RU2811802C2 - Turbulent etching device and metal strip processing system - Google Patents

Abstract

FIELD: metal processing.

SUBSTANCE: group of inventions is related to a device for turbulent etching of a metal strip and a system for processing a metal strip using this device. The turbulent etching device contains an etching bath in which free rollers are located. The free rollers are installed with the possibility of rotation around their axis due to the friction of the moving metal strip and rotational contact with its surface to break the boundary layer of the acid solution on the surface of the metal strip. The axes of the free rollers are perpendicular to the direction of movement of the metal strip. The free rollers are made of acid-resistant, wear-resistant, self-lubricating material.

EFFECT: etching effect is improved due to the continuous rupture of the boundary layer of the acid solution on the strip surface, increasing the turbulence of the acid solution and increasing the diffusion rate of hydrogen ions in the boundary layer of the strip surface.

9 cl, 7 dwg

Description

Field of technology

The present invention relates to the field of metal strip etching technology, and in particular relates to a turbulent etching apparatus and a system for processing a metal strip using the turbulent etching apparatus.

State of the art

In the field of metal strip etching, the etching device 1 is a key processing equipment. The strip is immersed in an etching device 1 filled with an acid solution at a certain temperature, and after passing through the etching device 1 at a certain speed, scale is removed from the surface of the strip due to the chemical action of the acid solution. To ensure final removal of scale from the strip surface at maximum process speed, it is necessary to design the pickling device 1 with a suitable length according to the required pickling time. The length of the etching device 1 is not only directly related to the investment and stability of the unit, but also affects the energy consumption of the etching process. If the pickling device 1 is long, the heat generation and acid vapor emission will be large, so it is necessary to maximize the efficiency of the pickling device 1 and shorten the length of the pickling device 1.

Currently, the prevailing pickling device 1 is a turbulent type device with shallow baths, as shown in Figure 1. The device is characterized in that by installing an internal cover, a relatively closed cavity with a shallow depth is filled with an acid solution. At the bottom of the cavity, several andesitic or wear-resistant plates are installed, so that the path of movement of the strip in the etching device 1 is almost straight; To ensure that the cavity is always filled with acid solution, a large spray manifold 101 is installed at the inlet and outlet of the cavity, respectively. The acid solution under a certain pressure is converted into high-speed jets through the nozzles of the manifold 101 and continuously sprayed into the cavity from the inlet and outlet of the cavity, thereby sealing the acid solution in the cavity, so a large amount of the acid solution can only flow out from the weir in the middle of the cavity.

At the two ends of the shallow turbulence type bath, strong turbulence may be generated under the high-speed jet from the manifold 101, but it is mainly concentrated in the upper part of the strip because the sprayed acid solution is blocked by the strip and cannot effectively enter the lower part of the strip. Due to the strong fluid resistance, the flow of acid solution in the middle of a shallow turbulent-type bath is relatively stable, and the turbulence is mainly caused by the movement of the strip itself. If andesite is used at the bottom of a shallow turbulent-type bath, the bottom surface of the strip can be easily scratched when producing some soft products; If a wear plate is used, chips scraped by the strip from the surface of the wear plate will contaminate the acid solution and clog the nozzles. For a shallow turbulent type bath, the acid solution is sealed by manifold 101 at the inlet and outlet. In the production of products such as silicon steel, which can cause contamination of the acid solution, clogging of the nozzles of the manifold 101 is easy to occur. As the flow rate of the sprayed acid solution decreases, the bath will eventually not be filled with acid solution, resulting in etching failure and the formation of defective products. In addition, in the process of the high-speed jet continuously sprayed from the inlet and outlet manifold 101 hitting the acid solution, a large amount of acid vapor will be generated. This area is equipped with squeeze rollers, and it is necessary to provide an acid vapor exhaust hole, so discharging a large amount of acid vapors not only causes a large loss of acid solution, but also increases the operating cost of the unit due to the additional treatment of acid vapors to discharge them according to the standard.

The essence of the invention

The present invention relates to a metal strip turbulent etching apparatus and a metal strip processing system using this turbulent etching apparatus, which can at least partially overcome the disadvantages of the prior art.

