SG10201501966TA - System and method for fault isolation by emission spectra analysis - Google Patents

System and method for fault isolation by emission spectra analysis

Info

Publication number
SG10201501966TA
SG10201501966TA SG10201501966TA SG10201501966TA SG10201501966TA SG 10201501966T A SG10201501966T A SG 10201501966TA SG 10201501966T A SG10201501966T A SG 10201501966TA SG 10201501966T A SG10201501966T A SG 10201501966TA SG 10201501966T A SG10201501966T A SG 10201501966TA
Authority
SG
Singapore
Prior art keywords
emission spectra
fault isolation
spectra analysis
analysis
fault
Prior art date
Application number
SG10201501966TA
Inventor
Deslandes Herve
Sabbineni Prasad
Freed Regina
Original Assignee
Dcg Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dcg Systems Inc filed Critical Dcg Systems Inc
Publication of SG10201501966TA publication Critical patent/SG10201501966TA/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G01R31/311—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G01N21/9505—Wafer internal defects, e.g. microcracks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • General Engineering & Computer Science (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Microscoopes, Condenser (AREA)
SG10201501966TA 2014-03-13 2015-03-13 System and method for fault isolation by emission spectra analysis SG10201501966TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201461952861P 2014-03-13 2014-03-13

Publications (1)

Publication Number Publication Date
SG10201501966TA true SG10201501966TA (en) 2015-10-29

Family

ID=54068613

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201501966TA SG10201501966TA (en) 2014-03-13 2015-03-13 System and method for fault isolation by emission spectra analysis

Country Status (3)

Country Link
US (2) US10041997B2 (en)
JP (1) JP2015175851A (en)
SG (1) SG10201501966TA (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG10201501966TA (en) 2014-03-13 2015-10-29 Dcg Systems Inc System and method for fault isolation by emission spectra analysis
US9903824B2 (en) 2014-04-10 2018-02-27 Fei Efa, Inc. Spectral mapping of photo emission
DE102016216828B4 (en) 2015-09-07 2021-06-10 Yazaki Corporation CONNECTOR

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JP4928862B2 (en) * 2006-08-04 2012-05-09 株式会社日立ハイテクノロジーズ Defect inspection method and apparatus
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JP5352111B2 (en) * 2008-04-16 2013-11-27 株式会社日立ハイテクノロジーズ Defect inspection method and defect inspection apparatus using the same
JP5007979B2 (en) * 2008-05-22 2012-08-22 独立行政法人産業技術総合研究所 Defect inspection method and defect inspection apparatus
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US20110242312A1 (en) * 2010-03-30 2011-10-06 Lasertec Corporation Inspection system and inspection method
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US8867580B2 (en) * 2012-05-15 2014-10-21 Finisar Corporation Wavelength tunable laser
SG10201501966TA (en) 2014-03-13 2015-10-29 Dcg Systems Inc System and method for fault isolation by emission spectra analysis
US9903824B2 (en) 2014-04-10 2018-02-27 Fei Efa, Inc. Spectral mapping of photo emission

Also Published As

Publication number Publication date
US10620263B2 (en) 2020-04-14
US10041997B2 (en) 2018-08-07
JP2015175851A (en) 2015-10-05
US20150260789A1 (en) 2015-09-17
US20180328985A1 (en) 2018-11-15

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