SE1950445A1 - Aperture device and analyser arrangement - Google Patents

Aperture device and analyser arrangement

Info

Publication number
SE1950445A1
SE1950445A1 SE1950445A SE1950445A SE1950445A1 SE 1950445 A1 SE1950445 A1 SE 1950445A1 SE 1950445 A SE1950445 A SE 1950445A SE 1950445 A SE1950445 A SE 1950445A SE 1950445 A1 SE1950445 A1 SE 1950445A1
Authority
SE
Sweden
Prior art keywords
aperture
aperture device
end surface
particles
analyser arrangement
Prior art date
Application number
SE1950445A
Inventor
Anders Nilsson
Peter Amann
Original Assignee
Scienta Omicron Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Scienta Omicron Ab filed Critical Scienta Omicron Ab
Priority to PCT/SE2019/051241 priority Critical patent/WO2020117123A2/en
Priority to EP19824409.7A priority patent/EP3891495A2/en
Publication of SE1950445A1 publication Critical patent/SE1950445A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46—Static spectrometers
    • H01J49/463—Static spectrometers using static magnetic fields
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • G01N23/2273—Measuring photoelectron spectrum, e.g. electron spectroscopy for chemical analysis [ESCA] or X-ray photoelectron spectroscopy [XPS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/285—Emission microscopes, e.g. field-emission microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46—Static spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/285—Emission microscopes
    • H01J2237/2855—Photo-emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

An aperture device (31) is described which is attachable to a lens system (13) comprising a first end (36), and a second end (37) at a distance from the first end (36). The aperture device comprises an end surface wall (40) with an end surface (S) and an aperture means (39) comprising at least one aperture (38), wherein the aperture device (31) is to be arranged with the end surface (S) facing a sample surface (Ss) which emits particles from a region which is elongated along a first direction (a). The lens system (13) is arranged to form a particle beam of charged particles, emitted from the sample surface (Ss). The aperture means (39) in the end surface (S) is elongated along a second direction (b), wherein the aperture device (31) is to be arranged with the second direction (b) essentially aligned along the first direction (a) in order to maximize the number of particles that enter the aperture means (39).
SE1950445A 2018-12-07 2019-04-09 Aperture device and analyser arrangement SE1950445A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/SE2019/051241 WO2020117123A2 (en) 2018-12-07 2019-12-06 Aperture device and analyser arrangement
EP19824409.7A EP3891495A2 (en) 2018-12-07 2019-12-06 Aperture device and analyser arrangement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE1851527A SE542903C2 (en) 2018-12-07 2018-12-07 Aperture device and analyser arrangement

Publications (1)

Publication Number Publication Date
SE1950445A1 true SE1950445A1 (en) 2020-06-08

Family

ID=71406181

Family Applications (2)

Application Number Title Priority Date Filing Date
SE1851527A SE542903C2 (en) 2018-12-07 2018-12-07 Aperture device and analyser arrangement
SE1950445A SE1950445A1 (en) 2018-12-07 2019-04-09 Aperture device and analyser arrangement

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SE1851527A SE542903C2 (en) 2018-12-07 2018-12-07 Aperture device and analyser arrangement

Country Status (2)

Country Link
EP (1) EP3891495A2 (en)
SE (2) SE542903C2 (en)

Also Published As

Publication number Publication date
SE1851527A1 (en) 2020-06-08
SE542903C2 (en) 2020-09-15
EP3891495A2 (en) 2021-10-13

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Legal Events

Date Code Title Description
NAV Patent application has lapsed