SE529426C2 - Apparatus and method of continuous coating in continuous deposition line - Google Patents

Abstract

A continuous roll-to-roll deposition coating apparatus and a method to continuous coat an edge of a strip substrate are disclosed. The invention is aimed at accomplishing a hard and abrasion resistant coated metal strip with improved adhesion between a dense coating and the substrate.The deposition coating apparatus, comprises: a vacuum process chamber (114) including an etching zone (116) upstream of a deposition zone (118);at least one ion assisted etcher(120) in the etching zone; and at least one deposition apparatus (122) in the deposition zone,wherein the at least one deposition apparatus includes at least one target (124), wherein the strip substrate, in travelling through the vacuum process chamber, projects a first edge region (140) toward the at least one ion assisted etcher in the etching zone and projects the first edge region toward the target of the at least one deposition apparatus in the deposition zone, wherein the first edge region of the strip substrate includes at least a first angled surface (142) tapered from a first proximal position (144) toward a first distal position, the first proximal position closer to a centre region of the strip substrate than the first distal position, the first angled surface having a first surface normal (150), and wherein the target of the at least one deposition apparatus includes a target surface (126) having a target normal(128) and is angled with respect to the first angled surface so that the target normal intersects the first surface normal at an angle a, where a is greater than or equal to 90 degrees.

Description

529 426 shaving applications, such as razor blades and scissors. Another example includes scraper and coating sheets, such as those used in the manufacture of paper and in the printing industry for scraping paper and ink from a surface, respectively. in connection with this, problems often occur with abrasion on the surface and on the coating or scraper blade. Coating and doctor blades are usually made of hardened strip steel. A common way to reduce the abrasion problem is to apply an abrasion resistant coating to the steel blade after it has been made to its final geometry, in the form of a coating or doctor blade. In this connection, a nickel layer must usually be applied to act as a bonding layer between the substrate and the abrasion resistant coating. Just to name a few examples. These are all applications where a hard and dense wear coating may be suitable, or even needed. Abrasion can, for example, result in the coating tearing off or cracking. These are also applications that need hard and sharp edges and cutting surfaces. In addition, many of the above applications are used in corrosive environments and therefore benefit from a corrosion resistant surface.

It is thus known that abrasion-resistant coatings can be used, but it is difficult to find a cost-effective and environmentally friendly method that can provide the desired quality. The cost of a coating or doctor blade with an abrasion resistant coating is currently very high.

In addition, the cost is high for quality problems, which occur during use in a printing industry or in a paper mill. Frequent blade changes also increase costs. In The good adhesion of a coating to an edge. needed for the functional quality of the finished product. A substandard adhesion or a porous or coarse-grained coating would cause problems when using the coated article, for example an industrial knife or saw, such as, for example, that the coating begins to fl bait, that grains or small parts wear off or that cracking problems occur. Overall, this is not acceptable from a quality and cost perspective.

There are several common methods of making a coating and also several different types of coatings used. Examples are: ceramic coatings, usually consisting of Al2O3 with possible additions of TiO2 and / or ZrO2. This type of coating is normally applied using a thermal spraying method. An example of a thermal spraying method is described in e.g. U.S. patent no. No. 6,431,066, in which a ceramic coating is applied along an edge of a doctor blade. Another example of a thermal spraying method is described in EP-B-758 026, in which an abrasion resistant coating is applied along an edge using several coating steps in a rather complicated continuous process, which involves thermal spraying.

Conventional thermal spraying methods generally have some significant disadvantages. For example, the coating formed is coarse, which means that polishing or other processing must usually be performed on the surface after the coating. In addition, a thermal spray coating usually involves a high degree of porosity, which means that a thin, dense coating cannot normally be achieved. Furthermore, the thickness of thermally sprayed coatings is normally quite large. During use, a thick and coarse coating has an increased risk of cracking or the grains being torn off from the surface. In many cases, expensive nickel or nickel alloys must also be used as a bonding layer to improve the adhesion of the ceramic coating.

Conventional metallic coatings, often consisting of pure nickel or chromium or in the form of a compound such as nickel-phosphorus, are normally applied using a plating method, and in particular electrolytic plating. L ~ 20 25 30 ~ 529 426 L: Electrolytic plating methods have certain disadvantages, where a major disadvantage is the difficulty in achieving an even thickness and also that the adhesion of the coating can be poor. In addition, plating processes are not environmentally friendly, but on the contrary, these processes often involve environmental problems.

Combinations of coatings, such as a nickel coating comprising abrasion resistant particles, e.g. SiC, is described in WO 02/46526, in which different layers are applied in a continuous process for electrolytic nickel coatings in several steps and by adding abrasive particles to at least one of these steps. This method also has some disadvantages, in principle the same disadvantages as for electrolytic plating as described above, but also that nickel is widely used as a bonding layer, which means that the coating is very expensive.

SUMMARY A hard and abrasion resistant, coated metal strip with improved adhesion between a dense coating and the substrate is described. For cost reasons, a continuous roll-to-roll coating process is preferred where the line can coat one or more strip edges in the same roll-to-roll coating process. In addition, for quality reasons, a dense coating with very good adhesion to the substrate is advantageous. From a cost perspective, it is also an additional advantage if there is such good adhesion of the abrasion-resistant coating that there is optionally no need for a separate bonding layer.

An exemplary embodiment of a continuous roll-to-roll deposition coating apparatus includes a vacuum process chamber, which includes an etching zone upstream of a deposition zone, at least one ion-assisted etchant in the etching zone, and at least one deposition apparatus deposition zone, wherein the at least one deposition zone comprises at least one source (en: target), wherein the strip substrate during movement through the vacuum process chamber, directs a first edge region towards the at least one ion-assisted etchant etching zone, and directs the first edge region towards the source of the at least one deposition apparatus in the deposition zone, wherein the strip substrate first angled surface tapering from a first proximal position toward a first distal position, the first proximal position being located closer to a central region of the band substrate than the first distal position, the first angled surface having a first a surface standard and wherein the source of the at least one deposition apparatus comprises a source surface having a source standard, and is angled relative to the first angled surface so that the source standard intersects the first surface standard at an angle or, where ot is greater than or equal to 90 degrees.

An exemplary embodiment of a method of continuously coating an edge on a strip substrate comprises supplying at least one strip substrate to a vacuum process chamber, the strip substrate comprising a body, a first main side opposite a second main side and a first iateral side opposite a second Iateral side, where the first and second Iteral sides are narrower than the first and second main sides, the strip substrate being moved through the vacuum process chamber, the vacuum process chamber including at least one ion-assisted etchant in an etching zone and at least one deposition apparatus in a deposition zone, where there is a deposition zone. of a first edge region of the at least one strip substrate in the etching zone, the first edge region including at least a first angled surface tapering from a first proximal position to a first distal position, the first proximal position being located closer to a center an area of the strip substrate other than the first distal position, and the first angled surface has a first surface normal, the coating being deposited on the first angled surface of the first edge area in the deposition zone, and the coated strip substrate being collected, wherein the at least one deposition apparatus comprises at least one source, the at least one strip substrate, as it moves through the vacuum process chamber, directing the first edge region towards the at least one ion-assisted etcher in the etching zone and directing the first edge region towards the at least one deposition zone and at least one deposition zone. wherein the source of the at least one deposition apparatus comprises a source surface with a source normal and is angled relative to the first angled surface so that the source normal intersects the first surface normal at an angle α, where α is greater than or equal to 90 degrees.

Another example of a continuous roll-to-roll deposition coating apparatus comprises a vacuum process chamber, which includes an etching zone upstream of a deposition zone, at least one ion-assisted etcher in the etching zone, and at least one deposition apparatus in the deposition zone, the at least one deposition apparatus comprising at least one . During movement through the vacuum process chamber, the strip substrate directs a first edge region toward the at least one ion-assisted etchant etching zone and directs the first edge region toward the source of the at least one deposition apparatus in the deposition zone.

The first edge region of the band substrate is divided and has a first proximal position and a first distal position, the first proximal position being located closer to a central region of the band substrate than the first distal position, and the first edge region having a first surface normal. The source of the at least one deposition apparatus comprises a target surface which has a target normal and is angled relative to the first edge area so that the source normal intersects the first surface normal at an angle α, where or is greater than or equal to 90 degrees. 10 15 .zo 25 30 529 426 1; BRIEF DESCRIPTION OF THE DRAWINGS The following detailed description of preferred embodiments can be read in conjunction with the accompanying drawings, in which like numerals indicate like elements, and in which: Figure 1 schematically shows a production line for manufacturing a coated metal strip according to a described embodiment. shows the schematic production line for production of coated; i 7 _ metal strip viewed along the line .A-Ai Figure 1.Ü b b '. 'I b coatings on egg geometries.

