KR20080102224A - Edge coating in continuous deposition line - Google Patents

Abstract

A continuous roll-to-roll deposition coating apparatus and a method to continuous coat an edge of a strip substrate are disclosed. The invention is aimed at accomplishing a hard and abrasion resistant coated metal strip with improved adhesion between a dense coating and the substrate.The deposition coating apparatus, comprises: a vacuum process chamber (114) including an etching zone (116) upstream of a deposition zone (118);at least one ion assisted etcher(120) in the etching zone; and at least one deposition apparatus (122) in the deposition zone,wherein the at least one deposition apparatus includes at least one target (124), wherein the strip substrate, in travelling through the vacuum process chamber, projects a first edge region (140) toward the at least one ion assisted etcher in the etching zone and projects the first edge region toward the target of the at least one deposition apparatus in the deposition zone, wherein the first edge region of the strip substrate includes at least a first angled surface (142) tapered from a first proximal position (144) toward a first distal position, the first proximal position closer to a centre region of the strip substrate than the first distal position, the first angled surface having a first surface normal (150), and wherein the target of the at least one deposition apparatus includes a target surface (126) having a target normal(128) and is angled with respect to the first angled surface so that the target normal intersects the first surface normal at an angle E, where E is greater than or equal to 90 degrees.

Description

EDGE COATING IN CONTINUOUS DEPOSITION LINE}

The present disclosure relates to a continuous lamination coating apparatus and method for continuously laminating a coating on a blade of a substrate such as a metal strip substrate. More specifically, the present disclosure relates to coated strip steel materials having a hard, dense and / or low friction coating. In addition, the present disclosure discloses such coated strips in a continuous roll-to-roll process that forms a hard, dense and / or low friction coating with very good adhesion to metal strip substrates. A method of manufacturing steel. Coated strip steels with good adhesion coatings are suitable for use in coater blades and doctor blades, razors, medical equipment, real life and industrial knives, as well as saw applications or other applications using metal strip substrates with coated blades, for example. Do.

In the following description, reference is made to specific structures and / or methods. However, the following references should not be construed that such structures and / or methods constitute prior art. Applicant expressly reserves the right to prove that such structures and / or methods are not considered prior art.

Coated steel products can be used for a variety of applications. Examples include real-life knives such as slicers, carving knives, bread knives, butcher knives, blender blades, hunting and fishing knives, pocket knives, and industrial knives for cutting synthetic fibers, paper, plastic films, fabrics and carpets. It is for the manufacture of such a knife. Such products may also be used in saws, medical equipment, and surgical knives. Another example is for shaving, such as razor blades and cutters. Other examples include doctor blades and coater blades, such as those used to scrape paper and printing inks from surfaces, respectively, in the paper making and printing industry. In this regard, problems often arise with wear on the surface and coater blades or doctor blades. Coater blades and doctor blades are typically made from hardened strip steel. One common way to reduce the wear problem is to provide a wear resistant coating to the steel blade after the steel blade is made into a final shape in the form of a coater blade or a doctor blade. In this regard, a nickel layer should generally be provided to act as a bond between the substrate and the wear resistant coating. Some examples have been described. These examples are all applications where a hard, dense wear coating is suitable or necessary. For example, abrasion can cause peeling or cracking of the coating. Also, these examples are the applications that need to have hard sharp edges and cutting surfaces. In addition, most of these applications benefit from corrosion resistant surfaces because they are used in corrosive environments.

Thus, while wear resistant coatings are known to be used, it is difficult to find a cost effective and environmentally friendly way to meet the required quality. The cost for coater blades or doctor blades provided with a wear resistant coating is currently very high. In addition, the costs for quality problems that arise during use in the printing industry or paper mills are high. In addition, frequent blade replacement increases costs. Good adhesion of the coating of the blade is necessary for the functional quality of the final product. Poor adhesion, porosity, or rough coating can cause problems during the use of coated objects such as industrial knives or saws, for example, the coating begins to peel off, particles or small pieces peel off, or cracking problems occur. These are all unacceptable in terms of quality and cost.

There are several common ways to make coatings, and various different types of coatings being used. Examples include the following.

Ceramic coating consisting mainly of Al ₂ O ₃ and TiO ₂ and / or ZrO ₂ as possible additives. Coatings of this type are generally provided using a thermal spray method. An example of a thermal spraying method is described, for example, in US Pat. No. 6,431,066, in which a ceramic coating is provided along one edge of the doctor blade. Another embodiment of the thermal spraying method is described in EP-B-758 026, where a wear resistant coating is provided along one edge using several coating steps in a rather complex continuous process involving thermal spraying.

Conventional thermal spraying methods generally have some significant drawbacks. For example, the coating formed is rough, which generally means that after coating the polishing or other further process must be carried out on the surface. In addition, thermal spray coatings generally have a high porosity, which means that thin dense coatings generally cannot be obtained. In addition, the thickness of the sprayed coating is generally rather large. During use, thick and rough coatings have a high risk of cracking or peeling of particles off the surface. Also, in many cases, expensive nickel or nickel alloys should be used as the bonding film to improve the adhesion of the ceramic coating.

Conventional metal coatings which are formed primarily of pure nickel or chromium or in the form of compounds such as nickel-phosphorus are generally provided using plating methods, in particular electroplating methods. The electroplating method has several drawbacks, one major drawback being that it is difficult to obtain a uniform thickness and the adhesion of the coating may be poor. In addition, the plating process is not environmentally friendly, and this process mainly involves environmental problems.

Combinations of coatings, such as nickel coatings comprising wear resistant particles, such as SiC, are disclosed in WO 02/46526, in which the different layers have several steps in a continuous process for electrolytic nickel coating and in at least one of the above steps. By adding abrasive particles. This method also has some drawbacks, basically the same drawbacks as the above electrolytic plating, but also nickel is widely used as a bonding film, which means that the coating is very expensive.

Disclosed are hard and wear resistant coated metal strips with improved adhesion between a dense coating and a substrate. For cost reasons, continuous roll-to-roll coating processes are preferred, and the lines can coat one or more strip blades in the same roll-to-roll coating process. Also, because of the quality, a dense coating having very good adhesion to the substrate is desirable. In terms of cost, it is more desirable if there is a good adhesive wear resistant coating in which no separate bonding film is optionally required.

Embodiments of a continuous roll-to-roll lamination coating apparatus include a vacuum process chamber upstream of the lamination region, at least one ion assisted etcher in the etch region, and at least one lamination apparatus in the lamination region. Wherein the at least one lamination apparatus comprises at least one target, and the strip substrate protrudes toward the at least one ion assisted etcher of the etch region and moves the first edge region during movement through the vacuum process chamber. Projecting the region toward the target of at least one lamination device of the lamination region, the first edge region of the strip substrate comprising at least one first inclined surface tapered from the first leading end to the first distal end, the first leading end being the first Closer to the central region of the strip substrate than the distal end, the first inclined plane has a first surface normal, and the target of the at least one lamination device It includes a target surface having a normal line nuggets and to target normal line intersects at an angle α less than 90 ° with the normal to the first surface is inclined with respect to the first inclined surface.

An embodiment of a method for continuous coating a strip of strip substrate comprises supplying at least one strip substrate into a vacuum process chamber, the strip substrate being the first main side opposite the body, the second main side. And a first transverse side opposite the second transverse side, wherein the first and second transverse sides are narrower than the first and second main sides and at least one via a vacuum process chamber. Moving the strip substrate, wherein the vacuum process chamber includes at least one ion assisted etcher in an etched region and at least one lamination device in a stacked region, the etched region upstream of the stacked region, Cleaning the first edge region of the at least one strip substrate in the etching region, wherein the first edge region is from the first leading end to the first end portion; A tapered at least first inclined surface, the first leading end being closer to the central region of the strip substrate than the first distal end, the first inclined surface having a first surface normal, the first of the first edge region in the laminated region Laminating a coating on an inclined surface, the method comprising collecting a coated strip substrate, wherein the at least one laminating device comprises at least one target, and the at least one strip substrate is subjected to a vacuum process chamber Protrudes the first blade region toward at least one ion assisted etchant of the etch region and moves the first blade region toward at least one target of the at least one stacking device of the stacking region during movement. The target includes a target surface with a target normal and intersects the target normal at an angle α that is at least 90 ° with the first surface normal. It is inclined with respect to lock the first inclined surface.

Another embodiment of the continuous roll-to-roll lamination coating apparatus includes a vacuum process chamber including an etch region upstream of the lamination region, at least one ion assisted etcher in the etch region, and at least one lamination apparatus of the lamination region. The at least one stacking device includes at least one target. The strip substrate protrudes toward the at least one ion assisted etcher of the etched region and protrudes the first edged region toward the target of at least one lamination device of the laminated region during movement through the vacuum process chamber. The first edge region of the strip substrate is rectangular and has a first leading edge and a second distal end, wherein the first leading edge is closer to the central region of the strip substrate than the first distal end, and the first edge region has a first surface normal. The target of the at least one laminating apparatus has a target surface with a target normal and is inclined with respect to the first edge region such that the target normal intersects the first surface normal at an angle α of at least 90 °.