In one aspect, the invention relates to a device for turbulent etching of a metal strip comprising an etching bath. The pickling bath contains free rollers. The free rollers are installed with the possibility of rotation around their axis due to the friction of the moving metal strip and rotational contact with its surface to break the boundary layer of the acid solution on the surface of the metal strip. The axes of the free rollers are perpendicular to the direction of movement of the metal strip. The free rollers are made of acid-resistant, wear-resistant, self-lubricating material.

As one embodiment, the free rollers include a plurality of free pinch rollers that are positioned in series above the strip passage along the direction of strip movement.

In one embodiment, the free pinch roller consists of a rod attached to the pickling bath and a rotating barrel that fits over the roller rod.

As one embodiment, the inner diameter of the rotating barrel is larger than the diameter of the pinch roller shaft.

As one embodiment, the free rollers include a plurality of free support rollers that are arranged in series below the strip path along the direction of the strip.

As one embodiment, there is a gap between the bottom of the free support roller and the bottom of the pickling bath.

As one embodiment, a plurality of side nozzles for spraying the acid solution are mounted on the side wall of the pickling bath.

As one embodiment, the side nozzles and the strip passage are located on the same horizontal plane. The spray of the side nozzles is directed towards the strip movement.

In another aspect, the invention relates to a metal strip processing system having an etching station and a cleaning station. A strip cleaning device is installed at the cleaning position, and the above-mentioned turbulent etching device is located at the etching position.

Embodiments of the present invention have at least the following beneficial effects: The turbulent etching device and metal strip processing system provided by the present invention are equipped with free rollers that rotate about their axis due to the friction of the moving strip. This can continuously break up the boundary layer of the acid solution on the strip surface, enhance the turbulence of the acid solution, and increase the diffusion rate of hydrogen ions in the boundary layer of the strip surface, which effectively improves the etching effect.

Description of drawings

To more clearly explain the embodiments of the present invention or the technical solutions in the prior art, the following will briefly describe drawings that need to be used in describing the embodiments or the prior art. It will be appreciated that the drawings in the following description represent only some embodiments of the present invention. It should be understood that a simple technician in the art can produce other drawings based on these drawings without creative work.

Figure 1 shows the block diagram of the current turbulent etching device provided in the background technique;

Figure 2 shows the block diagram of the turbulent etching device in embodiment No. 1 of the present invention;

Figure 3 is a plan view of the turbulent etching device in Embodiment No. 1 of the present invention;

Fig. 4 is a plan view of the cleaning device in Embodiment No. 4 of the present invention;

In Fig. Figures 5–7 show cross-sectional views along A-A and B-B in Figure 4 at different spray widths.

Detailed implementation methods

The technical solutions in the embodiments of the present invention will be clearly and fully described below. Obviously, the described embodiments are only part of the embodiments of the present invention and not all embodiments. All other embodiments obtained by a person skilled in the art based on the embodiments of the present invention without creative work shall fall within the scope of protection of the present invention.

Embodiment No. 1 As shown in Fig. 2 and fig. 3, an embodiment of the present invention provides a turbulent etching apparatus 1 including an etching bath 102. A plurality of free rollers are disposed in the etching bath 102. Loose rollers are used to make rotational contact with the surface of the metal strip in order to break the boundary layer of acid solution on the surface of the strip. The axis of the free roller is perpendicular to the direction of movement of the strip.

The pickling bath 102 is preferably a conventional shallow turbulent type bath in the art.

It is clear that the location of the free roller should ensure that the roller contacts the upper surface of the strip during rotation. Technical personnel skilled in the art can easily do this according to the specific situation. For example, the bottom edge of the roller is flush with the top of the strip passage, or the top of the roller is flush with the bottom of the strip passage. It is obvious that the axes of the above-mentioned free rollers are usually parallel to the horizontal direction; the corresponding free rollers are arranged in parallel.

An embodiment involves installing free rollers that rotate around their axis due to the friction of the moving strip. This can continuously break up the boundary layer of the acid solution on the strip surface, enhance the turbulence of the acid solution, and increase the diffusion rate of hydrogen ions in the boundary layer of the strip surface, which effectively improves the etching effect.

