JPH04503589A - Improved resonant radio frequency wave coupler device - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention] Improved Resonant Radio Frequency Wave Coupler Apparatus This invention utilizes a uniform electron beam in a low pressure plasma. cyclotron resonance Improved radio frequency wave coupler arrangement for creating and maintaining e　E　CR,) It's about location. In particular, this invention has the advantage that the magnetic field is lower voltage than the higher mode electric field. a device that is substantially vertical so as to create and maintain a uniform ECR at The present invention relates to an apparatus for creating plasma with a large treatment surface area.

(2) Conventional technology Asmussen, Reinhard and Da U.S. Patent No. 4.727,293, granted to Dabimen, A resonant radio frequency wave coupler device for creating and maintaining ECR is disclosed. With this device A special method is used to optimally match the static magnetic field and the microwave electric field. Not seen. The problem is to provide an improved device with a more uniform ECR. Our goal is to provide a device that is especially suitable for today's situations. This invention also makes manufacturing and operation relatively easy. The aim is also to provide a device that is easy to use. These and other purposes: It will become clearer by referring to the following description and drawings.

Brief description of the drawing Figure 1 is a longitudinal sectional front view of the improved radio frequency wave coupler device. The gas supply pipe 19 enters the chamber 15 through an inlet 20 adjacent to each magnet 34. Gas is supplied into the plasma region 16.

FIG. 1A is a cross-sectional plan view taken along line LA-IA in FIG. 1, showing the plasma region 16. are doing.

FIG. 2 is a cross-sectional plan view showing the plasma region 16 of the apparatus of FIG. Higher mode microwave field lines or cusps for TE, mode 16 b.

FIG. 2A is a cross-sectional plan view of the plasma region 16 of the apparatus of FIG. Line 16a is shown.

Since the magnetic field lines 16a cause ECR in the plasma, they are substantially different from the electric field lines 16b. It should be positioned vertically.

FIG. 3 is a cross-sectional plan view of a rectangular cavity 51 in the device, showing TE4. mode The microwave electric field cusp 51a is shown, and the same cusp is the magnetic field cusp 51 substantially perpendicular to b.

FIG. 3A is a cross-sectional plan view of the rectangular device 51 of FIG. 3, showing the magnetic field cusp 51b. ing.

Figure 4 shows various higher elevations within the cross-section of the empty circular cavity of the device illustrated in Figure 1. Indicates the mode. As can be seen from this figure, Figure 2 shows the TE mode. .

FIG. 5 is a schematic perspective view of the magnet 34, showing the electric field cusp 16b and the static magnetic field cusp 1. It shows the overlap with 6a. As a result, the microwave electric field and static magnetic field are They are substantially orthogonal everywhere within the ECR region.

This method exerts an increased force on electrons over the entire ECR surface 60 in the plasma. This will result in a loss.

FIG. 6 is a longitudinal sectional front view of the resonant radio frequency wave generator, and this device is shown in the chamber 15. It is for treating a substrate 46 in plasma region 16 .

FIG. 7 shows an apparatus similar to FIG. 6 in which the substrate 46 to be treated is placed outside the plasma region 16. It is located in

FIG. 8 is a longitudinal sectional front view of the apparatus shown in FIG. 6, in which plasma is supplied to the substrate 46. A double accelerating grid or screen is shown for accelerating ions.

FIG. 9 is a cross-sectional plan view taken along line 9--9 in FIG. 8.

The angle φ of the magnet 34 is changed relative to the antenna 14 as indicated by the arrow position. .

FIG. 10 is a longitudinal sectional front view of the device. In this device, the magnets 50 and 51 are The ring generates ECR61 in the plasma region 16 of the chamber 15. It is used to

FIG. 11 is a cross-sectional plan view taken along line 10-10 in FIG. 10.