DETAILED DESCRIPTION The following detailed description of the preferred embodiments may be read in conjunction with the accompanying drawings, wherein like reference numerals designate like elements in the accompanying drawings.

1 schematically shows a production line for the production of coated metal strips according to one disclosed embodiment.

FIG. 2 schematically shows a production line for the production of coated metal strips viewed along line A-A of FIG. 1.

3 shows the blade shapes of the various embodiments and the coatings of the various embodiments on the blade shapes.

4 shows a schematic cross section of an alternative arrangement for a plurality of strip substrates.

,

') 사이의 다른 실시예의 관계를 보여준다.5A and 5B show the protruding distance d of the strip substrate, the y distance in the y axis direction of the continuous strip substrate, and the angle of each target relative to the vertical line (

,

The relationship of another embodiment between ') is shown.

Dense abrasion resistant coatings and continuous lamination coating apparatuses with good adhesion are disclosed. Coatings on end products, such as strip substrates in the form of hardenable strip steel, can be used to produce metal strip substrates with coated edges, for example, in the manufacture of razors, medical equipment, real and industrial knives, saws, doctor blades and coater blades, or paper. It is a coating suitable for use in the field used for creping blades used for creping of paper. Coatings suitable for use in this field have a dense layer of abrasion resistant coatings with good adhesion, which is hard but has sufficient toughness to withstand working loads and pressures in use, and is less likely to break or peel off. none. In addition, low friction coatings may be used alone or in combination with coatings of other properties.

Description of Coating Materials and Arrangements

At least one layer of dense transition metal nitrides or mixtures thereof, for example TiN, ZrN, TiAlN, ZrAlN, VN, TiVN, VAlN, CrN, Cr ₂ N, CrAlN, MoNx, WNx, preferably TiN or CrN Wear resistance can be obtained by laminating a coating having a layer of system material. Depending on the requirements, the optimum required hardness, toughness and / or corrosion resistance can be obtained by using nitrides mixed in the coating. This can be accomplished by selectively selecting the alloy composition of the target material for lamination, such as lamination by arc evaporation or sputter lamination. In addition, multilayer coatings may be used to combine nitrides to optimize up hardness and toughness by providing up to 20 sublayers in a multilayer coating having different nitrides of the sublayers and optional carbide additives of the sublayers or separate carbide based sublayers.

For example, by laminating a coating having at least one layer of dense metal carbide material in the form of TiC, ZrC, VCx, CrCx, MoCx, WC, or a mixture of these carbides, preferably a layer of TiC, WC or CrCx based material Wear resistance can also be obtained. Depending on the requirements, optimized carbides, toughness and corrosion resistance can be obtained by using carbides mixed in the coating. This can be achieved by selecting the alloy composition of the target material for lamination such as lamination by evaporation or sputter lamination. Multilayer coatings may be used to combine carbides to optimize hardness and toughness by providing up to 20 sublayers in a multilayer coating having different carbides of the sublayers and optional nitride additives of the sublayers or separate nitride based sublayers.

Carbonitrides such as Ti (C, N) may be used alone or in a mixture in the coating or sublayer.

For example, wear resistance or low friction can be obtained by laminating a coating having at least one layer of a dense diamorphic carbon layer (DLC). The DLC layer can be mixed with small amounts of transition metals such as Ti, Ta, W and / or Cr. Depending on the requirements, an effective amount of transition metal additive up to about 20%, optionally greater than 0% up to about 10%, may be used to obtain optimum required hardness, toughness, corrosion resistance, and friction. This can be accomplished by selecting the alloy composition of the target material for lamination, such as lamination by arc evaporation or stuffer lamination. Multilayer coatings may be used to combine DLC to optimize hardness and toughness by providing up to 20 sublayers in a multilayer coating having different nitrides of the sublayers and optional carbide additives of the sublayers or separate carbide based sublayers.

Instead of the wear resistant layer consisting essentially of nitride, other coatings such as metal coatings can be used in the disclosed embodiments. Where simple and inexpensive coatings are desired to reduce the cost as much as possible, essentially metal coatings such as pure Ti, Zr, V, Nb, Ta, Cr, W, Fe, Mo, Ni, and Fe or TiAl, NiAl and Alloys of such materials, such as FeCrAlY, may also be used. Thin layers of pure metal coatings, such as the metal coatings described herein, may be used as a bond between the strip steel blade and the second coating, the second coating being a metal containing transition metal nitrides, carbides, diamond-like carbon (Me- DLC, Me may be a transition metal such as Ti, Ta, Cr, and W), or have a composition comprising a diamondoid carbon (DLC) layer.

Instead of abrasion resistant and / or low friction DLC coatings, materials containing MAX phases can be laminated. The MAX phase material is a ternary compound having the formula M _{n +1} A _z X _n . M is at least one transition metal selected from Ti, Sc, V, Cr, Zr, Nb, Ta, A is at least one element selected from the group consisting of Si, Al, Ge and / or Sn, X Is at least one of C and / or N which is a nonmetal. The range of other components of the single phase material is determined by n and z, n is 0.8 to 3.2 and z is 0.8 to 1.2. As a result, examples of the composition of the MAX phase material are Ti ₃ SiC ₂ , Ti ₂ AlC, Ti ₂ AlN, and Ti ₂ SnC. In addition to the pure MAX phase coating, a composite coating comprising the MAX phase may be laminated. No separate bonding film is required, but if necessary from a technical point of view, a metal coating element such as nickel or titanium may still be optionally used in one of the layers, for example to improve toughness. With respect to nickel, since nickel is expensive, it is used only for very thin layers, suitably only 0 to 2 μm, preferably 0 to 1 μm, most preferably 0 to 0.5 μm. However, if a nickel layer is used, no possible nickel layer will be the layer adjacent to the strip substrate.

The method disclosed and described herein is suitable for thin coatings of hard, dense, abrasion resistant coatings on each side of the blade region of the strip substrate totaling 25 μm in total, generally up to 20 μm, preferably up to 15 μm in total. . In terms of cost, the total thickness is preferably at most 12 μm, preferably at most 10 μm. If a thicker coating is coated, optimization may be achieved in the cost / property characteristics by using multilayers having up to 10 layers, each layer being 0.1-15 μm, suitably 0.1-10 μm, more suitably 0.1 ˜7 μm, preferably 0.1 to 5 μm, even more preferably 0.1 to 3 μm thick. Other suitable coating thicknesses include 10 μm or less, 5 μm or less, and 1 μm or less. The coating must have sufficient abrasion resistance to withstand the wear and shear applied by the treated material, while not being too thick due to economic reasons and brittleness. For example, for coater blades and doctor blades, the ratio between the thickness of the coating and the substrate is 0.1% to 12%, typically 0.1% to 10%, typically 0.1% to 7.5%, but most preferably 0.1 Can be from 5% to 5%.

Description of substrate material to be coated

The material to be coated should have good basic mechanical strength suitable for the intended use. In one embodiment, the strip substrate is a hardenable steel in a hardened and quenched state, or alternatively a precipitation hardenable steel, such as an alloy disclosed in WO 93/07303, which steel exceeds 1200 MPa in its final state, It is possible to achieve tensile strengths that are preferably above 1300 MPa, most preferably above 1400 MPa, and even more preferably above 1500 MPa.

If the final coated product is used in a corrosive environment, the strip based alloy steel must have sufficient chromium additive to have good basic corrosion resistance. For example, the Cr content may be greater than 10% by weight, at least 11% by weight, or preferably at least 12% by weight.

The coating method is applied to any kind of substrate made of alloy steel of this type, in the form of a strip having good hot workability, and which can be cold rolled to thin dimensions. The alloy may also be readily produced with the desired end product, typically for coater blades or doctor blades, razor blades and / or cutters such as razors, medical equipment, real and industrial knives, various saws, and other strip products. . The thickness of the strip substrate is generally 0.015 mm to 5.0 mm, suitably 0.03 mm to 3 mm. Preferably, the thickness of the strip substrate is from 0.03 mm to 2 mm, even more preferably from 0.03 mm to 1.5 mm. The typical thickness of the strip substrate for the coater blades is 0.3 mm to 1.0 mm, the typical thickness for the doctor blades is 0.1 mm to 0.4 mm and the typical thickness of the strip substrate for the razor blades is 0.076 mm to 0.1 mm. . The width of the strip base material and the shape of the blade to be coated depend on the intended use of the end product. In addition, the width may optionally be selected to be a width suitable for further manufacture to the final width of the coated product. Suitable examples of widths are from 1 mm to 500 mm, suitably from 1 mm to 250 mm, preferably from 1 mm to 100 mm, depending on the final product. The length of the strip base material is suitably 10 m to 20,000 m, preferably 100 m to 20,000 m. The strip base material is generally coiled for handling before and after coating. In general, the dimensions of the strip substrate are tailored to the intended end product's use, and other minimum and maximum thicknesses may be used as appropriate.

Description of Coating Methods and Coating Devices

Various physical or chemical vapor deposition methods may be used to apply coating media / materials and coating processes as long as they provide a continuous, uniform and adherent coating. Examples of deposition methods include chemical vapor deposition (CVD), metal organic chemical vapor deposition (MOCVD), physical vapor deposition (PVD), such as sputtering and evaporation by resistive heating, electron beam, induction, arc resistance, or laser lamination methods. Can be considered Arc evaporation or sputtering, in particular magnetron sputtering, is two exemplary methods preferred for lamination.