Figure 3 shows various examples of egg geometries and examples of __ 'Figure 4 shows a schematic cross-section of an alternative arrangement for the plurality of strip substrates.

Figures öa and öb show: another example of the relationship between the - projecting distance d of a strip substrate, the separating distance in the direction of the y-axis "between successive strip substrates y, and the angle_trans vertical, y and y ', of each source. RECOMMENDATIONS In A dense and abrasion resistant coating with good adhesion properties and a continuous deposition coating apparatus are described. edge is used, for example, in shaving equipment, medical instruments, utility knives and industrial knives, saw applications, scraper and coating blade applications or creping blades for use in creping paper in papermaking. A suitable coating for use in the above applications has a dense layer of an abrasion resistant coating with good adhesion, which is hard, but also tough enough to withstand the stresses and pressures during use, with reduced or no tendency to brittleness or to tear loose. Low friction coatings can also be used, alone or in combination with other properties of the coatings.

Description of the coating materials and device.

Abrasion resistance can be achieved by depositing, for example, a coating with at least one layer of dense transition metal nitride or mixtures of these nitrides, such as TiN, ZrN, TlA | N, ZrAlN, VN, TiVN, VAlN, CrN, CrgN, CrAlN, MoNx, WNx preferably a layer of a TiN or CrN-based material. Depending on the requirements, an optimum of desired hardness, toughness and / or corrosion resistance can be achieved by using mixed nitrides in the coating. This can be achieved by selectively selecting the alloy composition of the source material for deposition, e.g. for deposition by arc evaporation or sputter deposition. Coatings with fl your layers can also be used to allow a combination of nitrides to optimize hardness and toughness by having up to 20 sublayers in the multilayer coating, with optional carbide additive series sublayers or separate, carbide-based sublayers.

Abrasion resistance can also be achieved by depositing, for example, a coating with at least one layer of dense metal carbide material in the form of TiC, ZrC, VCx, CrCx, MoCx, WC, or mixtures of these carbides, preferably layers of TiC, WC or a CrCx-based material. . Depending on the requirements, an optimum of desired hardness and toughness as well as corrosion resistance can be achieved by using mixed carbide coating. This can be achieved by selecting the alloy composition of the source material for deposition, e.g. for deposition by arc evaporation or sputter deposition.

Coatings with fl your layers can also be used to allow a combination of carbides to optimize hardness and toughness by having up to 20 sublayers in the multilayer coating with different carbides in the sublayers, with optional nitride additives in the sublayers or separate nitride-based sublayers. Carbonitrides, such as Ti (C, N), can also be used in the coatings or in the sublayers, either alone or in mixtures.

Abrasion strength or low friction can be achieved by depositing, for example, a coating with at least one layer of a dense, diamond-like carbon layer (Diamond Like Carbon = DLC). Said DLC layer can be mixed with smaller amounts of transition metals, such as Ti, Ta, W and / or Cr. Depending on the requirements, an optimum of desired hardness and toughness and corrosion resistance and friction can be achieved by using effective amounts of a transition metal additive, up to about 20%, alternatively from> 0 to about 10%. This can be achieved by selecting the alloy composition of the source material for deposition, e.g. for deposition by arc evaporation or sputter deposition. Multilayer coatings can also be used to enable a combination of DLCs to optimize hardness and toughness by having up to 20 sublayers in the multilayer coating with different nitrides in the sublayers, with optional carbide additives in the sublayers or separate carbide-based sublayers.

As an alternative to the abrasion resistant layer described above consisting mainly of nitrides, other coatings, such as metallic coatings, can be used in the described embodiments.

Metallic coatings such as substantially pure Ti, Zr, V, Nb, Ta, Cr, W, Fe, Mo, Ni, and Fe, or alloys of these materials, such as TiAl, NiAl and FeCrAlY, can be used if a simple and inexpensive coating is to prefer for 10 20 25 in 5.29 426 / o to reduce costs as much as possible. Thin layers of pure metallic coatings as described here, e.g. the metallic coatings, may also be used as a binder coating layer between the steel strip edge and a second coating, where the second coating may have a composition comprising a transition metal nitride or carbide or metal-containing diamond-like carbon (Me-DLC, where Me is a transition metal. such as Ti, Ts, Cr and W) or a layer of diamond-like carbon (DLC).

As an alternative to abrasion resistant and / or low friction DCL coatings, materials containing MAX phases can be deposited. A MAX phase material is a ternary compound of the following formula MMAZX ". M is at least one transition metal selected from the group Ti, Sc, V, Cr, Zr, Nb. A is at least one element selected from the group consisting of Si, Al, Ge and / or Sn and X are at least one of the non-metals C and / or N. The amounts of the various components of the single phase material are determined by n and z, where n is in the range 0.8-3.2 and z in the range 0.8- Consequently, examples of compositions within the group of MAX phase materials are: TigSiCz, TigAlC, TizAlN and TigSnC In addition to pure MAX phase coatings, composite coatings comprising MAX phases can also be coated. coatings of metallic elements, such as nickel or titanium, can still optionally be used in one of these layers, if desired from a technical perspective, eg to improve the toughness.

As for nickel, it is used because nickel is expensive, usually only in very thin layers, preferably between 0 and 2 μm, more preferably between 0 and 1 μm and preferably between 0 and 0.5 μm. However, any possible nickel layer, if used, would not be the layer adjacent to the strip substrate. The methods disclosed and described herein are suitable for thin coatings of hard and dense, abrasion resistant coatings in thicknesses on either side of an edge area of a strip substrate, up to a total of 25 microns, normally up to a total of 20 pm, preferably up to a total of 15 pm. A maximum of 12 pm or preferably a maximum of a total of 10 pm is preferable from a cost perspective. If thicker coatings are to be applied, an optimum in cost versus properties can be achieved by using multilayers with up to 10 layers and where each layer is between 0.1 and 15 μm thick, preferably between 0.1 and 10 μm or more preferably between 0, 1 and 7 μm, more preferably 0.1 to 5 μm and even more preferably 0.1 to 3 μm. Other suitable coating thicknesses include 510 μm, 55 μm and 51 μm. The coating must be sufficiently resistant to withstand abrasion and shear to which the treated material is subjected, however, it should not be too thick for economic reasons and with regard to brittleness / brittleness. For example, the ratio between the thickness of the coating and the substrate material for coating sheets and doctor blades may be between 0.1% to 12%, normally 0.1 to 10% and usually 0.1 to 7.5% but preferably between 0.1 to 5%.

Description of the substrate material to be coated: The material to be coated should basically have a good mechanical strength, which is suitable for the intended application. In one example, the strip substrate is a curable steel in a hardened and temperate state, or alternatively a precipitation hardening steel, such as the alloy described in WO 93/07303, which in the final state can achieve a tensile strength of over 1200 MPa, or preferably more than 1300 MPa, or at best over 1400 MPa, or even 1500 MPa.

If the final, coated product is intended for use in a corrosive environment, the steel alloy in the strip substrate should also have a sufficient addition of chromium to enable good basic protection against corrosion. For example, the Cr content may be above 10% by weight, or at least 11%, or preferably a minimum of 12%.

The coating method can be applied to any substrate made of said steel alloy type and in the form of a strip, which has good hot working properties and can also be cold rolled to thin dimensions.

The alloy may also typically be easily manufactured for the desired end product, such as coating or doctor blade applications, shaving equipment such as razors and / or scissors, medical instruments, utility knives and industrial knives, various saws, and other belt product applications, in a manufacturing process involving steps such as shaping, grinding, shaving, cutting, polishing, pressing or the like.

The thickness of the strip substrate is usually between 0.015 mm and 5.0 mm and preferably between 0.03 mm and 3 mm. Preferably it is between 0.03 and 2 mm and even more preferably between 0.03 and 1.5 mm. The normal thickness for coating blades ranges from 0.3 up to 1.0 mm, while that for doctor blades ranges from 0.1 up to 0.4 mm, and for razor blades the normal thickness range of the strip material is 0.076 up to 0.1 mm.

