SG10201403278VA - Seasoning plasma processing systems - Google Patents

Seasoning plasma processing systems

Info

Publication number
SG10201403278VA
SG10201403278VA SG10201403278VA SG10201403278VA SG10201403278VA SG 10201403278V A SG10201403278V A SG 10201403278VA SG 10201403278V A SG10201403278V A SG 10201403278VA SG 10201403278V A SG10201403278V A SG 10201403278VA SG 10201403278V A SG10201403278V A SG 10201403278VA
Authority
SG
Singapore
Prior art keywords
plasma processing
processing systems
seasoning plasma
seasoning
systems
Prior art date
Application number
SG10201403278VA
Inventor
Brian Choi
Vijayakumar C Venugopal
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG10201403278VA publication Critical patent/SG10201403278VA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32862—In situ cleaning of vessels and/or internal parts

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
SG10201403278VA 2009-06-30 2010-08-26 Seasoning plasma processing systems SG10201403278VA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22202109P 2009-06-30 2009-06-30

Publications (1)

Publication Number Publication Date
SG10201403278VA true SG10201403278VA (en) 2014-10-30

Family

ID=43381609

Family Applications (2)

Application Number Title Priority Date Filing Date
SG2011091725A SG176798A1 (en) 2009-06-30 2010-08-26 Seasoning plasma processing systems
SG10201403278VA SG10201403278VA (en) 2009-06-30 2010-08-26 Seasoning plasma processing systems

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG2011091725A SG176798A1 (en) 2009-06-30 2010-08-26 Seasoning plasma processing systems

Country Status (5)

Country Link
US (1) US20100332010A1 (en)
KR (1) KR20130033925A (en)
CN (1) CN102511072A (en)
SG (2) SG176798A1 (en)
WO (1) WO2011017716A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10896833B2 (en) 2018-05-09 2021-01-19 Applied Materials, Inc. Methods and apparatus for detecting an endpoint of a seasoning process

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6197116B1 (en) * 1996-08-29 2001-03-06 Fujitsu Limited Plasma processing system
US7313451B2 (en) * 2002-03-12 2007-12-25 Tokyo Electron Limited Plasma processing method, detecting method of completion of seasoning, plasma processing apparatus and storage medium
US7505879B2 (en) * 2002-06-05 2009-03-17 Tokyo Electron Limited Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus
KR100628392B1 (en) * 2002-06-05 2006-09-26 동경 엘렉트론 주식회사 Processing device multivariate analysis model creation method, processing device multivariate analysis method, processing device control device, processing device control system
JP4365109B2 (en) * 2003-01-29 2009-11-18 株式会社日立ハイテクノロジーズ Plasma processing equipment
US7147747B2 (en) * 2003-03-04 2006-12-12 Hitachi High-Technologies Corporation Plasma processing apparatus and plasma processing method
JP4490704B2 (en) * 2004-02-27 2010-06-30 株式会社日立ハイテクノロジーズ Plasma processing method
US7231321B2 (en) * 2004-11-10 2007-06-12 Tokyo Electron Limited Method of resetting substrate processing apparatus, storage medium storing program for implementing the method, and substrate processing apparatus
JP4972277B2 (en) * 2004-11-10 2012-07-11 東京エレクトロン株式会社 Substrate processing apparatus recovery method, apparatus recovery program, and substrate processing apparatus
KR100699841B1 (en) * 2005-05-04 2007-03-27 삼성전자주식회사 Method for seasoning Chamber used in semiconductor process
JP4914119B2 (en) * 2006-05-31 2012-04-11 株式会社日立ハイテクノロジーズ Plasma processing method and plasma processing apparatus
US7572647B2 (en) * 2007-02-02 2009-08-11 Applied Materials, Inc. Internal balanced coil for inductively coupled high density plasma processing chamber
KR100892248B1 (en) * 2007-07-24 2009-04-09 주식회사 디엠에스 Endpoint detection device for realizing real-time control of a plasma reactor and the plasma reactor comprising the endpoint detection device and the endpoint detection method

Also Published As

Publication number Publication date
US20100332010A1 (en) 2010-12-30
WO2011017716A2 (en) 2011-02-10
SG176798A1 (en) 2012-01-30
WO2011017716A3 (en) 2011-05-05
KR20130033925A (en) 2013-04-04
CN102511072A (en) 2012-06-20

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