SE9102818L - Ett saett att rena zirkoniumtetraklorid och hafniumtetraklorid i en aangstroem - Google Patents

Ett saett att rena zirkoniumtetraklorid och hafniumtetraklorid i en aangstroem

Info

Publication number
SE9102818L
SE9102818L SE9102818A SE9102818A SE9102818L SE 9102818 L SE9102818 L SE 9102818L SE 9102818 A SE9102818 A SE 9102818A SE 9102818 A SE9102818 A SE 9102818A SE 9102818 L SE9102818 L SE 9102818L
Authority
SE
Sweden
Prior art keywords
tetrachloride
hafnium
flow
separative
barrier
Prior art date
Application number
SE9102818A
Other languages
Unknown language ( )
English (en)
Other versions
SE9102818D0 (sv
Inventor
T S Snyder
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of SE9102818D0 publication Critical patent/SE9102818D0/sv
Publication of SE9102818L publication Critical patent/SE9102818L/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
    • C01B33/10721—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of tetrachloride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G25/00—Compounds of zirconium
    • C01G25/04—Halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G27/00—Compounds of hafnium
    • C01G27/04—Halides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Silicon Compounds (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Treating Waste Gases (AREA)
  • Drying Of Gases (AREA)
SE9102818A 1990-10-12 1991-09-27 Ett saett att rena zirkoniumtetraklorid och hafniumtetraklorid i en aangstroem SE9102818L (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/597,254 US5102637A (en) 1990-10-12 1990-10-12 Method of purifying zirconium tetrachloride and hafnium tetrachloride in a vapor stream

Publications (2)

Publication Number Publication Date
SE9102818D0 SE9102818D0 (sv) 1991-09-27
SE9102818L true SE9102818L (sv) 1992-04-13

Family

ID=24390744

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9102818A SE9102818L (sv) 1990-10-12 1991-09-27 Ett saett att rena zirkoniumtetraklorid och hafniumtetraklorid i en aangstroem

Country Status (4)

Country Link
US (1) US5102637A (sv)
JP (1) JPH04300210A (sv)
FR (1) FR2667858B1 (sv)
SE (1) SE9102818L (sv)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI110311B (sv) * 1999-07-20 2002-12-31 Asm Microchemistry Oy Förfarande och anordning för eliminering av substanser från gaser
TW496907B (en) * 2000-04-14 2002-08-01 Asm Microchemistry Oy Method and apparatus of growing a thin film onto a substrate
US7060132B2 (en) * 2000-04-14 2006-06-13 Asm International N.V. Method and apparatus of growing a thin film
US20060062910A1 (en) * 2004-03-01 2006-03-23 Meiere Scott H Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof
US20050214458A1 (en) * 2004-03-01 2005-09-29 Meiere Scott H Low zirconium hafnium halide compositions
CN100345753C (zh) * 2006-03-10 2007-10-31 锦州铁合金股份有限公司 锆英砂沸腾氯化反应中产生的四氯化硅的回收提纯方法
CA2722707A1 (en) * 2008-04-29 2009-11-05 Cvmr Corporation Method of treating metalliferrous materials
CN101440102B (zh) * 2008-12-19 2011-07-20 山东东岳有机硅材料有限公司 一种甲基单体合成洗涤浆液处理方法
CN115679124B (zh) * 2022-11-07 2023-08-18 南通晶朋新材料科技有限公司 分离铪和锆的工艺

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2914379A (en) * 1955-07-11 1959-11-24 Metal & Thermit Corp Process for the chlorination of zirconium-bearing materials
US3388993A (en) * 1963-10-08 1968-06-18 West Virginia Pulp & Paper Co Method of separating metal chlorides
US3653620A (en) * 1970-12-22 1972-04-04 Hubert J O H Benoit Bag holder
US4053558A (en) * 1975-07-14 1977-10-11 Stauffer Chemical Company Purification of gas streams containing ferric chloride
US4913778A (en) * 1989-01-02 1990-04-03 Westinghouse Electric Corp. Molten salt scrubbing of zirconium or hafnium tetrachloride

Also Published As

Publication number Publication date
JPH04300210A (ja) 1992-10-23
FR2667858B1 (fr) 1993-06-18
SE9102818D0 (sv) 1991-09-27
US5102637A (en) 1992-04-07
FR2667858A1 (fr) 1992-04-17

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