Although the lamination apparatus has been described and described in some respects with reference to the arc evaporation and sputter lamination methods, the disclosure, principles, and methods may be similarly applied to other types of lamination methods and techniques. Thus, although generally described lamination apparatus specifically arc evaporation and sputtering, those skilled in the art will understand that other lamination methods are within the disclosure of the present application.

The coating method is integrated in a roll-to-roll strip production line, and the coating is laminated in a roll-to-roll continuous lamination coating apparatus by a selected lamination apparatus, such as by arc evaporation or sputtering. If multiple layers are desired, the formation of multiple layers can be achieved by integrating several arc evaporation or sputtering targets in a row in the deposition chamber (s). In addition, the coating on the blade portion of the strip substrate can be controlled by orienting the target at an appropriate angle relative to the surface on which the coating will be laminated. Lamination of the metal coating is essentially made from the metal target under reduced atmosphere at a maximum pressure of 1 × 10 ⁻² mbar without the addition of any reaction gas to promote pure metal film. Lamination of metal carbides and / or nitrides such as TiN, TiC, CrN, CrCx, VN, TiAlN and CrAlN is made from the metal target with the addition of the reaction gas. In addition, metal carbides and metal carbonitrides such as TiC and Ti (C, N) can be deposited from composite targets containing transition metals and carbon. The state during the coating can be adjusted in relation to the partial pressure of the reaction gas to allow the formation of the desired compound. In the case of nitrogen, a reaction gas such as N ₂ , NH ₃ or N ₂ H ₄ , preferably N ₂ may be used. In the case of carbon, as the reaction gas, any carbon containing gas such as CH ₄ , C ₂ H ₂ or C ₂ H ₄ may be used. Lamination of the metal oxide is performed at a reduced pressure with an oxygen source added to the chamber as the reaction gas. In order to achieve good adhesion, different types of cleaning steps are used. First, the surface of the base material is cleaned to remove oil residues, which may otherwise adversely affect the efficiency of the coating process and the adhesion and quality of the coating. In addition, very thin inherent oxide layers typically present on the surface of the steel are removed. This may preferably be done by pretreating the surface before lamination of the coating. In a roll-to-roll production line, the first production step is an ion assisted etching of the metal strip substrate surface to achieve a cleaning step, such as preferably good adhesion of the first coating. The coating is carried out at a rate of at least 0.1 m per minute, preferably at least 0.5 m / min and most preferably at least 1 m / min. The rate of movement of the strip substrate can vary depending on the number of targets and the rate of lamination of the lamination technique, with more targets increasing the rate of lamination and thus increasing the rate of movement of the strip substrate used.

1 schematically shows an embodiment of a production line for the production of coated metal strips according to the first disclosed embodiment. In FIG. 1, the production line for the production of coated metal strips is shown with a continuous roll-to-roll lamination coating apparatus 100. The continuous roll-to-roll lamination coating apparatus 100 includes a supply chamber 102 comprising an uncoiler 104 for each of a plurality of strip substrates 106 respectively disposed on a coil 108, and a plurality of And a collection chamber 110 that includes a recoiler 112 for each of the strip substrates 106. A vacuum process chamber 114 is located between the supply chamber 102 and the collection chamber 110. The vacuum process chamber 114 includes an etching region 116 upstream of the deposition region 118. At least one ion assisted etcher 120 is located in the etched region 116, and at least one lamination device 122 including at least one target 124 is located in the stacked region 118.

In the continuous roll-to-roll lamination coating apparatus 100 shown, four separate strip substrates are shown. However, it will be appreciated that the continuous roll-to-roll lamination coating apparatus 100 may have any number of strip substrates. For example, 1-10, or even more strip substrates can be used. In another embodiment, continuous roll-to-roll lamination coating apparatus 100 may have up to 100 strip substrates in a line when forming strip substrates for razor blades, but for coater blades and / or doctor blades. If intended to form a strip substrate, it may be provided with only four strip substrates in a line. In general, including more strips makes lines more productive, but lines are much more complicated.

A component of an ion assisted etcher 120 that includes an inert gas plasma generator that generates a plasma for impacting a strip substrate comprises a vacuum process chamber 114 to remove the thin oxide layer on the strip substrate prior to lamination of the coating. Is arranged in an operating manner.

An arc generator 122 comprising an arc generator and an evaporation target for generating an arc, or a component of a sputtering apparatus 122 including a sputter source and a sputtering target, is characterized in that the strip substrate 106 comprises a vacuum process chamber 114. And operatively disposed within the vacuum process chamber 114 to deposit the coating on the strip substrate as it passes through. The transverse side of the strip substrate may be coated. For example, and as shown in FIG. 1, the strip substrate 106 coming from each of the plurality of coils is moved from the supply chamber 102 to the collection chamber 110 via the vacuum process chamber 114. The blade regions (examples shown as 140 in FIGS. 2 and 3 and 140 ', 140 ", 140' ", 140 " ) And the first edge region protrudes toward the target 124 of the at least one arc evaporator or sputtering machine 122 of the stacked region 118. In the embodiment shown in FIG. 2, the first edge region 140 of the strip substrate 106 includes a first inclined surface 142 tapered toward at least the first distal end 144 from the first distal end 144. . The first tip 144 is marked closer to the central region 148 of the strip substrate 106 than the first distal end 146. However, the position of the first tip over the strip substrate is not limited, and in alternative embodiments may be at the opposite end of the strip substrate from the first edge region such that tapered tapered surfaces are formed throughout the strip substrate.

In some embodiments, the first distal end 146 of the first inclined surface 142 is at the same location as one of the edges of the strip substrate 106, such as the transverse side of the strip substrate 106. The first inclined surface 142 has a first surface normal 150. In FIG. 2, the strip substrate 106 is viewed from the transverse side, and the first edge region 140 including the first inclined surface 142 protrudes toward the target 124. 3 illustrates the blade shapes of various embodiments and the coatings of the various embodiments over the blade shapes of the embodiments. In FIG. 3, several examples of strip substrate 106 with a coating 130 are shown. As shown in FIG. 3, the strip substrate 106a is rectangular in the first blade region 140 and has a coating 130 surrounding the first blade region. 3 also includes a square shape 106a, a square shape 106b with rounded or chamfered corners, tapered shapes 106c and 106d on one side, tapered shape 106e on both sides, and rounded shape. Strip substrates 106b-106e are shown having various shapes with respect to first edge region 140, including 106e. The tapered portion may end in an angular form, or may be rounded or chamfered. In each case, the coating 130 follows or substantially follows the shape of the underlying first edge region 140. At the end of the stack, the coating 130 is optionally horizontal with the surface of the underlying strip substrate 106. The surface of the first edge region 140 of the strip substrate 106 is in a special spatial relationship with the target 124. This relationship is such that, for example, a plurality of strip substrates disposed vertically spaced with respect to each other (eg, spaced in the y axis direction) pass through the region of the vacuum process chamber 114 to the ion assisted etcher 120. By means of a lamination, and by each having a coating which is laminated by the lamination device 122. In addition, a number of strip substrates may be cleaned by ion assisted etchant 120, each passing through a region of vacuum process chamber 114, and each may have a coating deposited by lamination apparatus 122. So as to be horizontally displaced (eg, staggered at a distance d _n in the z-axis direction as shown in FIG. 4).

로 나타낸 원하는 각도로 기울어진다. 다수의 타겟 (124) 을 구비하는 실시예에서, 하나를 초과하는 코팅 재료를 적층시키기 위해 그리고/또는 스트립 기재의 제 1 날 영역의 하나를 초과하는 측면에 코팅을 적층시키기 위해, 연속하는 타겟 또는 타겟 군이 사용될 수 있다.In one embodiment, the target 124 of the stacking apparatus 122 is in FIG. 2 from a vertical line.

Tilt to the desired angle shown. In an embodiment with multiple targets 124, successive targets or for laminating more than one coating material and / or for laminating the coating on more than one side of the first edge region of the strip substrate. Target groups can be used.

또는

' 으로 나타낸 원하는 각도만큼 상이한 각도로 기울어질 수 있다. 일반적으로, 각각의 타겟은 타겟 홀더 (비도시) 에 장착되고, 타겟 홀더는 각각의 타겟에 개별적으로 제공되거나 하나를 초과하는 타겟을 함께 지탱할 수 있다. 타겟 홀더는 피벗 지점에 대해 피벗가능하고 그리고/또는 다수의 방향으로 이동가능하고 그리고/또는 조합되어 이동가능함으로 비스듬하게 조정될 수 있으며, 적어도 1 자유도, 바람직하게는 적어도 2 자유도 또는 3 자유도를 갖는다. 타겟 홀더가 연속 롤-투-롤 적층 코팅 장치 (100) 의 설치 동안 수동으로 조정될 수 있고, 또는 타겟 홀더의 위치에서 제자리 변화될 수 있도록 컨트롤러 인터페이스를 통해 원격으로 제어될 수 있다. 이러한 원격 제어는 예컨대 정해진 위치 또는 배향에 대해 타겟 홀더의 위치 및 배향을 변화시키도록 조정 압전기, 공압기, 또는 전자식 또는 기계식 장치를 통해 이루어질 수 있다. 자유도 중 하나는 x 방향으로 놓이는 축선에 대해 피벗될 수 있기 때문에, 타겟의 표면은 코팅될 스트립 기재의 표면에 대해 기울어진다. 이러한 유형의 운동이 도 2 에 도시되어 있으며, 타겟 (124) 의 각도 (

,

') 는 임의의 원하는 각도일 수 있다. 어떤 실시예에서, 각도 (

,

') 는 스트립 기재 (106) 의 제 1 날 영역 (140) 위에 코팅의 적층을 최대화하도록 선택된다. 어떤 실시예에서, 각도 (

,

') 는 코팅의 적층 동안 인접한 또는 가까운 다른 제 1 날 영역에 의한 제 1 날 영역의 가림을 최소화하거나 원하는 가림 효과를 얻도록 선택된다. 어떤 실시예에서, 상기 사항을 모두 고려하여, 균형있는 접근법을 사용한다.