As shown in Fig. 2 and fig. 3, the free rollers include a plurality of free pinch rollers 107, and the free pinch rollers 107 are sequentially positioned above the running passage of the strip along the running direction of the strip, that is, used for rotational contact with the upper surface of the strip to break up the boundary layer of acid solution on the upper surface of the strip. Preferably, the free pinch rollers 107 are spaced at intervals.

In an alternative embodiment, the aforementioned free pinch roller 107 includes a rod attached to the pickling bath 102 and a rotating barrel that fits over the roller rod. The roller core and the rotating barrel are preferably made of acid-resistant materials with good wear resistance and self-lubricating properties. More preferable design: there is a gap between the spinning barrel and the roller rod, that is, the inner diameter of the spinning barrel is larger than the diameter of the roller rod (preferably a little larger), so that the spinning barrel is easier to rotate due to the friction of the strip, and at the same time, can soften the shock caused by vibration stripes.

In one embodiment, as shown in Fig. 2 and fig. 3, the free rollers include a plurality of free support rollers 108 that are sequentially arranged below the strip running path along the strip running direction; that is, they are used to make rotational contact with the bottom surface of the strip to break up the boundary layer of acid solution on the bottom surface of the strip. Preferably, the free support rollers 108 are spaced.

An embodiment provides for the installation of free support rollers 108 to support the strip, while the free support rollers 108 rotate around its axis due to the friction of the moving strip. This can continuously break up the boundary layer of the acid solution on the bottom surface of the strip, enhance the turbulence of the acid solution, and increase the diffusion rate of hydrogen ions in the boundary layer of the strip surface, which effectively improves the etching effect. Since the use of andesite to support the strip is eliminated, the problem of scratching the bottom surface of the strip during movement is eliminated.

In an alternative embodiment, the free support roller 108 consists of a rod attached to the pickling bath 102 and a rotating barrel that fits over the roller rod. The roller core and the rotating barrel are preferably made of acid-resistant materials with good wear resistance and self-lubricating properties.

In addition, it is preferable that a distance be left between the bottom of the free support roller 108 and the bottom of the pickling bath 102 (the bottom of the pickling bath 102) in order to maintain the integrity of the bottom slope so that insoluble deposits do not accumulate locally, reduce deposition and facilitate cleaning.

In the case where the free pressure roller 107 and the free support roller 108 are installed at the same time, the number of the free pressure rollers 107 and the free support rollers 108 may be the same, and the rollers can be installed in a one-to-one correspondence. In each pair of free pinch rollers 107 and free support rollers 108 located at the top and bottom, both can be facing each other (top and bottom), and can also be staggered along the direction of movement of the strip, but it is recommended to place them adjacent, to ensure smooth lane movement.

To further optimize the design of the above turbulent etching device 1, as shown in Fig. 2 and fig. 3, a plurality of side nozzles 109 are installed on the side wall of the pickling bath 102 for spraying the acid solution. Through the side nozzles, 109 can not only feed the acid solution into the pickling bath 102, but also spray the acid solution into the bath with a high-speed jet, which greatly increases the overall turbulence intensity of the acid solution in the pickling bath and improves the etching effect. It is preferable that side nozzles 109 be installed on the two side walls of the etching bath 102; In a preferred embodiment, as shown in Fig. 2 and Fig. 3, the side nozzles 109 and the strip movement passage are on the same horizontal plane. The spray of the side nozzles 109 is directed towards the moving passage of the strip, which enhances the overall turbulence intensity of the acid solution, in particular, the acid solution near the strip has a better turbulence effect.

To further optimize the design of the above-mentioned turbulent etching device 1, an overflow hole 104 is provided on the etching bath 102. The etching bath 102 preferably includes a body 102 and a cover, the cover covering the body 102 and forming a relatively closed cavity that is convenient for storing the acid solution. In one embodiment, the bath roof includes an outer roof 1101 and an inner cover 1102. The inner cover 1102 closes and presses against a support at the top of the body 102, which has a good sealing effect on the acid solution and acid vapor in the cavity. The outer cover 1101 can further improve the sealing of the turbulent etching device 1.