FIG. 12 is a cross-sectional plan view of the apparatus of FIG. 1 for coupling an electric field into the plasma region 16. The relative position of electric field cusp 16b with respect to antenna 14 is shown.

general description The present invention relates to a plasma generator, which is made of non-magnetic metal and has a hollow shape. and the cavity is excited by resonance of - or multiple TE or 7M modes. In some places, plugs equipped with couplers for radio frequency waves, including ultra-high frequency waves or microwaves, a Zuma source, an electrically insulated chamber located within the coupler; Gas supply for supplying gas that is ionized to form plasma within the chamber means for coupling radio frequency waves to the coupler; a probe connected to a coupler and a radio frequency applied to said coupler; A number of waves are generated in the chamber under reduced pressure, perpendicular to the longitudinal axis of the chamber. creates a plasma surrounding the axis, and the plasma is maintained. hand, (a), having N and S magnetic poles, in the chamber between the magnetic poles, the chamber to form multiple static magnetic field cusps that help confine the plasma in the chamber. spaced magnet means disposed about the longitudinal axis of the chamber; (b) supplying the gas that is ionized to form plasma in the chamber; (C) the gas supply means for supplying the gas into the chamber; The static magnetic field produced by the above magnetic means is applied over the entire electron cyclotron resonance region of the magnet. microwave electric field cusps of multiple higher modes that overlap substantially perpendicular to The radio frequency wave generators to be generated are each configured to be provided.

The present invention also relates to a plasma generation method, which includes (a) the following plasma generation method; The generator is made of non-magnetic metal and has a shape that forms a cavity, and the cavity is - or multiple. ultrashort waves or a plasma source equipped with a coupler for radio frequency waves, including microwaves, disposed within said coupler; an electrically insulated chamber in which the ionized gas supply means for supplying gas for forming plasma, and for the coupler. connected to the coupler and facing inside the coupler to combine the radio frequency waves. a radio frequency wave applied to the coupler is connected to the channel under reduced pressure. within the bar, a plate perpendicular to and surrounding the longitudinal axis of the chamber. A device that creates Zuma and maintains the plasma, and has ■N and S magnetic poles. , confining plasma in the chamber between the magnetic poles in the chamber; The longitudinal axis of the chamber above forms multiple static magnetic field cusps that aid in Spaced magnet means arranged around, ■ ionization within the above chamber. the gas supply means for supplying gas into the chamber to form a plasma; , and ■ the entire electron cyclotron resonance region in the plasma in the above chamber. a plurality of overlapping strands substantially perpendicular to the static magnetic field of said magnetic means; A radio frequency wave generator that generates a high mode microwave electric field cusp can be installed. (b) in the chamber by the gas supply means; A gas is introduced under reduced pressure into the chamber to create plasma in the chamber, and the above-mentioned It is configured to obtain electron cyclotron resonance within the chamber.

ECR coupling excites a sinusoidal electric field E = EOE]ωshi but, (1), perpendicular to B to the static magnetic field, (2), ω = ω- = electron cyclotron frequency eB/Me (where e = electron charge, B = strength of static magnetic field, M e = mass of individual electron, ω = excitation frequency) (3), νe<ω=ω, (where νe=effective number of electron collisions) occurs when

In practice, ECR discharge utilizes a non-uniform static magnetic field. Therefore, the condition ω=ω, is achieved in a thin surface within the discharge volume. This surface is called the ECR layer region or surface. and is designated by the numeral 60 in FIGS. 1-9.

Condition (2) is therefore achieved at the surface within the discharge. However, for ECR acceleration All three conditions above must be met. νe<ω is achieved at low pressures.

The remaining condition, condition (1), is the component in which the microwave electric field is perpendicular to the magnetic field. It is necessary to have The present invention applies a microwave electric field to the ECR surface and directly This relates to optimal adjustment of the static magnetic field. This invention transforms the field pattern into a space. Generally, a cavity model is used that adjusts the electric field to be perpendicular to B everywhere on the ECR surface. and select a mode in which the electric field strength is concentrated on the ECR surface.