및

' 은 동일한 각도이고, 컴플리멘터리 (complimentary) 각이며, 수평 기준면에 대해 거울상 관계일 수 있고, 또는 필요하면 원하는 코팅 효과를 얻도록 상이할 수 있다.Each target 124 can be positioned for the desired coating effect. For example, successive targets or groups of targets are shown in FIG. 2 from a vertical line.

or

Can be inclined at different angles as desired. In general, each target is mounted to a target holder (not shown), and the target holder can be provided individually to each target or support more than one target together. The target holder can be adjusted obliquely by being pivotable and / or movable in multiple directions and / or in combination with respect to the pivot point, with at least one degree of freedom, preferably at least two degrees of freedom or three degrees of freedom. Have The target holder may be manually adjusted during installation of the continuous roll-to-roll lamination coating apparatus 100 or may be controlled remotely through a controller interface to be changed in place at the position of the target holder. Such remote control may be achieved, for example, via an adjusting piezoelectric, pneumatic, or electronic or mechanical device to change the position and orientation of the target holder with respect to a given position or orientation. Since one of the degrees of freedom can be pivoted about an axis lying in the x direction, the surface of the target is inclined with respect to the surface of the strip substrate to be coated. This type of motion is shown in FIG. 2, and the angle of the target 124 (

,

') Can be any desired angle. In some embodiments, the angle (

,

') Is selected to maximize the lamination of the coating over the first edge region 140 of the strip substrate 106. In some embodiments, the angle (

,

') Is chosen to minimize occlusion of the first edge region by another adjacent or near first edge region during lamination of the coating or to obtain the desired occlusion effect. In some embodiments, using all of the above, a balanced approach is used.

And

'Is the same angle, complimentary angle, may be mirror image relative to the horizontal reference plane, or may be different to achieve the desired coating effect if necessary.

For example, the target of at least one arc lamination apparatus 122 includes a target surface 126 having a target normal 128. The target surface 126 is inclined with respect to the first inclined surface 142 of the first edge region 140 such that the target normal 128 intersects the first surface normal 150 at an angle α. In one embodiment, the angle α is at least 90 °. In another embodiment, the angle α is between 90 ° and 135 °. Similar angular relationships for more than one target can be formed and executed in the continuous roll-to-roll lamination coating apparatus 100, and the targets for the ion assisted etchers in the etch regions 116 as well as the targets of the stacked regions 118. It can be applied to both targets of the lamination apparatus.

Since the other one of the degrees of freedom may be a displacement in the z direction (shown in the axis of FIG. 2), the targets 124, 180 are positioned at a distance from the first edge region 140. Changes in the distance between the targets 124 and 180 and the first edge region 140 can affect the rate of lamination and the quality of the coating. Since the other degrees of freedom are the movements in the y direction (shown in the axis of FIG. 2), the targets 124, 180 are located at different heights relative to the first edge region 140. Movement of the targets 124, 180 relative to the first edge region 140 may affect the rate of lamination and the quality of the coating.

The degree of freedom of the target makes it possible to coat multiple surfaces of one or more strip substrates by the movement of the target through the degrees of freedom. In one embodiment, the target holder is mounted to the back, for example opposite the impingement surfaces 126 and 182, and the target holder includes rails, racks and / or gears to provide the required degrees of freedom.

For example, in some embodiments, the first edge region 140 of the strip substrate 106 has more than one surface to be coated and / or more than one tilted surface. For example, the edges of the strip substrate, the first major side and / or the second major side of the strip substrate (whether or not inclined), and / or combination surfaces of these surfaces may have a coating laminated over them in the lamination area. have.

For example, the first edge region 140 of the strip substrate 106 can include a second inclined surface 160 on the major side of the strip substrate 106 opposite the first inclined surface 142. The second inclined surface 160 is tapered from the second distal end 162 toward the second distal end 164. The second tip 162 is closer to the central region 148 of the strip substrate 106 than the second distal end 164. In some embodiments, the second distal end 164 of the second inclined surface 162 is at the same position as one of the edges of the strip substrate 106, such as one of the transverse sides of the strip substrate 106. In some embodiments, the first distal end 146 of the first inclined surface 142 and the second distal end 164 of the second inclined surface 160 abut each other and form a blade. The second inclined surface 164 has a second surface normal 170. In FIG. 2, the strip substrate 106 is seen from one of the transverse sides, and the first edge region 140 including the second inclined surface 160 protrudes toward the evaporation target 124.

The continuous roll-to-roll lamination coating apparatus may have a plurality of lamination apparatuses, such as an arc evaporator or a sputtering machine, in the vacuum process area. For example, an embodiment of a continuous roll-to-roll lamination coating apparatus may include a second (or more) in a stacking region (eg, schematically illustrated in FIGS. 1 (6 targets) and 2 (2 targets)). It may include a lamination device. In this embodiment, the second (or subsequent) lamination device 172 is downstream of the at least one lamination device 122 in a process flow direction, such as the direction 174 of FIG. 1. Like at least one lamination device 122, the second (or subsequent) lamination device 172 includes a target 180. The second target 182 of the second lamination apparatus 172 includes a target surface 182 having a target normal 184, such that the target normal 184 intersects the second surface normal 170 at an angle β. It is inclined with respect to the second inclined surface 160. In one embodiment, the angle β is at least 90 °. In another embodiment, the angle β is 90 ° to 135 °. In another embodiment, α may be the same as or different from β.

,

') (도 1 에서 동일하게 기울어진 타겟은 동인한 음영으로 나타냈다), 및 확장하면 상이한 각도 (α, β) 로 교대로 도시되어 있다. 그러나, 상이한 코팅 효과를 달성하기 위해 원하는 경우에는 각각의 타겟에 대하여 상이한 각도를 사용할 수 있으며, 타겟이 동일하게 기울어지는 것을 요구하지 않는다. 또한, 제 1 적층 장치의 타겟 공급원은 제 2 적층 장치의 타겟 공급원 및/또는 임의의 후속의 적층 장치의 타겟 공급원과 동일한 재료 또는 상이한 재료일 수 있다.Subsequent lamination apparatus may be included in the continuous roll-to-roll lamination coating apparatus 100 and may each include a target. In FIG. 1, for example, six lamination devices are shown, each lamination device having a separate target 124, the target 124 having a different angle (

,

') (The same slanted targets in FIG. 1 are shown with equivalent shading), and when enlarged, are alternately shown at different angles (α, β). However, different angles can be used for each target if desired to achieve different coating effects, and do not require the target to tilt equally. In addition, the target source of the first lamination apparatus may be the same material or a different material as the target source of the second lamination apparatus and / or the target source of any subsequent lamination apparatus.

1 is an optional controller operatively connected to an uncoiler 104 for each of a plurality of strip substrates 106 disposed in a coil 108 and a recoiler 112 for each of the plurality of strip substrates 106. 186 is shown. The controller 186 controls the rate of supply and collection of the strip substrate 106 through the vacuum process chamber 114 to achieve the desired tension of the strip substrate 106 in the stacking region 118.

As above, the plurality of strip substrates can be disposed vertically spaced apart (e.g., spaced apart in the y axis direction), optionally can be horizontally displaced (e.g. staggered in the z axis direction), Optionally, the two arrangements can also be combined. For example, as shown in FIG. 2, the plurality of strip substrates 106 may be spaced vertically (eg, spaced in the y-axis direction) with an optional diaphragm 188 between successive strip substrates 106. Deployed). In another embodiment and as shown in FIG. 2, the protruding first edge region 140 of each of the plurality of strip substrates 106 is the same distance d from the inner surface 190 of the vacuum process chamber 114. To protrude.

In some embodiments, the first end 146 and / or the second end 164 of each of the plurality of strip substrates 106 are staggered. For example, the first end of the bottom strip substrate may be at a first distance, the first end of the top strip substrate may be at a second distance, and the second distance is greater than the first distance. In another example, the first distal end 146 of each of the plurality of strip substrates 106 between the lowermost strip substrate and the uppermost strip substrate is at a varying distance between the first and second distances.

