SE345482B - - Google Patents

Info

Publication number
SE345482B
SE345482B SE5969/68A SE596968A SE345482B SE 345482 B SE345482 B SE 345482B SE 5969/68 A SE5969/68 A SE 5969/68A SE 596968 A SE596968 A SE 596968A SE 345482 B SE345482 B SE 345482B
Authority
SE
Sweden
Application number
SE5969/68A
Inventor
G Wehner
G Anderson
Original Assignee
Litton Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Litton Industries Inc filed Critical Litton Industries Inc
Publication of SE345482B publication Critical patent/SE345482B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3471—Introduction of auxiliary energy into the plasma
    • C23C14/3478—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SE5969/68A 1967-05-05 1968-05-03 SE345482B (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US63633167A 1967-05-05 1967-05-05

Publications (1)

Publication Number Publication Date
SE345482B true SE345482B (xx) 1972-05-29

Family

ID=24551433

Family Applications (1)

Application Number Title Priority Date Filing Date
SE5969/68A SE345482B (xx) 1967-05-05 1968-05-03

Country Status (5)

Country Link
US (1) US3501393A (xx)
DE (1) DE1765287A1 (xx)
FR (1) FR1566888A (xx)
GB (1) GB1226004A (xx)
SE (1) SE345482B (xx)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1765850A1 (de) * 1967-11-10 1971-10-28 Euratom Verfahren und Vorrichtung zum Aufbringen von duennen Schichten
US3652443A (en) * 1970-08-25 1972-03-28 Gillette Co Deposition apparatus
US3856654A (en) * 1971-08-26 1974-12-24 Western Electric Co Apparatus for feeding and coating masses of workpieces in a controlled atmosphere
US3998718A (en) * 1976-02-18 1976-12-21 Bell Telephone Laboratories, Incorporated Ion milling apparatus
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area
US4138284A (en) * 1976-06-10 1979-02-06 Ppg Industries, Inc. Method of forming graded shade band on substrate
AU507748B2 (en) * 1976-06-10 1980-02-28 University Of Sydney, The Reactive sputtering
CH649578A5 (de) * 1981-03-27 1985-05-31 Ulvac Corp Hochgeschwindigkeits-kathoden-zerstaeubungsvorrichtung.
DE3237763C2 (de) * 1982-10-12 1985-09-12 Werner 3210 Elze Bartling Gerät zum Streuen bzw. Zerstäuben von Streugut vor die Räder von Kraftfahrzeugen
DE3306738A1 (de) * 1983-02-25 1984-08-30 Berna AG Olten, Olten Vorrichtung und verfahren zur beschichtung von substraten mittels glimmentladung, sowie deren anwendung
US4491509A (en) * 1984-03-09 1985-01-01 At&T Technologies, Inc. Methods of and apparatus for sputtering material onto a substrate
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US6168690B1 (en) * 1997-09-29 2001-01-02 Lam Research Corporation Methods and apparatus for physical vapor deposition
TWI466595B (zh) * 2005-08-02 2014-12-21 Pureron Japan Co Ltd A plasma generating device and a film forming method using the same
CN111962043B (zh) * 2020-08-19 2022-05-10 山东交通职业学院 一种轴承表面自润滑薄膜的制备装置及方法
CN111893444B (zh) * 2020-08-19 2022-08-09 山东交通职业学院 一种固体润滑薄膜的低温制备方法及应用

Also Published As

Publication number Publication date
FR1566888A (xx) 1969-05-09
US3501393A (en) 1970-03-17
DE1765287A1 (de) 1972-04-06
GB1226004A (xx) 1971-03-24

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