
JP6728236B2 (en) * | 2015-12-25 | 2020-07-22 | オリンパス株式会社 | Optical scanning endoscope and method of operating optical scanning endoscope |
JP6945316B2 (en) * | 2017-03-24 | 2021-10-06 | キヤノン株式会社 | Detection device, pattern forming device, acquisition method, detection method, and article manufacturing method |
-
2019
- 2019-09-19 JP JP2019170807A patent/JP7339826B2/en active Active
-
2020
- 2020-09-11 KR KR1020200116561A patent/KR20210033907A/en unknown
- 2020-09-15 US US17/021,520 patent/US20210090231A1/en active Pending
- 2020-09-17 TW TW109132033A patent/TWI810484B/en active
- 2020-09-17 SG SG10202009129SA patent/SG10202009129SA/en unknown
- 2020-09-18 CN CN202010986241.3A patent/CN112526835A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20210033907A (en) | 2021-03-29 |
TWI810484B (en) | 2023-08-01 |
CN112526835A (en) | 2021-03-19 |
US20210090231A1 (en) | 2021-03-25 |
JP2021047331A (en) | 2021-03-25 |
TW202113925A (en) | 2021-04-01 |
JP7339826B2 (en) | 2023-09-06 |
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