SE314448B - - Google Patents
Info
- Publication number
- SE314448B SE314448B SE894363A SE894363A SE314448B SE 314448 B SE314448 B SE 314448B SE 894363 A SE894363 A SE 894363A SE 894363 A SE894363 A SE 894363A SE 314448 B SE314448 B SE 314448B
- Authority
- SE
- Sweden
- Prior art keywords
- aperture
- layer
- aug
- narrowing
- lead
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
Abstract
1,011,172. Electron beam apparatus; electrode materials. BROWN, BOVERI & CO. Ltd. Aug. 15, 1963 [Aug. 17, 1962], No. 32289/63. Heading H1D. In an arrangement for producing a confined electron beam 3 including a collimator comprising an apertuted layer 1 of a metal of low atomic number and an apertured layer 2 of a metal having a high atomic number, the aperture-defining surface at the beam entrance side is located further from the beam axis 4 than the aperture-defining surface at the beam emergence side. Layer 1 may be of aluminium and layer 2 of lead, tungsten, or lead with a tungsten insert. As alternatives to the stepped arrangement of two widening apertures shown, the aperture-defining surfaces may be continuous so as to define an aperture narrowing in the direction of the beam, or a stepped arrangement of a narrowing and a widening aperture may be employed (Figs. 2 to 4, not shown).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH986862A CH394411A (en) | 1962-08-17 | 1962-08-17 | Collimator for beams of fast electrons |
Publications (1)
Publication Number | Publication Date |
---|---|
SE314448B true SE314448B (en) | 1969-09-08 |
Family
ID=4356551
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE894363A SE314448B (en) | 1962-08-17 | 1963-08-15 |
Country Status (3)
Country | Link |
---|---|
CH (1) | CH394411A (en) |
GB (1) | GB1011172A (en) |
SE (1) | SE314448B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2325335B (en) * | 1997-05-16 | 2001-07-11 | Leica Lithography Systems Ltd | Electron beam aperture element |
-
1962
- 1962-08-17 CH CH986862A patent/CH394411A/en unknown
-
1963
- 1963-08-15 GB GB3228963A patent/GB1011172A/en not_active Expired
- 1963-08-15 SE SE894363A patent/SE314448B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
CH394411A (en) | 1965-06-30 |
GB1011172A (en) | 1965-11-24 |
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