Therefore, the field strength of the TE mode is strongest at the outer periphery of the cavity. and select. where n is half the number of electric field cusps and p is along the axis of the cavity. It is the number of stationary half wavelengths. These modes have their highest field strength just It has at the part where the ECR surface is located. In addition, this mode pattern is On the other hand, if the electric field is adjusted to be perpendicular to the magnetic field everywhere on the ECR layer, It can be arranged. This allows efficient micro-coupling throughout the entire ECR layer. Wave coupling is caused. To obtain optimal matching between electric and magnetic field cusps requires 2n magnets for T E++lp excitation.

The above three conditions are necessary for ECR acceleration of electrons, and usually the ECR This is accomplished at low pressure within the physical volume of the discharge. This volume is the ECR acceleration volume (ECR acceleration volume), that is, it is called VECR. .

Electrons accelerated within the ECR volume move throughout the discharge volume and are excited to produce neutral gas. Ionizes body ions.

Therefore, if the mean free path of electrons is much larger than the discharge dimension, the discharge capacity Ions and excited species are created throughout the product, and some electrons enter the ECR capacitor. moving in and out and undergoing multiple accelerations during the collision. Microwave electricity using electronic gas Force absorption is primarily within the ECR volume (or surface) at a specific location inside the discharge. occurs. From now on, efficient transfer of microwave energy to plasma will be possible. The electric field should be concentrated in order to cause the Must. Moreover, if discharge uniformity is important, ECR electron acceleration The volume should be adjusted in terms of size and position so that a uniform discharge is produced. .

detailed description Figures 1-4 illustrate a preferred improved plasma generator according to the present invention. There is. Except for the magnet installation method (the basic structure of this device is based on U.S. Patent Nα4,507,5 88 and Nα4.724.293. For example, copper, brass, aluminum Various non-magnetic materials such as aluminum, silver, gold, platinum, and non-magnetic stainless steel are used in the equipment structure. It should be understood that it can be used.

The device shown is made of copper or brass and defines a microwave cavity 11. It comprises a cylinder or housing 10 preferably having a cavity 11. A sliding short circuit 12 made of copper or brass is provided for adjusting the length of the cavity 11. ing. A silver-plated copper brush 13 is brought into electrical contact with the housing 10. It is set. Although only two brushes 13 are shown in FIG. They are arranged around the entire circumference of 12. Movable excitation probe or antenna 14 is provided in order to obtain impedance tuning of the microwave energy within the cavity 11. It is being The probe 14 is inserted into the cavity 11 by means of a brass or copper conduit 21. Supported. The amount of insertion of the probe 14 into the cavity 11 in the radial direction The degree of plasma coupling in the cave 11 is changed. The sliding short circuit 12 is located above within the cavity 11. Its vertical movement is based on the U.S. patent Nα4, 507,588 using conventional adjustment means (not shown). This is done by the head 22.

A dish or chamber 15 made of quartz, preferably shaped like a round bottom flask. The plasma region 16 can be partitioned in cooperation with the base 30 made of stainless steel. be. The gas is supplied by a conduit 19 in the annular ring 18 to an inlet 20, where it is and flows into the plasma region 16. Optionally, the cooling conduit 42 that cools the base 30 is Can be provided. The housing 10 is installed by sliding onto the base 30, and the housing 10 is installed by sliding it onto the base 30. on the ring 10a of copper or brass attached to the housing 10. Therefore, the position is maintained. The ring 10a is made of copper or brass with port 33. and is held in position on the base 30. According to this structure, the base 30 and the chamber 1 5 from the housing 10.

A vacuum chamber 35 is connected to the base 30 and is operated by vacuum suction means (not shown). A reduced pressure in the plasma region 16 is thus obtained.

In the illustrated improved plasma device, chamber 15 and plasma region 16 are It is surrounded by stones 34. In a preferred embodiment, six or more A large number of equally spaced magnets 34 surround the chamber 15 around the axis a-a. It is set. Magnet 34 is connected to plasma region 16 of chamber 15 as shown in FIG. 2A. A plurality of interconnected magnetic field cusps 16a are provided therein. The magnet 34 is a chamber -15 to reduce particle diffusion losses from region 16. The magnetic field strength is along the longitudinal axis a- a and decreases as one approaches the center of the plasma region 16 due to the arrangement of the magnets 34. do.

