RU2362838C2 - Device for nano-cluster plating - Google Patents

Abstract

FIELD: nanotechnology.

SUBSTANCE: invention relates to micro- and nanotechnologies. Magnetron, outfitted by hollow tubular cathode-target (1), affixed by means of electromagnetic directional device (EDD) to working chamber (2), in which it is mounted holder (3) of treated product. Magnetron is outfitted by additional cooling cathode-target (5), dispersion plane of which is perpendicular to side surface of tubular cathode-target (1). EDD consists of co-axial located coil (6) of electromagnet, magnetic conductor, including implemented of ferromagnetic material electrically isolated from each other hollow cylinder (7), round plate (8) and annular bush (9), installed directly before entrance into working chamber (2), and aluminium bush (10), opening of which is implemented as diminished in direction of plasma transportation. Tubular cathode-target (1) is located inside the cylinder (7), plate (8) and additional cathode-target (5) are installed sequentially in direction of plasma transportation from the side of butt of tubular cathode-target. Coil (6) is located between side walls of cylinder (7) and tubular cathode-target (1), and bush (10) is connected to insert (9) of magnetic conductor.

EFFECT: nomenclature expansion of plated nano-cluster platings ensured by deregulation in point of amount and properties of components of covering materials and padding.

4 cl, 3 dwg

Description

The invention relates to micro and nanotechnology and relates to a magnetron sputtering system. An advantageous area of its use is the deposition of nanocluster coatings on the surfaces of various materials, in particular for the application of radar absorbing coatings.

A device for applying a nanocomposite coating containing a plasmatron and magnetron attached to a vacuum chamber with the possibility of forming and feeding a stream of silicon-containing plasma by a plasmatron and a stream of alloying metal particles by a magnetron onto a substrate located on a holder isolated from the flow of alloying metal particles, and a partial vapor pressure regulator silicon-containing liquid hydrocarbon (RU 2297471, С23С 14/06, 14/35, 2007).

However, this device is complex in terms of design and operation. In addition, the scope of its use is limited to coating, which includes a metal whose carbide has high conductivity.

A device for applying a nanocluster coating is also known, which includes a vacuum and a working chamber communicating by means of a diaphragm with an adjustable nozzle, while a magnetron is installed in the vacuum chamber with the ability to move towards the diaphragm, and a holder for the substrate being processed is placed in the working chamber (P. Kashtanov V., Smirnov BM, Hippler R. Magnetron plasma and nanotechnology. - "Advances in Physical Sciences", 2007, vol. 177, No. 5, pp. 473-510).

However, this device allows you to get only clusters of non-magnetic metals and therefore does not allow to spray multicomponent, as well as magnetic coatings.

Closest to the claimed is a device for applying a nanocluster coating containing an ion-plasma generator equipped with a hollow tubular carbon cathode-target, connected using an electromagnetic guide device to the working chamber, in which the holder of the workpiece is mounted (JP 2003096555, С01В 31/02; C23C 14/06; C23C 14/35; C01B 31/00, 2003).

The disadvantage of the prototype device is a narrow scope, since it can only be used to produce carbon nanoclusters. In addition, it is not suitable for applying multicomponent coatings.

The technical task of the proposed device is to expand the scope of its use.

The solution to this technical problem lies in the fact that the design of the device for applying a nanocluster coating containing an ion-plasma generator equipped with a hollow tubular target cathode, connected using an electromagnetic guide device to the working chamber in which the holder of the workpiece is mounted, makes the following changes .

1. The ion-plasma generator is equipped with an additional cooled target cathode, the sputtering plane of which is perpendicular to the side surface of the tubular target cathode. In this case, it is advisable to use a magnetron as an ion-plasma generator.

2. The electromagnetic guide device consists of:

2.1. coaxially arranged electromagnet coils;

2.2. magnetic circuit, including made of ferromagnetic material electrically isolated from each other:

- hollow cylinder;

- a round plate;

- an annular liner installed directly in front of the entrance to the working chamber;

2.3. bushings of non-magnetic material, the hole of which is made tapering in the direction of transportation of the plasma.

3. The tubular target cathode is located inside the hollow cylinder of the magnetic circuit.

4. A round plate of the magnetic circuit and an additional target cathode are installed sequentially in the direction of plasma transport from the end face of the tubular target cathode.

5. An electromagnet coil is placed between the side walls of the cylinder of the magnetic circuit and the tubular target cathode.

6. A sleeve of non-magnetic material of an electromagnetic guide device is connected to the liner of the magnetic circuit.

The causal relationship of the changes made with the achieved technical result is as follows. The two-electrode design of the magnetron allows you to set the required ratio of the components of the stream of sprayed substance. The proposed magnetic circuit system forms such a magnetic field configuration that allows you to simultaneously spray the material of both target cathodes, including in the case of manufacturing an additional target cathode from magnetic material. In addition, the formed magnetic circuit system, as well as the tapering surface of the sleeve bore, provide additional focusing of the flow of moving particles.

To control the ratio of the coating components, the cylindrical and flat target cathodes are expediently connected to separate electric power circuits.

The end surface of the annular magnetic core liner adjacent to the sleeve may be convex to improve the focusing effect on the transported plasma stream.

In the integrated embodiment, the working chamber is located inside the electromagnet (for the possibility of additional focusing of the plasma flow), and in the remote version it additionally contains an external working chamber, docked to the output of the latter.

Figure 1 shows the design of the optimal version of the device for applying a nanocomposite coating with an internal design of the working chamber; figure 2 is a diagram of the connection of the device to an external working chamber; figure 3 shows the image of the surface of the protective coating, including a carbon matrix interspersed with nanoclusters of cobalt, obtained using an atomic force microscope.

