SE0004807L - Förfarande för ytmodifiering - Google Patents
Förfarande för ytmodifieringInfo
- Publication number
- SE0004807L SE0004807L SE0004807A SE0004807A SE0004807L SE 0004807 L SE0004807 L SE 0004807L SE 0004807 A SE0004807 A SE 0004807A SE 0004807 A SE0004807 A SE 0004807A SE 0004807 L SE0004807 L SE 0004807L
- Authority
- SE
- Sweden
- Prior art keywords
- particles
- pattern
- target surface
- punch
- capillary
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 238000012986 modification Methods 0.000 title 1
- 230000004048 modification Effects 0.000 title 1
- 239000002245 particle Substances 0.000 abstract 6
- 238000005411 Van der Waals force Methods 0.000 abstract 2
- 239000000853 adhesive Substances 0.000 abstract 2
- 230000001070 adhesive effect Effects 0.000 abstract 2
- 230000002209 hydrophobic effect Effects 0.000 abstract 2
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Adhesives Or Adhesive Processes (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0004807A SE522780C2 (sv) | 2000-12-21 | 2000-12-21 | Förfarande och anordning för mönstring av yta medelst stämpel där ytan är belagd med partiklar, vilka dras av så att stämpelns mönster superponeras på ytan |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0004807A SE522780C2 (sv) | 2000-12-21 | 2000-12-21 | Förfarande och anordning för mönstring av yta medelst stämpel där ytan är belagd med partiklar, vilka dras av så att stämpelns mönster superponeras på ytan |
Publications (3)
Publication Number | Publication Date |
---|---|
SE0004807D0 SE0004807D0 (sv) | 2000-12-21 |
SE0004807L true SE0004807L (sv) | 2002-06-22 |
SE522780C2 SE522780C2 (sv) | 2004-03-09 |
Family
ID=20282387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0004807A SE522780C2 (sv) | 2000-12-21 | 2000-12-21 | Förfarande och anordning för mönstring av yta medelst stämpel där ytan är belagd med partiklar, vilka dras av så att stämpelns mönster superponeras på ytan |
Country Status (1)
Country | Link |
---|---|
SE (1) | SE522780C2 (sv) |
-
2000
- 2000-12-21 SE SE0004807A patent/SE522780C2/sv not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
SE0004807D0 (sv) | 2000-12-21 |
SE522780C2 (sv) | 2004-03-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |