SE328770B - - Google Patents
Info
- Publication number
- SE328770B SE328770B SE02825/68A SE282568A SE328770B SE 328770 B SE328770 B SE 328770B SE 02825/68 A SE02825/68 A SE 02825/68A SE 282568 A SE282568 A SE 282568A SE 328770 B SE328770 B SE 328770B
- Authority
- SE
- Sweden
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
- H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/043—Dual dielectric
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/051—Etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/106—Masks, special
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/901—Printed circuit
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US62309467A | 1967-03-14 | 1967-03-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
SE328770B true SE328770B (de) | 1970-09-21 |
Family
ID=24496746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE02825/68A SE328770B (de) | 1967-03-14 | 1968-03-04 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3537925A (de) |
DE (1) | DE1696139A1 (de) |
FR (1) | FR1556163A (de) |
GB (1) | GB1168208A (de) |
NL (1) | NL6803539A (de) |
SE (1) | SE328770B (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3663326A (en) * | 1970-01-09 | 1972-05-16 | Western Electric Co | Article holding methods and assemblage |
NL163370C (nl) * | 1972-04-28 | 1980-08-15 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleider- inrichting met een geleiderpatroon. |
JPS5146083A (en) * | 1974-10-18 | 1976-04-20 | Hitachi Ltd | Handotaisochino seizohoho |
GB1545208A (en) * | 1975-09-27 | 1979-05-02 | Plessey Co Ltd | Electrical solid state devices |
US4631113A (en) * | 1985-12-23 | 1986-12-23 | Signetics Corporation | Method for manufacturing a narrow line of photosensitive material |
US5234539A (en) * | 1990-02-23 | 1993-08-10 | France Telecom (C.N.E.T.) | Mechanical lift-off process of a metal layer on a polymer |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1922434A (en) * | 1931-03-13 | 1933-08-15 | Zeiss Carl Fa | Method of indexing glass photomechanically |
US3210226A (en) * | 1961-09-28 | 1965-10-05 | North American Aviation Inc | Method and means for controlling tapers in etching processes |
-
1967
- 1967-03-14 US US623094A patent/US3537925A/en not_active Expired - Lifetime
-
1968
- 1968-02-20 GB GB8238/68A patent/GB1168208A/en not_active Expired
- 1968-03-04 SE SE02825/68A patent/SE328770B/xx unknown
- 1968-03-08 DE DE19681696139 patent/DE1696139A1/de active Pending
- 1968-03-13 NL NL6803539A patent/NL6803539A/xx unknown
- 1968-03-14 FR FR1556163D patent/FR1556163A/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR1556163A (de) | 1969-01-31 |
DE1696139A1 (de) | 1971-11-04 |
US3537925A (en) | 1970-11-03 |
NL6803539A (de) | 1968-09-16 |
GB1168208A (en) | 1969-10-22 |