The magnet 34 is installed on a highly permeable (iron) ring 37 around the ring 31, and has magnetic absorption. It is held in place by gravity. Gas flows from the plasma region 16 through the openings or holes. It flows out through the nozzle 41. The nozzle 41 is optional and does not necessarily need to be used. There isn't.

FIG. 2 shows the higher electric field cusp 16 used for electron cyclotron resonance. b. FIG. 2A shows the magnetic field cusp 16a. Figure 5 shows cusp 1 6a and 16b are shown overlapping. Figure 4 shows the various higher levels that can be selected. Showing an electromagnetic field.

3 and 3A, the cross-sectional shape defining the microwave cavity 51 is rectangular. A coupler 50 is shown, with a magnet 52 on the inner circumference of the coupler 50 shielded by a plate 53 It is equipped with The electromagnetic field cusp 51a for high mode (TE, 2) is shown in FIG. It is. FIG. 3A shows the magnetic field cusp 51b. Cusp 51a as shown .

51b overlap to provide improved ECR.

FIG. 6 shows a support 46 for a sample or substrate 46. FIG. This support 46 is Connected to RF or DC bias line 47 to accelerate ions towards substrate 46 has been done. FIG. 7 shows a shorter support 458 for sample 46, which The support 45a is also connected to the bias line 47. FIG. 8 shows the iodine from the cavity 16. A grating 48 is shown to assist in drawing and applying the material against the substrate 46.

FIG. 9 shows the probe of magnet 34 to impart intersecting field cusps 16a, 16b. The angle of displacement φ relative to the position of the blade 14 is indicated by an arrow. Chapter 10.11 The figure shows another embodiment in which ring magnets 50, 51 are provided spaced apart from each other. Ru. A magnetic field exists between the ring magnets 50,51. According to this structure, the ECR area is the axis. It is uniform around the line a-a, and the field pattern is of the illustrated type, such as TEonp. Becomes the property of FIG. 12 shows a typical relative arrangement of electromagnetic field 16b with respect to probe 14. It shows the location. Magnet 50.51 or 34 is connected to the electric field to the magnetic field on the ECR surface. It is moved perpendicular to the object.

In the preferred coupler apparatus illustrated in Figures 1.2 and 5-9, the 8-inch Inside the cylindrical discharge vessel 11 with a diameter of 20, 32 cm, there are 14 magnets with alternating magnetic poles. It is surrounded by stones 34. The magnetic field consists of a pair of 2 inch (5.08 cm) square Rare earth magnets each having a magnetic pole surface free magnetic field strength exceeding 3 kG. Created by similar magnets. These magnets therefore fit an 8 inch diameter discharge surface. Creates a strong multicusp magnetic field adjacent to the surface. For 2.45GH2 excitation An ECR surface requiring a magnetic field strength of 875G is created within the discharge vessel. Fifth - The surface indicated by the solid line in Figure 9 is about 2-3.5 mm from the cylindrical inner surface of the chamber 15. It is a wavy curved thin volume surface located at cm.

The discharge vessel shown in Figure 1 can be excited with a number of TE or TM circular waveguide modes. can be done. The electromagnetic field patterns of numerous TE and TM circular waveguide modes are This is shown in FIG. Through careful testing of both TE and TM modes, The electric field perpendicular to the static magnetic field in the part of the ECR container shown in FIG. It has been found that it can be created by almost any mode. But (Tsukai) Depending on the mode, more complete and uniform excitation of the ECR space, that is, the entire circumference of the discharge region It is possible to create an excitation that spans the Static magnetic field pattern and excitation electromagnetic field pattern A particular mode is TE, which can produce good overlap between the modes. It is de. This mode has two characteristics similar to the multi-cusp static magnetic field pattern: (1) The strongest field (in this case the electric field) is located near the outer boundary of the wall of the chamber 15. (2) the mode pattern has 14 electric field cusps; Has characteristics. Therefore, the strong electric field is can be positioned such that it is perpendicular and provides a uniform layer of ECR acceleration. . The inlet gas supply ring 18 has 14 small gas inlet holes, and the ECR excitation region Force the gas to flow through the let This gas supply method ensures that the supply gas is uniform and efficient around the discharge area. ionized into.