The width of the strip substrate material and the shape of the edge to be coated depend on the intended use of the final product. In addition, the width can optionally be selected to be a width suitable for further manufacture to the final width of the coated product. Suitable examples of widths are 1 to 500 mm, preferably 1 to 250 mm, or preferably 1 to 100 mm, depending on the final product. The length of the tape substrate material is suitably between 10 and 20,000 m, preferably between 100 and 20,000 m. The tape substrate material is usually on a spool or roll for handling both before and after the coating has been applied. Of course, the dimensions of the strip substrate are adapted to the intended use of the final product and other minimum and maximum thicknesses can be suitably used. Description of the coating method and the coating: A number of physical or chemical deposition methods can be used for the application of the coating medium / material and the coating process, as long as they provide a continuous, uniform and adhesive coating. Examples of deposition methods are: Chemical Vapor Deposition (CVD), organometallic chemical vapor deposition (MOCVD), Physical Vapor Deposition (PVD), such as sputtering and evaporation by resistive heating, by electron beam, by induction of light, or by laser deposition methods. Arc evaporation or sputtering, especially magnetron sputtering, are two examples of preferred deposition methods. Although the deposition apparatus is referred to, and described herein, at certain points by reference to the arc evaporation and sputter deposition methods, the description, principles and methods may be applied analogously to the other types of deposition methods and techniques. Thus, it will be appreciated by one of ordinary skill in the art that although deposition apparatus is generally discussed or arc evaporation and sputtering specifically, other deposition methods fall within this description.

The coating method is integrated in a roll-to-roll strip production line and the coating is deposited through a selected deposition apparatus, for example by arc evaporation or sputtering continuous roll-to-roll deposition coating apparatus. If multilayer is needed, the formation of multilayer can be achieved by integrating several arc emission or sputtering sources one after the other in the deposition chamber (s). Furthermore, coatings on the edge area of the strip substrate can be regulated by placing the sources at suitable angles to the surface on which the coating is to be deposited. The deposition of metallic coatings is carried out from metallic sources in a reduced atmosphere at a maximum pressure of 1 x 104 mbar without the addition of any reactive gas to favor substantially pure metal films.

The deposition of metal carbides and / or nitrides such as TiN, TiC, CrN, CrCx, VN, TiAlN and CrAIN, is carried out from metallic sources with the addition of reactive gases. Metal carbides and metal carbonitrides, such as TiC and Ti (C, N), can also be deposited from composite sources, containing both a transition metal and carbon. The conditions during the coating can be adjusted with regard to the partial pressure of a reactive gas to enable the formation of the intended compound. In the case of nitrogen, a reactive gas such as N 2, NH; or N 2 H 4, but preferably Ng, can be used. In the case of carbon, any carbon-containing gas can be used as the reactive gas, for example CH4, C2H2 or C2H4.

The deposition of metal oxides is carried out under reduced pressure with the addition of an oxygen source as reactive gas in the chamber.

To enable good adhesion, different types of cleaning steps are used. First, the surface of the substrate material is cleaned to remove oil residues, which can otherwise adversely affect the efficiency of the coating process and the adhesion and quality of the coating. In addition, very thin natural oxide layers, which are normally found on a steel surface, are removed. This can preferably be done by including a pre-treatment of the surface before depositing the coating. In the roll-to-roll production line, the first production step consists of a purification step, for example preferably an ion-assisted etching of the surface of the metallic strip substrate, in order to achieve good adhesion of the first coating. The coating is performed at a speed of at least 0.1 meters per minute, preferably 0.5 m / min, most preferably 1 m / min. The speed of movement of the strip substrate may depend on the number of sources and the deposition rate of the deposition technique, where more sources increase the deposition rate and thus allow an increased movement speed of the strip substrate to be used. Figure 1 schematically shows an example of a production line for manufacturing a coated metal strip according to a first described embodiment. Figure 1 illustrates the production line for fabricating a coated metal strip as a continuous roll-to-roll deposition coating apparatus 100. The continuous roll-to-roll deposition coating apparatus 100 includes a supply chamber 102 including a unwinding reel 104 for each of a plurality of strip substrates 106. , each arranged in a reel 108, and a collection chamber 110 including a winding reel 112 for each of the multiple belt substrates 106. A vacuum process chamber 114 is located between the feed chamber 102 and the collection chamber 110.

The vacuum process chamber 114 includes an etching zone 116 upstream of a deposition zone 118. At least one ion-assisted etchor 120 is located in the etching zone 116, and at least one deposition apparatus 122, which includes at least one source 124, is located in the deposition zone 118.

In the illustrated continuous rulie-to-ruler deposition coating apparatus 100, four separate tape substrates are shown. It is to be understood, however, that the continuous roll-to-roll deposition coating apparatus 100 may have any number of strip substrates. For example, from 1 to 10, or even more, strip substrates can be used. In another example, the continuous roll-to-roll deposition coating apparatus 100 could have up to 100 strip substrates in the line when forming strip substrates for razor blade applications, but could have only four strip substrates in the line if designed to form strip substrates for coating and doctor blade applications. . In general, the more bands that are included, the more productive the line becomes, but it also becomes more complex.

The components of the ion-assisted etchant 120, including inert gas-plasma generating equipment for producing a plasma for abutment against the strip substrate, are operatively arranged within the vacuum process chamber 15 529 426 m; 114 to remove the thin oxide layer on the strip substrate material prior to depositing the coating.

The components of the arc evaporator 122, including arc generating equipment for producing an arc and an evaporation source or sputter 122, including a sputtering source and a sputtering target (herein referred to as a source), are operatively arranged within the vacuum process chamber 114 to dispense a bump to the band 114. Lateral sides of the tape substrate can be coated. For example, and as shown in Figure 1, the belt substrate 106 from each of the multiple reels, as it moves from the supply chamber 102 through the vacuum process chamber 114 to the collection chamber 110, directs a first edge region (an example of which is shown at 140 in Figures 2 and 3). , and at 140 '140 ", 140'" and 140 "in Figure 4) toward the at least one ion-assisted etchant 120 in the etching zone 116, and directs the first edge region toward the source 124 in the at least one arc evaporator or sputter 122 in the deposition zone 118. 1 exemplary embodiments, and as shown in Figure 2, the first edge region 140 of the tape substrate 106 includes at least a first angled surface 142 which tapers from a first proximal position 144 toward a first distal position 146. The first proximal position 144 is shown located closer to a central region 148 of the band substrate 106 than the first distal position 146. However, the location of the first proximal position on the band substrate is in is not limited and may, in optional embodiments, be on an opposite end of the strip substrate, from the first edge region, so that the taper of the angled surface extends across a full dimension of the strip substrate.

In some embodiments, the first distal position 146 of the first angled surface 142 has the same extent as an edge on the tape substrate 106, 529 426 I? for example one of the lateral sides of the strip substrate 106. The first angled surface 142 has a first surface normal 150. In Figure 1, the strip substrate 106 is viewed from the lateral side, and the first edge region 140, including the first angled surface 142, is in a direction into the the view, directed towards the sources 124. Figure 3 shows different examples of egg geometries and different examples of coatings on the examples of egg geometries. Figure 3 shows variations of the strip substrate 106 with a coating 130. As seen in Figure 3, a strip substrate 106a, at the first edge region 140, may be square cut and have a coating 130 enclosing the first edge region. Figure 3 also shows strip substrates 106b-106e having different geometries in the first edge region 140, including square cut-off (106a), cut-off with rounded or bevelled corners (106b), tapered on one side (106c and 106d), which tapers off on both sides (106e), and rounded (106e). The tapered parts can be terminated at an angle, or rounded or chamfered. In each case, the coating 130 fully or partially conforms to the shape of the underlying first edge region 140. At the border of the deposit, the coating 130 may optionally be thinned toward the surface of the underlying tape substrate 106.

The surfaces of the first edge region 140 of the strip substrate 160 have specific, spatial or spatial, relations with the sources 124. These relations allow, for example, a plurality of substrates arranged vertically spaced apart (e.g. arranged spaced along the direction of the y-axis), to be cleaned by the ion-assisted etchant 120 and to each depositing a coating by the deposition apparatus 122 as the strip passes through the zones of the vacuum process chamber. The multiple strip substrates can also optionally be displaced horizontally (e.g., arranged staffed or zigzagged at a distance in the direction of the iz axis shown in Figure 4) to allow each to be cleaned by the ion-assisted etchant 120, and that at each and a coating is deposited by the deposition apparatus 122 as the strip substrates pass through the zones of the vacuum process chamber 114. In one embodiment, the source 124 of the deposition apparatus 122 is angled from the vertical at a desired angle, represented by y in Figure 2. In embodiments with several sources 124, such as for depositing coatings of more than one material, and / or for depositing coatings on more than one side of the first edge region of the strip substrate, successive sources or groups of sources may be used.

