SE340563B - - Google Patents

Info

Publication number
SE340563B
SE340563B SE09726/67*A SE972667A SE340563B SE 340563 B SE340563 B SE 340563B SE 972667 A SE972667 A SE 972667A SE 340563 B SE340563 B SE 340563B
Authority
SE
Sweden
Application number
SE09726/67*A
Inventor
L Ott
M Giangualano
I Martenson
Original Assignee
Fmc Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fmc Corp filed Critical Fmc Corp
Publication of SE340563B publication Critical patent/SE340563B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
SE09726/67*A 1966-02-01 1967-04-29 SE340563B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US539236A US3376139A (en) 1966-02-01 1966-02-01 Photosensitive prepolymer composition and method
US56269166A 1966-07-05 1966-07-05

Publications (1)

Publication Number Publication Date
SE340563B true SE340563B (es) 1971-11-22

Family

ID=27066048

Family Applications (1)

Application Number Title Priority Date Filing Date
SE09726/67*A SE340563B (es) 1966-02-01 1967-04-29

Country Status (4)

Country Link
US (2) US3376139A (es)
CH (1) CH484458A (es)
ES (1) ES342356A1 (es)
SE (1) SE340563B (es)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3376139A (en) * 1966-02-01 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method
US3475176A (en) * 1966-09-06 1969-10-28 Eastman Kodak Co Azide sensitized photosensitive prepolymer compositions
US3458313A (en) * 1966-09-07 1969-07-29 Nasa High resolution developing of photosensitive resists
US3622365A (en) * 1968-04-18 1971-11-23 Fairchild Camera Instr Co Process of forming an arsenic sulfide mask
US4330611A (en) * 1969-05-29 1982-05-18 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials
US4133685A (en) * 1969-05-29 1979-01-09 Richardson Chemical Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials
US4486526A (en) * 1969-05-29 1984-12-04 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials
US3808004A (en) * 1969-05-29 1974-04-30 Richardson Graphic Co Lithographic plate and photoresist having two photosensitive layers
US3635711A (en) * 1969-06-06 1972-01-18 Grace W R & Co Method and automated apparatus for photocomposing
US3640765A (en) * 1969-08-06 1972-02-08 Rca Corp Selective deposition of metal
US3648607A (en) * 1969-08-21 1972-03-14 Xerox Corp Imaging system
CA980163A (en) * 1970-12-23 1975-12-23 Jack R. Celeste Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds
US3673140A (en) * 1971-01-06 1972-06-27 Inmont Corp Actinic radiation curing compositions and method of coating and printing using same
US3772171A (en) * 1971-04-05 1973-11-13 Inmont Corp Novel quick setting inks
US3902902A (en) * 1971-06-22 1975-09-02 Siemens Ag Method of forming a photo-cross-linked insulator film
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
US3751248A (en) * 1971-12-27 1973-08-07 Bell Telephone Labor Inc Method of selective multilayered etching
US3883352A (en) * 1973-04-05 1975-05-13 Grace W R & Co Process for forming a photocured solder resist
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
US4197125A (en) * 1974-02-12 1980-04-08 Teijin Limited Process of making photosensitive resin printing plates
DE2457882B2 (de) * 1974-12-06 1977-06-02 Siemens AG, 1000 Berlin und 8000 München Waermebestaendige, lichtvernetzbare massen
US4233390A (en) * 1979-07-20 1980-11-11 Polychrome Corporation Lithographic printing plate having dual photosensitive layering
JPS5820420B2 (ja) * 1978-12-15 1983-04-22 富士通株式会社 パタ−ン形成方法
US4292396A (en) * 1980-03-03 1981-09-29 Western Litho Plate & Supply Co. Method for improving the press life of a lithographic image having an outer layer comprising an epoxy resin and article produced by method
US4452877A (en) * 1982-08-26 1984-06-05 American Hoechst Corporation Electrolysis treatment of light sensitive diazo coated supports
JPS5953836A (ja) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
DE3246403A1 (de) * 1982-12-15 1984-06-20 Merck Patent Gmbh, 6100 Darmstadt Verfahren zur entwicklung von reliefstrukturen auf der basis von strahlungsvernetzten polymervorstufen hochwaermebestaendiger polymere
US4785062A (en) * 1984-07-31 1988-11-15 W. R. Grace & Co.-Conn. Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane resin and phenol with product having no remaining epoxy groups
US4608331A (en) * 1984-11-16 1986-08-26 Witco Chemical Corporation Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer
US4684599A (en) * 1986-07-14 1987-08-04 Eastman Kodak Company Photoresist compositions containing quinone sensitizer
US4886731A (en) * 1987-01-05 1989-12-12 Cookson Graphics Inc. Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions
US5254429A (en) * 1990-12-14 1993-10-19 Anocoil Photopolymerizable coating composition and lithographic printing plate produced therefrom
US5458921A (en) 1994-10-11 1995-10-17 Morton International, Inc. Solvent system for forming films of photoimageable compositions

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2339058A (en) * 1942-03-25 1944-01-11 Gen Electric Coating composition comprising partially polymerized allyl esters containing polymerization inhibitor
NL87862C (es) * 1951-08-20
US2722512A (en) * 1952-10-23 1955-11-01 Du Pont Photopolymerization process
US2832758A (en) * 1954-02-19 1958-04-29 Fmc Corp Solid prepolymers of diallyl phthalate
BE590472A (es) * 1959-05-06
BE596694A (es) * 1959-11-03
BE599102A (es) * 1960-01-27
US3376138A (en) * 1963-12-09 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method
US3376139A (en) * 1966-02-01 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method

Also Published As

Publication number Publication date
US3462267A (en) 1969-08-19
CH484458A (de) 1970-01-15
ES342356A1 (es) 1968-07-16
US3376139A (en) 1968-04-02

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