This ECR discharge excitation method uses a large diameter discharge (>5 inches (12,7 This is particularly useful when attempting to create an). For example 12-18 inches (30,48-45,72ao) diameter waveguide with 6-12 inch (15,24- 30,48an) Used to excite the TE7r mode that tends to occur on the discharge region. can be used. The waveguide applicator applies the TE and I modes to the cylindrical discharge region. Make sure to combine them. But TE, if a mode is excited, many lower order There will also be TE and TM modes. Depending on the existence of these modes Non-uniform and undesirable ECR volume excitation will result. Therefore, it is possible to tune The adjustable cylindrical cavity coupling device has several advantages. Firstly, the internal tunable cavity Therefore, it is difficult to match any waveguide mode to the cylindrical discharge region. It will be done. Second, the excitation of undesired modes can be prevented by adjusting the cavity length. I can do it. Therefore, in order to obtain single mode excitation and obtain optimal ECR operation, It is possible to control and obtain a desired electric field pattern.

A cavity given an ECR discharge is tuned to T1. at a particular input power. Against resonance and are aligned. Then, as the input power is gradually increased and/or decreased, the EC Retune the R discharge cavity to match in T a l p mode. therefore The power absorbed in the ECR region can be carefully varied and controlled.

The main feature of the present invention is that TE with respect to the angle φ of the cylindrical cavity, 1. mode pattern, The point is to rotate and displace the static magnetic field so that it is perpendicular to the electric field everywhere.

This physically rotates and displaces the magnet 34 relative to the probe 14. It will be done more.

Preferably, the magnet has a field strength of about 0.01-5 Tesla. The radio frequency is approximately 4 00 MHz - 10 GHz, preferably 915 MHz, 2.45 GHz It is of Hertz approved heating frequency. The pressure inside the chamber is approximately 10-' Torr and 10-'Torr is preferable.

The above description is only for illustratively explaining this invention, and this invention shall be limited only by the scope of the claims appended hereto.

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Claims (1)

