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NL136527C
(US06826419-20041130-M00005.png)
*
|
1966-11-07 |
|
|
|
|
US3484241A
(en)
*
|
1967-01-16 |
1969-12-16 |
Ibm |
Diazo type films with extended linear latitude
|
|
US3622325A
(en)
*
|
1968-03-07 |
1971-11-23 |
Ricoh Kk |
Diazotype photographic copying material adapted for wet development and for producing copied image in black color
|
|
GB1292607A
(en)
*
|
1968-12-28 |
1972-10-11 |
Ricoh Kk |
Improvements in and relating to heat-developable light-sensitive material
|
|
DE1817417C3
(de)
*
|
1968-12-30 |
1974-04-11 |
Kalle Ag, 6202 Wiesbaden-Biebrich |
Z weikomponenten-Diazotypiematerial
|
|
US3976488A
(en)
*
|
1969-02-19 |
1976-08-24 |
Mita Industrial Company, Ltd. |
Treating agent for diazo-type multicolor reproduction
|
|
US3628954A
(en)
*
|
1970-03-24 |
1971-12-21 |
Keuffel And Esser Co |
Diazo material and visible light development process therefore
|
|
US3918974A
(en)
*
|
1970-05-01 |
1975-11-11 |
Mita Industrial Co Ltd |
Process for the diazo-type multicolor reproduction
|
|
US3904414A
(en)
*
|
1971-09-24 |
1975-09-09 |
Gaf Corp |
Precoated diazotype photocopying materials
|
|
GB1376840A
(en)
*
|
1972-08-02 |
1974-12-11 |
Ozalid Group Holdings Ltd De M |
Photosensitive compositions and their uses
|
|
US3837858A
(en)
*
|
1972-09-11 |
1974-09-24 |
Lith Kem Corp |
Printing plate and method of making the same
|
|
US3836366A
(en)
*
|
1972-09-11 |
1974-09-17 |
Lith Kem Corp |
Planographic printing plates and method for their preparation
|
|
US3899332A
(en)
*
|
1972-09-11 |
1975-08-12 |
Lith Kem Corp |
Printing plate and method of making the same
|
|
US4093465A
(en)
*
|
1973-08-14 |
1978-06-06 |
Polychrome Corporation |
Photosensitive diazo condensate compositions
|
|
US3912512A
(en)
*
|
1974-03-04 |
1975-10-14 |
Addressograph Multigraph |
Light-sensitive diazotype film and method of making and using same
|
|
US4201588A
(en)
*
|
1974-04-15 |
1980-05-06 |
Eastman Kodak Company |
Radiation sensitive co(III)complex photoreduction element with image recording layer
|
|
US4195998A
(en)
*
|
1974-04-15 |
1980-04-01 |
Eastman Kodak Company |
CO(III) Complex containing radiation sensitive element with diazo recording layer
|
|
US4314019A
(en)
*
|
1976-09-07 |
1982-02-02 |
Eastman Kodak Company |
Transition metal photoreduction systems and processes
|
|
US4230492A
(en)
*
|
1978-01-17 |
1980-10-28 |
The Richardson Company |
Aryl sulfonic acid based stabilizers for presensitized planographic plates
|
|
US4334003A
(en)
*
|
1979-06-01 |
1982-06-08 |
Richardson Graphics Company |
Ultra high speed presensitized lithographic plates
|
|
US4263392A
(en)
*
|
1979-06-01 |
1981-04-21 |
Richardson Graphics Company |
Ultra high speed presensitized lithographic plates
|
|
FR2470984B1
(fr)
*
|
1979-11-28 |
1986-06-13 |
Schaeffer Andre |
Materiau diazotype developpable par la vapeur, l'eau ou la chaleur
|
|
JPS5898729A
(ja)
*
|
1981-12-08 |
1983-06-11 |
Ricoh Co Ltd |
熱現像型ジアゾ複写材料の製造方法
|
|
US4511642A
(en)
*
|
1982-02-17 |
1985-04-16 |
Nippon Telegraph And Telephone Public Corp. |
Photo-fixing heat-sensitive recording media with photosensitive diazonium salt, coupler, and organic boron salt
|
|
US4568628A
(en)
*
|
1982-09-21 |
1986-02-04 |
Polychrome Corporation |
Water developable diazo printing plate composition with quaternary nitrogen stabilizer
|
|
US4495269A
(en)
*
|
1982-09-22 |
1985-01-22 |
Am International, Inc. |
Waterborne two component diazo type coating composition with hydrolyzed polyvinyl acetate and hexamethoxy methylmelamine resin
|
|
EP0122523A3
(en)
*
|
1983-04-18 |
1987-05-27 |
Andrews Paper and Chemical Co., Inc. |
Diazotype compositions and materials
|
|
US4499170A
(en)
*
|
1983-06-17 |
1985-02-12 |
Richardson Graphics Company |
Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative
|
|
US4576899A
(en)
*
|
1984-05-01 |
1986-03-18 |
Imperial Metal & Chemical Company |
Method for enhancing apparent photospeed of diazonium plates by using thiocyanate to insolubilize diazonium compound after photolysis
|
|
US5188924A
(en)
*
|
1984-05-14 |
1993-02-23 |
Kabushiki Kaisha Toshiba |
Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt
|
|
DE3433247A1
(de)
*
|
1984-09-11 |
1986-03-20 |
Hoechst Ag, 6230 Frankfurt |
Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
|
|
US5223376A
(en)
*
|
1986-06-20 |
1993-06-29 |
Toyo Soda Manufacturing Co., Ltd. |
Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent
|
|
US4863827A
(en)
*
|
1986-10-20 |
1989-09-05 |
American Hoechst Corporation |
Postive working multi-level photoresist
|
