SG10202000156PA - Plasma Assisted Deposition Apparatus And Method Of Forming The Same - Google Patents

Plasma Assisted Deposition Apparatus And Method Of Forming The Same

Info

Publication number
SG10202000156PA
SG10202000156PA SG10202000156PA SG10202000156PA SG10202000156PA SG 10202000156P A SG10202000156P A SG 10202000156PA SG 10202000156P A SG10202000156P A SG 10202000156PA SG 10202000156P A SG10202000156P A SG 10202000156PA SG 10202000156P A SG10202000156P A SG 10202000156PA
Authority
SG
Singapore
Prior art keywords
forming
same
deposition apparatus
plasma assisted
assisted deposition
Prior art date
Application number
SG10202000156PA
Inventor
Wickramanayaka Sunil
Original Assignee
Airise Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Airise Pte Ltd filed Critical Airise Pte Ltd
Publication of SG10202000156PA publication Critical patent/SG10202000156PA/en

Links

SG10202000156PA 2019-01-10 2020-01-07 Plasma Assisted Deposition Apparatus And Method Of Forming The Same SG10202000156PA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG10201900235W 2019-01-10

Publications (1)

Publication Number Publication Date
SG10202000156PA true SG10202000156PA (en) 2020-08-28

Family

ID=69926079

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202000156PA SG10202000156PA (en) 2019-01-10 2020-01-07 Plasma Assisted Deposition Apparatus And Method Of Forming The Same

Country Status (2)

Country Link
CN (1) CN210215542U (en)
SG (1) SG10202000156PA (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112575319A (en) * 2021-01-21 2021-03-30 江苏爱康能源研究院有限公司 Mesh radio frequency PECVD electrode structure and application method thereof

Also Published As

Publication number Publication date
CN210215542U (en) 2020-03-31

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