[Claims] 1. It is made of non-magnetic metal and has a shape that forms a cavity, and the cavity is made of - or a plurality of TE or Including extremely high frequency waves or microwaves that are excited by TM mode resonance. a plasma source comprising a coupler of radio frequency waves, an electric current disposed in said coupler; A gas-insulated chamber in which ionization occurs to form a plasma. a gas supply means for supplying a gas comprising a radio frequency wave to the coupler; A probe facing inside the coupler and connected to the coupler is provided to couple the The radio frequency waves applied to the coupler are transmitted within the chamber under reduced pressure. , creating a plasma perpendicular to and surrounding the longitudinal axis of the chamber; In the plasma generator where the plasma is maintained, (a) having N and S magnetic poles in the chamber between the magnetic poles; top to form multiple static magnetic field cusps that help confine the plasma within the spaced magnet means disposed about the longitudinal axis of the chamber; (b). The gas that is ionized to form plasma in the chamber is supplied to the chamber. the above-mentioned gas supply means for supplying into the chamber, and (c) In the above chamber, the entire electron cyclotron resonance region in the plasma is or a plurality of higher heights overlapping substantially perpendicular to the static magnetic field of said magnetic means. a radio frequency wave generator that generates a microwave electric field cusp of modes; A plasma generating device characterized by being provided with. 2. The generator is a variable generator used to modify the radio frequency waves in the coupler. 2. The plasma generator according to claim 1, further comprising a power source. 3. at least six even numbers of said magnet means arranged around said chamber; The mode is TEnlp (where n is half the number of magnetic field cusps). 1, P is the number of stationary half wavelengths along the axis of the cavity. ) is selected from 2. The plasma generating device according to claim 1. 4. The plasma generating device according to claim 3, wherein a permanent rare earth magnet is used as the magnet means. Place. 5. Plasma is reduced into the chamber along the longitudinal axis and into the chamber. in a vacuum chamber disposed adjacent to the chamber to impart pressure; A support for the substrate to be treated with the plasma is provided as above. The nozzle means is provided in a reduced pressure chamber on the longitudinal axis and below the nozzle means. 1 plasma generator. 6. A plasma generator, (a). Metallic and non-magnetic – or excited by multiple TE or TM mode resonances coupling of radio frequency waves, including very high frequency waves or microwave waves, in a shape that forms a cavity in which plasma source with a (b). an electrically insulated chamber located within the coupler; (c). from a highly permeable material around the longitudinal axis of the chamber with N and S magnetic poles. on the ring consisting of a plurality of rings that help confine the plasma within the chamber. A plurality of spaced apart magnets arranged to form a static magnetic field cusp between the magnetic poles. permanent magnet, (d). Supplying gas that is ionized to form plasma in the above chamber gas supply means for (e). To couple the radio frequency waves to the above coupler movable antenna means facing the interior of the coupler and connected to the coupler; (f). made of non-magnetic metal, and arranged in the cavity perpendicularly to the axis of the cavity, and A sliding shunt movably arranged so as to be able to move near and far from the chamber. movable plate means, (g). a pressure reducing means for applying reduced pressure within the chamber; and (h). Generates multiple higher mode microwave electric field cusps in the above chamber radio frequency wave generator, movement of the plate means and the antenna means in the coupler; resonance of the selected TE or TM mode of the radio frequency wave in the coupler by is achieved and the resonant mode is changed to increase the radio frequency applied to the coupler. waves perpendicular to the longitudinal axis of the chamber under reduced pressure; It creates plasma surrounding the axis and maintains the plasma. a plurality of electric fields along a longitudinal axis and substantially perpendicular to the magnetic field cusp; A cusp is created and uniform electrons are generated within the chamber adjacent to each of the magnets. said movable plate means such that a cyclotron resonance region is created and maintained; A plasma generating device having a length determined by. 7. the generator combines radio frequency waves in the coupler and is adjacent to each of the magnets; Claims comprising a variable power source used to maintain a mode with an electromagnetic field Item 6. Plasma generator. 8. An even number of at least 6 magnets are provided around the cavity, and the mode is set to T. nlp (where n is 1/2 the number of magnetic field cusps, P is the constant 2 min along the axis of the cavity) is the number of wavelengths in one wavelength. ) The plasma generator according to claim 6. 9. A plasma is reduced into the chamber along the longitudinal axis and into the chamber. in a vacuum chamber disposed adjacent to the chamber to impart pressure; A support for the substrate to be treated with the plasma is provided as above. a claim located in the reduced pressure chamber below the nozzle means on the longitudinal axis; Item 6. Plasma generator. 