SG10201809170SA - Process for plasmonic-based high resolution color printing - Google Patents

Process for plasmonic-based high resolution color printing

Info

Publication number
SG10201809170SA
SG10201809170SA SG10201809170SA SG10201809170SA SG10201809170SA SG 10201809170S A SG10201809170S A SG 10201809170SA SG 10201809170S A SG10201809170S A SG 10201809170SA SG 10201809170S A SG10201809170S A SG 10201809170SA SG 10201809170S A SG10201809170S A SG 10201809170SA
Authority
SG
Singapore
Prior art keywords
plasmonic
high resolution
based high
color printing
resolution color
Prior art date
Application number
SG10201809170SA
Inventor
Joel Kwang Wei Yang
Xiao Ming Goh
Di Zhu
Shawn Tan
Ying Min Wang
Zhaogang Dong
Original Assignee
Agency Science Tech & Res
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency Science Tech & Res filed Critical Agency Science Tech & Res
Publication of SG10201809170SA publication Critical patent/SG10201809170SA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/008—Surface plasmon devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/204—Filters in which spectral selection is performed by means of a conductive grid or array, e.g. frequency selective surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0012—Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/32—Circuits or arrangements for control or supervision between transmitter and receiver or between image input and image output device, e.g. between a still-image camera and its memory or between a still-image camera and a printer device
    • H04N1/32101—Display, printing, storage or transmission of additional information, e.g. ID code, date and time or title
    • H04N1/32144—Display, printing, storage or transmission of additional information, e.g. ID code, date and time or title embedded in the image data, i.e. enclosed or integrated in the image, e.g. watermark, super-imposed logo or stamp
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1226—Basic optical elements, e.g. light-guiding paths involving surface plasmon interaction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Plasma & Fusion (AREA)
  • Credit Cards Or The Like (AREA)
  • Laminated Bodies (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PROCESS FOR PLASMONIC-BASED HIGH RESOLUTION COLOR PRINTING 5 A process for plasmonic-based high resolution color printing is provided. The process includes a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, 10 the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible light. A nanostructured metal film or metal-film coated support obtained by the process and a method for generating a color image are also provided. 15 FIG. 3
SG10201809170SA 2014-04-17 2015-04-14 Process for plasmonic-based high resolution color printing SG10201809170SA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG10201401610R 2014-04-17

Publications (1)

Publication Number Publication Date
SG10201809170SA true SG10201809170SA (en) 2018-11-29

Family

ID=54324370

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201809170SA SG10201809170SA (en) 2014-04-17 2015-04-14 Process for plasmonic-based high resolution color printing
SG11201608576WA SG11201608576WA (en) 2014-04-17 2015-04-14 Process for plasmonic-based high resolution color printing

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201608576WA SG11201608576WA (en) 2014-04-17 2015-04-14 Process for plasmonic-based high resolution color printing

Country Status (3)

Country Link
US (2) US10831097B2 (en)
SG (2) SG10201809170SA (en)
WO (1) WO2015160310A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11249226B2 (en) 2016-07-07 2022-02-15 Bar-Ilan University Micron-size plasmonic color sorter
US11899285B2 (en) * 2016-12-30 2024-02-13 Danmarks Tekniske Universitet Photothermal modification of high index dielectric structures
US20220397533A1 (en) * 2021-06-10 2022-12-15 The Regents Of The University Of California Aluminum thin film microarray chip substrates for biosensing via surface plasmon resonance spectroscopy and imaging

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005017570A2 (en) * 2003-08-06 2005-02-24 University Of Pittsburgh Surface plasmon-enhanced nano-optic devices and methods of making same
WO2012024793A1 (en) * 2010-07-30 2012-03-01 Quantum Solar Power Corp. Apparatus for manipulating plasmons
WO2013039454A1 (en) 2011-09-12 2013-03-21 Agency For Science, Technology And Research An optical arrangement and a method of forming the same
EP2653903A1 (en) * 2012-04-20 2013-10-23 FOM Institute for Atomic and Molecular Physics Plasmonic microscopy

Also Published As

Publication number Publication date
US10831097B2 (en) 2020-11-10
US11513438B2 (en) 2022-11-29
WO2015160310A1 (en) 2015-10-22
SG11201608576WA (en) 2016-11-29
US20210018834A1 (en) 2021-01-21
US20170192351A1 (en) 2017-07-06

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