RU2016145911A3 - - Google Patents

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Publication number
RU2016145911A3
RU2016145911A3 RU2016145911A RU2016145911A RU2016145911A3 RU 2016145911 A3 RU2016145911 A3 RU 2016145911A3 RU 2016145911 A RU2016145911 A RU 2016145911A RU 2016145911 A RU2016145911 A RU 2016145911A RU 2016145911 A3 RU2016145911 A3 RU 2016145911A3
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RU
Russia
Application number
RU2016145911A
Other versions
RU2016145911A (ru
RU2682447C2 (ru
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=50624442&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=RU2016145911(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed filed Critical
Publication of RU2016145911A publication Critical patent/RU2016145911A/ru
Publication of RU2016145911A3 publication Critical patent/RU2016145911A3/ru
Application granted granted Critical
Publication of RU2682447C2 publication Critical patent/RU2682447C2/ru

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Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G05B13/041—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators in which a variable is automatically adjusted to optimise the performance
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G3/00—Apparatus for cleaning or pickling metallic material
    • C23G3/02—Apparatus for cleaning or pickling metallic material for cleaning wires, strips, filaments continuously
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B17/00—Systems involving the use of models or simulators of said systems
    • G05B17/02—Systems involving the use of models or simulators of said systems electric

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • General Physics & Mathematics (AREA)
  • Artificial Intelligence (AREA)
  • Evolutionary Computation (AREA)
  • Software Systems (AREA)
  • Medical Informatics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Drying Of Semiconductors (AREA)
RU2016145911A 2014-04-24 2015-03-25 Основанная на моделировании травильной линии оптимизация последовательности подвергаемых травлению полос RU2682447C2 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP14165815.3 2014-04-24
EP14165815.3A EP2937747A1 (de) 2014-04-24 2014-04-24 Auf Modellierung einer Beizlinie beruhende Optimierung einer Sequenz von zu beizenden Bändern
PCT/EP2015/056344 WO2015161975A2 (de) 2014-04-24 2015-03-25 Auf modellierung einer beizlinie beruhende optimierung einer sequenz von zu beizenden bändern

Publications (3)

Publication Number Publication Date
RU2016145911A RU2016145911A (ru) 2018-05-24
RU2016145911A3 true RU2016145911A3 (ru) 2018-08-31
RU2682447C2 RU2682447C2 (ru) 2019-03-19

Family

ID=50624442

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2016145911A RU2682447C2 (ru) 2014-04-24 2015-03-25 Основанная на моделировании травильной линии оптимизация последовательности подвергаемых травлению полос

Country Status (5)

Country Link
US (1) US11053596B2 (ru)
EP (2) EP2937747A1 (ru)
CN (1) CN106462120B (ru)
RU (1) RU2682447C2 (ru)
WO (1) WO2015161975A2 (ru)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2937747A1 (de) * 2014-04-24 2015-10-28 Siemens Aktiengesellschaft Auf Modellierung einer Beizlinie beruhende Optimierung einer Sequenz von zu beizenden Bändern
CN105785963B (zh) * 2016-05-18 2018-08-10 中南大学 一种基于人工蜂群算法的炼钢连铸调度方法
CN106054616B (zh) * 2016-07-27 2018-12-14 昆明理工大学 模糊逻辑优化pid控制器参数的钛带卷连续酸洗活套高度控制方法
CN110520805B (zh) * 2017-04-18 2022-12-06 首要金属科技德国有限责任公司 过程模型的建模优化

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6410351B1 (en) * 2000-07-13 2002-06-25 Advanced Micro Devices, Inc. Method and apparatus for modeling thickness profiles and controlling subsequent etch process
US6749693B2 (en) * 2001-09-13 2004-06-15 Ak Properties Method of producing (110)[001] grain oriented electrical steel using strip casting
ITRM20010747A1 (it) * 2001-12-19 2003-06-19 Ct Sviluppo Materiali Spa Procedimento a ridotto impatto ambientale e relativo impianto per descagliare, decapare e finire/passivare, in modo continuo, integrato e fl
US7416634B2 (en) 2002-03-25 2008-08-26 Matvice Ehf Method and apparatus for processing nanoscopic structures
DE10306273A1 (de) 2003-02-14 2004-09-02 Siemens Ag Mathematisches Modell für eine hüttentechnische Anlage und Optimierungsverfahren für den Betrieb einer hüttentechnischen Anlage unter Verwendung eines derartigen Modells
US7127358B2 (en) * 2004-03-30 2006-10-24 Tokyo Electron Limited Method and system for run-to-run control
US7242998B2 (en) * 2005-03-07 2007-07-10 Taiwan Semiconductor Manufacturing Co., Ltd. Etching operation management systems and methods
US20070122920A1 (en) 2005-11-29 2007-05-31 Bornstein William B Method for improved control of critical dimensions of etched structures on semiconductor wafers
FR2925530B1 (fr) * 2007-12-21 2010-08-27 Siemens Vai Metals Tech Sas Installation et procede pour le decapage en continu de bandes d'acier
US8019458B2 (en) * 2008-08-06 2011-09-13 Tokyo Electron Limited Creating multi-layer/multi-input/multi-output (MLMIMO) models for metal-gate structures
WO2011085172A2 (en) * 2010-01-11 2011-07-14 Kolene Corporation Metal surface scale conditioning
EP2927772B1 (en) * 2012-11-30 2017-10-18 Baoshan Iron & Steel Co., Ltd. Method and apparatus for controlling acid concentration for pickling in cold rolling
US20160045841A1 (en) * 2013-03-15 2016-02-18 Transtar Group, Ltd. New and improved system for processing various chemicals and materials
EP2937747A1 (de) * 2014-04-24 2015-10-28 Siemens Aktiengesellschaft Auf Modellierung einer Beizlinie beruhende Optimierung einer Sequenz von zu beizenden Bändern
CN105483310B (zh) * 2015-11-23 2017-05-10 东北大学 一种面向全流程生产的炼钢组批与排产方法

Also Published As

Publication number Publication date
CN106462120A (zh) 2017-02-22
EP3134775B1 (de) 2018-05-09
US20170044676A1 (en) 2017-02-16
WO2015161975A3 (de) 2016-03-17
CN106462120B (zh) 2019-11-19
US11053596B2 (en) 2021-07-06
EP3134775A2 (de) 2017-03-01
RU2016145911A (ru) 2018-05-24
WO2015161975A2 (de) 2015-10-29
EP2937747A1 (de) 2015-10-28
RU2682447C2 (ru) 2019-03-19

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