RU98116869A - METHOD FOR MANAGING SPATIAL DISTRIBUTION OF PLASMA DENSITY IN A MICROWAVE PLASMA SOURCE WITH ELECTRON-CYCLOTRON RESONANCE - Google Patents

METHOD FOR MANAGING SPATIAL DISTRIBUTION OF PLASMA DENSITY IN A MICROWAVE PLASMA SOURCE WITH ELECTRON-CYCLOTRON RESONANCE

Info

Publication number
RU98116869A
RU98116869A RU98116869/09A RU98116869A RU98116869A RU 98116869 A RU98116869 A RU 98116869A RU 98116869/09 A RU98116869/09 A RU 98116869/09A RU 98116869 A RU98116869 A RU 98116869A RU 98116869 A RU98116869 A RU 98116869A
Authority
RU
Russia
Prior art keywords
electron
cyclotron resonance
spatial distribution
plasma source
microwave plasma
Prior art date
Application number
RU98116869/09A
Other languages
Russian (ru)
Other versions
RU2152663C1 (en
Inventor
С.А. Кудряшов
Р.К. Яфаров
Original Assignee
Р.К. Яфаров
Filing date
Publication date
Application filed by Р.К. Яфаров filed Critical Р.К. Яфаров
Priority to RU98116869A priority Critical patent/RU2152663C1/en
Priority claimed from RU98116869A external-priority patent/RU2152663C1/en
Publication of RU98116869A publication Critical patent/RU98116869A/en
Application granted granted Critical
Publication of RU2152663C1 publication Critical patent/RU2152663C1/en

Links

Claims (1)

Способ управления пространственным распределением плотности плазмы в микроволновом источнике плазмы с электронно-циклотронным резонансом, включающий возбуждение в круглом волноводе бегущей электромагнитной волны и наложение на область плазмообразования продольного постоянного магнитного поля с напряженностью, соответствующей электронно-циклотронному резонансу, отличающийся тем, что возбуждают электромагнитную волну двух или более типов с одинаковыми азимутальными числами и изменяют разность фаз между этими типами волн.A method for controlling the spatial distribution of plasma density in a microwave plasma source with electron-cyclotron resonance, comprising exciting a traveling electromagnetic wave in a circular waveguide and applying a longitudinal constant magnetic field with an intensity corresponding to electron-cyclotron resonance to the plasma forming region, characterized in that they excite an electromagnetic wave of two or more types with the same azimuthal numbers and change the phase difference between these types of waves.
RU98116869A 1998-09-02 1998-09-02 Method for controlling three-dimensional distribution of plasma density in microwave plasma source with electron-cyclotron resonance RU2152663C1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
RU98116869A RU2152663C1 (en) 1998-09-02 1998-09-02 Method for controlling three-dimensional distribution of plasma density in microwave plasma source with electron-cyclotron resonance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
RU98116869A RU2152663C1 (en) 1998-09-02 1998-09-02 Method for controlling three-dimensional distribution of plasma density in microwave plasma source with electron-cyclotron resonance

Publications (2)

Publication Number Publication Date
RU98116869A true RU98116869A (en) 2000-06-27
RU2152663C1 RU2152663C1 (en) 2000-07-10

Family

ID=20210314

Family Applications (1)

Application Number Title Priority Date Filing Date
RU98116869A RU2152663C1 (en) 1998-09-02 1998-09-02 Method for controlling three-dimensional distribution of plasma density in microwave plasma source with electron-cyclotron resonance

Country Status (1)

Country Link
RU (1) RU2152663C1 (en)

Similar Documents

Publication Publication Date Title
US5216329A (en) Device for distributing a microwave energy for exciting a plasma
US5081398A (en) Resonant radio frequency wave coupler apparatus using higher modes
JPH04503589A (en) Improved resonant radio frequency wave coupler device
KR950005121A (en) RF Induced Plasma Sources for Plasma Processing
CA2302668A1 (en) Tubular microwave applicator
US5666023A (en) Device for producing a plasma, enabling microwave propagation and absorption zones to be dissociated having at least two parallel applicators defining a propogation zone and an exciter placed relative to the applicator
JP2001102200A (en) Method for generating separate plasma uniformly applied to the work surface and apparatus therefor
US7230218B2 (en) Microwave or radio frequency device including three decoupled generators
KR19980017873A (en) Microwave Waveguide Structure
Shinohara et al. Helicon m= 0 mode characteristics in large-diameter plasma produced by a planar spiral antenna
SU743567A3 (en) Magnetic drum separator
US6072167A (en) Enhanced uniformity in a length independent microwave applicator
JP3064875B2 (en) High frequency heating equipment
RU98116869A (en) METHOD FOR MANAGING SPATIAL DISTRIBUTION OF PLASMA DENSITY IN A MICROWAVE PLASMA SOURCE WITH ELECTRON-CYCLOTRON RESONANCE
RU2120681C1 (en) Electron-cyclone resonance tuned device for microwave vacuum-plasma treatment of condensed media
US20090166354A1 (en) Microwave Heating Applicator
DE69206543D1 (en) Electron cyclotron resonance ion source with coaxial supply of electromagnetic waves.
Ganachev et al. Surface-wave propagation along a corrugated plasma–dielectric interface
SU1608758A1 (en) Ferrite phase shifter with rotating magnetic field
KR100284501B1 (en) Slot antenna for microwave oven
RU2152663C1 (en) Method for controlling three-dimensional distribution of plasma density in microwave plasma source with electron-cyclotron resonance
KR100385942B1 (en) A cancer thermotherapy apparatus
JPH11508724A (en) Scalable helicon wave plasma processing apparatus with non-cylindrical source chamber
RU2153733C1 (en) Device for microwave vacuum-plasma treatment of ribbon-carried condensed media using electronic cyclotron resonance
JPH10134955A (en) Wave guide for microwave oven