In addition, a plurality of protective blocks 111 are provided on the inner wall of the bath. For example, the protective block 111 is located on a supporting support for the inner cover, etc., which can prevent the strip from being deflected during movement and damaging the side wall of the bath.

The above overflow hole 104 is installed on the bathtub 102, for example, the hole is installed in the middle of the bathtub 102 along the length of the bathtub.

To further optimize the design of the above-mentioned turbulent etching device 1, at least one end of the etching bath 102 is a liquid barrier end 103, and a support barrier 1031 and a liquid barrier 1032 are installed at the liquid barrier end 103. The support barrier 1031 continues from the bottom of the bath upward, the liquid barrier 1032 continues from the top of the bath downwards. The support barrier 1031 and the liquid barrier 1032 extend to the strip passage area, respectively, and the gap between the two barriers allows the strip to pass; Or, the gap between the support barrier 1031 and the fluid barrier 1032 is less than the thickness of the strip, and the support barrier 1031 and the fluid barrier 1032 are elastic such that, by pressing the barriers, the strip will pass between the support barrier 1031 and the fluid barrier 1032.

In a preferred embodiment, both ends of the pickling bath 102 are installed as a liquid barrier end 103; It is obvious that the two ends of the pickling bath 102 are the corresponding two ends of the pickling bath 102 in the direction of movement of the strip.

In a preferred embodiment, the support barrier 1031 serves as a barrier to block the acid solution as well as to support the strip. That is, the top of the support barrier 1031 extends to the bottom edge of the lane passage so that it is flush with the bottom edge of the lane passage. For example, the support barrier 1031 is a wear block suitable for supporting a strip; In addition, the support barrier 1031 also has acid resistance, while the support barrier 1031 can preferably absorb shock caused by vibration and poor flatness of the strip to a certain extent. In another embodiment, during normal operation, the aforementioned support barrier 1031 does not contact the bottom surface of the strip. For example, there is a slight gap between the top of the support barrier 1031 and the bottom edge of the lane passage.

In a preferred embodiment, during normal operation, the lower end of the liquid barrier 1032 is in direct contact with the upper surface of the strip; or there is a gap between the bottom end and the top surface of the strip. The smaller the gap, the better (preferably no more than 1mm). That is, the lower end of the liquid barrier 1032 extends to be flush with the upper edge of the strip passage. Or, the lower end of the liquid barrier 1032 is above the strip passage and close to the strip passage. In this embodiment, the liquid barrier 1032 is preferably elastic. On the one hand, it can prevent acid solution from flowing out from the top of the strip, and at the same time, it can better absorb the shock caused by vibration and poor flatness of the strip, on the other hand, it can also adapt to strips of different thicknesses. The above-mentioned liquid barrier 1032 may be attached to the inner cover support support, the upper end of the barrier being in contact with the inner cover 1102; Preferably, the barrier is removably mounted on a support support for the inner cover, for example secured with clamps or screws, etc.

The above elastic barrier may be a modified rubber block, which is wear-resistant and acid-resistant; Of course, other elastic materials can also be used, but preferably it is resistant to acid corrosion.

The turbulent etching device 1 in this embodiment provides a liquid barrier end 103 consisting of a support barrier 1031 and a liquid barrier 1032 so that a relatively closed cavity is formed in the pickling bath 102 for storing the acid solution. Since it is no longer necessary to use a high-speed jet to seal the acid solution at both ends of the pickling bath 102, a large amount of acid vapor will not be generated, thereby reducing acid consumption and acid vapor treatment costs; In addition, since there are no nozzles to seal the liquid, the applicability of the pickling bath 102 will be greatly improved, and it will be eliminated when pickling grades such as silicon steel, the high impurity content of the acid solution will cause the nozzles to clog, the pickling bath will not be filled with acid solution and will cause unsuccessful etching.

