SG10201903504RA - System and method for drying and analytical testing of containers - Google Patents
System and method for drying and analytical testing of containersInfo
- Publication number
- SG10201903504RA SG10201903504RA SG10201903504RA SG10201903504RA SG10201903504RA SG 10201903504R A SG10201903504R A SG 10201903504RA SG 10201903504R A SG10201903504R A SG 10201903504RA SG 10201903504R A SG10201903504R A SG 10201903504RA SG 10201903504R A SG10201903504R A SG 10201903504RA
- Authority
- SG
- Singapore
- Prior art keywords
- containers
- drying
- analytical testing
- analytical
- testing
- Prior art date
Links
- 238000012863 analytical testing Methods 0.000 title 1
- 238000001035 drying Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B9/00—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards
- F26B9/06—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards in stationary drums or chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02046—Dry cleaning only
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
- F26B25/22—Controlling the drying process in dependence on liquid content of solid materials or objects
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/006—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects the gas supply or exhaust being effected through hollow spaces or cores in the materials or objects, e.g. tubes, pipes, bottles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/46—Inspecting cleaned containers for cleanliness
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B23/00—Heating arrangements
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B3/00—Drying solid materials or objects by processes involving the application of heat
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D21/00—Measuring or testing not otherwise provided for
- G01D21/02—Measuring two or more variables by means not covered by a single other subclass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M3/00—Investigating fluid-tightness of structures
- G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
- G01M3/26—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors
- G01M3/32—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators
- G01M3/3281—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators removably mounted in a test cell
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/06—Investigating concentration of particle suspensions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Analytical Chemistry (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Medicinal Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Food Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microbiology (AREA)
- Dispersion Chemistry (AREA)
- Sustainable Development (AREA)
- Drying Of Solid Materials (AREA)
- Examining Or Testing Airtightness (AREA)
- Testing Of Devices, Machine Parts, Or Other Structures Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16/255,923 US10914521B2 (en) | 2019-01-24 | 2019-01-24 | System and method for drying and analytical testing of containers |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201903504RA true SG10201903504RA (en) | 2020-08-28 |
Family
ID=69232806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201903504RA SG10201903504RA (en) | 2019-01-24 | 2019-04-18 | System and method for drying and analytical testing of containers |
Country Status (7)
Country | Link |
---|---|
US (1) | US10914521B2 (en) |
EP (1) | EP3686533B1 (en) |
JP (1) | JP6856699B2 (en) |
KR (1) | KR102283246B1 (en) |
CN (1) | CN111473610B (en) |
SG (1) | SG10201903504RA (en) |
TW (1) | TWI683095B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102019211212A1 (en) * | 2019-07-29 | 2021-02-04 | Rehm Thermal Systems Gmbh | Mechatronic curtain for a process chamber to carry out thermal processes in the manufacture of electronic assemblies |
CN113137853B (en) * | 2021-04-26 | 2022-10-21 | 四川蜀冷冷暖设备有限公司 | Intelligent control method suitable for dryer |
DE102021214981A1 (en) * | 2021-12-23 | 2023-06-29 | Carl Zeiss Smt Gmbh | PROCESS AND DRYING DEVICE |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1525131A (en) * | 1921-03-22 | 1925-02-03 | Pittsburgh Plate Glass Co | Process of drying articles |
DE2724058A1 (en) * | 1977-05-27 | 1978-12-14 | Draegerwerk Ag | METHOD OF FILLING COMPRESSED GAS CYLINDERS AND A DEVICE FOR FILLING THEM |
US5249369A (en) * | 1992-02-19 | 1993-10-05 | Mark Mallet | Method and apparatus for drying the interior surfaces of hollow articles such as air rebreathing or resuscitator bags |
DE4230066C2 (en) * | 1992-09-09 | 1994-06-16 | Aichelin Ind Ofen | Method and device for drying industrial drums |