4 shows the placement of the optional combination of horizontal displacement (eg, displaced along the z axis) and vertical displacement (eg, displaced along the y axis). For example, vertical displacement (d _n : n = 1, 2, 3, ....) and the horizontal displacement (y) is the first edge region of the strip substrate 106 '' next to one of the strip substrates 106 'during the lamination process. 140 ") may be arranged to prevent the stacking of materials onto the substrate, for example to hide the adjacent strip substrate. Subsequent vertical and horizontal displacements of the strip substrate likewise have a distance that minimizes or prevents obstruction during the lamination process. In FIG. 4, the protruding first edge regions 140 ′, 140 ″, 140 ′ ″ of each of the plurality of strip substrates 106 ′, 106 ″, 106 ′ ″, 106 ″ ″, 140 '''' protrude from the inner surface 190 of the vacuum process chamber 114 at a different distance (d _n : n = 1, 2, 3 ...) and, for example, are displaced horizontally (e.g., z Staggered in the axial direction). The diaphragm 188 and other portions of the stacking region, such as the wall of the inner surface 190, may be cooled, for example, by fluid or gas flow through the cooling channel 192.

Devices in the etch regions, such as ion assisted etchers, may also be selectively tilted, displaced, or moved in one or more degrees of freedom, similar to the tilt, displacement, and movement of one or more targets of the stacking apparatus.

Continuous roll-to-roll lamination coating apparatus 100 may optionally be under atmospheric control, such as vacuum or under a specific atmosphere, or optionally a portion of continuous roll-to-roll lamination coating apparatus 100 may be under such atmosphere control. There may be. For example, the vacuum process chamber 114 may be under atmospheric control, and the continuous roll-to-roll lamination coating apparatus 100 may apply the inlet vacuum locking system 200 to the inlet side 202 of the vacuum process chamber 114. And an outlet vacuum locking system 204 on the outlet side 206 of the vacuum process chamber 114. In another embodiment, the supply chamber 102, the vacuum process chamber 114, and the collection chamber 110 are all under atmospheric control.

Atmosphere control may include maintaining the vacuum process chamber 114 at a particular operating pressure. Atmosphere control may also include maintaining each of supply chamber 102 and collection chamber 110 at a particular operating pressure. The specific operating pressure does not have to be the same in each chamber. The working pressure is for example at most 1 × 10 ⁻² mbar. Atmosphere control may also optionally include maintaining an atmosphere of the vacuum process chamber 114 that does not include at least a reactant gas, a particular gas, or a gas concentrate.

In one embodiment, uncoiler 104 and recoiler 112 are both under atmospheric control. For example, the uncoiler 104 and the recoiler 112 may be under vacuum, and may have an essential device such as a vacuum pump (not shown) connected to these two chambers.

Between the supply chamber 102 and the vacuum process chamber 114 is a vacuum locking system 200 having a strip guide similar to the strip guide 188 located in the vacuum process chamber 114. In one embodiment, the strip substrate 106 may pass through a narrow section to avoid gas diffusion from the supply chamber 102 to the vacuum process chamber 114. In another embodiment, because the supply chamber 102 may be at a lower pressure than the vacuum process chamber 114, or at least a lower pressure than the etching region 116, the gas, such as Ar gas, may be the etching region 116. Diffuses from the supply chamber 102 into the vacuum process chamber 114 from the supply chamber 102. In another embodiment, between the etched region 116 and the stacked region 118 is an intermediate vacuum locking system 210 having a strip guide similar to the strip guide 188 located in the vacuum process chamber 114. The pump capacity of the intermediate vacuum lock system 210 is greater than the pump capacity of the laminate area 118 and the pump capacity of the etch area 116, compared to the intermediate vacuum lock system 118 and the etching area 116, respectively. Since the pressure in the 210 is formed and maintained lower, the reaction gas does not diffuse from the deposition region 118 to the etching region 116, ie the intermediate vacuum lock system 210 functions as a gas lock.

Gas locking can be implemented in two ways, one being the intermediate vacuum locking system from the etched region 116 and the stacked region 118 at a low pressure of the chamber of the vacuum locking system 210, such as the intermediate vacuum locking system 210. Or to diffuse into the etched region 116 and the stacked region 118 at a higher gas pressure in the chamber of the intermediate vacuum locking system 210, such as the intermediate vacuum locking system 210. Supplying the gas to be supplied, and thus the diffusion can prevent any reaction gas from diffusing from the deposition region 118 into the etching region 116.

In another embodiment, between the vacuum process chamber 114 and the collection chamber 110, a vacuum lock similar to the type described for the vacuum locking system 200 between the supply chamber 102 and the vacuum supply chamber 114. There is a system 204.

Embodiments of the pressure relationship of various chambers, regions, and / or vacuum locks of the device of the embodiments can be described as follows.

Pressure (supply chamber) <pressure (etching zone)> pressure (medium vacuum lock) <pressure (stacking zone)> pressure (collection chamber) (Equation 1)

When Ar gas is introduced into the intermediate chamber, it is as follows.

Pressure (Uncoiler) <Pressure (Etching Machine) <Pressure (Intermediate Area, Ar)> Pressure (Lamination Area)> Pressure (Recoiler) (Equation 2)

,

') 사이의 관계에 대한 추가적인 실시예를 설명할 것이다. 도 5a 에 있어서, 도 2 의 특징의 일부가 도시되어 있으며, 동일한 도면부호가 표시되어 있다. 또한, 아래쪽의 두 스트립 기재 (106) 와 관련된 특징이 도시되어 있다. 이는, 스트립 기재가 진공 공정 챔버 (114) 의 내측 표면 (190) 을 지나서 돌출하기 시작하는 최하측 스트립 기재의 표면상의 위치 (도면 부호 M 으로 표시), 스트립 기재의 형상 (도 3 참조) 에 관계없이 스트립 기재 (160) 의 가장 멀리 돌출해 있는 부분을 나타내는 최하측 스트립 기재의 표면의 돌출부상의 위치 (도면 부호 N 으로 표시), 및 스트립 기재가 진공 공정 챔버 (114) 의 내측 표면 (190) 을 지나서 돌출하기 시작하는 옆에 있는 연속하는 스트립 기재의 표면상의 위치 (도면 부호 O 로 표시) 를 포함한다. 도시되어 있는 바와 같이, 선분

은 옆에 있는 연속하는 스트립 기재를 바라보는 아래쪽 스트립 기재의 표면을 나타내고, 그의 표면은 지점 O 를 포함하며, 선분

의 거리는 d 이고, 선분

로부터 지점 O 까지의 간격은 선분

의 거리이며 y 로 표시된다.Referring now to FIGS. 5A and 5B, the protrusion distance d of the strip substrate, the y-axis spacing y between successive strip substrates, and the angle from the vertical line of each target (

,

Further embodiments of the relationship between ') will be described. In FIG. 5A, some of the features of FIG. 2 are shown and the same reference numerals are indicated. Also shown are features associated with the bottom two strip substrates 106. This is related to the position on the surface of the lowermost strip substrate (indicated by reference numeral M), the shape of the strip substrate (see FIG. 3) where the strip substrate begins to protrude beyond the inner surface 190 of the vacuum process chamber 114. The position on the protrusion of the surface of the lowermost strip substrate (denoted by reference numeral N), which indicates the furthest protruding portion of the strip substrate 160 without the strip substrate, and the strip substrate is formed on the inner surface 190 of the vacuum process chamber 114. A position on the surface of the continuous strip substrate next to it that begins to protrude past (indicated by reference numeral O). As shown, line segments

Represents the surface of the bottom strip substrate facing the next continuous strip substrate, the surface of which comprises point O, the line segment

Is the distance d,

To the point O is the line segment

The distance of, denoted by y.

사이의 관계는 본원의 다른 부분에 설명된 바와 같이 결정될 수 있다. 도 5b 에 도시되어 있는 바와 같이, M 에서는 직각이고 N 에서는 각도 θ 인 직각 삼각형 MNO 가 두 스트립 기재 (106) 사이에 형성될 수 있다. 각도 θ 는 하기와 같이 선분

와 선분

의 거리와 관련이 있다.Referring to FIG. 5B, the geometric position and features are shown very schematically, with the angle θ and the angle of the triangle formed by MNO.

The relationship between can be determined as described elsewhere herein. As shown in FIG. 5B, a right triangle MNO with a right angle at M and an angle θ at N can be formed between the two strip substrates 106. Angle θ is line segment as below

And line segment

It is related to the distance.

θ = tan ^-1 (y / d) (Equation 3)

에 평행한 법선 (128) 으로 형성되는 일 변을 갖는다. 삼각형 (300) 은 90 °의 각도 및 각도 θ 와 동일한 각도 λ 를 갖는다.Triangle 300 may be formed as shown in FIG. 5B and includes a base coinciding with surface 126 of target 124, and a line segment NO of triangle MNO and hypotenuse of triangle MNO.

It has one side formed by a normal 128 parallel to. Triangle 300 has an angle λ equal to an angle of 90 ° and an angle θ.

는 각도 θ 와 동일하도록 결정될 수 있다. 그러므로, 타겟 (124, 180) 을 배향하기 위한 각도

는 하기와 같이 스트립 기재 (106) 의 관계 및 공간 위치의 함수로 표현될 수 있다.With this information, two different angles can be determined. First of all, angle

May be determined to be equal to the angle θ. Therefore, the angle for orienting the targets 124, 180

Can be expressed as a function of the relationship of the strip substrate 106 and the spatial position as follows.