In the above embodiment, a small amount of acid solution still flows from both ends of the pickling bath 102, respectively, as shown in Fig. 2 and fig. 3, a transition bath 105 is externally connected to the liquid barrier end 103 to collect the acid solution flowing from that end. The transition bath 105 is provided with an acid solution return port and a strip movement passage. The acid solution collected in the transfer bath 105 can be drained through the return port 1051 into the turbulent pickling device 1 for circulation use. The bottom of the transition bath 105 should be lower than the top of the support barrier 1031, and it is preferable that the bottom of the transfer bath 15 be lower than the bottom of the pickling bath 102 to facilitate collection and return of the acid solution. In addition, a vapor exhaust end hole is also provided in the transition bath 105 to prevent acid vapor from leaking out of the transition bath 105.

Generally, wringing rollers 106 are respectively installed at the strip inlet and outlet of the pickling bath 102. With respect to the design with the transition bath 105, the wringing rollers 106 on the side of the liquid partitioning end 103 are located in the transfer bath 105 to reduce the occupied space.

In addition, a connection hole is provided at the lowest point of the bottom of the etching bath 102. During production, a portion of the acid solution is continuously released in a small stream through this connection hole for recirculation. Some of the impurities deposited at the bottom of the pickling bath 102 will be drained along with the acid solution. An emptying hole is also provided at the lowest point of the bottom of the pickling bath 102. When the unit is temporarily stopped or stopped for maintenance, it is possible to quickly drain the acid solution from the pickling bath 102 through the emptying hole. After stopping the unit, the acid solution is completely drained through the emptying hole, then the outer cover 1101, the inner cover 1102 and free pressure roller 107, after which the bath can be entered for maintenance and cleaning. The pickling bath 102 is also provided with a water seal groove, the intermittent places of the water seal are connected through connecting pipes. The water seal groove provides a better seal against acid vapors generated in the pickling bath 102.

Embodiment #2

An embodiment of the present invention provides a metal strip processing system having an etching station and a cleaning station. A strip cleaning device 2 is installed at the cleaning position, and a turbulent etching device 1, provided in embodiment No. 1, is located at the etching position. The detailed structure of the turbulent etching device 1 will not be described here.

The cleaning position can be located before the pickling position, that is, the strip first passes through the strip cleaning device 2, then enters the turbulent pickling device 1, for example, to process a stainless steel strip; The pickling position can also be located before the cleaning position, for example for processing some cold-rolled strips, but is not described in detail here.

Embodiment #3

As shown in Fig. 4, an embodiment of the present invention provides a spray manifold 202 including a manifold body 2021. Along an axial direction of the manifold body 2021, a plurality of nozzles 2022 are arranged in series, the arrangement of the nozzles 2022 generally being linear, and parallel to the axial direction of the manifold body.

The spray direction of the nozzles 2022 is generally the same, and it is preferable that the nozzles 2022 be spaced at equal intervals.

As shown in Fig. 4, a guide rod 2023 is provided within the manifold body 2021, which is arranged parallel to the axial direction of the manifold body, and at least one plug 2024 is provided on the guide rod 2023. Each plug 2024 corresponds to one injector 2022, and both are located on the same and the same radial section of the manifold body 2021. A guide rod 2023 is connected to a drive mechanism to drive the rod to rotate so that the plug 2024 blocks or deviates from the corresponding nozzle 2022.

The plug 2024 may be mounted on the guide rod 2023 using a support. It is understood that the plug support is located radially along the manifold body 2021. The guide rod drive mechanism causes the guide rod 2023 to rotate about its axis, and accordingly causes the plugs 2024 to rotate, that is, the plugs 2024 rotate about the guide rod 2023.

In this case, the guide rod 2023 is preferably located coaxially with the manifold body 2021, during the rotation of the plug 2024 together with the guide rod 2023, the plug 2024 is always in contact with the wall of the manifold. In another embodiment, the guide rod 2023 is located eccentrically, that is, the axis of the guide rod deviates from the axis of the manifold body, and is located on the side of the axis of the manifold body close to the injectors 2022. Then the distance between the blocking surface of the plug 2024 and the axis of the guide rod is equal to the distance between the axis of the guide rod rod and the inlet of the injector 2022. As the plug 2024 rotates in conjunction with the guide rod 2023, only when the plug rotates to the location of the corresponding injector 2022 will it contact the inner wall of the manifold body 2021 and close the corresponding injector 2022. In other cases, the plug 2024 does not contact the inner wall of the manifold body 2021, which can reduce the wear of the plug 2024 and prevent the friction force received by the plug 2024 from being continuously transferred to the guide rod 2023, so as not to affect the service life of the guide rod 2023.

