SE340563B - - Google Patents
Info
- Publication number
- SE340563B SE340563B SE09726/67*A SE972667A SE340563B SE 340563 B SE340563 B SE 340563B SE 972667 A SE972667 A SE 972667A SE 340563 B SE340563 B SE 340563B
- Authority
- SE
- Sweden
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US539236A US3376139A (en) | 1966-02-01 | 1966-02-01 | Photosensitive prepolymer composition and method |
US56269166A | 1966-07-05 | 1966-07-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
SE340563B true SE340563B (xx) | 1971-11-22 |
Family
ID=27066048
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE09726/67*A SE340563B (xx) | 1966-02-01 | 1967-04-29 |
Country Status (4)
Country | Link |
---|---|
US (2) | US3376139A (xx) |
CH (1) | CH484458A (xx) |
ES (1) | ES342356A1 (xx) |
SE (1) | SE340563B (xx) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3376139A (en) * | 1966-02-01 | 1968-04-02 | Gilano Michael Nicholas | Photosensitive prepolymer composition and method |
US3475176A (en) * | 1966-09-06 | 1969-10-28 | Eastman Kodak Co | Azide sensitized photosensitive prepolymer compositions |
US3458313A (en) * | 1966-09-07 | 1969-07-29 | Nasa | High resolution developing of photosensitive resists |
US3622365A (en) * | 1968-04-18 | 1971-11-23 | Fairchild Camera Instr Co | Process of forming an arsenic sulfide mask |
US4330611A (en) * | 1969-05-29 | 1982-05-18 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials |
US4133685A (en) * | 1969-05-29 | 1979-01-09 | Richardson Chemical Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials |
US4486526A (en) * | 1969-05-29 | 1984-12-04 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials |
US3808004A (en) * | 1969-05-29 | 1974-04-30 | Richardson Graphic Co | Lithographic plate and photoresist having two photosensitive layers |
US3635711A (en) * | 1969-06-06 | 1972-01-18 | Grace W R & Co | Method and automated apparatus for photocomposing |
US3640765A (en) * | 1969-08-06 | 1972-02-08 | Rca Corp | Selective deposition of metal |
US3648607A (en) * | 1969-08-21 | 1972-03-14 | Xerox Corp | Imaging system |
CA980163A (en) * | 1970-12-23 | 1975-12-23 | Jack R. Celeste | Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds |
US3673140A (en) * | 1971-01-06 | 1972-06-27 | Inmont Corp | Actinic radiation curing compositions and method of coating and printing using same |
US3772171A (en) * | 1971-04-05 | 1973-11-13 | Inmont Corp | Novel quick setting inks |
US3902902A (en) * | 1971-06-22 | 1975-09-02 | Siemens Ag | Method of forming a photo-cross-linked insulator film |
US3905815A (en) * | 1971-12-17 | 1975-09-16 | Minnesota Mining & Mfg | Photopolymerizable sheet material with diazo resin layer |
US3751248A (en) * | 1971-12-27 | 1973-08-07 | Bell Telephone Labor Inc | Method of selective multilayered etching |
US3883352A (en) * | 1973-04-05 | 1975-05-13 | Grace W R & Co | Process for forming a photocured solder resist |
US3890149A (en) * | 1973-05-02 | 1975-06-17 | American Can Co | Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers |
US4197125A (en) * | 1974-02-12 | 1980-04-08 | Teijin Limited | Process of making photosensitive resin printing plates |
DE2457882B2 (de) * | 1974-12-06 | 1977-06-02 | Siemens AG, 1000 Berlin und 8000 München | Waermebestaendige, lichtvernetzbare massen |
US4233390A (en) * | 1979-07-20 | 1980-11-11 | Polychrome Corporation | Lithographic printing plate having dual photosensitive layering |
JPS5820420B2 (ja) * | 1978-12-15 | 1983-04-22 | 富士通株式会社 | パタ−ン形成方法 |
US4292396A (en) * | 1980-03-03 | 1981-09-29 | Western Litho Plate & Supply Co. | Method for improving the press life of a lithographic image having an outer layer comprising an epoxy resin and article produced by method |
US4452877A (en) * | 1982-08-26 | 1984-06-05 | American Hoechst Corporation | Electrolysis treatment of light sensitive diazo coated supports |
JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
DE3246403A1 (de) * | 1982-12-15 | 1984-06-20 | Merck Patent Gmbh, 6100 Darmstadt | Verfahren zur entwicklung von reliefstrukturen auf der basis von strahlungsvernetzten polymervorstufen hochwaermebestaendiger polymere |
US4785062A (en) * | 1984-07-31 | 1988-11-15 | W. R. Grace & Co.-Conn. | Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane resin and phenol with product having no remaining epoxy groups |
US4608331A (en) * | 1984-11-16 | 1986-08-26 | Witco Chemical Corporation | Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer |
US4684599A (en) * | 1986-07-14 | 1987-08-04 | Eastman Kodak Company | Photoresist compositions containing quinone sensitizer |
US4886731A (en) * | 1987-01-05 | 1989-12-12 | Cookson Graphics Inc. | Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions |
US5254429A (en) * | 1990-12-14 | 1993-10-19 | Anocoil | Photopolymerizable coating composition and lithographic printing plate produced therefrom |
US5458921A (en) | 1994-10-11 | 1995-10-17 | Morton International, Inc. | Solvent system for forming films of photoimageable compositions |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2339058A (en) * | 1942-03-25 | 1944-01-11 | Gen Electric | Coating composition comprising partially polymerized allyl esters containing polymerization inhibitor |
NL87862C (xx) * | 1951-08-20 | |||
US2722512A (en) * | 1952-10-23 | 1955-11-01 | Du Pont | Photopolymerization process |
US2832758A (en) * | 1954-02-19 | 1958-04-29 | Fmc Corp | Solid prepolymers of diallyl phthalate |
BE590472A (xx) * | 1959-05-06 | |||
BE596694A (xx) * | 1959-11-03 | |||
BE599102A (xx) * | 1960-01-27 | |||
US3376138A (en) * | 1963-12-09 | 1968-04-02 | Gilano Michael Nicholas | Photosensitive prepolymer composition and method |
US3376139A (en) * | 1966-02-01 | 1968-04-02 | Gilano Michael Nicholas | Photosensitive prepolymer composition and method |
-
1966
- 1966-02-01 US US539236A patent/US3376139A/en not_active Expired - Lifetime
- 1966-07-05 US US562691A patent/US3462267A/en not_active Expired - Lifetime
-
1967
- 1967-04-29 SE SE09726/67*A patent/SE340563B/xx unknown
- 1967-06-27 ES ES342356A patent/ES342356A1/es not_active Expired
- 1967-07-05 CH CH951867A patent/CH484458A/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US3376139A (en) | 1968-04-02 |
CH484458A (de) | 1970-01-15 |
US3462267A (en) | 1969-08-19 |
ES342356A1 (es) | 1968-07-16 |