Each source 124 can be placed for a desired coating effect. For example, successive sources or groups of sources can be angled from a vertical at different desired angles, represented by y and y 'in Figure 2. Generally, each source is mounted on a source holder (not shown), which can be individualized for each source, or collectively hold more than one source. The source holder is rotatable about a pivot point and / or movable in fl your directions and / or movable in combinations resulting in inclination and has at least one degree of freedom, preferably at least two degrees of freedom, or three degrees of freedom. A source holder can be manually manipulated during adjustment of the continuous roll-to-roll deposition coating apparatus 100, or remotely controlled through a control interface to allow in-situ changes of the source holder position. Such scarring can be done, for example, by manipulating piezoelectric, pneumatic, or other, electronic or mechanical devices to change the position and orientation of the source holder relative to a calibrated position or orientation. One of the degrees of freedom may consist of pivoting about a geometric axis located in the x-direction so that a surface of the source is angled relative to the surface of the strip substrate to be coated.

This type of motion is shown in Figure 2, where the angles y and y 'of the sources 124 can be any desired angle. In some embodiments, the angles y and y 'are selected to maximize the deposition of coatings on the first edge regions 140 of the strip substrate 106. In some embodiments, the angles y and y' are selected to minimize shading of the first edge region IO other, adjacent areas, or areas near the first edge area during the deposition of coatings, or to achieve a desired shadow effect. In some embodiments, both of the above considerations are applied and a balanced approach is used. y and y 'may be the same angle, complementary angles, mirror images through a horizontal reference plane, or may be different, whatever is needed to achieve the desired coating effect.

For example, the source of the at least one arc deposition apparatus 122 includes a source surface 126 with a source normal 128. The source surface 126 is angled relative to the first angled surface 142 on the first edge region 140 so that the source normal 128 intersects the first surface normal 150 at an angle a. for example, the angle α is greater than or equal to 90 degrees. In another example. is the angle a from 90 to 135 degrees. Similar angular conditions for more than one source can be developed and implemented in the continuous roll-to-roll deposition coating apparatus 100, and can be applied to both sources in the deposition apparatus in the deposition zone 118, as well as to sources of ion-assisted etchers in the etching zone 116. Another of the degrees of freedom may be offset in the z-direction (shown in the axes of Figure 2), the sources 124, 180 being spaced from the first edge region 140.

A change in the distance between the sources 124, 180 and the first edge area 140 can affect the deposition rate and the quality of the coating. A further degree of freedom is the translation in the yy direction (shown in the axes in Figure 2), the sources 124, 180 being located at different heights relative to the first edge area 140. A translation of the sources 124, 180 relative to the first edge area 140 can affect the deposition rate and the quality of the coating.

The degrees of freedom of the source can consist of coating several surfaces on one or more strip substrates by maneuvering the sources according to the degrees of freedom. In an example in 529 426 310 example, the source holder is mounted on the back, e.g. the side opposite the active surface 126, 182, and the source holder includes rails, racks and / or gears to provide the necessary degrees of freedom.

In some embodiments, for example, the first edge region 140 of the tape substrate 106 has more than one surface to be coated, and / or more than one surface that is angled. For example, an edge on the strip substrate, a first and / or second main side of the strip substrate, whether angled or not, and / or a combination of these surfaces, may have a coating deposited thereon in the deposition zone.

For example, the first edge region 140 of the strip substrate 106 may include a second angled surface 160 on an opposite major side of the strip substrate 106 from the first angled surface 142. The second angled surface 160 tapers from a second proximal position 162 toward a second distal position 164. The second proximal position 162 is located closer to the central region 148 of the band substrate 106 than the second distal position 164. In some embodiments, the second distal position of the second angled surface 160 has the same extent as an edge on the tape substrate 106, e.g. one of the lateral sides of the strip substrate 106. In some embodiments, the first distal position 146 of the first angled surface 142 and the second distal position 164 of the second angled surface 160 thereof have a common boundary and form a knife edge. The second angled surface 164 has a second surface normal 170. Figure 2 shows the strip substrate 106 from one of the lateral sides and the first edge area 140, including the second angled surface 160, is in the direction of the view, projecting towards the evaporation sources 124.

The continuous roll-to-roll deposition coating apparatus may have your deposition apparatuses in the vacuum process zone, e.g. arc evaporators or sputters. For example, an embodiment of a continuous roll-to-roll roll-deposition coating apparatus may include a second (or more) deposition apparatus in the deposition zone (as shown schematically in Figure 1 (six sources) and Figure 2 (two sources), for example. sources)). In these examples there is a second (or subsequent) depositing apparatus 172 downstream of the depositing apparatus 122 in the process direction, e.g. in the direction 174 in Figure 1. Like the deposition apparatus 122, the second (or subsequent) deposition apparatus 172 includes a source 180. The second source 180 of the second deposition apparatus 172 includes a source surface 182 having a source normal 184 and is angled relative to the second angled the surface 160 so that the source normal 184 intersects the second surface normal 170 at an angle ß. In one example, the angle ß is greater than or equal to 90 degrees. In another example, the angle ß is from 90 to 135 degrees. In still other examples, or may be equal to ß or different from ß.

Successive deposition apparatuses may be included in the continuous roll-to-roll deposition apparatus 100 and each also include a source. Figure 1, for example, shows six deposition apparatuses, each with a separate source 124, the sources being shown alternately with different angles y and y '(equilateral sources are represented by the same shading l Figure 1) and, to the extent with different angles a and ß. However, different angles for each source can be used as desired to achieve different coating effects and it is not required that the sources be equilateral. Furthermore, the source of the first deposition apparatus may be the same material as, or a material other than, the source of the second deposition apparatus and / or the source of any of the following deposition apparatuses. Figure 1 illustrates an optional control device 186 operatively coupled to the unwinding reel 102 for each of the various tape substrates 106 arranged in a reel 108, and to the winding reel 112 for each of 25 ~ 529 426 .m. the various tape substrates 106. The controller 186 controls the rate of supply and collection of the tape substrate 106 through the vacuum process chamber 114 to achieve a desired voltage of the tape substrate 106 in the deposition zone 118.

As mentioned herein, a plurality of strip substrates may be arranged vertically. of this. For example, and as shown in Figure 2, the multiple band substrates 106 may be separated vertically (e.g., spaced apart in the y-axis direction) by an optional spacer 188 between successive band substrates 106. In another example, and shown in Figure 2, the projecting first edge region 140 of each of the multiple band substrates 106, protrudes the same stretch d from an inner surface 190 of the vacuum process chamber 114.

In some examples, the first distal position 146 and / or the second distal position 164 for each of the multiple band substrates 106 is staffed or arranged zigzag. For example, the first distal position of a lower band substrate may be at a first distance, and the first distal position of a top band substrate at a second distance, the second distance being greater than the first distance. As another example, the first distal position 146 of each of the multiple band substrates 106 between the lower band substrate and the top band substrate is at a graduated distance between the first distance and the second distance. in Figure 4 shows an optional combination of horizontally offset (e.g. offset along the z-axis) and vertically offset (e.g. offset along the y-axis) arrangements. As an example, the vertical displacement dn, n = 1, 2, and the horizontal displacement y may be such that one of the strip substrates 106 'does not block the deposition of material on a first edge region 140 "of the next strip substrate. 106 "during the deposition process. Eg does not shade the next strip substrate. Vertical and horizontal displacement of successive strip substrates can analogously have distances to minimize or prevent shading during the deposition process. L Figure 4 shows the first protruding edge area 140 ', 140", 140 '", 140" "of each of the plurality of strip substrates 106', 106", 106 "', 106" "out a different distance dn, n = 1,2,3, ..., from an inner surface 190 in the vacuum process chamber 114, e.g. are horizontally offset (eg staffed in the z-axis direction). The spacer 188 and other portions of the deposition zone, such as the wall of the interior surface 190, may be cooled by, for example, a flow of liquid or gas through cooling channels 192.

It should be understood that the device in the etching zone, e.g. the ion-assisted etchor, has a source which can also be optionally angled, displaced or translated in one or more degrees of freedom similar to the angulation, displacement and translation of one or more sources in the deposition apparatus.