The plug 2024 is preferably made of rubber; the blocking surface of the plug 2024 is preferably an arcuate surface with the same curvature as the inner wall of the manifold body 2021. In the above structure, in which the guide rod 2023 is located eccentrically, the blocking surface of the plug 2024 can be designed as an arcuate surface suitable for fitting into the wall in place of the nozzle 2022 to provide a blocking effect at the liquid inlet of the nozzle 2022. Moreover, preferably, as shown in Fig. 5-7, a groove is provided in the middle of the blocking surface of the plug 2024, which can reduce the friction between the plug 2024 and the wall to a certain extent. collector

On the atomization manifold 202, some injectors 2022 may be installed without plugs 2024, that is, these injectors 2022 are in a normally atomizing/open state, and the remaining injectors 2022 may be locked or unlocked by corresponding plugs 2023 to implement opening and closing control. Accordingly, a constant spray zone and a controlled spray zone are formed on the commutator body 2021. In addition, preferably, the constant spray zone is located in the middle of the manifold body 2021, and there are two controlled spray zones that are located on the left and right sides of the constant spray zone. That is, the 2021 manifold body has a constant spray zone in the middle and two adjustable spray zones located on both sides of the constant spray zone. The 2024 plugs are placed on two controlled spray zones. The spray header 202 with this structure can be used for cleaning, strip cooling, etc. In addition, preferably, the two controlled spray zones are located symmetrically with respect to the constant spray zone in the middle to ensure uniform cleaning/cooling of the strip.

When the constant spray zone in the middle has an even number of nozzles 2022, the nozzles 2022 are arranged symmetrically with respect to the axis of the strip processing unit; when the constant spray zone in the middle has an odd number of nozzles 2022, then one of the nozzles 2022 is located exactly in the axis of the strip processing unit, the remaining nozzles are located symmetrically relative to the axis of the strip processing unit.

In a controlled spray zone, the number of plugs for each nozzle 2022 may be the same or different; When the number of plugs for each injector 2022 is the same, the location of the plugs 2024 may be different. For example, two adjacent nozzles 2022 have the same number of plugs, but the plugs 2024 are staggered so that the two nozzles 2022 can alternately spray liquid.

In a preferred embodiment, each controlled spray zone includes multiple controlled spray sections. Each controlled spray section is provided with at least one nozzle 2022; At each controlled spray section, the number and location of the plugs for the nozzles 2022 are the same, then in this section the spray moment of the nozzles 2022 is the same, that is, the nozzles simultaneously spray or close; In two adjacent controlled spray sections, the number of plugs for one nozzle 2022 in one controlled spray section is different from the number of plugs for one injector 2022 in the other controlled spray section. Based on this design, section-by-section spray control for the spray manifold 202 can be realized. When one controlled spray section sprays, the nozzles 2022 in the other controlled spray section can be closed to stop spraying, so that the spray range of the spray collector 202 can be adjusted.

Preferably, when multiple plugs 2024 are provided for one injector 2022, the plugs 2024 of that injector 2022 are spaced at equal intervals around the circumference of the manifold body 2021 to facilitate adjustment. In this case, the plugs 2024 corresponding to this nozzle 2022 can be located 360° around the circumference of the guide rod 2023 or can be located in a sector shape relative to the guide rod 2023.

In a preferred embodiment, the plugs 2024 of each controlled spray zone include at least one row of axial plugs, the number of plugs in the axial row is equal to the number of nozzles 2022 in that controlled spray zone, and the direction of the plugs 2024 is parallel to the axis of the manifold body. That is, the center row plugs include a plurality of plugs 2024, and these plugs are arranged in a one-to-one relationship with the nozzles 2022 of this controlled spray zone; in addition, the direction of the linear arrangement of the axial row plugs 2024 is parallel to the axis of the manifold body, so that the axial row plugs can simultaneously close all the nozzles 2022 of this controlled spray zone, i.e. cover this controlled spray area.