= tan^-1(y/d) = θ (식 4)

= tan ^-1 (y / d) = θ (Equation 4)

' 에 대하여 유사한 관계가 성립될 수 있다.Angle

A similar relationship can be established for '.

Secondly, the angles α and β can also be expressed as a function of the spatial position and the relationship of the strip substrate 106 as follows.

α '= 90 ° + tan ^-1 (y / d) (Equation 5)

에서부터 각도 δ 만큼 변한다. 그러므로, 각도 α 는 다음과 같이 제 1 근사치로 표현될 수 있다.α 'is approximately equal to the angle α which varies only by any inclined surface of the protruding end of the strip substrate 106 (see FIG. 3). In a first approximation, this sloped surface is a parallel first surface

Is changed by an angle δ from. Therefore, angle α can be expressed as a first approximation as follows.

α = α '+ δ (Equation 6)

Similar relationships can be established for angle β.

Although described and described with reference to two bottom strip substrates of a number of strip substrate arrangements, the same principles and relationships can be provided with any of the strip substrates of the continuous roll-to-roll lamination apparatus 100 of the embodiment. Continuous roll-to-roll lamination coating apparatus 100 can deposit a coating on a strip substrate in a continuous operation. An embodiment method for continuously coating a strip of strip substrate comprises supplying at least one strip substrate from a supply chamber to a vacuum process chamber, the strip substrate being opposite the body, the second main side. And a first transverse side opposite the first major side and a second transverse side, the surfaces of the first and second transverse sides being narrower than the surfaces of the first and second major sides, and vacuum Moving at least one strip substrate through the process chamber, wherein the vacuum process chamber includes at least one lamination apparatus including at least one ion assisted etcher in the etch region and at least one target in the lamination region. And wherein the etch region is upstream of the stacking region, cleaning the first edge region of the at least one strip substrate in the etch region. Wherein the first edge region comprises at least a first inclined surface tapered from the first tip to the first distal end, wherein the first tip is closer to the central region of the strip substrate than the first distal end, and the first slope is The surface has a first surface normal, comprising laminating a coating to the first sloped surface of the first edge region in the lamination region, and collecting the coated strip substrate in a collection chamber. The at least one strip substrate projects the first edge region toward the at least one ion assisted etcher of the etch region and moves the first edge region of the stacking region while moving from the supply chamber to the collection chamber via the vacuum process chamber. Protrude toward at least one target of the device. The target of the at least one lamination apparatus includes a target surface having a target normal, and is inclined with respect to the first inclined plane such that the target normal intersects the first surface normal at an angle α. The angle α may be as described herein for an embodiment of the device 100. Examples for angle α include that α is at least 90 °, α is 90 ° to 135 °, and α is about 90 ° + tan ⁻¹ (y / d), y being a continuous strip substrate Is the spacing distance in the y axis direction between and d is the protruding distance of the strip substrate. In some embodiments, two surfaces of the strip substrate may be coated. For example, the first edge region of the strip substrate may comprise a second sloped surface on the major side of the strip substrate opposite the first sloped surface. The second inclined surface is tapered from the second tip to the second end, and the second tip is closer to the central region of the strip substrate than the second end. The second slope has a second surface normal. In this embodiment, the method includes cleaning the second edge region of the at least one strip substrate in the etch region, and depositing a coating on the second slope of the first edge region in the lamination region. The method of an embodiment may use one or more etch regions that include one or more ion assisted etchers, and may use one or more laminate regions that include one or more lamination devices. For example, a second (or subsequent or third, fourth, fifth ...) lamination device comprising a second (or subsequent or third, fourth, fifth ...) target is laminated May be in the area. The second (or subsequent or third, fourth, fifth ...) arc evaporator or sputtering group is downstream of the at least one arc evaporator or sputtering machine in the direction of processing. The second target includes a target surface having a target normal, and is inclined with respect to the second slope so that the target normal intersects at an angle β with respect to the second surface normal. Angle β may be as described herein for an embodiment of device 100. Examples of angle β include that β is at least 90 °, β is 90 ° to 135 °, and β is about 90 ° + tan ⁻¹ (y / d), where y is a continuous strip substrate Is the spacing distance in the y axis direction between and d is the protruding distance of the strip substrate. In some embodiments, α is equal to β, and in other embodiments, α is not equal to β. In this embodiment, laminating the coating on the second slope of the first blade region in the lamination region includes laminating the coating with a second arc evaporator or sputter. In all the methods of the embodiment, further adjustment of the target may be carried out through the degrees of freedom given by the target holder, such as one degree of freedom, two degrees of freedom, or three degrees of freedom. The method of the embodiment may optionally include controlling the feed rate and collection rate of the strip substrate through the vacuum process chamber to achieve the desired tension of the strip substrate in the lamination area.

The position of the strip substrate in the vacuum process chamber can be controlled to obtain the desired placement and affect the quality of the coating. For example, the protruding first edge regions of each of the plurality of strip substrates may protrude at the same distance. Here, the inclination of the target surface relative to the surface to be coated prevents the side strip substrate from covering the surface to be coated. In another embodiment, the protruding first edge regions of each of the plurality of strip substrates protrude at different distances. Here, the different protruding distances and the inclination of the target surface relative to the surface to be coated ensure that the adjacent strip substrate does not obscure the surface to be coated. Another embodiment of positioning of the strip substrate includes a first end portion of each of the plurality of strip substrates, with the first end portion of the lowermost strip substrate at a first distance and the first end portion of the uppermost strip substrate being second At a distance, the second distance being greater than the first distance. Yet another embodiment includes a first end portion of each of the plurality of strip substrates between the lowermost strip substrate and the uppermost strip substrate at a stepwise varying distance between the first and second distances.

The method may optionally control the atmosphere of one or more regions of the device. For example, the vacuum process chamber can have a controlled atmosphere, the inlet vacuum lock system can be at the inlet side of the vacuum process chamber, and the outlet vacuum lock system can be at the outlet side of the vacuum process chamber. The etched and stacked regions may be separated by a vacuum lock system. In this embodiment, the method includes moving at least one strip substrate through an inlet vacuum lock system and an outlet vacuum lock system. In another embodiment, in addition to the vacuum process chamber, the supply chamber and collection chamber may also be in a controlled atmosphere. An example of a controlled atmosphere is to control it to maintain the vacuum process chamber at a working pressure of up to 1 × 10 ^-2 mbar, the supply chamber and the collection chamber, each with a maximum operating pressure of 1 × 10 ^-2 mbar, the vacuum process Maintaining the chamber in an atmosphere containing no reactive gas, or a combination of these methods. As described in equations 1 and 2, additional atmosphere control may be included for pressure relationships in the various chambers, regions, and / or vacuum locks of the device of the embodiment. The laminated coating can have a variety of materials, thicknesses, hardness, tensile strengths as described herein. For example, the total thickness of the coating is at most 25 μm and the tensile strength of the strip steel substrate is at least 1200 MPa.

Also for example, the target source of the first arc evaporator or sputter group may be a different material than the target source of the second arc evaporator or sputter group, the coating may be a mixed composition or a layered composition of the above materials, or It can be laminated to different surfaces of the strip substrate. Also for example, the target source of the first arc evaporator or sputter group may be the same material as the target source of the second arc evaporator or sputter group, and the coating may be laminated on the same or different surfaces of the strip substrate.

The material of the strip substrate has a composition suitable for curing as follows.

0.1 to 1.5% C, 0.001 to 4% Cr, 0.01 to 1.5% Mn, 0.01 to 1.5% Si, ~ l% Ni, 0.001 to 0.5% N, balance hardenable essentially with Fe Carbon steel;

0.1 to 1.5% C, 10 to 16% Cr, 0.001 to 1% Ni, 0.01 to 1.5% Mn, 0.01 to 1.5% Si, 3% Mo, 0.001 to 0.5% N, balance As curable chromium steel having essentially Fe as; or

0.001-0.3% C, 10-16% Cr, 4-12% Ni, 0.1-1.5% Ti, 0.01-1.0% Al, 0.01-6% Mo, 0.001--4% Cu, A precipitation hardenable steel having 0.001 to 0.3% N, 0.01 to 1.5% Mn, 0.01 to 1.5% Si, and essentially Fe as the remainder.

Example  One

The chemical composition of the base material of the examples is in accordance with the internal Sandvik specifications 20C2 and 13C26 having the following nominal composition.

Sandvik 20C2: 1.0 wt% C, 1.4 wt% Cr, 0.3 wt% Si, and 0.3 wt% Mn; And

Sandvik 13C26: 0.7 wt% C, 13 wt% Cr, 0.4 wt% Si, and 0.7 wt% Mn.

First, a base material is produced by normal steelmaking with the above chemical composition. Thereafter, the substrate material is hot rolled to a medium size, and then the recrystallization step is executed several times between the rolling steps while cold rolling in several steps until a final thickness of 0.2 mm and a width of up to 400 mm are obtained. Thereafter, the strip steel is cured and quenched to the desired mechanical strength level, preferably at least 1200 MPa. Thereafter, the strip of full width is divided by the final width of the product. The blades of the divided strips are then treated, such as shaving, grinding, and polished, for their intended use, including round blades, sharp edged blades, square blades, burr free blades, and diagonal blades. In a suitable state and shape. The surface and blade of the substrate material are then cleaned to remove oil residues from previous operations before the coating process.