The continuous roll-to-roll deposition coating apparatus 100 may optionally be under atmospheric control, e.g. vacuum or specified atmosphere, or optionally parts of the continuous roll-to-roll deposition coating apparatus 100 may be under such atmospheric control. For example, the vacuum process chamber 114 may be under atmospheric control and the continuous roll-to-roll deposition coating apparatus 100 includes an inlet vacuum lock system 200 at an inlet side 202 of the vacuum process chamber 114, and an outlet vacuum lock system 204 at an outlet side 20 of the vacuum chamber 10. The supply chamber 102, the vacuum process chamber 114, and the collection chamber 110 are all under atmospheric control.

Atmospheric controls may include maintaining the vacuum process chamber 113 at a specified operating pressure. Atmospheric control may also include maintaining each of the supply chambers 102 and the collection chamber 110 at a specified operating pressure. The specified working pressure does not have to be the same for each chamber. An example of a working pressure is a maximum of 1x10'2 mbar. Atmospheric controls may also optionally involve maintaining an atmosphere at least the vacuum process chamber 114, which does not include reactive gases or a specified gas or gas concentration. In one example, both the unwinding reel 104 and the winding reel 112 are under atmospheric control. For example, the unwinding reel 104 and the winding reel 112 may be under vacuum and have the necessary equipment, e.g. vacuum pumps, connected to these two chambers (not shown).

Between the supply chamber 102 and the vacuum process chamber 114, a vacuum locking system 200 with supervisors similar to tape guides 188 located the vacuum process chamber 114. For example, the tape substrate 106 may pass through a narrow section to avoid gas diffusion from the supply chamber 102 into the vacuum process chamber 102. a lower pressure than the vacuum process chamber 114, or at least a lower pressure than the etching zone 116, so that the gas from the etching zone 116, e.g. Ar gas, diffuses into the supply chamber 102 and "residual gas" from the supply chamber 102 does not flow into the vacuum process chamber 114.

In another example, between the etching zone 116 and the deposition zone 118, there is an intermediate vacuum locking system 210 with strip conductors similar to the strip conductors 188 located in the vacuum process chamber 114. A pump capacity in the intermediate vacuum locking system 220 is greater than the pumping capacity of the deposition zone 118 and greater than the pump capacity of the etching zone 116, to develop and maintain a lower pressure in the intermediate vacuum locking system 210 relative to each of the deposition zone 118 and the etching zone 116, so that reactive gas from the deposition zone 118 does not diffuse into the etching zone 116. ie the intermediate vacuum lock system 210 acts as a gas lock.

The gas lock can be done in two ways - either with a lower pressure in the vacuum lock system 210, e.g. a chamber in an intermediate vacuum locking system 210 removes gas which diffuses into it from both the etching zone 116 and the deposition zone 118, or with a higher gas pressure in the intermediate vacuum locking system 210, e.g. a chamber in an intermediate vacuum locking system 210 supplies gas which diffuses into the etching zone 116 and the deposition zone 118, which is acceptable since such diffusion will also block a reactive gas diffusing from the deposition zone 118 to the etching zone 116. In a further example, between the vacuum process chamber 114 and the collection chamber 110, a vacuum locking system 204, similar to the type described with respect to the vacuum locking system 200 between the supply chamber 102 and the vacuum process chamber 114.

An example of pressure conditions in the various chambers, zones and / or vacuum locks in an exemplary apparatus could be described as follows: Pressure (supply chamber) <Pressure (etching zone)> Pressure (intermediate vacuum lock) <Pressure (deposition zone)> Pressure (collection chamber) Eq. 1 10 l5 20 25 529 426 ätt »Or, if argon gas is introduced into the intermediate chamber: Pressure (unwinding reel) <Pressure (etchant) <Pressure (intermediate, argon)> Pressure (deposition)> Pressure (winding reel) Eq. Now, a further example of the relationship between the projecting distance (d) of a strip substrate, the direction of separation in the y-axis direction between successive strip substrates (y), and the angle to the vertical of each of the sources (y and f, respectively) will be shown by reference to Figures 5a and 5b. l F ig. 5a, some of the features of Fig. 2 are represented and similarly provided with reference numerals. In addition, features associated with the two lower band substrates 106 are illustrated. These include placement on the surface of the bottom tape substrate as it begins to protrude beyond the inner surface 190 of the vacuum process chamber 114, indicated by the reference numeral M, placement on a projection of the surface of the bottom tape substrate representing the longest degree of ejection of the tape substrate 160, regardless of its shape. (see Fig. 3), indicated by the reference numeral N, and location on the surface of the next strip substrate, where the strip substrate begins to protrude past the inner surface 190 of the vacuum process chamber 114, indicated by the reference numeral O. As illustrated, the line segment W is representative of the surface on the lower band substrate facing the next band substrate, the surface of which contains the point O and the distance of the line segment -MYV- is d, and the separation from the line segment TÃ to point O is the distance to the line segmentlTÖ and is illustrated as y.

Referring now to Fig. 5b, the above-mentioned geometric positions and features are represented in a highly schematic illustration, the relationship between the angle i in the triangle formed by the MNO and the angle γ previously described elsewhere in FIG. this description, can be determined. As illustrated in Fig. 5b, a right-angled triangle MNO can be formed between the two band substrates 106, with a right angle at M and an angle 6 at N. The angle förhåll relates to the line segments _MÜ \ 7 and à / Élengths by the following: e = rafflry / d) Eq. A triangle 300 may, as illustrated in Fig. 5b, be formed with a base coinciding with the surface 126 of the source 124, and where one side is formed by the normal 128, which contains the line segment NO itrangel MNO, and / or is parallel to the hypotenuse W in the triangle MNO. The triangle 300 has a 90-degree angle and an angle k, which is equal to the angle..

With this information, two additional angles can be determined. First, the angle γ can be determined to be equal to the angle Därför. Therefore, for orientation of the sources 124 and 180, the angle γ can be expressed as a function of the spatial position and ratio of the tape substrate 106 as follows: y =: arfRy / a) = e Eq. 4 A similar relationship can be developed for the angle y ”.

Second, the angles oi and ß can also be expressed as a function of the spatial position and ratio of the strip substrate 106 as follows: u '= 90 ° + iarrlly / d) Eq. IS 20 25 in 529 426 Qi 'a' is approximately equal to a and varies only with one of the angled surfaces on the projecting end of the strip substrate 106 (see, for example, Fig. 3). led first assumption does this angled surface differ from the flat first surface fi? in the angle ö. Therefore, the angle or in a first assumption can be expressed as: Q = CC + Ö A similar relationship can be developed for the angle ß.

It will be appreciated that although described and illustrated with reference to the two lower belt substrates by an arrangement of a plurality of belt substrates, the same principles and conditions may be provided for any of the belt substrates in the exemplary continuous roll-to-roll deposition coating apparatus. 100. The continuous roll-to-roll deposition coating apparatus 100 can deposit coatings on strip substrates in a continuous operation. An example of a method of continuously coating an edge on a strip substrate comprises supplying at least one strip substrate from a supply chamber to a vacuum process chamber, the strip substrate comprising a body, a first main side opposite a second main side, and a first lateral side which is opposite a second lateral side, where the surfaces of the first and second lateral sides are narrower than the surfaces of the first and second main sides, movement of the at least one strip substrate through the vacuum process chamber, the vacuum process chamber including at least one ion-assisted etchor in an etching zone, and at least one deposition zone; comprising at least one source in a deposition zone, where the etching zone is located upstream of the deposition zone, cleaning a first edge area on the at least one strip substrate in the etching zone, the first edge area including at least a first angled surface tapering from a first 10 A20 25 30 529: vi 426 proximal pos towards a first distal position, where the first proximal position is located closer to a central region of the strip substrate than the first distal position, where the first angled surface has a first surface normal, depositing a coating on the first angled surface of the first edge region in the deposition zone, and collecting the coated tape substrate in a collection chamber. The at least one strip substrate directs the first edge region towards the at least one ion-assisted etchant in the etching zone and directs the first edge region towards the at least one source of the deposition apparatus, during its movement from the supply chamber through the vacuum processing chamber to the collection chamber. The source of the at least one deposition apparatus includes a source surface having a source normal and is angled relative to the first angled surface so that the source normal intersects the first surface normal at an angle α. The angle α may be as described with respect to embodiments of the apparatus 100. Examples of the angle α include a which is greater than or equal to 90 degrees, a = from 90 to 135 degrees, and a is about 90 ° + tan "(y / d), where y is the separation distance in the y-axis direction between In some embodiments, two surfaces of the tape substrate may be coated. the surface tapers from a second proximal position toward a second distal position, the second proximal position being located closer to the central region of the band substrate than the other distal position. The second angled surface has a second surface normal. In this example, the method comprises cleaning the second edge area of the at least one strip substrate etching zone, and depositing a coating on the second angled surface of the first edge area in the deposition zone. This method example may use one or more etching zones, which include one or more ion-assisted etchers, and may use one or more deposition zones, which include one or more deposition apparatuses. For example, a second (or subsequent third or fourth, and so on) landfill apparatus that includes a second (or subsequent third or fourth, and so on) source may be the landfill zone. The second (or subsequent third or fourth and so on) arc evaporator or sputter is located downstream of the at least one arc evaporator or sputter in the process flow direction.