JPH07270285A (en) * | 1994-03-30 | 1995-10-20 | Jeol Ltd | Sample-concentration and liquid-purification device |
US5966499A (en) * | 1997-07-28 | 1999-10-12 | Mks Instruments, Inc. | System for delivering a substantially constant vapor flow to a chemical process reactor |
FR2775064B1 (en) * | 1998-02-16 | 2000-05-05 | Sidel Sa | METHOD FOR DRYING HOLLOW BODIES AND DEVICE FOR CARRYING OUT SAID |
US6018885A (en) * | 1998-03-09 | 2000-02-01 | Hill; Frederick J. | Fire and rescue equipment dryer system and method |
US6526824B2 (en) | 2001-06-07 | 2003-03-04 | Air Products And Chemicals, Inc. | High purity chemical container with external level sensor and liquid sump |
DE60204543T2 (en) * | 2001-02-16 | 2006-05-11 | Steris Inc., Temecula | DECONTAMINATION OF CONTAINERS WITH STEAM |
US7387738B2 (en) * | 2003-04-28 | 2008-06-17 | Air Products And Chemicals, Inc. | Removal of surface oxides by electron attachment for wafer bumping applications |
US7124913B2 (en) | 2003-06-24 | 2006-10-24 | Air Products And Chemicals, Inc. | High purity chemical container with diptube and level sensor terminating in lowest most point of concave floor |
GB0417309D0 (en) * | 2004-08-03 | 2004-09-08 | Micropharm Ltd | Freeze-drying apparatus |
JP2006064416A (en) | 2004-08-24 | 2006-03-09 | Takeshi Kage | Method and apparatus for measuring gas barrier property of plastic molded body |
US8524321B2 (en) * | 2007-01-29 | 2013-09-03 | Praxair Technology, Inc. | Reagent dispensing apparatus and delivery method |
DE102009059824A1 (en) * | 2009-12-21 | 2011-06-22 | Inficon GmbH, 50968 | Method and device for determining the leak |
EP2572147B1 (en) | 2010-05-17 | 2016-04-06 | Joseph Company International, Inc. | Method and apparatus for cleaning and recharging self cooling keg type containers |
US8590705B2 (en) * | 2010-06-11 | 2013-11-26 | Air Products And Chemicals, Inc. | Cylinder surface treated container for monochlorosilane |
CA2816090A1 (en) * | 2010-10-29 | 2012-05-03 | Velico Medical, Inc. | System and method for spray drying a liquid |
JP5647083B2 (en) * | 2011-09-06 | 2014-12-24 | 株式会社フジキン | Raw material vaporization supply device with raw material concentration detection mechanism |
FR3008145B1 (en) * | 2013-07-04 | 2015-08-07 | Pfeiffer Vacuum Sas | DRY PRIMARY VACUUM PUMP |
KR101536234B1 (en) * | 2013-10-17 | 2015-07-13 | 주식회사 지에스티에스 | Vaporizer |
JP6520088B2 (en) * | 2014-12-08 | 2019-05-29 | 東洋製罐株式会社 | Container internal drying apparatus and container internal drying method |
CN205002524U (en) * | 2015-09-25 | 2016-01-27 | 安徽红桥金属制造有限公司 | Automatic remove ability of swimming gas tightness and detect machine |
US10384944B2 (en) | 2016-05-19 | 2019-08-20 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Preparation of Si—H containing iodosilanes via halide exchange reaction |
KR102489730B1 (en) * | 2016-07-29 | 2023-01-18 | 삼성전자주식회사 | Source supplier for supercritical fluid, substrate treating apparatus having the same and method of treating substrates in the substrate treating apparatus |
CN108007168B (en) * | 2016-11-18 | 2023-07-07 | 麻城市中达精密机械有限公司 | Valve cleaning and drying cavity, valve cleaning and drying system and valve cleaning and drying method |
FR3061949A1 (en) * | 2017-01-17 | 2018-07-20 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | METHOD AND DEVICE FOR DRYING FLUID BOTTLES UNDER PRESSURE |
CN206739772U (en) * | 2017-05-12 | 2017-12-12 | 福建中烟工业有限责任公司 | Pipette drying device |
CN107640335A (en) * | 2017-07-31 | 2018-01-30 | 芜湖杨燕制药有限公司 | A kind of traditional Chinese medicine embedding aftertreatment technology |
CN108303220B (en) * | 2018-02-11 | 2019-10-25 | 青岛市中心医院 | A kind of bacterium sterilizing leak detection unit of medical ampoule bottle dress injection |
-
2019
- 2019-01-24 US US16/255,923 patent/US10914521B2/en active Active
- 2019-04-11 TW TW108112616A patent/TWI683095B/en active
- 2019-04-18 SG SG10201903504RA patent/SG10201903504RA/en unknown
- 2019-04-26 JP JP2019085542A patent/JP6856699B2/en active Active
- 2019-07-29 CN CN201910690171.4A patent/CN111473610B/en active Active
- 2019-08-14 KR KR1020190099781A patent/KR102283246B1/en active IP Right Grant
-
2020
- 2020-01-24 EP EP20153742.0A patent/EP3686533B1/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN111473610A (en) | 2020-07-31 |
JP6856699B2 (en) | 2021-04-07 |
KR20200092243A (en) | 2020-08-03 |
JP2020118662A (en) | 2020-08-06 |
KR102283246B1 (en) | 2021-07-29 |
EP3686533B1 (en) | 2023-04-19 |
EP3686533A1 (en) | 2020-07-29 |
CN111473610B (en) | 2021-10-15 |
US10914521B2 (en) | 2021-02-09 |
TW202028714A (en) | 2020-08-01 |
US20200240709A1 (en) | 2020-07-30 |
TWI683095B (en) | 2020-01-21 |
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