SE386987B - Optiskt system - Google Patents

Optiskt system

Info

Publication number
SE386987B
SE386987B SE7403751A SE7403751A SE386987B SE 386987 B SE386987 B SE 386987B SE 7403751 A SE7403751 A SE 7403751A SE 7403751 A SE7403751 A SE 7403751A SE 386987 B SE386987 B SE 386987B
Authority
SE
Sweden
Prior art keywords
optical system
optical
Prior art date
Application number
SE7403751A
Other languages
English (en)
Swedish (sv)
Inventor
F Caprari
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of SE386987B publication Critical patent/SE386987B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/24Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
SE7403751A 1973-04-26 1974-03-20 Optiskt system SE386987B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US354644A US3860335A (en) 1973-04-26 1973-04-26 Optical system

Publications (1)

Publication Number Publication Date
SE386987B true SE386987B (sv) 1976-08-23

Family

ID=23394302

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7403751A SE386987B (sv) 1973-04-26 1974-03-20 Optiskt system

Country Status (8)

Country Link
US (1) US3860335A (fr)
JP (1) JPS556209B2 (fr)
BE (1) BE814040A (fr)
DE (1) DE2419567C3 (fr)
IN (1) IN139363B (fr)
IT (1) IT1011786B (fr)
SE (1) SE386987B (fr)
YU (1) YU39652B (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4378583A (en) * 1980-12-10 1983-03-29 Rca Corporation Xenon flash lamp shield
US4348105A (en) * 1981-04-30 1982-09-07 Rca Corporation Radiation shadow projection exposure system
US4432641A (en) * 1981-10-16 1984-02-21 Rca Corporation Visual defect inspection of masks
US4532427A (en) * 1982-03-29 1985-07-30 Fusion Systems Corp. Method and apparatus for performing deep UV photolithography
JPS6382237U (fr) * 1986-11-19 1988-05-30
JP2841424B2 (ja) * 1989-02-15 1998-12-24 日本電気株式会社 周波数切替型戦術航法システム
EP0660373A3 (fr) * 1993-12-21 1996-11-20 Hughes Aircraft Co Source de lumière punctuelle comportant une lampe à arc au Xenon.
US5703374A (en) * 1996-08-08 1997-12-30 Actinic Systems, Inc. Telecentric NUV-DUV irradiator for out-of-contact exposure of large substrates
CN106886124B (zh) * 2015-12-16 2019-02-01 深圳光峰科技股份有限公司 一种分束装置、光源系统及投影系统

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1908043A (en) * 1930-02-07 1933-05-09 Projector G M B H Optical projection system
US3222981A (en) * 1961-11-24 1965-12-14 James W Lucas Two-element projection lens

Also Published As

Publication number Publication date
YU39652B (en) 1985-03-20
JPS5015555A (fr) 1975-02-19
DE2419567A1 (de) 1974-11-14
BE814040A (fr) 1974-08-16
US3860335A (en) 1975-01-14
DE2419567B2 (de) 1979-11-15
IT1011786B (it) 1977-02-10
IN139363B (fr) 1976-06-12
DE2419567C3 (de) 1980-07-31
JPS556209B2 (fr) 1980-02-14
YU116874A (en) 1982-05-31

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