SG10201709736UA - Dividing method of workpiece and laser processing apparatus - Google Patents

Dividing method of workpiece and laser processing apparatus

Info

Publication number
SG10201709736UA
SG10201709736UA SG10201709736UA SG10201709736UA SG10201709736UA SG 10201709736U A SG10201709736U A SG 10201709736UA SG 10201709736U A SG10201709736U A SG 10201709736UA SG 10201709736U A SG10201709736U A SG 10201709736UA SG 10201709736U A SG10201709736U A SG 10201709736UA
Authority
SG
Singapore
Prior art keywords
workpiece
laser
laser processing
dividing method
processing apparatus
Prior art date
Application number
SG10201709736UA
Inventor
Yamada Hiroaki
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201709736UA publication Critical patent/SG10201709736UA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/0869Devices involving movement of the laser head in at least one axial direction
    • B23K26/0876Devices involving movement of the laser head in at least one axial direction in at least two axial directions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • B23K26/032Observing, e.g. monitoring, the workpiece using optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/359Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/362Laser etching
    • B23K26/364Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/60Preliminary treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment
    • B23K26/702Auxiliary equipment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K37/00Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
    • B23K37/04Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work
    • B23K37/0426Fixtures for other work
    • B23K37/0435Clamps
    • B23K37/0443Jigs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0095Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination

Abstract

DIVIDING METHOD OF WORKPIECE AND LASER PROCESSING APPARATUS Disclosed herein is a dividing method of a workpiece including a dicing tape sticking step of sticking a dicing tape to the workpiece, a first laser processing step of irradiating the workpiece with a laser beam with such a wavelength as to be absorbed by the workpiece along a first direction to form first laser- processed grooves, a first expanding step of expanding the dicing tape in a second direction to enlarge the width of the first laser-processed grooves, a second laser processing step of irradiating the workpiece with the laser beam with such a wavelength as to be absorbed by the workpiece along the second direction to form second laser-processed grooves, and a second expanding step of expanding the dicing tape in the first direction to enlarge the width of the second laser-processed grooves. (Figure 6)
SG10201709736UA 2016-12-08 2017-11-24 Dividing method of workpiece and laser processing apparatus SG10201709736UA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016238301A JP6870974B2 (en) 2016-12-08 2016-12-08 How to divide the work piece

Publications (1)

Publication Number Publication Date
SG10201709736UA true SG10201709736UA (en) 2018-07-30

Family

ID=62487764

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201709736UA SG10201709736UA (en) 2016-12-08 2017-11-24 Dividing method of workpiece and laser processing apparatus

Country Status (7)

Country Link
US (1) US10758998B2 (en)
JP (1) JP6870974B2 (en)
KR (1) KR102343533B1 (en)
CN (1) CN108176926B (en)
MY (1) MY185736A (en)
SG (1) SG10201709736UA (en)
TW (1) TWI747989B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6935168B2 (en) * 2016-02-12 2021-09-15 株式会社ディスコ Processing equipment
JP7157527B2 (en) * 2017-12-18 2022-10-20 株式会社ディスコ expansion unit
JP7355618B2 (en) * 2018-12-04 2023-10-03 株式会社ディスコ Wafer splitting device
JP7233816B2 (en) * 2019-02-19 2023-03-07 株式会社ディスコ Wafer processing method
JP7368098B2 (en) * 2019-04-17 2023-10-24 株式会社ディスコ Wafer processing method
CN116441751B (en) * 2023-04-23 2024-01-19 常州英诺激光科技有限公司 Splitting jig, splitting machine and splitting method

