SG10201907862UA - Substrate processing method and substrate processing apparatus - Google Patents

Substrate processing method and substrate processing apparatus

Info

Publication number
SG10201907862UA
SG10201907862UA SG10201907862UA SG10201907862UA SG10201907862UA SG 10201907862U A SG10201907862U A SG 10201907862UA SG 10201907862U A SG10201907862U A SG 10201907862UA SG 10201907862U A SG10201907862U A SG 10201907862UA SG 10201907862U A SG10201907862U A SG 10201907862UA
Authority
SG
Singapore
Prior art keywords
substrate processing
processing apparatus
processing method
substrate
processing
Prior art date
Application number
SG10201907862UA
Inventor
Osada Yamato
Kamimura Ryuichiro
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of SG10201907862UA publication Critical patent/SG10201907862UA/en

Links

SG10201907862UA 2018-08-30 2019-08-26 Substrate processing method and substrate processing apparatus SG10201907862UA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018161917A JP2020035923A (en) 2018-08-30 2018-08-30 Substrate processing method and substrate processing apparatus

Publications (1)

Publication Number Publication Date
SG10201907862UA true SG10201907862UA (en) 2020-03-30

Family

ID=69669195

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201907862UA SG10201907862UA (en) 2018-08-30 2019-08-26 Substrate processing method and substrate processing apparatus

Country Status (3)

Country Link
JP (1) JP2020035923A (en)
CN (1) CN110875216A (en)
SG (1) SG10201907862UA (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04240724A (en) * 1991-01-25 1992-08-28 Sumitomo Electric Ind Ltd Dry etching device
JP3232585B2 (en) * 1991-06-17 2001-11-26 ソニー株式会社 Semiconductor cleaning equipment
JP2007088398A (en) * 2004-12-14 2007-04-05 Realize Advanced Technology Ltd Cleaning device, cleaning system using the cleaning device, and method of cleaning substrate to be cleaned
JP2009087992A (en) * 2007-09-27 2009-04-23 Hitachi High-Technologies Corp Plasma processing apparatus

Also Published As

Publication number Publication date
JP2020035923A (en) 2020-03-05
CN110875216A (en) 2020-03-10

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