Thereafter, the coating process is carried out in a continuous process line starting with the decoiling device placed in a separate vacuum or low pressure decoiling chamber. The first stage of the roll-to-roll processing line may be a vacuum chamber and / or an inlet vacuum lock, and then ion assisted etching is performed to remove the thin oxide layer of the edge of the substrate material to be coated in the etching chamber. . The strip then enters the lamination chamber (s) for laminating the coating on the blade. In this embodiment, TiN is selected as the material to be laminated. Typically, a metal nitride layer of 0.1 to 25 μm is laminated on the blade, the preferred thickness of which depends on the application. In the embodiment described here, a thickness of 2 μm is laminated using one arc evaporation chamber. After arc evaporation, the coated strip material is passed through an outlet vacuum chamber or outlet vacuum lock before being wound into the coiler.

The final products described here, i.e. coated 20C2 and 13C26 strip materials, each having a strip thickness of 0.2 mm and a thin TiN coating of 2 μm, have very good adhesion of the coated layer, and therefore particularly flexogravure or roto It is suitable for the manufacture of doctor blades for gravure printing and industrial knives.

Example  2

The chemical composition of the base material of this example is in accordance with internal Sandvik Standard 20C having essentially the following nominal composition.

Sandvik 20C: 1.0 wt% C, 0.2 wt% Cr, 0.3 wt% Si, and 0.4 wt% Mn.

First, a base material is produced by conventional steelmaking with the above chemical composition. The recrystallization step is then carried out between the rolling steps several times while the material is hot rolled to medium size and then cold rolled in several steps until a final thickness of 0.45 mm and a width of up to 400 mm are obtained. Thereafter, the strip steel is hardened and quenched to a level above the desired mechanical strength, preferably 1200 MPa. The total width of the strip is then divided by the final width of the product, which in this example is divided by 100 mm for the coater blade. The blades of the divided strips are then treated, such as shaving, grinding, and polished, to suit the intended use, including round blades, sharp edged blades, square blades, burr-free blades, and diagonal blades. State and shape. The surface and blade of the base material are then cleaned to remove oil residues from previous operations before the coating process.

The final product is a coated strip, the coating material and thickness are as in Example 1. The coated strip material can now be divided in the middle along the section 206 to obtain two coated strips, each strip having dimensions and blade shapes suitable for the end use. Basically, only the cut to the desired final length remains.

The final product described in this example, i.e., strip thickness of 0.45 mm and final split width of 100 mm, was processed and coated, and the coated strip base material was a 2 μm thin blade coating with very good adhesion of the coated layer. It has a titanium nitride layer. This product can be cut to the desired length, typically 3 to 10 m, depending on the end use without any further processing and then used as a coater blade in the paper mill.

Embodiments of the coated steel products described herein include scissors and gardening shears, kitchen and bakery tools, plastering tools, trowels, medical equipment and surgical knives, razor blades, cutters, flapper valves, die cutting tools , Saws and cutters in general, such as slicers, engraving knives, bread knives, butcher knives, blender blades, hunting and fishing knives, pocket knives and industrial knives for cutting synthetic fibers, paper, plastic films, fabrics and carpets Hard, dense and / or low friction wear resistant coatings may be used, such as, for example, coater blades and doctor blades, or other uses using metal strip substrates with coated blades.

Thus, the strip material according to the embodiment is suitable for use in shaving devices such as razor blades and cutters, and in medical equipment such as thin surgical knives. The thickness of the base material in this type of field is rather thin, typically 0.015 to 0.75 mm, generally 0.015 to 0.6 mm, preferably 0.03 to 0.45 mm. Thus, the total thickness of the coating may be preferably as thin as possible, typically 0.1 to 5 μm, generally 0.1 to 3 μm, preferably 0.1 to 2 μm, even more preferably 0.1 to 1 μm. In this case, it is therefore preferable that the ratio between the thickness of the coating and the thickness of the strip substrate is small. The ratio is usually 0.01 to 7%, preferably 0.01 to 5%.

One other use of this embodiment is that a coating may be provided prior to curing and quenching of the base material. In this case, the coating is at least 400 ° C. for a holding time at a curing temperature generally used for curing the base material to obtain a tensile strength, ie a minimum tensile strength of 1200 MPa, preferably exceeds 800 ° C., more preferably Preferably it should be able to withstand curing temperatures in excess of 950 ° C.

For other descriptions, typical dimensions for strip substrates for razor blades have a substrate material of less than 0.15 mm, typically less than 0.10 mm and a strip width of about 400 mm, with a coating of less than 5 μm, generally 2 μm. , Typically less than about 1 μm, or even thinner.

The strip material according to the embodiment is suitable for use in knife applications and also saw applications in various real and industrial applications. The thickness of the base material is relatively thick for this type of application, typically from 0.1 to 5 mm, generally from 0.2 to 3 mm. However, the total thickness of the coating is kept as thin as possible, typically from 0.1 to 10 μm, generally from 0.1 to 5 μm, preferably from 0.1 to 3 μm, even more preferably from 0.1 to 2 μm. In this case, the ratio between the thickness of the coating and the thickness of the strip material is preferably small. The ratio is usually 0.002% to 7%, preferably 0.01% to 5%.

Another use of this embodiment is that a coating may be provided prior to curing and quenching of the base material. In this case, the rigid dense coating is at least 400 ° C., preferably more than 800 ° C., more preferably at least 800 ° C. during the holding time at the curing temperature normally used for curing the base material to obtain a tensile strength, ie at least 1200 MPa. It must be able to withstand curing temperatures above 950 ° C.

Examples 1 and 2 above are both examples applied in a similar manner for razor blades and / or thin surgical knives and / or real and industrial knives and / or saw applications. Thus, this example describes a coating method and substrate material suitable for such use. The only difference is the order of progress for curing and quenching as above, which can be reversed with the coating as described above.

While the invention has been described in connection with the preferred embodiments, those skilled in the art will recognize that additions, deletions, changes, and substitutions may be made within the spirit and scope of the invention as defined in the appended claims.

Claims (54)