A device for applying a nanocluster coating (Fig. 1) contains a magnetron equipped with a hollow tubular target cathode 1, connected by means of an electromagnetic guide device to the working chamber 2, in which the holder 3 of the workpiece 4 is mounted. The magnetron is equipped with an additional cooled target cathode 5, the spray plane of which is perpendicular to the lateral surface of the tubular target cathode 1. The electromagnetic guide device consists of a coaxially arranged coil 6 of an electromagnet, agnitoprovoda comprising made of a ferromagnetic material are electrically isolated from each other by a hollow cylinder 7, the circular plate 8 and annular liner 9 is mounted directly in front of the working chamber 2, and an aluminum sleeve 10, which opening tapers in the direction of plasma transport. The tubular target cathode 1 is located inside the hollow cylinder 7 of the magnetic circuit, the round plate 8 of the magnetic circuit and the additional target cathode 5 are installed sequentially in the direction of plasma transport from the side of the end of the tubular target cathode 1, an electromagnet coil 6 is placed between the side walls of the cylinder 7 of the magnetic circuit and the tubular cathode targets 1, and the sleeve 10 is attached to the liner 9 of the magnetic circuit.

The working chamber 2 is connected to a vacuum system.

The working gas (gas mixture) from the gas distribution chamber 12 is connected to the target cathodes 1 and 5.

The cooling system of the additional target cathode 5 includes a hollow rod 13, at the end of which elements 5 and 8 are fixed. Inside the rod 13 there is a tube 14 with the possibility of circulating cooling water in the cavity of the rod 13. At the same time, the rod 13 is equipped with a Wilson-type sealing clip (key 15 , 16 and 17) for the possibility of moving the elements 5 and 8 fixed on it along the axis of the cylindrical target cathode 1.

The cylindrical target cathode 1 is connected to the first output of the high-voltage direct current source 18, and the additional target cathode 5 is connected to the second output of the specified current source. Connections are made through the conductive elements of the device. When spraying high-resistance or dielectric materials, an RF generator is installed as a source 18.

In the embodiment of figure 1, the working chamber 2 is located inside the electromagnet 11 for the possibility of focusing the plasma flow, which is advisable to perform in case of additional equipment of the device with an external working chamber 12 (figure 2).

To ensure manufacturability, ring-shaped covers 19 and 20 (also included in the design of the magnetic circuit and simultaneously serving to hold the coil 6 of the electromagnet) are welded from the inside to the bases of the hollow cylinder 7 of the magnetic circuit, between the ends of which a stainless steel pipe 21 is installed, closing the vacuum volume of the magnetron's working space.

The device operates as follows. When a high voltage is applied to the target cathodes 1 and 5, a magnetron discharge occurs, under the influence of which inside the space bounded by the inner surface of the hollow cylindrical target cathode 1 (pos. 22), the target material is sprayed in vacuum. The partial ratio of the sprayed materials is regulated by the ratio of currents in the cathode circuits. In this design, a supersaturation of the plasma-vapor stream in region 22 is achieved, which causes the formation of clusters. Under the influence of the magnetic field created by elements 6, 7, 9 and 20, and the lateral surface of the non-magnetic sleeve 10, the flow of clusters is focused and transported to the working chamber 2 through the hole of the sleeve 10 and the highway 23 connecting the space 22 with the working chamber 2. the tapering bore of the sleeve 10 provides a laminar flow movement. In the working chamber 2, a cluster-containing stream is deposited on the surface of the workpiece 4.

The device has been tested for the technical implementation of the process of applying a protective coating containing cobalt and carbon nanoclusters on substrates of glass, silicon, polycor, sitall and lavsan. As can be seen from figure 3, the tested device allows you to apply a protective coating, including nanoclusters of cobalt (pos. 23) and carbon (pos. 24) up to 80 nm in size.

Thus, in comparison with the prototype, the use of the proposed device expands the range of applied nanocluster coatings. However, there are no restrictions on the number and properties of the components of the coating material and the substrate.

Claims (4)

1. A device for applying a nanocluster coating containing an ion-plasma generator equipped with a tubular target cathode, connected via an electromagnetic guide device to the working chamber, in which the holder of the workpiece is mounted, characterized in that a magnetron equipped with an ion-plasma generator additional cooled target cathode, the sputtering plane of which is perpendicular to the lateral surface of the tubular target cathode, and the electromagnetic The leveling device consists of a coaxially arranged electromagnet coil, a sleeve of non-magnetic material, the hole of which is made narrowing in the direction of plasma transport, and a magnetic circuit including a hollow cylinder made of ferromagnetic material, a circular plate and an annular insert installed directly in front of the entrance to the working chamber, and the tubular target cathode is located inside the hollow cylinder of the magnetic circuit, the round plate of the magnet the wire and the additional target cathode are installed sequentially in the direction of plasma transport from the end face of the tubular target cathode, an electromagnet coil is placed between the side walls of the cylinder of the magnetic circuit and the tubular target cathode, and the sleeve is connected to the magnetic core liner. 2. The device according to claim 1, characterized in that the tubular and additional cooled target cathodes are connected to separate electrical power circuits to control the ratio of the coating components. 3. The device according to claim 1, characterized in that the end surface of the annular liner of the magnetic circuit adjacent to the sleeve of a non-magnetic material is convex for focusing the effect on the transported plasma stream. 4. The device according to any one of claims 1 to 3, characterized in that the working chamber is located inside the electromagnet.

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