CH407356A - Electron optical system - Google Patents

Electron optical system

Info

Publication number
CH407356A
CH407356A CH1314562A CH1314562A CH407356A CH 407356 A CH407356 A CH 407356A CH 1314562 A CH1314562 A CH 1314562A CH 1314562 A CH1314562 A CH 1314562A CH 407356 A CH407356 A CH 407356A
Authority
CH
Switzerland
Prior art keywords
optical system
electron optical
electron
optical
Prior art date
Application number
CH1314562A
Other languages
German (de)
Inventor
Pietari Wilska Alvar
Original Assignee
Philips Electronic Pharma
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic Pharma filed Critical Philips Electronic Pharma
Publication of CH407356A publication Critical patent/CH407356A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/58—Arrangements for focusing or reflecting ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
CH1314562A 1961-11-15 1962-11-09 Electron optical system CH407356A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US152531A US3100260A (en) 1961-11-15 1961-11-15 Electron lens for reduction of spherical aberration

Publications (1)

Publication Number Publication Date
CH407356A true CH407356A (en) 1966-02-15

Family

ID=22543323

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1314562A CH407356A (en) 1961-11-15 1962-11-09 Electron optical system

Country Status (6)

Country Link
US (1) US3100260A (en)
CH (1) CH407356A (en)
DE (1) DE1236097B (en)
GB (1) GB995387A (en)
NL (1) NL285301A (en)
SE (1) SE300852B (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3452241A (en) * 1966-09-06 1969-06-24 Rca Corp Electron gun suitable for electron microscope
DE1905937B1 (en) * 1969-02-06 1971-01-14 Corpuscular Forschungs Stiftun Stigmator for the electrical compensation of imaging errors in electron-optical systems with hollow beams and annular diaphragms
DE1937482C3 (en) * 1969-07-23 1974-10-10 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Microbeam probe
NL7012387A (en) * 1970-08-21 1972-02-23 Philips Nv
US3996468A (en) * 1972-01-28 1976-12-07 Nasa Electron microscope aperture system
GB1416043A (en) * 1972-01-28 1975-12-03 Nasa Electron microscope aperture system
US4002912A (en) * 1975-12-30 1977-01-11 The United States Of America As Represented By The United States Energy Research And Development Administration Electrostatic lens to focus an ion beam to uniform density
DE2752598C3 (en) * 1977-11-25 1981-10-15 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Method for operating an electromagnetic focusing electron-optical lens arrangement and lens arrangement therefor
JPS5842935B2 (en) * 1978-04-07 1983-09-22 日本電子株式会社 Objective lenses for scanning electron microscopes, etc.
AU534599B2 (en) * 1978-08-25 1984-02-09 Commonwealth Scientific And Industrial Research Organisation Cold cathode ion soirce
JPS6091544A (en) * 1983-10-24 1985-05-22 Anelva Corp Auger mass spectrometer device
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
US7947964B2 (en) * 2006-11-21 2011-05-24 Hitachi High-Technologies Corporation Charged particle beam orbit corrector and charged particle beam apparatus
JP5153348B2 (en) * 2008-01-09 2013-02-27 株式会社日立ハイテクノロジーズ Charged particle beam trajectory corrector and charged particle beam apparatus
JP6747687B2 (en) * 2014-08-25 2020-08-26 ナショナル ユニヴァーシティー オブ シンガポール Aberration corrector, device having the same, and method for correcting aberrations of charged particles
WO2016174891A1 (en) * 2015-04-27 2016-11-03 国立大学法人名古屋大学 Spherical aberration correction device for charged particle beam electromagnetic lens
US11798776B2 (en) * 2019-05-15 2023-10-24 Hitachi High-Tech Corporation Charged particle beam apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL192009A (en) * 1953-11-02
NL95815C (en) * 1954-03-11

Also Published As

Publication number Publication date
NL285301A (en)
SE300852B (en) 1968-05-13
DE1236097B (en) 1967-03-09
GB995387A (en) 1965-06-16
US3100260A (en) 1963-08-06

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