The second source comprises a source surface which has a source normal and is angled relative to the second angled surface so that the source normal intersects the second surface normal at an angle ß. The angle ß may be as described with respect to embodiments of the apparatus 100. Example of the angle ß includes ß greater than or equal to 90 degrees, ß = from 90 to 135 degrees, and ß is about 90 ° + tan'1 (y / d), where y is the separation distance in the direction of the y-axis between successive band substrates , and d is the distance that the tape substrate protrudes. In some examples, a is equal to ß, and in other examples, ot is not equal to ß. In all these method examples, further manipulation of the sources can be performed in the degrees of freedom given by the source holder, e.g. one degree of freedom, two degrees of freedom or three degrees of freedom. The method may optionally include controlling a feed rate and a collection rate of the tape substrate through the vacuum process chamber to achieve a desired voltage of the tape substrate in the deposition zone.

The position of the strip substrate inside the vacuum process chamber can be adjusted to affect the desired location and quality of the coating. For example, the protruding first edge region of each of the multiple 10 15 20 25 30 529 426 ”eel strip substrates may protrude the same cover. Here, the angle of the source surface relative to the surface to be coated contributes to the adjoining strip substrate not shading the surface to be coated. In another example, the protruding first edge region of each of the multiple band substrates protrudes a different distance. Here, both the difference, the ejection distance and the angle of the source surface relative to the surface to be coated, contribute to adjacent strip substrates not shading the surface to be coated. Other examples of the positioning of the tape substrate include that the first distal position of each of the folded tape substrates, which are spaced, and the first distal position of a lower tape substrate are at a first distance, the first distal position of a top tape substrate is at a second distance. distance, and the second distance is greater than the first distance. A further example involves that the first distal position of each of the random band substrates between the lower band substrate and the top band substrate is at a graduated distance between the first distance and the second distance.

The method can optionally regulate the atmosphere in one or more areas of the device.

For example, the vacuum process chamber may have a controlled atmosphere and an inlet vacuum locking system may be located on the inlet side of the vacuum process chamber and an outlet vacuum locking system may be located on the outlet side of the vacuum process chamber. The etching zone and the deposition zone are also separated by a vacuum locking system. In this example, the method involves moving the at least one tape substrate through the input vacuum lock system and the output vacuum lock system. In another example, in addition to the vacuum process chamber, the supply chamber and the collection chamber may also be under a controlled atmosphere. An example of a controlled atmosphere involves maintaining the vacuum process chamber at a working pressure of a maximum of 1x10'2 mbar, regulating the supply chamber and the collection chamber to a collection pressure of a maximum pressure of 1x10'2 mbar each, V, the vacuum chamber regulating the vacuum. to an atmosphere that does not involve reactive gases, or combinations of these methods. Additional atmospheric controls may be included for the pressure ratio in the various chambers, zones and / or vacuum locks of the exemplified apparatus, as described by, for example, Eq. 1 and 2. The deposited coating may be as described herein in various ways, including material, thickness, hardness and tensile strength. For example, a total coating thickness is a maximum of 25 μm, and a tensile strength of the steel strip substrate is at least 1200 MPa.

In addition, and for example, the source of the first arc evaporator or sputter may be a different material from the source of the second arc evaporator or sputter and the coating may have mixed compositions or a layered composition of the materials, or the different materials may be deposited on different surfaces of the strip substrate. In addition, and for example, the source of the first arc evaporator or sputter may be of the same material as the source of the second arc evaporator or sputter and the coating may be deposited on the same or different surfaces of the strip substrate.

The strip substrate material has a composition suitable for hardening, which means, for example: - Hardenable carbon steel of: 0, 1-1.5% C, 0.001-4% Cr, 0.01-1.5% Mn, 0.01-1 .5% Si, up to 1% Ni, 0.001-0.5% N, the remainder mainly Fe; or - Hardenable chromium steels of: 0, 1-1.5% C, 10-16% Cr, 0.001-1% Ni, 0.01- 1.5% Mn, 0.01-1.5% Si, up to 3% Mo, 0.001-0.5% N, the remainder mainly Fe; or 10 ~ 259 529 426 .55 - Precipitation hardenable steels of: 0.001-0.3% C, 10-16% Cr, 4-12% Ni, 0.1-1.5% Ti, 0.01-1, 0% Al, 0.01-6% Mo, 0.001-4% Cu, 0.001-0.3% N, 0.01-1.5% Mn, 0.01-1.5% Si, the remainder mainly Fe.

EXAMPLE 1: The chemical compositions of the substrate materials in the example are according to Sandvik's internal designations 20C2 and 13626, with essentially the following nominal composition: Sandvik 20C2: 1.0% C, 1.4% Cr, 0.3% Si and 0.3% Mn (by weight); and Sandvik 13C26: O.7% C, 13% Cr, O.4% Si and O.7% Mn (by weight).

First, the substrate materials are produced by ordinary metallurgical steelmaking, into a chemical composition described above. After this, they are hot-rolled down to an intermediate size, and then cold-rolled in several steps with a number of recrystallization steps between said rolling steps to a final thickness of 0.2 mm and a width of a maximum of 400 mm. Thereafter, the strip steel is hardened and tempered to the desired mechanical strength level, which is preferably at least 1200 MPa. The full width band is then cut to the final width of the products. The edges along the cut strip are then edge treated, for example planed, ground and polished, to the condition and geometry considered suitable for the intended application, which includes round edge, sharp-edged edge, square edge, deburred edge, and bevelled edge. The surfaces and edges of the substrate material are then cleaned, to remove oil residues from the previous handling before the coating process.

Thereafter, the coating process takes place in a continuous process line beginning with a unwinding equipment, which is placed in a separate vacuum or low pressure unwinding chamber. The first step in the roll-to-roll process line may be a vacuum chamber and / or an inlet vacuum lock followed by an etching chamber in which ion-assisted etching takes place to remove the thin oxide layer on the edges of the substrate material to be coated. The strip then enters the deposition chamber (s) in which the deposition of the coating on the edges takes place. In this example, TiN is selected as the material to be deposited. A metal nitride layer of normally 0.1 up to 25 μm is deposited on the edge, where the preferred thickness depends on the application. In the examples described here, a thickness of 2 μm is deposited using an arc evaporation chamber. After arc evaporation, the coated strip material passes through the exit vacuum chamber or exit vacuum lock before being wound up on a reel.

The final product described here, i.e. a coated 20C2 and 13C26 strip material, respectively, in a strip thickness of 0.2 mm and with a thin coating of TiN of 2 μm, has a very good adhesion of the coated layer, and is therefore suitable for use especially for the manufacture of doctor blades for flexography or rotogravure printing and for industrial knives.

EXAMPLE 2 The chemical composition of the substrate material in this example is according to Sandvik's internal designation 20C with essentially the following nominal composition: in Sandvik 20C: 1.0% C, 0.2% Cr, O.3% Si and O.4% Mn (by weight).

First, the substrate material is manufactured by ordinary metallurgical steelmaking into a chemical composition, as described above. The material is then hot rolled down to a medium size and then cold rolled in several steps with a number of recrystallization steps between said rolling steps, until a final thickness of 0.45 mm and a width of a maximum of 400 mm is achieved. Thereafter, the strip steel is hardened and tempered to the desired mechanical strength level, which is preferably above 1200 MPa.

The full-width band is then cut to the final width of the products. The edges along the cut strip are then edge treated, for example planed, ground and polished, to the condition and geometry considered suitable for the intended application, which includes round edge, sharp-edged edge, square edge, deburred edge, and bevelled edge. The surface and edges of the substrate material are then cleaned to remove oil residues from the previous handling prior to the coating process.