In addition, in the two controlled spray zones, at least two rows of axial plugs are collinear, that is, one row of axial plugs in one controlled spray zone and one row of axial plugs in the other controlled spray zone are on the same axis. By rotating the guide rod 2023, the nozzles 2022 in the two controlled spray zones can be closed simultaneously, only the constant spray zone in the middle remains in operation to obtain a minimum spray width.

In a further preferred embodiment, from the constant spray zone in the middle to the corresponding end of the manifold body 2021, in each controlled spray zone, the number of plugs for one injector 2022 increases sequentially. For example, from the constant atomization zone in the middle to the corresponding end of the commutator body 2021, the controlled atomization zone includes a 1st controlled atomization section, a 2nd controlled atomization section... an Nth controlled atomization section (N greater than 2). In the 1st controlled spray section, the number of plugs for each nozzle 2022 is 1, in the 2nd controlled spray section, the number of plugs for each nozzle 2022 is 2, the number increases similarly, and in the Nth controlled spray section, the number of plugs for each nozzle 2022 is N. Based on the above implementation method, the closing probability of the nozzles 2022 gradually increases from the constant atomization zone in the middle to the corresponding end of the manifold body 2021, and can gradually reduce the atomization range of this atomization manifold 202.

Additionally, in the above embodiment, in each controlled spray zone, there is one row of axial plugs, which is used as a base row; Among the plugs 2024 for each nozzle 2022, the angle of each two adjacent plugs 2024 with respect to the guide rod is θ, that is, starting from the base row, the plugs are arranged in series with the same arc length. The position where the base row plugs cover the nozzles 2022 is considered as the initial position, after turning the guide rod 2023 by θ, the 1st controlled spray section is put into operation. After the guide rod 2023 is rotated by 2θ, the 1st and 2nd controlled atomization sections are put into operation. Then, each time the guide rod 2023 rotates by θ, one controlled atomization section is put into operation so that a gradual increase in the atomization width of the atomization manifold 202 is realized, and the reverse operation realizes a gradual decrease in the atomization width of the atomization manifold 202.

In the embodiment shown in Fig. 4, the controlled spray zone includes two controlled spray sections, each controlled spray section is equipped with one nozzle 2022. At the same time, one plug 2024 is installed for the nozzle 2022 in the first controlled spray section, and two plugs 2024 are installed for the nozzle 2022 in the second controlled spray section. , the central angle of the two plugs 2024 relative to the guide rod 2023 is 90°. Figure 5 shows the case when the object being cleaned is the widest assortment. All 2022 injectors are open; In Fig. 6 shows the case where the object to be cleaned is a secondary wide range, the nozzles 2022 of the first controlled spray section are in the open state, and the nozzles 2022 of the second controlled spray section are in the closed state; In Fig. 7 shows the case when the object being cleaned is the narrowest range, all nozzles 2022 of the first and second controlled spray sections are in a closed state. Obviously, when the number of controlled spray sections is increased accordingly, the width range of the object to be cleaned by the spray manifold 202 is correspondingly expanded.

The design of the spray manifold 202 is described at length, as shown in Fig. 4, the guide rod drive mechanism includes a drive block coupled to the guide rod 2023, two male and female quick connectors that can be matched with each other, and a positioning pin for fixing and assembling the two quick connectors. One quick connector is attached to the guide rod 2023, and the other quick connector is attached to one end of the manifold body 2021. The design of the male and female quick connectors is an existing technique and can be purchased in the market, the specific design will not be repeated here. The quick-release connectors with internal and external threads are equipped with a positioning hole, respectively, for example, the quick-release connector with internal threads has several positioning holes installed, and the quick-release connector with external threads has a locking hole. As the female quick-disconnect connector rotates relative to the male quick-disconnect, the locking hole and the positioning hole on the female quick-disconnect change position and face each other. After the guide rod 2023 is rotated to a predetermined position, the guide rod 2023 can be limited by inserting the positioning pin into the stop hole and the corresponding position hole, that is, the position restriction of the plugs 2024 is realized. It is understood that in the above structure, where the center angle of every two adjacent plugs 2024 relative to the guide rod 2023 is θ, the corresponding central angle between each two adjacent positioning holes is β, then θ may be equal to β or a multiple of β. The above guide rod driving unit may be a handle or an automatic driving device, which will not be specifically listed here.