Family Cites Families (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10305420A (en) 1997-03-04 1998-11-17 Ngk Insulators Ltd Method for fabricating matrix made up of oxide single crystal and method for manufacturing functional device
US6271102B1 (en) * 1998-02-27 2001-08-07 International Business Machines Corporation Method and system for dicing wafers, and semiconductor structures incorporating the products thereof
JP3410371B2 (en) 1998-08-18 2003-05-26 リンテック株式会社 Surface protection sheet for wafer back grinding and method of using the same
JP3816253B2 (en) * 1999-01-19 2006-08-30 富士通株式会社 Manufacturing method of semiconductor device
JP3408805B2 (en) 2000-09-13 2003-05-19 浜松ホトニクス株式会社 Cutting origin region forming method and workpiece cutting method
JP4647830B2 (en) 2001-05-10 2011-03-09 株式会社ディスコ Workpiece division processing method and chip interval expansion apparatus used in the division processing method
KR101029235B1 (en) * 2001-08-10 2011-04-18 닛토덴코 가부시키가이샤 Dicing adhesive sheet and dicing method
JP2004322168A (en) * 2003-04-25 2004-11-18 Disco Abrasive Syst Ltd Laser machining apparatus
JP2005064230A (en) * 2003-08-12 2005-03-10 Disco Abrasive Syst Ltd Dividing method of plate-shaped article
JP2005116739A (en) 2003-10-07 2005-04-28 Disco Abrasive Syst Ltd Manufacturing method of semiconductor chip
JP4471632B2 (en) * 2003-11-18 2010-06-02 株式会社ディスコ Wafer processing method
US7074695B2 (en) 2004-03-02 2006-07-11 Chippac, Inc. DBG system and method with adhesive layer severing
JP4342992B2 (en) * 2004-03-17 2009-10-14 株式会社ディスコ Laser processing machine chuck table
JP2006024676A (en) * 2004-07-07 2006-01-26 Disco Abrasive Syst Ltd Method for dividing wafer
JP2006114691A (en) 2004-10-14 2006-04-27 Disco Abrasive Syst Ltd Division method of wafer
JP4854061B2 (en) * 2005-01-14 2012-01-11 日東電工株式会社 Manufacturing method of laser processed product and protective sheet for laser processing
JP4873863B2 (en) * 2005-01-14 2012-02-08 日東電工株式会社 Manufacturing method of laser processed product and pressure-sensitive adhesive sheet for laser processing
JP4368312B2 (en) * 2005-01-21 2009-11-18 株式会社ディスコ Laser processing method
JP4630689B2 (en) * 2005-03-01 2011-02-09 株式会社ディスコ Wafer division method
JP2006269897A (en) * 2005-03-25 2006-10-05 Disco Abrasive Syst Ltd Laser processing method of wafer
JP4694900B2 (en) 2005-06-28 2011-06-08 株式会社ディスコ Laser processing method
JP2007027562A (en) 2005-07-20 2007-02-01 Disco Abrasive Syst Ltd Method of fracturing bonding film attached on wafer
JP2007134454A (en) * 2005-11-09 2007-05-31 Toshiba Corp Method of manufacturing semiconductor device
EP2437049A1 (en) * 2006-10-17 2012-04-04 Nitto Denko Corporation Method and system for laminating optical elements
JP2008117945A (en) * 2006-11-06 2008-05-22 Nitto Denko Corp Adhesive sheet for water jet laser dicing
EP1992443B1 (en) * 2006-12-22 2013-09-25 Panasonic Corporation Laser processing apparatus and laser processing method using the same
JP2008212999A (en) * 2007-03-06 2008-09-18 Disco Abrasive Syst Ltd Laser beam machining apparatus
JP5117920B2 (en) * 2008-04-28 2013-01-16 株式会社ディスコ Laser processing equipment
DE102008022449A1 (en) * 2008-05-08 2009-11-12 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Laser processing machine with extended working space
JP2010087433A (en) * 2008-10-02 2010-04-15 Disco Abrasive Syst Ltd Laser processing method, laser processing apparatus, and manufacturing method of chip
JP5318544B2 (en) * 2008-12-01 2013-10-16 株式会社ディスコ Laser processing equipment
TWI523720B (en) * 2009-05-28 2016-03-01 伊雷克托科學工業股份有限公司 Acousto-optic deflector applications in laser processing of features in a workpiece, and related laser processing method
JP5473414B2 (en) * 2009-06-10 2014-04-16 株式会社ディスコ Laser processing equipment
JP5431831B2 (en) * 2009-08-21 2014-03-05 株式会社ディスコ Laser processing equipment
CN102596830A (en) * 2009-08-28 2012-07-18 康宁股份有限公司 Methods for laser cutting articles from chemically strengthened glass substrates
JP2011224931A (en) * 2010-04-22 2011-11-10 Disco Corp Optical device wafer processing method and laser processing apparatus
WO2012053045A1 (en) * 2010-10-18 2012-04-26 新日本製鐵株式会社 Laser apparatus and laser processing apparatus provided with same
KR20220046706A (en) * 2010-10-22 2022-04-14 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 Laser processing systems and methods for beam dithering and skiving
JP5839923B2 (en) * 2011-10-06 2016-01-06 株式会社ディスコ Ablation processing method for substrate with passivation film laminated
JP5964604B2 (en) * 2012-02-09 2016-08-03 株式会社ディスコ Laser processing equipment
JP5902540B2 (en) * 2012-04-02 2016-04-13 株式会社ディスコ Laser processing method and laser processing apparatus
DE102012207201B3 (en) * 2012-04-30 2013-04-11 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Method for laser-assisted plasma cutting or plasma welding and apparatus therefor
JP5996260B2 (en) * 2012-05-09 2016-09-21 株式会社ディスコ Workpiece division method
JP5982172B2 (en) * 2012-05-15 2016-08-31 株式会社ディスコ Wafer laser processing method
JP6208430B2 (en) * 2013-01-25 2017-10-04 株式会社ディスコ Laser processing method
JP6071641B2 (en) * 2013-02-27 2017-02-01 三菱重工業株式会社 Processing device, processing method
JP6054234B2 (en) 2013-04-22 2016-12-27 株式会社ディスコ Wafer processing method
JP6234161B2 (en) 2013-10-24 2017-11-22 株式会社ディスコ Adhesive tape sticking device
KR102258918B1 (en) 2014-01-08 2021-06-02 린텍 가부시키가이샤 Composite sheet for protective-film formation
JP2015204362A (en) * 2014-04-14 2015-11-16 株式会社ディスコ chip interval maintenance method
JP6425435B2 (en) 2014-07-01 2018-11-21 株式会社ディスコ Tip spacing maintenance device
JP6366393B2 (en) * 2014-07-15 2018-08-01 株式会社ディスコ Wafer processing method
JP6411822B2 (en) * 2014-09-09 2018-10-24 株式会社ディスコ Laser processing equipment
JP6460704B2 (en) * 2014-09-30 2019-01-30 株式会社ディスコ Method for dividing ceramic substrate
JP2016068149A (en) * 2014-10-02 2016-05-09 株式会社ディスコ Laser processing device
JP6388823B2 (en) * 2014-12-01 2018-09-12 株式会社ディスコ Laser processing equipment
JP6407066B2 (en) * 2015-03-06 2018-10-17 株式会社ディスコ Manufacturing method of optical device chip
JP6441731B2 (en) * 2015-04-03 2018-12-19 株式会社ディスコ Laser processing equipment
JP6600254B2 (en) * 2015-12-28 2019-10-30 株式会社ディスコ Wafer processing method

