SG10201510070XA - Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system - Google Patents

Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system

Info

Publication number
SG10201510070XA
SG10201510070XA SG10201510070XA SG10201510070XA SG10201510070XA SG 10201510070X A SG10201510070X A SG 10201510070XA SG 10201510070X A SG10201510070X A SG 10201510070XA SG 10201510070X A SG10201510070X A SG 10201510070XA SG 10201510070X A SG10201510070X A SG 10201510070XA
Authority
SG
Singapore
Prior art keywords
uniformity
methods
processing system
plasma processing
azimuthal non
Prior art date
Application number
SG10201510070XA
Inventor
Marakhtanov Alexei
Dhindsa Rajinder
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG10201510070XA publication Critical patent/SG10201510070XA/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/0046—Arrangements for measuring currents or voltages or for indicating presence or sign thereof characterised by a specific application or detail not covered by any other subgroup of G01R19/00
    • G01R19/0061—Measuring currents of particle-beams, currents from electron multipliers, photocurrents, ion currents; Measuring in plasmas
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/08—Measuring electromagnetic field characteristics
    • G01R29/0864—Measuring electromagnetic field characteristics characterised by constructional or functional features
    • G01R29/0878—Sensors; antennas; probes; detectors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • General Physics & Mathematics (AREA)
SG10201510070XA 2012-06-12 2013-05-14 Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system SG10201510070XA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/494,456 US9245720B2 (en) 2012-06-12 2012-06-12 Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system

Publications (1)

Publication Number Publication Date
SG10201510070XA true SG10201510070XA (en) 2016-01-28

Family

ID=49714360

Family Applications (2)

Application Number Title Priority Date Filing Date
SG2013037932A SG195484A1 (en) 2012-06-12 2013-05-14 Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system
SG10201510070XA SG10201510070XA (en) 2012-06-12 2013-05-14 Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG2013037932A SG195484A1 (en) 2012-06-12 2013-05-14 Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system

Country Status (4)

Country Link
US (1) US9245720B2 (en)
KR (1) KR20130139187A (en)
SG (2) SG195484A1 (en)
TW (1) TWI591683B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9337000B2 (en) 2013-10-01 2016-05-10 Lam Research Corporation Control of impedance of RF return path
US9401264B2 (en) * 2013-10-01 2016-07-26 Lam Research Corporation Control of impedance of RF delivery path
JP7072572B2 (en) * 2016-12-27 2022-05-20 エヴァテック・アーゲー RF Capacitive Dual Frequency Etching Reactor
CN106918734A (en) * 2017-05-11 2017-07-04 中国工程物理研究院应用电子学研究所 A kind of B dot probes for vacuum diode current measurement

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8004293B2 (en) * 2006-11-20 2011-08-23 Applied Materials, Inc. Plasma processing chamber with ground member integrity indicator and method for using the same
US8381677B2 (en) * 2006-12-20 2013-02-26 Applied Materials, Inc. Prevention of film deposition on PECVD process chamber wall
US7972470B2 (en) * 2007-05-03 2011-07-05 Applied Materials, Inc. Asymmetric grounding of rectangular susceptor
US9074285B2 (en) * 2007-12-13 2015-07-07 Lam Research Corporation Systems for detecting unconfined-plasma events
KR101641130B1 (en) * 2008-10-09 2016-07-20 어플라이드 머티어리얼스, 인코포레이티드 Rf return path for large plasma processing chamber
US20100136261A1 (en) * 2008-12-03 2010-06-03 Applied Materials, Inc. Modulation of rf returning straps for uniformity control
TWI527930B (en) * 2009-02-04 2016-04-01 應用材料股份有限公司 Ground return for plasma processes
US10586686B2 (en) * 2011-11-22 2020-03-10 Law Research Corporation Peripheral RF feed and symmetric RF return for symmetric RF delivery
US8898889B2 (en) * 2011-11-22 2014-12-02 Lam Research Corporation Chuck assembly for plasma processing
US20130240147A1 (en) * 2012-03-19 2013-09-19 Sang Ki Nam Methods and apparatus for selectively modulating azimuthal non-uniformity in a plasma processing system
US9230779B2 (en) * 2012-03-19 2016-01-05 Lam Research Corporation Methods and apparatus for correcting for non-uniformity in a plasma processing system
US8911588B2 (en) * 2012-03-19 2014-12-16 Lam Research Corporation Methods and apparatus for selectively modifying RF current paths in a plasma processing system

Also Published As

Publication number Publication date
TW201415518A (en) 2014-04-16
US20130327481A1 (en) 2013-12-12
KR20130139187A (en) 2013-12-20
US9245720B2 (en) 2016-01-26
SG195484A1 (en) 2013-12-30
TWI591683B (en) 2017-07-11

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