Of course, the guide rod driving mechanism is not limited to the above structure, and all self-locking rotary motion driving mechanisms can be applied to this embodiment, for example, a motor + gearbox combination structure can be used as a drive.

To further optimize the above embodiment, as shown in Fig. 4, a plug 2025 is provided at one end of the manifold body 2021. The plug 2025 may be a threaded plug 2025 suitable for a threaded connection with the manifold body 2021, and is used to close the end of the manifold body 2021. In this embodiment, a restriction hole is provided on the plug 2025, this, for example, may be an opening directly on the plug 2025, or may be a restriction tube mounted on the plug 2025. A guide rod 2023 is inserted into the restriction hole. The diameter of the restriction hole is the same or approximately the same as that of the guide rod 2023, so that it can restrict the guide rod 2023 in the axial and radial directions. As the screw plug 2023 is continuously tightened, the pressure exerted by the restriction hole on the guide rod 2023 also increases, and this pressure is ultimately transferred to the plugs 2024 to firmly press against the inner wall of the manifold body 2021. The above structure maximizes the securing effect of the guide rod 2023 without obstructing the rotation of the guide rod 2023, it can reduce the deformation of the guide rod 2023 during use and achieve the effect of closing the injectors 2022 with the plugs 2024.

Embodiment #4

The present embodiment provides an energy-saving cleaning device 2, which can be used in Embodiment No. 2 as the strip cleaning device 2.

The energy-saving cleaning device 2 includes a cleaning container 201 in which a strip movement passage is formed, and accordingly, at least one cleaning manifold is provided above and below the strip movement passage, and a part of the cleaning manifold uses a spray manifold 202 provided in embodiment #3.

The above-mentioned cleaning container 201 may be a cleaning bath, a cleaning tank, a cooling bath, a cooling tank, etc.

Generally, a plurality of cleaning manifolds are provided above and below the strip running passage along the strip moving direction, and the above-mentioned spray manifold 202 is preferably used as the cleaning manifold.

The above description is given only to represent the preferred embodiments of the present invention, and is not intended to limit the present invention. It should be understood that any modifications, equivalent replacements or improvements, etc. made based on the description within the spirit and principle of the present invention shall fall within the scope of protection of the present invention.

Claims (9)

1. A device for turbulent etching of a metal strip, containing an etching bath, characterized in that free rollers are located in the etching bath, which are installed with the ability to rotate around their axis due to friction of the moving metal strip and rotational contact with its surface to break the boundary layer of the acid solution on the surface of the metal strip, while the axes of the free rollers are perpendicular to the direction of movement of the metal strip and the free rollers are made of acid-resistant wear-resistant self-lubricating material. 2. The device according to claim 1, characterized in that the free rollers include several free pressure rollers, which are located sequentially above the passage of the strip along the direction of the strip. 3. The device according to claim 2, characterized in that the free pressure roller consists of a rod attached to the pickling bath and a rotating barrel placed on the roller rod. 4. The device according to claim 3, characterized in that the internal diameter of the rotating barrel is larger than the diameter of the pressure roller rod. 5. The device according to claim 1, characterized in that the free rollers include several free support rollers, which are located sequentially under the passage of the strip along the direction of the strip. 6. The device according to claim 5, characterized in that there is a gap between the bottom of the free support roller and the bottom of the pickling bath. 7. Device according to any one of paragraphs. 1-6, characterized in that a plurality of side nozzles for spraying the acid solution are installed on the side wall of the etching bath. 8. The device according to claim 7, characterized in that the side nozzles and the strip movement passage are located on the same horizontal plane, while the spray of the side nozzles is directed towards the strip movement passage. 9. A metal strip processing system having an etching position and a cleaning position, in which a strip cleaning device is installed at the cleaning position, characterized in that a turbulent etching device according to any one of claims is located at the etching position. 1-8.