RU2001114694A - COMPOSITION FOR CHEMICAL DEPOSITION OF COBALT - Google Patents
COMPOSITION FOR CHEMICAL DEPOSITION OF COBALTInfo
- Publication number
- RU2001114694A RU2001114694A RU2001114694/02A RU2001114694A RU2001114694A RU 2001114694 A RU2001114694 A RU 2001114694A RU 2001114694/02 A RU2001114694/02 A RU 2001114694/02A RU 2001114694 A RU2001114694 A RU 2001114694A RU 2001114694 A RU2001114694 A RU 2001114694A
- Authority
- RU
- Russia
- Prior art keywords
- cobalt
- composition
- chemical deposition
- hydrazine hydrate
- thiourea
- Prior art date
Links
- 238000005234 chemical deposition Methods 0.000 title claims 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt Chemical group [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 title claims 2
- 229910052803 cobalt Inorganic materials 0.000 title claims 2
- 239000010941 cobalt Substances 0.000 title claims 2
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine hydrate Chemical compound O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 claims 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N Thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims 2
- 235000011114 ammonium hydroxide Nutrition 0.000 claims 2
- XCGBFXNVKPHVEQ-UHFFFAOYSA-N cobalt;2,3-dihydroxybutanedioic acid;ethane-1,2-diamine Chemical compound [Co].NCCN.NCCN.NCCN.OC(=O)C(O)C(O)C(O)=O XCGBFXNVKPHVEQ-UHFFFAOYSA-N 0.000 claims 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
Claims (1)
Соль кобальта - 1,8-4,7 (в пересчете на металл)
Гидразин гидрат - 3-40
Тиомочевина - 0,2-2,0
Аммиак водный - ОстальноеComposition for the chemical deposition of cobalt, including cobalt salt and hydrazine hydrate, characterized in that it additionally contains thiourea and aqueous ammonia solution in the following ratio of components, g / l:
Cobalt salt - 1.8-4.7 (in terms of metal)
Hydrazine Hydrate - 3-40
Thiourea - 0.2-2.0
Ammonia water - The rest
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU2001114694A RU2198242C1 (en) | 2001-05-31 | 2001-05-31 | Composition for cobalt chemical deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU2001114694A RU2198242C1 (en) | 2001-05-31 | 2001-05-31 | Composition for cobalt chemical deposition |
Publications (2)
Publication Number | Publication Date |
---|---|
RU2198242C1 RU2198242C1 (en) | 2003-02-10 |
RU2001114694A true RU2001114694A (en) | 2003-02-10 |
Family
ID=20250177
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
RU2001114694A RU2198242C1 (en) | 2001-05-31 | 2001-05-31 | Composition for cobalt chemical deposition |
Country Status (1)
Country | Link |
---|---|
RU (1) | RU2198242C1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD4087C1 (en) * | 2010-02-10 | 2011-08-31 | Государственный Университет Молд0 | Process for chemical-catalytic deposition of metal coatings |
-
2001
- 2001-05-31 RU RU2001114694A patent/RU2198242C1/en not_active IP Right Cessation
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새해 et al. | cöyright (c) 2003 NuriMedia Co., Ltd. |