SG10201403210VA - Article storage facility - Google Patents

Article storage facility

Info

Publication number
SG10201403210VA
SG10201403210VA SG10201403210VA SG10201403210VA SG10201403210VA SG 10201403210V A SG10201403210V A SG 10201403210VA SG 10201403210V A SG10201403210V A SG 10201403210VA SG 10201403210V A SG10201403210V A SG 10201403210VA SG 10201403210V A SG10201403210V A SG 10201403210VA
Authority
SG
Singapore
Prior art keywords
switching valve
gas supply
relief
zone
storage facility
Prior art date
Application number
SG10201403210VA
Inventor
Otsuka Hiroshi
Kawamura Shinsuke
Yoshimoto Tadahiro
Original Assignee
Daifuku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daifuku Kk filed Critical Daifuku Kk
Publication of SG10201403210VA publication Critical patent/SG10201403210VA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769—Storage means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02—Articles
    • B65G2201/0297—Wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/6851—With casing, support, protector or static constructional installations
    • Y10T137/6966—Static constructional installations

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Food Science & Technology (AREA)
  • Mechanical Engineering (AREA)

Abstract

30 An article storage facility is provided which is relatively simple in structure and in which it is easier to perform maintenance work of apparatus provided to 5 each zone. A first switching valve is provided in each of a plurality of zone gas supply portions whereas a second switching valve is provided in each of a plurality of storage section gas supply portions. A plurality of relief passages is provided with each relief passage connected to the inactive gas supply passage on a downstream side, with respect to a gas supplying direction, of the position 10 in which the first switching valve is provided and on an upstream side, with respect to the gas supplying direction, of the position in which the second switching valve is provided in the inactive gas supply passage. A zone relief switching valve is provided to each of the plurality of relief passages. 15 Fig. 5
SG10201403210VA 2013-06-26 2014-06-12 Article storage facility SG10201403210VA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013134267A JP5892113B2 (en) 2013-06-26 2013-06-26 Goods storage facility

Publications (1)

Publication Number Publication Date
SG10201403210VA true SG10201403210VA (en) 2015-01-29

Family

ID=52114432

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201403210VA SG10201403210VA (en) 2013-06-26 2014-06-12 Article storage facility

Country Status (6)

Country Link
US (1) US9679795B2 (en)
JP (1) JP5892113B2 (en)
KR (1) KR102179872B1 (en)
CN (1) CN104249899B (en)
SG (1) SG10201403210VA (en)
TW (1) TWI610866B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6032372B2 (en) * 2013-09-26 2016-11-30 村田機械株式会社 Purge apparatus and purge method
JP6160520B2 (en) * 2014-03-11 2017-07-12 株式会社ダイフク Maintenance equipment for ladders and storage shelves equipped with them
SG11201801353VA (en) * 2015-08-25 2018-03-28 Murata Machinery Ltd Purge device, purge stocker, and purge method
JP6414525B2 (en) * 2015-09-02 2018-10-31 株式会社ダイフク Storage facilities
JP6455404B2 (en) * 2015-11-17 2019-01-23 株式会社ダイフク Container transfer equipment
JP6551240B2 (en) * 2016-01-06 2019-07-31 株式会社ダイフク Article storage rack and article storage facility provided with the same
JP6460015B2 (en) * 2016-03-07 2019-01-30 株式会社ダイフク Container transfer equipment
JP6614174B2 (en) * 2017-02-08 2019-12-04 株式会社ダイフク Flow measurement system
JP6794898B2 (en) * 2017-03-29 2020-12-02 株式会社ダイフク Storage rack
US10703563B2 (en) * 2017-11-10 2020-07-07 Taiwan Semiconductor Manufacturing Co., Ltd. Stocker
JP6856015B2 (en) * 2017-12-20 2021-04-14 株式会社ダイフク Storage equipment
CN112262465B (en) * 2018-06-15 2024-03-26 村田机械株式会社 Pipe support
JP7090513B2 (en) * 2018-09-06 2022-06-24 東京エレクトロン株式会社 Board processing equipment and purging method
KR102102413B1 (en) * 2018-09-19 2020-04-20 크린팩토메이션 주식회사 Modular stocker for storing container and carousel type module for storing container used therefor
JP7487703B2 (en) * 2021-04-27 2024-05-21 株式会社ダイフク Storage Shelf

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3330166B2 (en) * 1992-12-04 2002-09-30 東京エレクトロン株式会社 Processing equipment
JP3122311B2 (en) * 1994-06-29 2001-01-09 東京エレクトロン株式会社 Apparatus for supplying liquid material to film forming chamber and method of using the same
NO972004D0 (en) * 1997-04-30 1997-04-30 Hatteland Electronic As Jacob Method for organizing flow of goods for a horizontally layered and deep-stacked inventory with disparate components, as well as transfer equipment for standardized containers for the purpose
JPH11168135A (en) * 1997-12-03 1999-06-22 Toshiba Corp Substrate storing equipment and substrate storage method
JP2001284433A (en) * 2000-01-28 2001-10-12 Sony Corp Substrate transfer apparatus and method for transferring substrate
KR100572321B1 (en) * 2003-10-02 2006-04-19 삼성전자주식회사 Semiconductor device manufacturing equipment and method and stocker used therein
US7274971B2 (en) * 2004-02-28 2007-09-25 Applied Materials, Inc. Methods and apparatus for electronic device manufacturing system monitoring and control
JP4428646B2 (en) * 2004-06-18 2010-03-10 平田機工株式会社 Gas purge method in the container
US20060176928A1 (en) * 2005-02-08 2006-08-10 Tokyo Electron Limited Substrate processing apparatus, control method adopted in substrate processing apparatus and program
KR100706243B1 (en) 2005-02-22 2007-04-11 삼성전자주식회사 Apparatus and method depositing tungsten nitride
JP2007173695A (en) * 2005-12-26 2007-07-05 Sokudo:Kk Method and system for substrate processing, and substrate processing device
JP4670808B2 (en) * 2006-12-22 2011-04-13 ムラテックオートメーション株式会社 Container transport system and measuring container
JP2009054859A (en) * 2007-08-28 2009-03-12 Tokyo Electron Ltd Substrate-receiving device and substrate-receiving method
WO2009117440A1 (en) 2008-03-17 2009-09-24 Applied Materials, Inc. Heated valve manifold for ampoule
JP5236518B2 (en) * 2009-02-03 2013-07-17 株式会社ダン・タクマ Storage system and storage method
JP4940290B2 (en) 2009-12-15 2012-05-30 三洋電機株式会社 Photoelectric conversion device and manufacturing method thereof
US9032990B2 (en) * 2011-04-25 2015-05-19 Applied Materials, Inc. Chemical delivery system

Also Published As

Publication number Publication date
JP2015012041A (en) 2015-01-19
TWI610866B (en) 2018-01-11
KR20150001622A (en) 2015-01-06
CN104249899A (en) 2014-12-31
JP5892113B2 (en) 2016-03-23
US9679795B2 (en) 2017-06-13
TW201506331A (en) 2015-02-16
KR102179872B1 (en) 2020-11-17
CN104249899B (en) 2018-01-05
US20150000765A1 (en) 2015-01-01

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