SE1950444A1 - Aperture device and analyser arrangement - Google Patents

Aperture device and analyser arrangement

Info

Publication number
SE1950444A1
SE1950444A1 SE1950444A SE1950444A SE1950444A1 SE 1950444 A1 SE1950444 A1 SE 1950444A1 SE 1950444 A SE1950444 A SE 1950444A SE 1950444 A SE1950444 A SE 1950444A SE 1950444 A1 SE1950444 A1 SE 1950444A1
Authority
SE
Sweden
Prior art keywords
aperture
length axis
aperture device
end surface
transverse distance
Prior art date
Application number
SE1950444A
Inventor
Anders Nilsson
Peter Amann
Original Assignee
Scienta Omicron Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Scienta Omicron Ab filed Critical Scienta Omicron Ab
Priority to PCT/SE2019/051240 priority Critical patent/WO2020117122A2/en
Priority to US17/311,264 priority patent/US11942316B2/en
Priority to EP19821306.8A priority patent/EP3891776A2/en
Publication of SE1950444A1 publication Critical patent/SE1950444A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/06Electron- or ion-optical arrangements
    • H01J49/067Ion lenses, apertures, skimmers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/285Emission microscopes, e.g. field-emission microscopes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/085Investigating materials by wave or particle radiation secondary emission photo-electron spectrum [ESCA, XPS]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • G01N23/2273Measuring photoelectron spectrum, e.g. electron spectroscopy for chemical analysis [ESCA] or X-ray photoelectron spectroscopy [XPS]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18Vacuum control means
    • H01J2237/188Differential pressure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/2602Details
    • H01J2237/2605Details operating at elevated pressures, e.g. atmosphere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/285Emission microscopes
    • H01J2237/2855Photo-emission
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/44Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46Static spectrometers
    • H01J49/48Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
    • H01J49/484Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with spherical mirrors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

An aperture device (31) is described, which is attachable to a lens system (13). The lens system (13) is arranged to form a particle beam of charged particles, emitted from a sample surface (Ss).The aperture device (31) comprises an end surface (S) which is to be arranged facing the sample surface (Ss), at least one aperture (38) arranged in the end surface (S), a length axis (32) which extends through the centre of said at least one aperture (38), and at least one gas outlet (10), which is arranged at a transverse distance (T) perpendicular from the length axis (32), and is arranged to direct gas into a volume between at least one aperture (38) and the sample surface (Ss). The end surface (S) within a distance, equal to 1/3 of the transverse distance (T), perpendicular from the length axis (32) has a variation along the length axis (32) being smaller than 1/6 of the transverse distance (T).
SE1950444A 2018-12-07 2019-04-09 Aperture device and analyser arrangement SE1950444A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
PCT/SE2019/051240 WO2020117122A2 (en) 2018-12-07 2019-12-06 Aperture device and analyser arrangement
US17/311,264 US11942316B2 (en) 2018-12-07 2019-12-06 Aperture device and analyzer arrangement
EP19821306.8A EP3891776A2 (en) 2018-12-07 2019-12-06 Aperture device and analyser arrangement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE1851526A SE542902C2 (en) 2018-12-07 2018-12-07 Aperture device and analyser arrangement for photo-electron spectroscopy at ambient pressures

Publications (1)

Publication Number Publication Date
SE1950444A1 true SE1950444A1 (en) 2020-06-08

Family

ID=71406180

Family Applications (2)

Application Number Title Priority Date Filing Date
SE1851526A SE542902C2 (en) 2018-12-07 2018-12-07 Aperture device and analyser arrangement for photo-electron spectroscopy at ambient pressures
SE1950444A SE1950444A1 (en) 2018-12-07 2019-04-09 Aperture device and analyser arrangement

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SE1851526A SE542902C2 (en) 2018-12-07 2018-12-07 Aperture device and analyser arrangement for photo-electron spectroscopy at ambient pressures

Country Status (2)

Country Link
EP (1) EP3891776A2 (en)
SE (2) SE542902C2 (en)

Also Published As

Publication number Publication date
SE542902C2 (en) 2020-09-15
SE1851526A1 (en) 2020-06-08
EP3891776A2 (en) 2021-10-13

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Legal Events

Date Code Title Description
NAV Patent application has lapsed