A vacuum process chamber including an etching region upstream of the deposition region; At least one ion assisted etcher in the etch region; And A continuous roll-to-roll lamination coating apparatus comprising at least one lamination apparatus in at least one lamination area and comprising at least one target, Projecting the first blade region toward at least one ion assisted etcher of the etching region and projecting the first blade region towards the target of at least one laminating device of the deposition region while the strip substrate is moving through the vacuum process chamber, The first edge region of the strip substrate comprises at least one first inclined surface tapered from the first tip to the first distal end, wherein the first tip is closer to the central region of the strip substrate than the first distal end, and the first slope is Has a first surface normal, The target of the at least one lamination device comprises a target surface having a target normal and is inclined relative to the first inclined plane such that the target normal intersects the first surface normal at an angle α of at least 90 °. Laminated coating device. The continuous roll-to-roll lamination coating apparatus according to claim 1, wherein α is 90 to 135 °. 2. The continuous of claim 1, wherein α is about 90 ° + tan ⁻¹ (y / d), wherein y is a distance in the y axis direction between successive strip substrates, and d is a protruding distance of the strip substrate Roll-to-roll lamination coating apparatus. The continuous roll-to-roll lamination coating apparatus according to claim 1, wherein the first end portion of the first inclined surface is in the same position as the edge of the strip substrate. The method of claim 1, further comprising a second lamination apparatus in the lamination region, The second lamination apparatus includes a second target, The second lamination device is downstream from the at least one lamination device in the process progressing direction, The first edge region of the strip substrate comprises a second surface on a major side of the strip substrate opposite from the first inclined surface, The second target of the second lamination apparatus comprises a target surface having a target normal and is inclined relative to the second surface of the strip substrate such that the target normal intersects the second surface normal at an angle β of at least 90 ° Two-roll lamination coating apparatus. 2. The method of claim 1, wherein the first edge region of the strip substrate comprises a second sloped surface on the major side of the strip substrate opposite the first sloped surface, the second sloped surface being tapered from the second leading end to the second end portion. Wherein the second leading end is closer to the central region of the strip substrate than the second ending and the second inclined surface has a second surface normal. The continuous roll-to-roll lamination coating apparatus according to claim 6, wherein the second end portion of the second inclined surface is in the same position as the edge of the strip substrate. The continuous roll-to-roll lamination coating apparatus according to claim 6, wherein the first end portion of the first inclined surface and the second end portion of the second inclined surface are in contact with each other to form a blade. 7. The apparatus of claim 6, comprising a second lamination device in the lamination area, The second lamination apparatus includes a second target, The second laminating device is downstream from the at least one laminating device in the process progressing direction, The second target of the second lamination apparatus includes a target surface having a target normal and is inclined relative to the second inclined plane such that the target normal intersects the second surface normal at an angle β of at least 90 °. Roll lamination coating device. 10. The continuous roll-to-roll lamination coating apparatus according to claim 9, wherein β is 90 to 135 degrees. 10. The continuous of claim 9, wherein β is about 90 ° + tan ⁻¹ (y / d), wherein y is a distance in the y axis direction between successive strip substrates, and d is a protruding distance of the strip substrate. Roll-to-roll lamination coating apparatus. 10. The continuous roll-to-roll lamination coating apparatus according to claim 9, wherein α ≠ β. 10. The continuous roll-to-roll lamination coating apparatus according to claim 9, wherein the target of the first lamination apparatus is a material different from that of the second lamination apparatus. 10. The continuous roll-to-roll lamination coating apparatus according to claim 9, wherein the target of the first lamination apparatus is the same material as the target of the second lamination apparatus. The method of claim 9, A supply chamber each including an uncoiler for each of the plurality of strip substrates disposed in the coil; And A collection chamber comprising a recoiler for each of the plurality of strip substrates, Wherein said vacuum process chamber is between a supply chamber and a collection chamber. 16. The apparatus of claim 15, comprising a controller operatively connected to an uncoiler for each of the plurality of coils and a recoiler for each of the plurality of strip substrates, the strip substrate from the supply chamber via a vacuum process chamber to the collection chamber. And the controller controls the feed and collection rate of the strip substrate through the vacuum process chamber to obtain the desired tension of the strip substrate in the stacking region. The continuous roll-to-roll lamination coating apparatus according to claim 1, wherein the plurality of strip substrates are horizontally spaced with an optional diaphragm between successive strip substrates. The continuous roll-to-roll lamination coating apparatus according to claim 1, wherein the protruding first edge regions of each of the plurality of strip substrates protrude at the same distance. The continuous roll-to-roll lamination coating apparatus according to claim 1, wherein the protruding first edge regions of each of the plurality of strip substrates protrude at different distances. 20. The continuous roll to roll of claim 19, wherein the first distal end of each of the plurality of strip substrates between the lowermost strip substrate and the uppermost strip substrate is at a stepwise varying distance between a first distance and a second distance. Roll lamination coating device. The continuous roll-to-roll lamination coating apparatus according to claim 1, wherein the continuous roll-to-roll lamination coating apparatus is under atmospheric control. The continuous roll-to-roll lamination coating apparatus according to claim 1, wherein the vacuum process chamber has an atmosphere free of a reactive gas. The continuous roll-to-roll lamination coating apparatus according to claim 1, wherein the strip substrate is a substrate of a coater blade, a doctor blade, a shaver component, a medical device, a real knife or an industrial knife. Supplying at least one strip substrate to the vacuum process chamber, the strip substrate having a body, a first main side opposite the second main side, and a first transverse side opposite the second transverse side A side, wherein the first and second lateral sides are narrower than the first and second major sides; Moving at least one strip substrate through a vacuum process chamber, the vacuum process chamber including at least one ion assisted etchant in an etched region and at least one laminating apparatus in a stacked region, wherein the etched region Is upstream of the stacking region; Cleaning the first edge region of the at least one strip substrate in the etch region, the first edge region comprising at least a first inclined surface tapered from the first leading end to the first distal end, the first leading end being Closer to the central region of the strip substrate than the first distal end, the first slope having a first surface normal; Laminating the coating to the first slope of the first edge region in the lamination region; And A method for continuously coating a strip of strip substrate, the method comprising collecting a coated strip substrate, the method comprising: The at least one lamination device comprises at least one target, The at least one strip substrate protrudes through the vacuum process chamber to the at least one ion assisted etcher of the first edge region and the first edge region to at least one of the at least one lamination apparatus of the laminated region. Protrude toward the target, and The target of the at least one stacking device comprises a target surface having a target normal and successively edges of the strip substrate inclined relative to the first inclined plane such that the target normal intersects the first surface normal at an angle α of at least 90 °. Method for coating. The method of claim 24, wherein α is 90 to 135 °. The strip of claim 24, wherein α is about 90 ° + tan ⁻¹ (y / d), where y is a distance in the y axis direction between successive strip substrates, and d is the protruding distance of the strip substrate. Method for continuously coating the blade of the substrate. The device of claim 24, wherein the first edge region of the strip substrate comprises a second surface on a major side of the strip substrate opposite from the first sloped surface, and Cleaning the second edge region of the at least one strip substrate in an etching region, and Laminating the coating to a second slope of the first edge region in the lamination region. The apparatus of claim 27, wherein the second lamination apparatus is located in a lamination region, The second lamination apparatus includes at least one target, The second lamination device is downstream from the at least one lamination device in the process advancing direction, At least one target of the second lamination apparatus includes a target surface having a target normal and is inclined relative to the second surface such that the target normal intersects the second surface normal at an angle β of at least 90 °, and Laminating the coating on the second surface of the first blade region in the lamination region comprises laminating the coating with a second lamination device. 25. The device of claim 24, wherein the first edge region of the strip substrate comprises a second inclined surface on a major side of the strip substrate opposite from the first inclined surface, the second inclined surface tapered from the second leading end to the second distal end. The second tip is closer to the central region of the strip substrate than the second distal end, the second slope has a second surface normal, and Cleaning the second edge region of the at least one strip substrate in an etching region, and Laminating the coating to a second slope of the first edge region in the lamination region. The apparatus of claim 29, wherein the second lamination apparatus is located in a lamination region, The second lamination apparatus includes at least one target, The second lamination device is downstream from the at least one lamination device in the process progressing direction, At least one target of the second lamination device comprises a target surface having a target normal and is inclined relative to the second inclined plane such that the target normal intersects the second surface normal at an angle β of at least 90 °, and Laminating the coating on the second inclined surface of the first edge region in the lamination region comprises laminating the coating with a second lamination apparatus. 31. The method of claim 30, wherein β is from 90 to 135 degrees. The strip of claim 30, wherein β is about 90 ° + tan ⁻¹ (y / d), where y is a distance in the y axis direction between successive strip substrates, and d is the protrusion distance of the strip substrate. Method for continuously coating the blade of the substrate. 31. The method of claim 30, wherein the blades of the strip substrate are continuously coated with? 31. The method of claim 30, wherein the target of the first lamination device is a different material than the target of the second lamination device. 31. The method of claim 30, wherein the target of the first lamination device is the same material as the target of the second lamination device. 25. The method of claim 24, comprising controlling the feed rate and collection rate of the strip substrate through the vacuum process chamber to obtain the desired tension of the strip substrate in the lamination area. . 25. The method of claim 24, wherein the protruding first edge regions of each of the plurality of strip substrates protrude at the same distance. 25. The method of claim 24, wherein the protruding first edge regions of each of the plurality of strip substrates protrude at different distances. 39. The edge of a strip substrate of claim 38, wherein the first distal end of each of the plurality of strip substrates between the bottom strip substrate and the top strip substrate is at a stepwise varying distance between a first distance and a second distance. Method for continuous coating. 25. The method of claim 24, comprising controlling at least an atmosphere of the vacuum process chamber. 41. The method of claim 40, wherein the at least one strip substrate is supplied from a supply chamber, the coated strip substrate is collected in a collection chamber, and controlling the atmosphere in at least one of the supply chamber and the collection chamber, Method for continuously coating the blade of the strip substrate. 25. The method of claim 24, wherein the vacuum process chamber has an atmosphere free of reactant gas. The method of claim 24, wherein the total thickness of the coating is at most 25 μm and the tensile strength of the strip steel substrate is at least 1200 MPa. The method of claim 24, wherein the coating is a metal coating comprising Cr or Ni. 43. The method of claim 42, wherein the strip substrate has a thickness of 0.015 mm to 5.0 mm. 43. The method of claim 42, wherein the strip substrate is made of hardenable carbon steel, hardenable stainless chromium steel, or precipitation hardenable strip steel. The method of claim 24, wherein the coating comprises transition metal nitride, transition metal carbide, transition metal carbonitride, diamond-like carbon, or mixtures thereof. 25. The method of claim 24, wherein the coating is a multilayer comprising transition metal nitride, transition metal carbide, transition metal carbonitride, diamond-like carbon, or mixtures thereof. 25. The method of claim 24, wherein the coating comprises pure metal. The method of claim 24, wherein the coating comprises a MAX phase material. The method of claim 24, wherein the coating is a multilayer comprising up to 20 sublayers. The method of claim 24, wherein the coating comprises at least one nickel layer having a thickness up to 2 μm, wherein the at least one layer is not adjacent to the strip substrate. . 25. The method of claim 24, comprising incorporating the coated strip substrate into a coater blade, a doctor blade, a shaver part, a medical device, a real knife or an industrial knife. A vacuum process chamber including an etching region upstream of the deposition region; At least one ion assisted etcher in the etch region; And A continuous roll-to-roll lamination coating device comprising at least one lamination device in a lamination area, The strip substrate protrudes toward the at least one ion assisted etcher of the etched region and protrudes the first edged region toward the target of at least one lamination device of the laminated region during movement through the vacuum process chamber, The first edge region of the strip substrate is rectangular and has a first leading end and a first distal end, the first leading end being closer to the central region of the strip substrate than the first distal end, and the first edge region has a first surface normal , The target of the at least one laminating apparatus includes a target surface having a target normal and is inclined relative to the first edge region such that the target normal intersects with the first surface normal at an angle α of at least 90 °, continuous roll-to-roll lamination Coating device.

Images