10. (a). Plasma generators such as the following, i.e., a cavity made of non-magnetic metal The cavity has a shape of - or is excited by resonance of multiple TE or TM modes. equipped with a coupler for radio frequency waves, including ultra-high frequency waves or microwaves, which are an electrically isolated chamber located within the coupler. , for supplying gas that is ionized to form a plasma within this chamber. gas supply means and a coupler for coupling radio frequency waves to said coupler; A probe is connected to the coupler facing inside and applied to the coupler. A radio frequency wave is generated in the chamber under reduced pressure along the longitudinal axis of the chamber. A device that creates a plasma that is perpendicular to the axis and surrounds the axis, and a device that maintains the plasma. (1) having N and S magnetic poles in the chamber between the magnetic poles; Forms multiple static magnetic field cusps that help confine the plasma within the chamber Spaced magnets arranged around the longitudinal axis of the chamber above so as to (2) the gas that is ionized to form a plasma in the chamber; (3) the gas supply means for supplying the gas into the chamber; and (3) the gas supply means supplying the gas into the chamber; Magnetism by the above magnetic means is applied over the entire electron cyclotron resonance region in Zuma. Microwave electric field cusps of multiple higher modes that overlap substantially perpendicular to the field Using a plasma generator equipped with a radio frequency wave generator that generates (b). Gas is introduced into the chamber under reduced pressure by the gas supply means to In addition to creating plasma in the chamber, an electron cyclone is generated in the above chamber. Obtain Tron resonance, Plasma generation method. 11. 11. The plasma generation method of claim 10, wherein the pressure is about 10-1-10-6 Torr. . 12. said chamber having nozzle means; said nozzle means being injected from within said chamber; 11. The method for generating plasma according to claim 10, wherein the plasma is moved through the plasma. 13. Plasma is applied to the substrate to be treated with plasma within the chamber. 11. The plasma generation method according to claim 10, wherein the plasma generation method is performed at a location outside the chamber. 14. The magnet is a rare earth magnet with a magnetic field strength of about 0.01-0.5 Tesla. Claim 1, wherein the radio frequency waves are of approximately 400 MHz to 10 GHz. 0 plasma generation method. 15. the magnet has a magnetic field strength of about 875 Gauss in the ECR region of the plasma; 15. The method of claim 14, wherein the frequency is about 2.45 gigahertz. 16. (a). The following plasma generators, namely (1) metal and non-magnetic Yes - or a shape that forms a cavity excited by resonance of multiple TE or TM modes a plasma source equipped with a coupler of radio frequency waves, including very high frequency waves or microwaves, ( 2) an electrically insulated chamber disposed within said coupler; (3) said The chamber is placed on a ring made of highly permeable material around the longitudinal axis of the chamber. Forms multiple static magnetic field cusps between the magnetic poles that help confine the plasma inside A number of spaced apart permanent magnets are installed with alternating north and south magnetic poles. (4) providing a gas that is ionized to form a plasma in the chamber; (5) gas supply means for coupling radio frequency waves to the coupler; (6) movable antenna means connected to the coupler so as to face the interior of the coupler; The chamfer is made of non-magnetic metal and has a chamfer in the cavity perpendicular to the axis of the cavity. Movable as a sliding short circuit that is movably arranged so that it can be moved closer to or closer to the member. plate means; (7) pressure reduction means for applying reduced pressure within the chamber; and (8) Over the entire electron cyclotron resonance region of the plasma in the above chamber. The above is applied so that an electric field cusp that overlaps with a magnetic field cusp due to the above magnet is given. A radio frequency generator that generates multiple microwave electric field cusps of higher modes in the chamber. Using a plasma generator equipped with a wave number wave generator, (b). Plasma is generated within the chamber by introducing gas into the chamber under reduced pressure. generate, (c). Said movable plate means is adjusted to move the electric field cusp within said chamber. The microwave electric field and magnetic field cusp are maintained perpendicular to each other and the chamber is A plasma generation method that creates and maintains an electron cyclotron resonance region inside. 17. 17. The plasma of claim 16, wherein the reduced pressure is about 10-1-10-6 Torr. How to generate ma. 18. said chamber having nozzle means; said nozzle means being injected from within said chamber; 17. The method for generating plasma according to claim 16, wherein the plasma is moved through the plasma. 19. Plasma is applied to the substrate to be treated with plasma within the chamber. 17. The method for generating plasma according to claim 16, wherein the plasma is generated outside the chamber. 20. The magnet is a rare earth magnet with a magnetic field strength of about 0.01-0.5 Tesla. 17. The plasma of claim 16, wherein the plasma has a frequency of about 400 MHz to 10 GHz. Generator. 21. The magnet has a magnetic field strength of about 875 Gauss in the ECR region of the plasma. 17. The plasma generation method of claim 16, wherein the frequency is about 2.45 gigahertz. 22. The magnet means includes a plurality of spaced apart magnets along the axis of the chamber. The plasma generator according to claim 1, which is a ring magnet of Raw equipment. 23. The magnet means includes a plurality of spaced apart magnets along the axis of the chamber. 11. The plasma according to claim 10, wherein the plasma is a ring magnet that imparts a magnetic field cusp. How it occurs.