Also Published As

Publication number Publication date
KR20180065923A (en) 2018-06-18
JP2018098235A (en) 2018-06-21
JP6870974B2 (en) 2021-05-12
TWI747989B (en) 2021-12-01
US20180161919A1 (en) 2018-06-14
KR102343533B1 (en) 2021-12-28
CN108176926B (en) 2021-08-17
MY185736A (en) 2021-06-02
TW201822268A (en) 2018-06-16
US10758998B2 (en) 2020-09-01
CN108176926A (en) 2018-06-19

Similar Documents

Publication Publication Date Title
SG10201709736UA (en) Dividing method of workpiece and laser processing apparatus
MX2018001587A (en) Method for cutting a thin glass layer.
WO2015073391A3 (en) Laser processing of a bed of powdered material with variable masking
EP3459675A4 (en) Laser cutting and machining method for plated steel plate, laser cut-and-machined product, thermal cutting and machining method, thermal cut-and-machined product, surface-treated steel plate, laser cutting method, and laser machining head
PL3159093T3 (en) Method of controlling a laser cuting process in a high energy zone with interruption of the cutting process ; corresponding device and computer program
WO2014075995A3 (en) Method for producing aligned linear breaking points by ultra-short focussed, pulsed laser radiation; method and device for separating a workpiece by means of ultra-short focussed laser radiation using a protective gas atmosphere
MY178429A (en) Method and device for providing through-openings in a substrate and a substrate produced in said manner
CL2020000681A1 (en) Aerosol generating material bar segment.
CL2017000628A1 (en) Stable fungal blastospores and methods for their production, stabilization and use
SG10201802546UA (en) Method of processing workpiece
MX2018009285A (en) Method and device for producing planar modifications in solid bodies.
SG10201708553PA (en) Method of processing wafer
WO2011041371A3 (en) System and method for efficient laser processing of a moving web-based material
EP3524373A4 (en) Cutting machine and thermoelectric power generation method
WO2016109059A8 (en) Films and film laser converting
SG10201802542RA (en) Workpiece processing method
SG10201802543SA (en) Method of processing workpiece
EP4257069A3 (en) Apparatus for directional skin tightening
SG10201900105UA (en) Method of processing workpiece with laser beam
SG10201800068TA (en) Method of processing workpiece
EP3685956A4 (en) Method for processing workpiece with laser, and use thereof in cutter manufacturing
MX2018006695A (en) Method of laser cutting a web structure.
SG10201802803YA (en) Laser processing method of wafer
EP3659740A4 (en) Laser cutting method, laser cutting nozzle, and laser cutting nozzle manufacturing method
MX360804B (en) Technique for setting energy-related laser-pulse parameters.