The final product will be a coated strip, the coating material and thickness being the same as in Example 1. Now the coated strip material can be cut in the middle along section 206 to obtain two coated strips, each with suitable dimension and edge geometry for a final application. In principle, only cutting to the desired final length remains.

The final product described in this example, i.e. a cut edge-treated and coated strip substrate material in a strip thickness of 0.45 mm and a final cut width of 100 mm, has a thin edge-covering nitride layer of 2 μm which has a very good adhesion. This product can be cut to the desired length depending on the final application without any further treatment, e.g. normally between 3 to 10 m, and then used as a coating sheet led paper mill.

Examples of shapes of the coated steel products described herein can be used in applications where a hard, dense and / or abrasion resistant low friction coating may be suitable, such as: scissors and secateurs, kitchen and baking tools, hand tools for plastering and plastering, trowels, medical instruments and surgical knives, razor blades, cutters, flaps, punching tools, saws 10 15 20 25 = 529 426 Bb and various knives in general, such as utility knives, e.g. Cutters, handicraft knives, bread knives, meat knives, mixer blades, hunting and fishing knives, pocket knives, and industrial knives for cutting synthetic fibers, paper, piast m lm, fabrics and carpets, coating and scraping biad, or other applications, where a metal band substrate used.

Thus, a belt material according to the exemplary embodiments is also suitable for use in shaving equipment, such as razor blades and cutters, and medical instruments such as thin surgical knives. The thickness of the substrate material is rather thin in these types of applications, normally between 0.015 and 0.75 mm, and usually 0.015 to 0.6 mm, and preferably 0.03 to 0.45 mm. The thickness of the coating can thus preferably be as small as possible, normally a total of between 0.1 and 5 μm and usually 0.1 to 3 μm, preferably 0.1 to 2 μm, or even more preferably 0.1 to 1 μm. In this case, it is thus desirable to have a small ratio between the thickness of the coating and the thickness of the strip material. The ratio is usually between 0.01% and 7%, and preferably between 0.01% and 5%.

A further use of these exemplary embodiments is that the coating can be applied before the curing and heat treatment of the substrate material. The coating should in this case be able to withstand a curing temperature of at least 400 ° C, and preferably more than 800 ° C, and more preferably above 950 ° C, during holding times at curing temperatures of the kind normally used in curing said substrate material to achieve a tensile strength, ie a minimum tensile strength of 1200 MPa.

To further illustrate, typical dimensions, in the case of a razor blade strip material, would be a substrate material with a thickness below 0.15 mm, normally less than 0.10 mm, and a bandwidth of about 400 10 15 20 25 529 426 “NO mm, and a coating thickness of less than 5 μm, usually 2 μm, normally less than about 1 μm or even thinner.

A strip material according to exemplary embodiments is also suitable for use in various utility and industrial knife applications, and also saw applications. The thickness of the substrate material is relatively large in this type of application, normally between 0, 1 and 5 mm and usually between 0.2 and 3 mm. However, the thickness of the coating is kept as small as possible, normally a total of between 0.1 and 10 μm and usually 0.1 and 5 μm and preferably 0.1 to 3 μm, or even more preferably 0.1 to 2 μm. In this case, it is thus desirable to have a small ratio between the thickness of the coating and the thickness of the strip material. The ratio is normally between 0.002% and 7%, and preferably between 0.01 and 5%.

Another, further use of these exemplary embodiments is that the coating can be applied before the curing and the tempering treatment of the substrate material. The hard and dense coating should in this case be able to withstand a curing temperature of at least 400 ° C and preferably more than 800 ° C, and more preferably above 950 ° C, during holding times at a curing temperature normally used in curing said substrate material to achieve a tensile strength. , ie a minimum of 1200 MPa. Examples 1 and 2 above both show examples of embodiments which are applicable in an analogous manner to razor blades and / or thin surgical knives, and / or utility and industrial knives, and / or saw applications. Thus, these examples illustrate coating methods and substrate materials suitable for these applications. The only difference is the order of curing and tempering, which can be changed with the coating, which is also described above. Although the present invention has been described in connection with preferred embodiments, it will be understood by those skilled in the art that additions, deletions, modifications and substitutions are not in 529 426 35 '. specifically described, may be made without departing from the spirit and content of the invention as set forth in the appended claims.

Claims (54)

