SE300852B - - Google Patents

Info

Publication number
SE300852B
SE300852B SE12217/62A SE1221762A SE300852B SE 300852 B SE300852 B SE 300852B SE 12217/62 A SE12217/62 A SE 12217/62A SE 1221762 A SE1221762 A SE 1221762A SE 300852 B SE300852 B SE 300852B
Authority
SE
Sweden
Application number
SE12217/62A
Inventor
A Wilska
Original Assignee
Philips Electronic Pharma
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic Pharma filed Critical Philips Electronic Pharma
Publication of SE300852B publication Critical patent/SE300852B/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/58Arrangements for focusing or reflecting ray or beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/14Lenses magnetic
    • H01J37/141Electromagnetic lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
SE12217/62A 1961-11-15 1962-11-14 SE300852B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US152531A US3100260A (en) 1961-11-15 1961-11-15 Electron lens for reduction of spherical aberration

Publications (1)

Publication Number Publication Date
SE300852B true SE300852B (en) 1968-05-13

Family

ID=22543323

Family Applications (1)

Application Number Title Priority Date Filing Date
SE12217/62A SE300852B (en) 1961-11-15 1962-11-14

Country Status (6)

Country Link
US (1) US3100260A (en)
CH (1) CH407356A (en)
DE (1) DE1236097B (en)
GB (1) GB995387A (en)
NL (1) NL285301A (en)
SE (1) SE300852B (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3452241A (en) * 1966-09-06 1969-06-24 Rca Corp Electron gun suitable for electron microscope
DE1905937B1 (en) * 1969-02-06 1971-01-14 Corpuscular Forschungs Stiftun Stigmator for the electrical compensation of imaging errors in electron-optical systems with hollow beams and annular diaphragms
DE1937482C3 (en) * 1969-07-23 1974-10-10 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Microbeam probe
NL7012387A (en) * 1970-08-21 1972-02-23 Philips Nv
US3996468A (en) * 1972-01-28 1976-12-07 Nasa Electron microscope aperture system
GB1416043A (en) * 1972-01-28 1975-12-03 Nasa Electron microscope aperture system
US4002912A (en) * 1975-12-30 1977-01-11 The United States Of America As Represented By The United States Energy Research And Development Administration Electrostatic lens to focus an ion beam to uniform density
DE2752598C3 (en) * 1977-11-25 1981-10-15 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Method for operating an electromagnetic focusing electron-optical lens arrangement and lens arrangement therefor
JPS5842935B2 (en) * 1978-04-07 1983-09-22 日本電子株式会社 Objective lenses for scanning electron microscopes, etc.
AU534599B2 (en) * 1978-08-25 1984-02-09 Commonwealth Scientific And Industrial Research Organisation Cold cathode ion soirce
JPS6091544A (en) * 1983-10-24 1985-05-22 Anelva Corp Auger mass spectrometer device
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
US7947964B2 (en) * 2006-11-21 2011-05-24 Hitachi High-Technologies Corporation Charged particle beam orbit corrector and charged particle beam apparatus
JP5153348B2 (en) * 2008-01-09 2013-02-27 株式会社日立ハイテクノロジーズ Charged particle beam trajectory corrector and charged particle beam apparatus
JP6747687B2 (en) * 2014-08-25 2020-08-26 ナショナル ユニヴァーシティー オブ シンガポール Aberration corrector, device having the same, and method for correcting aberrations of charged particles
WO2016174891A1 (en) * 2015-04-27 2016-11-03 国立大学法人名古屋大学 Spherical aberration correction device for charged particle beam electromagnetic lens
US11798776B2 (en) * 2019-05-15 2023-10-24 Hitachi High-Tech Corporation Charged particle beam apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL192009A (en) * 1953-11-02
NL95815C (en) * 1954-03-11

Also Published As

Publication number Publication date
CH407356A (en) 1966-02-15
NL285301A (en)
DE1236097B (en) 1967-03-09
GB995387A (en) 1965-06-16
US3100260A (en) 1963-08-06

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