10 15 20 25 30 529 426 39 REQUIREMENTS An apparatus for continuously coating edges on strip substrates comprising a vacuum process chamber (114) including an etching zone (116) upstream of a deposition zone (118), at least one ion-assisted etchant (120) in the etching zone, and at least one deposition apparatus (122) in the deposition zone, the at least one deposition apparatus comprising at least one source (124), characterized in that the strip substrate, during passage through the vacuum process chamber, directs a first edge region (140) towards the ion-assisted etcher in the etching zone, and has the first edge region directed towards the source of the deposition apparatus, the first edge region of the band substrate includes at least one first angled surface (142) which tapers from a first proximal position (144) toward a first distal position (146), the first proximal position being closer to a central region of the band substrate than the first distal position, and the first angled surface has a bearing surface source (150), and that the source of the deposition apparatus includes a source surface (126) having a source normal (128) and angled relative to the first angled surface so that the source normal intersects the first surface normal at an angle α, where a is greater than or equal to 90 degrees. Apparatus according to claim 1, wherein ot = from 90 to 135 degrees. The apparatus of claim 1, wherein a is about 90 ° + tan'1 (y / d), where y is the spacing distance in the y-axis direction between successive strip substrates, and d is the projecting distance of the strip substrate. The apparatus of claim 1, wherein the first distal position (146) of the first angled surface (142) is to the same extent as an edge on the tape substrate. 10 15 20 25 30 '529 426 ao Apparatus according to claim 1, characterized in that it comprises a second deposition apparatus (172) arranged in the deposition zone, which includes a second source (180), and is located downstream of the first deposition apparatus in the process direction, the first edge region (140) of the strip substrate. includes a second surface (160) on a major side of the tape substrate opposite the first angled surface (142), and the second source of the second deposition apparatus includes a source surface (182) having a source normal (184) and angled relative to the tape substrate. second surface so that the source normal intersects the second surface normal (170) at an angle ß, where ß is greater than or equal to 90 degrees. The apparatus of claim 1, characterized in that the first edge region (140) of the tape substrate includes a second angled surface (160) on a major side of the tape substrate opposite the first angled surface, wherein the second angled surface tapers from a second proximal position. (162) toward a second distal position (164) and wherein the second proximal position is located closer to the central region (148) of the band substrate than the second distal position, and the second angled surface has a second surface normal (170). The apparatus of claim 6, wherein the second distal position (164) of the second angled surface has the same extent as an edge on the tape substrate. The apparatus of claim 6, wherein the first distal position (146) of the first angled surface and the second distal position (164) of the second angled surface have a common boundary and form a knife wall. Apparatus according to claim 6, characterized in that it comprises a second deposition apparatus (172) arranged in the deposition zone, which comprises a second source (180), the second deposition apparatus being located downstream of the first-mentioned deposition apparatus in a 529 426 Hi process flow direction, and wherein the second source of the second deposition apparatus includes a source surface (182) having a source normal (184) and is angled relative to the second angled surface so that the source normal intersects the second surface normal at an angle ß, where ß is greater than or equal to 90 degrees. Apparatus according to claim 9, wherein ß = from 90 to 135 degrees. The apparatus of claim 9, wherein β = is about 90 ° + tan'1 (y / d), wherein y is the spacing distance in the y-axis direction between successive strip substrates, and d is the projecting distance of the strip substrate. Apparatus according to claim 9, wherein aa fi ß. Apparatus according to claim 9, wherein the source of the first deposition apparatus is a different material from the source of the second deposition apparatus. The apparatus of claim 9, wherein the source of the first deposition apparatus consists of the same material as the source of the second deposition apparatus. Apparatus according to claim 9, characterized in that it comprises a supply chamber (102) comprising a unwinding reel (104) for each of a plurality of belt substrates each arranged in a roll (108) and, a collecting chamber (110) including a winding reel (112) for each of the multiple strip substrates, wherein the vacuum process chamber (114) is located between the supply chamber and the collecting chamber. Apparatus according to claim 15, characterized in that it comprises a control device operatively coupled to the unwinding reel (104) for each of the random rollers (108) and to the winding reel (112) for the unwinding reels (108). 529 426 Adhesive tape substrates, wherein the tape substrate is fed from the supply chamber (102) through the vacuum process chamber (114) to the collection chamber (110), and the control device controls the rate of supply and collection of the tape substrate through the vacuum process chamber to achieve a desired voltage distribution state (118). ). The apparatus of claim 1, wherein the random tape substrates are horizontally separated by an optional spacer (188) between successive tape substrates. The apparatus of claim 1, wherein the projecting first edge region (140) of each of the multiple band substrates projects the same distance. The apparatus of claim 1, wherein the protruding first edge region (140) of each of the multiple band substrates projects different distances. The apparatus of claim 19, wherein the first distal position (146) of each of the recessed band substrates, between the lowest band substrate and the top band substrate, is located at a graduated distance between the first stretch and the second stretch. The apparatus of claim 1, wherein the continuous roll-to-roll deposition coating apparatus is under atmospheric controls. The apparatus of claim 1, wherein the vacuum process chamber has an atmosphere that does not include reactive gases. The apparatus of claim 1, wherein the tape substrate is a substrate for a coating blade, a doctor blade, a shaving equipment part, a medical instrument, a utility knife or an industrial knife. 10 15 20 25 30 529 426 * (3 A method of continuously coating an edge on a strip substrate characterized in that it comprises supplying at least one strip substrate to a vacuum process chamber (114) wherein the strip substrate includes a body, a first major side opposite a second major side and a first lateral side opposite a second lateral side, the first and second lateral sides being narrower than the first and second main sides, moving the at least one strip substrate through the vacuum process chamber, the vacuum process chamber comprising at least one ion-assisted etchant (120) in an etching zone (116), and at least one depositing apparatus (122) in a depositing zone (118), the etching zone being located upstream of the deposition zone, cleaning a first edge area on the at least one strip substrate in the etching zone, the first edge area including at least a first angled surface (146) tapering from a first proximal position (144) toward a first distal position (146) ), and the first proximal position is located closer to a central region (148) of the band substrate than the first distal position, and wherein the first angled surface has a first surface normal (150), depositing a coating on the first angled surface on the first the edge area in the deposition zone, and collecting the tape substrate, wherein the deposition apparatus includes at least one source (124), wherein the strip substrate during passage through the vacuum process chamber directs the first edge area toward the ion-assisted etcher in the etching zone, and directs the first edge area toward the deposition apparatus deposition zone. source comprises a source surface (126) having a source normal (128) and is angled relative to the first angled surface so that the source normal intersects the first surface normal (150) at an angle oi, where oi is greater than or equal to 90 degrees. The method of claim 24, wherein or = from 90 to 135 degrees. 10 15 20 25 30 529 426 LW ' The method of claim 24, wherein oi = is about 90 ° + tan'1 (y / d), wherein y is the spacing distance in the y-axis direction between successive strip substrates, and d is the projecting distance of the strip substrate. The method of claim 24, wherein the first edge region (140) of the strip substrate includes a second surface (160) on a major side of the strip substrate opposite the first angled surface, and wherein the method comprises cleaning the second edge region of the at least one strip substrate in the etching zone, and depositing a coating on the second angled surface of the first edge area in the deposition zone. The method of claim 27, wherein a second deposition apparatus (172) is located in the deposition zone, and includes at least one source (180), wherein the second deposition apparatus is located downstream of the first said deposition apparatus in a process direction, and the source of the second deposition apparatus includes (182) having a source standard (184) and angled relative to the second surface so that the source standard intersects the second surface standard (170) at an angle ß, where ß is greater than or equal to 90 degrees, and wherein the deposition of the coating on the second surface of the first edge area in the deposition zone involves depositing the coating with the second deposition apparatus. The method of claim 24, wherein the first edge region (140) of the strip substrate includes a second angled surface (160) on a major side of the strip substrate opposite the first angled surface, wherein the second angled surface tapers from a second proximal position (162). toward a second distal position (164), and wherein the second proximal position is located closer to the central region (148) of the tape substrate than the second distal position, the second angled surface having a second surface normal (170), and wherein the method comprises: 529 426 n: cleaning the second edge area on the at least one strip substrate in the etching zone, and depositing a coating on the second angled surface on the first edge area in the deposition zone. The method of claim 29, wherein a second deposition apparatus (172) is located in the deposition zone, and includes at least one source (180), wherein the second deposition apparatus is located downstream of the first said deposition apparatus in a process direction, and wherein the source of the second deposition apparatus includes a source surface (182) having a source normal (184) and angled relative to the second angled surface (160) so that the source normal intersects the second surface normal (170) at an angle ß, where ß is greater than or equal to 90 degrees, and wherein depositing the coating on the second angled surface of the first edge area in the deposition zone includes depositing the coating with the second deposition apparatus. The method of claim 30, wherein ß = 90 to 135 degrees. The method of claim 30, wherein ß = is about 90 ° + tan "(y / d), wherein y is the spacing distance in the y-axis direction between successive strip substrates and d is the projecting distance of the strip substrate. The method of claim 30, wherein aa fi ß. The method of claim 30, wherein the source of the first landfill consists of a material other than the source of the second landfill. The method of claim 30, wherein the source of the first landfill consists of the same material as the source of the second. 10 15 20 25 529 426 HQ The method of claim 24, comprising controlling a feed rate and a collection rate of the tape substrate through the vacuum process chamber, to achieve a desired state of tension in the tape substrate in the deposition zone. The method of claim 24, wherein the protruding first edge region of each of the bands random band substrates projects the same distance. The method of claim 24, wherein the protruding first edge region of each of the bands random band substrates projects different distances. in The method of claim 38, wherein the first distal position (146) of each of the recessed band substrates, between the lowest band substrate and the top band substrate, is located at a graduated distance between the first stretch and the second stretch. The method of claim 24, comprising controlling the atmosphere in at least the vacuum process chamber. The method of claim 40, wherein the at least one tape substrate is supplied from a supply chamber (102), and wherein the coated tape substrate is collected in a collection chamber (110), the method comprising controlling the atmosphere in at least one of the supply chamber and the collection chamber. The method of claim 24, wherein the vacuum process chamber has an atmosphere that does not include reactive gases. 10 15 20 25 30 529 426 fi? The method of claim 24, wherein a total thickness of the coating is a maximum of 25 microns and a tensile strength of the steel strip substrate is at least 1200 MPa. The method of claim 24, wherein the coating is a metallic coating comprising Cr or Ni. The method of claim 42, wherein the thickness of the strip substrate is between 0.015 mm and 5.0 mm. The method of claim 42, wherein the strip substrate is made of curable carbon steel, curable stainless chromium steels, or precipitation curable strip steels. The product of claim 24, wherein the coating comprises a transition metal nitride, a transition metal carbide, a transition metal carbonitride, a diamond-like carbon, or mixtures thereof. The method of claim 24, wherein the coating is a multilayer comprising a transition metal nitride, a transition metal carbide, a transition metal carbonitride, a diamond-like carbon, or mixtures thereof. The method of claim 24, wherein the coating comprises a pure metal. The method of claim 24, wherein the coating comprises a MAX phase material. The method of claim 24, wherein the coating is a multilayer comprising up to 20 sublayers. The method of claim 24, wherein the coating comprises at least one layer of nickel having a thickness of up to 2 μm, wherein the at least one layer 10 x 529 426 w does not adjoin the strip substrate. The method of claim 24, comprising incorporating the coated tape substrate into a coating blade, a doctor blade, a shaving equipment part, a medical instrument, a utility knife or an industrial knife. An apparatus for coating edges on strip substrates comprising a vacuum process chamber (114) including an etching zone (116) upstream of a deposition zone (118), at least one ion-assisted etchant (120) in the etching zone, and at least one deposition apparatus (122) in the deposition zone, k characterized in that the deposition apparatus comprises at least one source (124), wherein the strip substrate during movement through the vacuum process chamber, directs a first edge region (140) towards the ion-assisted etcher in the etching zone, and directs the first edge region towards the deposition apparatus source in the deposition zone; and having a first proximal position (144) and a first distal position (146), the first proximal position being located closer to a central region (148) of the tape substrate than the first distal position, the first edge region having a first surface normal (150). ), and wherein the source of the at least one landfill (124) includes a source surface (126) having a source normal (128) and angled relative to the first edge region (140) so that the source normal intersects the first surface normal (150) at an angle ot, where ot is greater than or equal to 90 degrees .